ATR-FTIR Investigation of Hydrogen-terminated Si(111) Surface in Various NH4F-Based Solutions

Wet chemical cleaning of silicon is a critical step in the semiconductor manufacturing. Particles, contaminants, metallic impurities, roughness and native oxide on silicon surface after wet chemical cleaning deteriorate the reliability of transistor performance in integrated circuits^[1]. Wet chemical etching of Si(111) and Si(100) in fluoride and alkaline solutions has been extensively studied in the past few years by using scanning tunneling microscopy (STM) and attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR)^[2-11]. In the present work, we extend our study to Si(111) surface after treating with NH₄F/HCl mixtures. STM, X-ray photo spectroscopy (XPS), and ATR-FTIR are used to determine surface roughness, contamination and bond information on Si(111) surface after wet chemical cleaning with various NH₄F/HCl mixtures. The results are discussed in details by comparison to those treated with RCA and HF solutions, indicating that ultra-clean and flat Si(111) surface is obtained by treatment with NH₄F/HCl mixture.     

Ultra-clean Si(111) and Si(001) Surfaces Prepared by Advanced Wet Chemical Cleaning

Wet chemical cleaning of silicon is a critical step, e.g., pre-gate clean, in the semiconductor manufacturing^[1]. For example, pre-gate oxide cleaning demands ultra-clean silicon surface with least surface roughness. It is well known that metallic infinities and roughness cause the lower breakdown voltage in gate dielectric^[2]. It has stringent requirements for ultra-clean and atomically flat silicon surface as the thickness of gate oxide is decreasing. In the present work, we have extended our study on Si(100) surface13] and extensively investigated wet chemical cleaning of Si(111) and Si(100) surfaces in NH₄F-based solutions by using scanning tunneling microscopy (STM), attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR), X-ray photoelectron spectroscopy (XPS) and total reflection X-ray fluorescence spectrometry (TXRF). Surface roughness, organic contamination, metallic impurities and surface termination on the silicon surfaces after wet chemical cleaning with various NH₄F-based solutions have been determined and compared with those treated with RCA cleans, HF solutions and other industrially used solutions. Our results indicate that ultra-clean and smooth Si(111) and Si(001) surfaces are obtained by treatment with NH4F-based solutions.     

Das perfluortriazinium-kation als oxidationsmittel in der metallorganischen synthese—ein neuer weg zur darstellung von [Cp2MCl2](M = Mo

The oxidation of Cp₂MCl₂ (M= Mo, W) with perfluortriazinium tetrafluoroborate, [(FCN)₃F]⁺[BF₄]⁻, in the presence of a flouride ion acceptor (BF₃ or PF₅) in SO₂ solution yielded the cationic metallocene complexes [Cp₂MCl ₂]²⁺[BF₄]⁻ or [C_p2MCl₂] ²⁺[BF₄]⁻[PF₆]⁻ (M = Mo, W), respectively. In these reactions, for the first time the perfluortriazinium cation has proved to be easy to handle and a useful oxidizer in organometallic chemistry. The oxidizer strength of three fluorotriazinium cations, [(XCN)₃F]⁺ (X = F, Cl, H), has been computed ab initio (HF/6 − 31 + G) and calibrated on literature data which were obtained by local density functional calculations. It was anchored to its F⁺ zero point by an experimental value for KrF⁺. ab]Die Oxidation von Cp²MCl₂ mit (M = MO, W) Perfluortriaziniumtetrafluoroborat, [(FCN)₃F]⁺[BF₄]⁻, in Anwesenheit eines Fluoridionenakzeptors (BF₃ oder PF₅) führte in SO₂-Lösung zur Bildung der kationischen Metallocen-Komplexe [Cp₂MCl₂₊]²⁺[BF₄]₂⁻ bzw. [Cp₂MCl₂]²⁺[BF₄]⁻ [PF₆]⁻ (M = Mo, W). In diesen Reaktionen konnte erstmals gezeigt werden, daß Perfluortriazinium-Kationen einfach zu handhabende und nützliche Oxidationsmittel im Bereich der metallorganischen Synthese darstellen. Das (Mdationsvermögen von drei Fluorotriazinium-Kationen, [(XCN)₃F]⁺(X = F, Cl, H), wurde ab initio berechnet (HF/6 − 31 + G) und mit Hilfe von Literaturdaten, die mittels local density functional-Berechnungen erhalten und am experimentellen Wert von KrF ⁺ bezüglich des F⁺ Nullpunktes verankert wurden, kalibriert.     

