Grafted self-assembled monolayers derived from naturally occurring phenolic lipids

Self-assembled monolayers grafted onto silicon surfaces were obtained from the hydrosilylation products by trialcoxysilanes of naturally occurring phenolic lipid allyl ethers. The as-obtained materials were characterized by various physical and physicochemical methods. Thus, contact angles of water drops showed that they possess very high hydrophobicity. Their excellent regularity was corroborated by AFM microscopy. The frequencies of the stretching CH2 infrared modes indicate the presence of alkyl chains mainly in the trans/trans conformation. Additionally, optical ellipsometry and quartz microbalance measurements enabled us to estimate the thickness of the films. The results, as a whole, are in good agreement with the formation of densely packed monolayers.     

Effect of Metal Ions on the Formation and Properties of Monolayers and Nanosized Langmuir-Blodgett Films Based on Diphilic Aminomethylated Calix[4]resorcinarenes

The behavior of the monolayers of three diphilic aminomethylated calix[4]resorcinarene (CRA) derivatives on the surface of a pure aqueous subphase and subphase containing copper(II), nickel(II), europium(III), terbium(III), and lanthanum(III) ions was investigated. The monolayer transfer to the quartz and single-crystal silicon substrates was accomplished by the Langmuir-Blodgett (LB) technique. The films were studied by ellipsometry and mass-spectrometry. Metal ions were found to exert effect on the limit area per one CRA molecule in the monolayer, on the surface collapse pressure and transfer coefficient of monolayer, and on the thickness and refractive index of the CRA-based LB films.     

Multilayer Film Fabrication and Photoelectric Conversion Property of Two Pyrrolidinofullerene Carboxylic Acid Derivatives

Fullerene has many special properties', and our group had successfully introducedfullerene into the photoelectric conversion field by Langmuir-Blodgett technology'. Theonly work of fullerene multilayer films that we have seen was done by J. S. Bae'. In thispaper we tried to introduce fullerene carboxylic acid derivatives into multilayer withoutorganosilicon derivatives and st-IJdied their photoelectric conversion properties. A newway of fabricating fullerene multilayer film was reported her…     

Determination of volatile organic compounds using piezosensors modified with the Langmuir-Blodgett films of calix[4]resorcinarene

A sensor based on a piezoelectric quartz resonator modified with the Langmuir-Blodgett (LB) films of calix[4]resorcinarene is proposed for the detection of volatile organic compounds. Parameters for the formation of ordered LB films based on calix[4]resorcinarene were optimized, and the effects of the pH and metal ion content of the subphase on the behavior of the Langmuir monolayers of calix[4]resorcinarene were studied. The effects of the number of monolayers in a sensor coating, the pH of the subphase from which the monolayers were transferred, and the presence of copper ions in the subphase on the response of the resulting piezoelectric quartz sensors to the vapors of various volatile organic compounds (ethanol, benzene, toluene, ethylbenzene, ethyl acetate, acetone, hexane, and cumene) were studied. It was found that the proposed sensor was characterized by a short response time and reproducible measurements.     

一种含苯并菲侧基的“毛-棒”状梯形聚倍半硅氧烷LB膜研究(英文)

一种新的含烷基取代的苯并菲侧基的"毛-棒"状(hairy-rod)梯形聚倍半硅氧烷(LPSQ)可以在空气-水界面形成稳定的单分子层,研究了温度、铺展溶剂和浓度对π-A等温曲线的影响.在适当的表面压下,以甲苯为铺展溶剂该单分子层可以被成功地转移至疏水的硅片或石英片上形成均一稳定的Y-型LB膜,其紫外吸收强度在几个月内均保持不变,说明该LB膜具有良好的稳定性,AFM图像表明其形成了均一致密的膜.通过偏振紫外光谱和荧光光谱研究了其面内各向异性,发现LPSQ的分子链采取了平行于拉膜方向的优先取向,最优取向因子S为0.42.     

Nanoscale patterning of alkyl monolayers on silicon using the atomic force microscope

Self-assembled monolayers (SAMs) of 1-alkenes on hydrogen-passivated silicon substrates were successfully patterned on the nanometer scale using an atomic force microscope (AFM) probe tip. Nanoshaving experiments on alkyl monolayers formed on H-Si(111) not only demonstrate the flexibility of this technique but also show that patterning with an AFM probe is a viable method for creating well-defined, nanoscale features in a monolayer matrix in a reproducible and controlled manner. Features of varying depths (2-15 nm) were created in the alkyl monolayers by controlling the applied load and the number of etching scans made at high applied loads. The patterning on these SAM films is compared with the patterning of alkyl siloxane monolayers on silicon and mica.     

