ZnO肖特基势垒紫外探测器

以p-Si(111)为衬底,用水热法首次制得六棱微管ZnO。并以此为有源区利用平面磁控溅射技术沉积得到Ag叉指状电报,从而制作了Ag／n-ZnO肖特基势垒结紫外探测器。对该紫外光探测器的暗电流和365nm波长光照下的光电流、光响应和量子效率进行了测试。测试结果表明：Ag和ZnO六棱管间已形成肖特基接触．其有效势垒高度为0．35eV。无光照时,暗电流很小,当用λ=365nm的光照射Ag/n-ZnO肖特基结时．在5．9V偏压时,光生电流分别为25．6,57．9μA。Ag／n-ZnO紫外探测器有明显的光响应特性和较高的量子效率,在366nm波长处,光响应度达到最大值0．161A／W,量子效率为54．7％。     

MSM结构ZnO紫外探测器的制备与性质

采用射频磁控溅射在石英衬底上制备了c轴择优取向的ZnO薄膜,利用蚀刻技术制备了MSM结构的光导型紫外探测器。在3V偏压下,器件的暗电流小于250nA,光响应峰值在370nm,响应度是0.34A/W。其紫外(360nm)与可见光(420nm)的抑制比为4个数量级。器件的光响应时间上沿仅为20ns。     

ZnO基紫外探测器研究进展

近年来,直接带隙宽禁带半导体ZnO（3.37 eV）以其优越的光电特性而成为紫外探测领域研究中的新热点.文章介绍了不同类型的ZnO基紫外光敏探测器的结构和性能,并对ZnO基紫外光敏探测器的最新研究进展和应用前景进行探讨和展望.     

ZnO 紫外探测器的研究

利用水热法生长的N型优质ZnO晶体材料蒸镀了Au、Ag、Al金属,制备出金属-半导体-金属型(MSM)ZnO紫外探测器,测试了五种接触类型的ZnO紫外探测器(Au-ZnO-Au、Ag-ZnO-Ag、Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al)在365nm紫外光光照前后的I-V特性曲线。实验表明Au-ZnO-Au 型、Ag-ZnO-Ag型的探测器的光电流是暗电流的100 万倍,因此,Au-ZnO-Au型、Ag-ZnO-Ag型的ZnO紫外探测器性能比Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al型的优越。ZnO材料的电阻率对ZnO紫外探测器的光电流有较大的影响。在相同偏压下,电阻率越大,探测器的光电流越小。ZnO ultraviolet(UV) detectors with Metal-Semiconductor-Metal(MSM) structure were fabricated by the vacuum evaporation of Au, Ag, and Al on the n-type ZnO single crystal, which was grown with hydrothermal synthesis method. Five types of MSM ZnO detectors(Au-ZnO-Au, Ag-ZnO-Ag, Au-ZnO-Al, Ag-ZnO-Al,Al-ZnO-Al) were illuminated with 365 nm UV light respectively, and their corresponding I-V(Current-Voltage) characteristics were measured. The UV photocurrent values for Au-ZnO-Au and Ag-ZnO-Ag detectors were 1x106 times than their dark current values, and these facts imply that the Au-ZnO-Au and Ag-ZnO-Ag detectors were rather good UV detectors compared to Au-ZnO-Al, Ag-ZnO-Al, Al-ZnO-Al detectors. The photocurrent of the MSM ZnO detectors was also sensitive to the cubic resistance of the ZnO crystal. And it’s found that the higher resistance rate the ZnO crystal the smaller photocurrent value the detector under the same working voltage.     

Al/ZnO/Al薄膜的结构与磁性分析

采用直流磁控溅射的方法制备了Al/ZnO/Al纳米薄膜,并对薄膜分别在真空及空气中进行退火处理.利用X射线衍射仪(XRD)和物理性能测量仪(PPMS)分别对薄膜样品的结构和磁性进行了表征.XRD分析表明,不同的退火氛围对薄膜的微结构有着很大的影响.采用了一种新的修正方法对磁测量结果进行修正,计算了基底拟合误差的最大值,并对修正后样品的磁性进行了分析.结果显示,室温铁磁性可能与Al和ZnO基体之间发生的电荷转移以及在不同退火氛围下Al在ZnO晶格中的地位变化有关. 关键词： Al/ZnO/Al薄膜 铁磁性 磁性表征     

一种新型GaN基肖特基结构紫外探测器

提出了一种新型GaN基肖特基结构紫外探测器.该结构在常规的GaN肖特基结构紫外探测器上外加了一层禁带宽度更大的n型AlGaN层，模拟计算结果表明：与常规器件结构相比，该结构能有效地减小表面复合的影响，提高了器件的量子效率.进一步地研究结果还表明：采取较薄、载流子浓度较高的AlGaN层更有利于提高这种新结构器件的量子效率. 关键词： GaN 肖特基结构 紫外探测器 AlGaN     

Au电极厚度对MgZnO紫外探测器性能的影响

利用分子束外延设备(MBE)制备了MgZnO薄膜.X射线衍射谱、紫外-可见透射光谱和X射线能谱表明薄膜具有单一六角相结构,吸收边为340 nm,Zn/Mg组分比为62:38.采用掩膜方法使用离子溅射设备,在MgZnO薄膜上制备了Au电极,并实现了Au-MgZnO-Au结构的紫外探测器.通过改变溅射时间,得到具有不同Au电极厚度的MgZnO紫外探测器.研究结果表明:随着Au电极厚度的增加,导电性先缓慢增加,再迅速增加,最后缓慢增加并趋于饱和;而Au电极的透光率则随厚度的增加呈线性下降.此外,随着Au电极厚度的增加,器件光响应度先逐渐增大,在Au电极厚度为28 nm时达到峰值,之后逐渐减小.     