Synthesis, F,Te NMR Spectra and crystal structure of NBu4TeF5 and NH4TeF5 (NH4F)0.25 (‘(NH4)2TeF6’)

¹⁹F and ¹²⁵Te NMR in different organic solvents and X-Ray investigations NBu₄TeF₅ (I) and ‘(NH₄)₂TeF₆’ (II) show that TeF₅⁻ anion in (I) both solution and the solid state has a square pyramidal structure. No octahedral arrangement of fluorine was found in (II). This compound consists of NH₄TeF₅ and NH₄F molecules, the NH₄F being in channels between the layers of NH₄TeF₅.     

Anionic derivatives of pentafluoro-λ-sulfanyl (fluorosulfonyl) acetic acid esters

New ester salts [R₃NH]⁺[F₅SC(SO₂F)C(O)OR′]⁻ where RH, CH₃CH₂ and R′CH₃,(CH₃)₂CH have been prepared from corresponding esters and amines. The sodiumsalt Na[F₅SC(SO₂F)C(O)OCH(CH₃)₂] was used to prepare the following -substitutedderivatives: SF₅CX(SO₂F)C(O)OCH(CH₃)₂, XBr, Cl. The crystal structure of[(C₂H₅)₃NH]⁺[F₅SC(SO₂F)C(O)OCH₃]⁻ was determined and is monoclinic: P2₁/n;a=8.758(2) Å, b=9.645(2) Å and c=19.167(4) Å; β=97.92(3)°; V=1603.6 ų; Z=4.     

Self-assembled Alkylation of Atomically Flat Hydrogen-terminated Silicon (111) Surface By Using Highly Polarized Fluoroalkylsilane

Hydrogen-terminated silicon surface is of technological importance to semiconductor processes such as pre-gate^[1]. Re-contamination and re-oxidation on silicon surface become more stringent issues in order to meet the requirements in the process for producing reduced size IC chips. The modification of silicon surfaces by various strategies has attracted more attention in the past few years^[2-4]. The frequently used techniques to attach functional groups to silicon surfaces are via chemical^[2], photochemical^[3] and electrochemical reactions^[4]. Various ways to attach monlayers to silicon surfaces has been reported, including alkylation of silicon with alkenes, alkyenes, aldehydes, alcohols and Grigard reagents under photoactivated or catalytic reactions. Particularly, porous silicon prepared by chemical or electrochemical treatments has been extensively studied. Preparation of passivated layers on porous silicon surfaces has disadvantages that the silicon surfaces are damaged by reactive agents during the reaction or become porous for attachment of molecules. Recently, self-assembled monolayer of alcohols on porous silicon was reported at modest heating without the aid of catalyst or photoexcitation or potential^[5]. In the paper, we report a novel method to attach highly polarized fluoroalkylsilane on atomically flat Si(111) surface at room temperature and to form a self-assembled monolayer to prevent the silicon surface from re-contamination and re-oxidation.     

Optically active coordination compounds---XLVIII. Synthesis, resolution and interconversions of isomers of tris-salicylatocobaltate(III)

Stable aqueous solutions of the green ion [Co(sa1)₃]³⁻ (sa1 = dianion, C₆H₄( )(CO ), of salicylic acid, 2-hydroxybenzoic acid) are obtained from [Co(NH₃)₅ C1]C1₂ and an excess of salicylic acid. Several salts, [C][Co(sa1)₃] have been characterized, where C = [Co(NH₃)₆]³⁺ and [M(en)₃]³⁺ (M = Co or Rh, EN = 1,2-diamino-ethane). By using (+)-[Rh(en)₃]³⁺, optical resolution via less soluble diastereoisomeric salts has been achieved, and isomerization and racemization have been studied. Resolved tris-malonatocobaltate(III) has been used as a model. A novel thermochromism (77-293 K) in solid Δ(+)-[Rhen₃]Λ[Co(sa1)₃ is described.     