Substrate-induced modulation of the Raman scattering signals from self-assembled organic nanometric films

Raman scattering signals recorded by microscopy from organic self-assembled monolayers (thin nanometric films of calibrated thickness) on silica substrates were found to be much stronger than those obtained from identical films assembled on bulk silicon substrates. This effect, observed in the backscattering geometry, is shown to result from interferences between the direct and reflected beams (including both the excitation and scattered radiation) in front of a smooth reflecting surface. Strong dependence of the effect on the distance between the sampled monolayer and the bulk silicon substrate allows enhancement of the Raman signals of organic monolayer films on silicon by factors up to approximately 70 by using appropriate silica spacers. The dependence of the Raman signal intensity on film thickness was also studied for thicker nanometric films comprising a series of self-assembled organosilane multilayers on bulk silicon and fused silica substrates, and the predicted deviation from linearity in the case of the silicon substrate is experimentally confirmed.     

A new patterning method using photocatalytic lithography and selective atomic layer deposition

We report a new patterning method using photocatalytic lithography of alkylsiloxane self-assembled monolayers and selective atomic layer deposition of thin films. The photocatalytic lithography is based on the fact that the decomposition rate of the alkylsiloxane monolayers in contact with TiO2 is much faster than that with SiO2 under UV irradiation in air. The photocatalytic lithography, using a quartz plate coated with patterned TiO2 thin films, was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. A ZrO2 thin film was selectively deposited onto the monolayer-patterned Si substrate by atomic layer deposition.     

Asymmetric Arrangement of Monolayer in the Multilayer Films of 2-Hydroxy-4,4＇-dihexyloxy-azobenzene

Multilayer films of 2-hydroxy-4,4‘‘-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy, temperature-dependent FTIR, and X-Ray diffraction technique. The results show that the multilayer films are formed by stacking of HAB monolayers via π-π interactions and the adjacent two monolayers in the film are arranged in an asymmetric way in the multilayer films.     

Monolayer-derivative functionalization of non-oxidized silicon surfaces

This article describes a variety of monolayers anchored directly onto silicon surfaces without an oxide interlayer, their formation mechanisms, their technological applications, and our personal views on the future prospects for this field. The chemical modification of non-oxidized silicon surfaces utilizing monolayers was first reported in 1993. The basic finding that a non-oxidized silicon surface could be neutralized with alkyl chains through direct covalent linkage, i.e., silicon-carbon, has offered chemical scientists ease of handling even in an ambient environment and, thus, research has been predictably focused on forming anti-stiction coating films for nano- and micro-electromechanical systems (NEMS/MEMS). Such surface reforming has also been achieved by using other monolayers, which form interfacial bonds, e.g., silicon-nitrogen and silicon-oxygen. The resultant monolayer surfaces are useful for silicon-based applications including molecular electron transfer films, monolayer templates, molecular insulators, capsulators, and bioderivatives. Such monolayers are applicable not only for surface modification, but also for manipulating individual nanomaterials. By modifying the terminal groups of monolayers with nanomaterials including nanocrystals and biomolecules, the nanomaterials can remarkably be immobilized directly onto non-oxidized silicon surfaces based on the formation mechanisms of the monolayer. Such immobilizations will revolutionize the analysis of the specific features and capabilities of individual nanomaterials. Furthermore, the path will be opened for the development of more advanced monolayer-derived chip technology. To achieve this goal, it is extremely important to thoroughly understand the functionalization processes on silicon, since the resultant internal structures and properties of monolayer-derivative silicon may strongly depend on their course of formation.     

不含亲水基团的偶氮苯衍生物L-B膜的制备和性质研究

本文合成了具有一定结构特点的偶氮苯的衍生物, 以元素分析和^1HNMR鉴定了B产物的组成和结构。采用L-B技术制备了其多层L-B膜, 以紫外可见光谱研究了膜中分子的聚集状态和膜的纵向均匀性; 以偏振紫外确定了膜中分子偶氮基的取向; L-B膜的小角度X射线衍射结果表明膜具有层状有序的周期性结构。     

Perfecting imperfect "monolayers": removal of siloxane multilayers by CO2 snow treatment

Self-assembled monolayers (SAMs) of N-(3-triethoxysilylpropyl)-4-hydroxybutyramide were prepared on silicon oxide on silicon (Si/SiO(2)). Initial silane adsorption and high-temperature annealing led to a stable base monolayer with many large over-lying islands of disordered multilayers as a result of the non-self-limited growth process. The disordered multilayers were hydrolyzed and subsequently removed by CO(2) snow treatment. The resulting films were one monolayer thick as measured by ellipsometry. Atomic force microscopy, attenuated total reflection Fourier transform infrared spectroscopy, and contact angle analysis showed that the films were composed of monolayers with full and uniform surface coverage rather than nonuniform coverage by islands or patches of multilayers. Monolayers of octadecyltrichlorosilane were also prepared by multilayer removal via CO(2) treatment, showing the general applicability of the technique toward siloxane SAMs. We believe that CO(2) is an excellent solvent for weakly bound and hydrolyzed molecules that compose multilayers, and this ability to prepare near-perfect monolayer films from imperfect ones allows for less stringent formation conditions.     