热处理对ZnO/Au薄膜结构和压电特性的影响

通过射频磁控溅射在氧化硅片表面沉积ZnO/Au薄膜,并通过不同的热处理方式对薄膜进行退火。为了研究退火对ZnO/Au薄膜结构和压电特性的影响,采用X射线衍射分析（XRD）、光学显微镜、场发射扫面电镜（FESEM）和压电力分析仪对薄膜退火前后的材料特性进行了分析。研究发现,热处理能够改善ZnO/Au薄膜的结晶质量。特别是在氮气保护氛围下慢速退火后,薄膜结晶质量有明显改善。但是,热处理导致了薄膜的压电系数d33和d31降低。分析认为,热处理过程中Au原子在ZnO中的易迁移特性破坏了ZnO/Au薄膜的压电性能。     

热处理对ZnO/Au薄膜结构和压电特性的影响

通过射频磁控溅射在氧化硅片表面沉积ZnO/Au薄膜,并通过不同的热处理方式对薄膜进行退火。为了研究退火对ZnO/Au薄膜结构和压电特性的影响,采用X射线衍射分析（XRD）、光学显微镜、场发射扫面电镜（FESEM）和压电力分析仪对薄膜退火前后的材料特性进行了分析。研究发现,热处理能够改善ZnO/Au薄膜的结晶质量。特别是在氮气保护氛围下慢速退火后,薄膜结晶质量有明显改善。但是,热处理导致了薄膜的压电系数d33和d31降低。分析认为,热处理过程中Au原子在ZnO中的易迁移特性破坏了ZnO/Au薄膜的压电性能。     

片上制备横向结构ZnO纳米线阵列紫外探测器件

将纳米技术与传统的微电子工艺相结合, 片上制备了横向结构氧化锌(ZnO)纳米线阵列紫外探测器件, 纳米线由水热法直接自组织横向生长于叉指电极之间, 再除去斜向的多余纳米线, 其余工艺步骤与传统工艺相同. 分别尝试了铬(Cr)和金(Au)两种金属电极的器件结构: 由于Cr电极对其上纵向生长的纳米线有抑制作用, 导致横向生长纳米线长度可到达对侧电极, 光电响应方式为受表面氧离子吸附控制的光电导效应, 光电流大但增益低, 响应速度慢, 经二次电极加固, 纳米线根部与电极金属直接形成肖特基接触, 光电响应方式变为光伏效应, 增益和速度得到了极大改善; 由于Au电极对其上纵向生长的纳米线有催化作用, 导致溶质资源的竞争, 相同时间内横向生长的纳米线不能到达对侧, 而是交叉桥接, 但却形成了紫外光诱导的纳米线间势垒结高度调控机理, 得到的器件特性为最优, 在波长为365 nm的20 mW/cm²紫外光照下, 1 V电压时暗电流为10^-9 A, 光增益可达8×10⁵, 响应时间和恢复时间分别为1.1 s和1.3 s.     

ZnO nanorod-based UV photodetection and the role of persistent photoconductivity

We report on the substantial persistent photoconductivity (PPC) response exhibited by the zinc oxide (ZnO) nanorod-based ultraviolet (UV) photodetection system. An increase in photocurrent and, hence, rise in PPC was observed for larger UV exposure times at regular intervals. Triggered by quantum efficiency, the increment in sustained conduction band electrons is proposed as the main reason behind the increased photocurrent response. In contrast, the trap centers located below the conduction band are expected to slow down the recombination rate, which accounts for the rise in PPC. The lowering of PPC upon annealing suggests the surface dependent nature of the PPC. The growth and decay mechanism of PPC has a direct relevance while assessing figure of merit of prototype nanostructure-based optical sensor and UV photodetectors.     