过硫酸钾-脲氧化还原引发下的丙烯酰胺水溶液聚合

为制备高分子量聚丙烯酰胺(PAM),对其引发体系,尤其是对氧化还原引发做了许多探索^[1]。     

顺式二氯二氨合铂与核苷作用的13C核磁共振研究

本文用¹³C NMR法系统研究了溶液中顺式二氯二氨合铂与胸苷、胞苷、鸟苷和5'-腺嘌呤单核苷酸的作用,确定了不同条件下形成配合物的组成及其分子申铂原子与配体的成键方式。在中性介质中顺铂分别与胸苷、胞苷作用,生成N₃配位的顺-[Pt(NH₃)₂(ThyH_-1)₂]和顺-[Pt(NH₃)₂(Cyt)₂]²⁺;与鸟苷随摩尔比不同相应生成顺-[Pt(NH₃)₂(N₂-Guo)₂]²⁺和[Pt(NH₃)₂(N₂,N₁-GuoH_-1)]_nⁿ⁺,当pH=3和摩尔比为1时,尚有微量[Pt(NH₃)₂(N₇,O(C₆)Guo)]²⁺生成;在中性介质中顺铂与5'-AMP亦随摩尔比不同,生成顺-[Pt(NH₃)₂(N₇-5'-AMP)₂]^2-或兼生成顺-[Pt(NH₃)₂(N₇,N₁-5'-AMP)]_n。根据所得结果讨论了顺铂抗癌作用机制,提出了顺铂可能与DNA同一链上相邻二个鸟嘌呤基上的N₇N₁键合形成链内交联的新机制。     

铜改性凹凸棒土催化剂对Hg0及NH3的氧化性能研究

采用改进湿式浸渍法制备了兼备汞氧化和氨氧化活性的铜改性凹凸棒土（Cu₃-ATP）催化剂，对其进行SEM、H₂-TPR和NH₃-TPD表征，并在150-400℃测试其汞氧化及氨氧化性能。结果表明，铜物种成功负载在ATP表面，显著提高了催化剂的氧化还原能力，增加了表面中强酸性位和部分强酸性位，从而有效促进Hg⁰和NH₃的氧化。HCl在Hg⁰的高效氧化中起重要作用，高温不利于Hg⁰氧化反应的进行，但能够促进NH₃的氧化。在350℃下，Cu₃-ATP对Hg⁰和NH₃的氧化效率均在90%以上。影响因素实验显示，高空速下NH₃对汞氧化反应有明显抑制作用，而低浓度Hg⁰及HCl对氨氧化活性无显著影响，当气体空速（GHSV）低于5×10⁴ h^-1时，Cu₃-ATP能够实现NH₃和Hg⁰的同时氧化。此外，汞的氧化反应具备良好的抗硫性和抗水性，而SO₂对氨氧化有一定抑制作用。     

TERNARY Cu(Ⅱ)(ATP)AND HETEROAROMATIC N BASE COMPLEXES IN SOLUTION:STABILITY CONSTANTS AND ANTITUMOR MECHANISM EXPLORATION

The stability of the complexes of four pyridine-like ligandswith Cu(ATP)~(2-) was studied and by comparing the stability constants of theternary complexes[Cu(ATP)L]~(2-) with those of the binary complexes[CuL]~(2+),astacking interaction between the pyridine ring and the purine ring of ATP isindicated.It is possible to interpret the antitumor mechanism of[Pt(NH_3)_8(N-het)Cl]Cl in terms of this stacking interaction.     

基于碳纳米管的高灵敏度免标记电化学核酸适体传感电极

以电活性钌化合物[Ru(NH₃)₆]³⁺为信号传感源,借助碳纳米管构建了高灵敏检测腺苷免标记电化学传感电极（BSA/Apt/CNTs/GC）. BSA/Apt/CNTs/GC电极在最佳实验条件下检测腺苷线性范围为5.0×10^-11 ~ 1.0×10^-7 mol·L^-1,检测下限为2.7×10^-11 mol·L^-1. 该传感电极有较高的灵敏度、良好的选择性、重现性和稳定性. 与传统标记型适体传感电极相比,其制作简便,也许还适用于其他小分子和蛋白质的检测,有一定的普适性.     