不同基底对TiO2和SiO2薄膜的光学性能的影响

采用溶胶-凝胶法分别在K9玻璃、单晶硅和石英玻璃基底上制备了纳米TiO₂和SiO₂薄膜。利用SEM、UV-Vis及反射式椭圆偏振光谱仪对薄膜的微观结构及光学特性进行了表征和分析。结果表明:3种基底中, 单晶硅基底上TiO₂和SiO₂薄膜折射率最大;在非晶态K9玻璃和石英玻璃基底上TiO₂薄膜折射率和透光率差异较大;SiO₂薄膜在非晶态基底上折射率、透光率相近;3种基底上薄膜的折射率和消光系数都有随波长增大而减小的趋势, 同时Cauchy模型能较好的描述单晶硅基底上两种薄膜在400~800 nm波段的光学性能。     

不同基底对TiO2和SiO2薄膜的光学性能的影响

采用溶胶-凝胶法分别在K9玻璃、单晶硅和石英玻璃基底上制备了纳米TiO₂和SiO₂薄膜。利用SEM、UV-Vis及反射式椭圆偏振光谱仪对薄膜的微观结构及光学特性进行了表征和分析。结果表明：3种基底中, 单晶硅基底上TiO₂和SiO₂薄膜折射率最大;在非晶态K9玻璃和石英玻璃基底上TiO₂薄膜折射率和透光率差异较大;SiO₂薄膜在非晶态基底上折射率、透光率相近;3种基底上薄膜的折射率和消光系数都有随波长增大而减小的趋势, 同时Cauchy模型能较好的描述单晶硅基底上两种薄膜在400~800 nm波段的光学性能。     

One step growth of protein antifouling surfaces: monolayers of poly(ethylene oxide) (PEO) derivatives on oxidized and hydrogen-passivated silicon surfaces

We compare two routes for creating protein adsorption-resistant self-assembled monolayers (SAMs) by chemical modification of silicon surfaces with poly(ethylene oxide) (PEO) oligomeric derivatives. The first route involves the assembly of 2-methyl[(polyethyleneoxy)propyl]trichlorosilane (Cl3SiMPEO) films onto oxidized silicon surfaces (OH-SiO(x)) either by a liquid-phase process at room temperature or by a gas-phase process at 423 K, producing Si-O-Si bonds between the substrate and the organic layer. The second pathway makes use of the assembly of poly(ethylene glycol methyl ether) (MPEG) films onto hydrogen-passivated silicon surfaces (H-Si) using a liquid-phase process at 353 or 423 K, leading to the formation of Si-O-C bonds between the substrate and the organic layer. Structural investigation by X-ray reflectometry (XRR) reveals that the thickness and surface densities of the grafted PEO monolayers strongly depend on experimental conditions such as temperature and grafting time. Atomic force microscopy (AFM) shows that very smooth and homogeneous monolayers can be obtained with average roughnesses close to those measured on the corresponding bare substrates. Finally, the antifouling properties of the modified silicon surfaces were evaluated by X-ray photoelectron spectroscopy (XPS), using a membrane protein (P.69 antigen) as model protein. Both types of PEO monolayers exhibit excellent protein repellency, as soon as the grafting density is equal to or higher than 1.7 chains/nm2.     

Characterization of a novel water-soluble 3,4,9,10-perylenetetracarboxylic diimide in solution and in self-assembled zirconium phosphonate thin films

The properties of N,N'-bis(2-phosphonoethyl)-3,4,9,10-perylenetetracarboxylic diimide (PPDI), a water-soluble perylene dye, have been studied in solution and in thin films. Absorption spectra showed that PPDI exists in the monomeric form in water/ethanol (1:1) and water/dimethyl sulfoxide (DMSO) (3:7) mixtures, but forms dimers in water and higher aggregates in ethanol. The PPDI monomer is highly fluorescent, in contrast to the dimers and aggregates, which are nonfluorescent. The monomer/dimer equilibrium was conveniently followed in a water/ethanol (7:3) mixture by varying the dye concentration. An equilibrium constant of K = 1.25 x 10(5) M(-1) was estimated for the dimerization process in this solvent mixture. The addition of cetyl trimethylammonium bromide (CTAB), a cationic surfactant, to aqueous solutions of PPDI resulted in the dissociation of the dimers, showing that the dye was incorporated into the micellar phase. Self-assembled thin films of PPDI were grown on both silica gel particles and flat surfaces, using zirconium phosphonate chemistry. The growth of multilayered films on flat surfaces was monitored by ellipsometry (silicon substrates) and UV/Vis spectroscopy (quartz slides), and was linear with the number of deposition cycles. No fluorescence was detected from the PPDI films, and the absorption spectra of the films were quite similar to the spectrum of the compound in ethanol, indicating that the dye molecules were stacked in the films. Mixed monolayers containing PPDI and N,N'-bis(2-phosphonoethyl)-1,4,5,8-naphthalenediimide (PNDI) on quartz were also prepared. Monolayers obtained by codeposition from solutions containing both PPDI and PNDI were richer in PPDI, even when the solution contained a large excess of the naphthalene derivative, showing that pi-stacking of PPDI is an important driving force in the formation of the films.     