Au层退火温度对ZnO/Au/ZnO多层膜的结构、光学及电学性质的影响

采用金属有机化学气相沉积(MOCVD)技术在蓝宝石衬底上制备出晶体质量较好的透明导电的ZnO/Au/ZnO(ZAZ)多层膜,其中,Au夹层是通过射频磁控溅射的方法获得。通过对Au夹层进行不同温度的退火处理,研究了Au层退火温度对ZAZ多层膜的结构特性、电学性能和光学特性的影响。利用原子力显微镜(AFM)、扫描电子显微镜(SEM)、X射线衍射(XRD)仪、霍尔效应测试和透射谱分析等测试手段对ZAZ多层膜的性质进行了分析。测试结果表明,在200 ℃下对Au夹层进行快速退火处理,多层膜的结构、电学和光学性质达到最优,表面等离子体效应也更明显。其中,XRD(002)衍射峰的半高宽为0.14°,电阻率为2.7×10^-3 Ω·cm,载流子浓度为1.07×10²⁰ cm^-3,可见光区平均透过率为75.3%。     

N 掺杂ZnO薄膜的接触特性

氧化锌(ZnO)是一种直接带隙半导体材料,室温下带隙为3.37eV,激子束缚能为60meV。ZnO因其优越的光电特性在高亮度蓝紫光发光器件、紫外探测器件和短波长激子型激光器等方面具有广阔的应用前景。而要实现大功率的光电器件,稳定可靠的欧姆接触是必需的。研究了氮气氛条件下,不同温度快速退火对氮掺杂ZnO样品的电学性质以及Ni/Au与其接触特性的影响。原生样品表现为弱的肖特基接触,适当温度退火后,由肖特基转成了欧姆接触,650℃退火后得到最小比接触电阻率8×10-4Ω·cm2。霍尔测量表明550℃快速退火后,样品的导电类型由p型转变成了n型。采用AES和GXRD分别研究了不同退火温度下Au、Ni、Zn、O的深度分布变化及退火后所生成的合金相。实验结果表明,退火所导致的薄膜电学性质的变化以及界面态和表面态的增加是接触特性变化的原因。     

Binary response Se/ZnO p‐n heterojunction UV photodetector with high on/off ratio and fast speed

A high‐performance UV photodetector (PD) based on a p‐Se/n‐ZnO hybrid structure with large area (more than 1×1 cm) is presented in this study. The device is theoretically equivalent to a parallel‐connection circuit for its special structure and shows multifunction at different voltage bias, which means the output signal can be tailored by an applied voltage. The Se/ZnO PD shows binary response (positive and negative current output under on/off periodical light illumination) under small reverse bias (–0.05 V and –0.1 V) which efficiently reduces the negative effect of noise signal in weak‐signal detection applications. At zero bias, with the aid of a p‐n heterojunction, a high on/off ratio of nearly 10⁴ is achieved by this device at zero set bias under 370 nm (∼0.85 mW cm⁻²) illumination and this on/off ratio can be achieved in 0.5 s. The device also shows a fast speed with rise time of 0.69 ms and decay time of 13.5 ms measured by a pulse laser, much faster than that of a pure ZnO film. The Se/ZnO PD in this research provides a new pathway to fabricate multifunctional high‐speed, high signal‐to‐noise ratio, high detectivity and high selectivity UV photodetectors.

     

Nanocomposite ZnO/Au formation by pulsed laser irradiation

The ZnO/Au nanocomposite formation involves synthesis of Au and ZnO colloidal solutions by 532 nm pulse laser ablation of metal targets in deionized water followed by laser irradiation of the mixed colloidal solution. The transmission electron microscope (TEM) and high-resolution transmission electron microscope (HRTEM) images show evolution of spherical particles into ZnO/Au nanonetworks with irradiation time. The formation mechanism of the nanonetwork can be explained on the basis of near resonance absorption of 532 nm irradiation by gold nanoparticles which can cause selective melting and fusion of gold nanoparticles to form network. The ZnO/Au nanocomposites show blue shift in the ZnO exciton absorption and red shift in the Au plasmon resonance absorption due to interfacial charge transfer.     

ZnO/Au纳米复合物的制备及光学性质的研究简

摘要：采用ZnO纳米晶表面还原Au＋的方法合成了ZnO／Au纳米复合物,研究了其光学性质。     

Au cluster growth on ZnO thin films by pulsed laser deposition

Nanostructures formed by Au nanoparticles on ZnO thin film surface are of interest for applications which include medical implants, gas-sensors, and catalytic systems. A frequency tripled Nd:YAG laser (λ = 355 nm, τ_FWHM ∼ 10 ns) was used for the successive irradiation of the Zn and Au targets. The ZnO films were synthesized in 20 Pa oxygen pressure while the subsequent Au coverage was grown in vacuum. The obtained structures surface morphology, crystalline quality, and chemical composition depth profile were investigated by acoustic (dynamic) mode atomic force microscopy, X-ray diffraction, and wavelength dispersive X-ray spectroscopy. The surface is characterized by a granular morphology, with average grain diameters of a few tens of nanometers. The surface roughness decreases with the increase of the number of laser pulses applied for the irradiation of the Au target. The Au coverage reveals a predominant (1 1 1) texture, whereas the underlying ZnO films are c-axis oriented. A linear dependence was established between the thickness of the Au coverage and the number of laser pulses applied for the irradiation of the Au target.     

新型半导体激光器——ZnO紫外激光器

最近人们发现在室温下ZnO薄膜能产生强烈的光受激辐射,这表明此种材料可用于制造紫外光半导体激光器,此种激光器在光信息存在贮上有广泛应用。文章介绍了最近几年来用不同方法制备的ZnO薄膜的光受激辐射的研究进展。