Poly(trifluoroethylene) adsorption and heterogeneous photochlorination reactions

Heterogeneous (gas-solid) photochlorination reactions of poly(trifluoroethylene) (PF 3E) films were studied as a function of reaction time and light intensity. The rate of chlorination was found to be faster in high-intensity light when compared to the reaction in ambient light. PF 3E irreversibly adsorbed to oxidized silicon and covalently attached amine monolayers supported on silicon, producing hydrophobic thin films in the thickness range of 8-40 A. Adsorption conditions such as polymer concentration and solvent composition were investigated. Radical grafting of maleic anhydride to the polymer backbone resulted in increased adsorption on oxidized silicon.     

Study of Thin Polymeric Film Deposited by the PECVD Process for use at 193 nm

A plasma enhanced chemical vapor deposition (PECVD) reactor was used to deposit thin polymeric films with high absorption at 193 nm. The reactor is suitable to deposit uniform and pinhole free thin polymeric films with conformality over 95%. Conformal films with thickness as low as 200 Å have been deposited on silicon, glass, and quartz substrates, as well as silicon oxide, silicon nitrate, and aluminum films. Deposited films had variations in thickness of 3 to 5% over an area of 8 inches in diameter. Thin films deposited on silicon substrates under varying levels of RF power were scanned using the AFM technique. The measurements show increasing surface roughness of the scanned samples as the RF power increases.     

Langmuir-Blodgett films of a Mo-blue nanoring [Mo(142)O(429)H(10)(H(2)O)(49)(CH(3)CO(2))(5)(CH(3)CH(2)CO(2))](30)(-) (Mo(142)) by the semiamphiphilic method

Langmuir monolayers and LB films of the ring-shaped mixed-valence polyoxomolybdate [Mo142O429H10(H2O)49(CH3CO2)5(CH3CH2CO2)](30-) (Mo142) dissolved in the aqueous subphase have been successfully fabricated by using the adsorption properties of a DODA monolayer. Infrared and ultraviolet-visible spectroscopy of the LB films indicates that Mo142 and DODA molecules are incorporated within these LB films. X-ray reflectivity experiments indicate that the LB films exhibit a well-defined lamellar structure formed by bilayers of DODA molecules alternating with monolayers of Mo142. Using behenic acid-modified hydrophobic quartz substrate is critical for the formation of the well-defined lamellar structure. From the values of the periodicity obtained by these experiments it is clear that the Mo142 clusters lie flat along the charged organic layers. AFM images also showed the flat and homogeneous films on the quartz substrates treated with behenic acid. Cyclic voltammograms of Mo142-LB films deposited on ITO substrates showed quasi-reversible oxidation/reduction waves with positive shift of the potential compared to the case of solution.     

Tribological durability of silane monolayers on silicon

We report the frictional performance and long-term tribological stability of various alkyl silane monolayer films on silicon by using pin-on-disk tribometry at ambient conditions. We show that the durability of monolayers derived from n-alkyltrichlorosilanes on silicon increases exponentially with the chain length of the silane precursor, which we relate to the cohesive energy of these monolayers through molecular dynamics simulations. X-ray photoelectron spectroscopy (XPS) was used to show that tribological damage consisted of the loss of molecular components that could be partially replaced upon exposure to a solution containing perfluorinated silane precursors. For monolayers derived from n-octadecyltrichlorosilane, a critical load was identified to be approximately 250 mN (200 MPa), above which failure of films occurred within 100 cycles of testing. Monolayers with hydroxyl surfaces exhibited reduced stabilities due to stronger tip-surface interactions. Monolayers with the capability for cross-linking exhibited much greater stabilities than monolayers where cross-linking was limited or prevented. Collectively, these results demonstrate that the mechanical durability of monolayers when subjected to a tribological load is greatly enhanced by maximizing dispersional interactions and cross-linking and minimizing tip-surface interactions.