Role of the sulfhydryl group on the gas phase fragmentation reactions of protonated cysteine and cysteine containing peptides

The gas phase fragmentation reactions of protonated cysteine and cysteine-containing peptides have been studied using a combination of collisional activation in a tandem mass spectrometer and ab initio calculations [at the MP2(FC)/6-31G*//HF/6-31G* level of theory]. There are two major competing dissociation pathways for protonated cysteine involving: (i) loss of ammonia, and (ii) loss of the elements of [CH₂O₂]. MS/MS, MS/MS of selected ions formed by collisional activation in the electrospray ionization source as well as ab initio calculations have been carried out to determine the mechanisms of these reactions. The ab initio results reveal that the most stable [M + H − NH₃]⁺ isomer is an episulfonium ion (A), whereas the most stable [M + H − CH₂O₂]⁺ isomer is an immonium ion (B). The effect of the position of the cysteine residue on the fragmentation reactions of the [M + H]⁺ ions of all the possible simple dipeptide and tripeptide methyl esters containing one cysteine (where all other residues are glycine) has also been investigated. When cysteine is at the N-terminal position, NH₃ loss is observed, although the relative abundance of the resultant [M + H − NH₃]⁺ ion decreases with increasing peptide size. In contrast, when cysteine is at any other position, water loss is observed. The proposed mechanism for loss of H₂O is in competition with those channels leading to the formation of structurally relevant sequence ions.     

Structural characterisation of [Pt(NH3)4]2[W(CN)8][NO3]·2H2O donor–acceptor complex

The bimetallic [Pt(NH₃)₄]₂[W(CN)₈][NO₃]·2H₂O is characterised by single-crystal X-ray diffraction [S.G.P2₁/m(11), a=8.0418(7), b=19.122(2), c=9.0812(6) Å, Z=2]. All platinum centres have the square-plane D_4h geometry with average dimensions Pt(1)–N 2.042(2) and Pt(2)–N 2.037(10) Å. The octacyanotungstate anion has the square-antiprismatic D_4d configuration with average dimensions W(1)–C 2.164(13), C–N 1.140(12), W(1)–N 3.303(5) Å. The structure exhibits two different mutual orientations of Pt versus W units resulting in Pt(2)–W(1), W(1)^* separations of 4.77(2), 4.55(2)^* and Pt(1)–W(1) of 6.331(8) Å. A centrosymmetric structure reveals groups of two distinct columns: the first is formed by intercalated NO₃⁻ between parallel [Pt(1)(NH₃)₄]²⁺ planes and the second consists of [W(CN)₈]³⁻ interlayered by, parallel to square faces of W-antiprisms, [Pt(2)(NH₃)₄]²⁺. The structure is stabilised through a three-dimensional hydrogen bond network via nitrogen atoms of cyanide ligands, hydrogen atoms of NH₃ ligands, water molecules and oxygen atoms of NO₃⁻ counteranions. The vibrational pattern and the range of ν(CN) frequencies attributable to the electronic environment of W(V) and W(IV) are consistent with the ground state Pt(II)↔W(V) charge transfer.     

氧化石墨阳离子交换容量测定过程中结构的变化

氧化石墨(GO)结构层上的碳羟基(―C―OH)和边缘羧基(―COOH)在水介质中发生质子化反应解离出的H+具有阳离子可交换性。实验采用甲醛缩合法测量了GO的阳离子交换容量(CEC),用X射线衍射(XRD)、傅里叶变换红外(FTIR)光谱和X射线光电子能谱(XPS)分析测试手段对GO阳离子交换过程中间产物的结构变化进行了分析。结果表明,GO的CEC高达541.48 mmol/100 g。NH_4~+和Ca~(2+)交换后的GO,保持稳定的层状结构,c轴方向层间距分别增大了0.1499和0.2905 nm。NH_4+和Ca~(2+)主要以层间可交换阳离子形式存在于层间域中,并与水分子形成可交换水化阳离子层,部分以[NH_4(H_2O)_6]+和[Ca(H_2O)_6]_2+的形式存在于结构层的边缘附近,共同平衡结构层水解产生的负电荷。     

Spectroscopic and quantum chemical studies on proton motion in bifurcated hydrogen-bonded systems

The infrared spectra of crystalline 1,8-bis (N,N-dimethylamino) naphthalene hydrohalides within the proton absorption range have been studied. The spectral features suggest a bifurcated interaction of the [N H N]⁺ cation with the relevant ionic species. Quantum-chemical SCF-MO-LCAO ab initio calculation of the potential energy curves for the proton motion were carried out for the model [H₃N H NH₃]⁺ H⁻ system. Preliminary calculations corroborate the experimental conclusions about the proton motion mechanism.     

Kinetics of formation of intermediates in silver ion assisted aquations

There is kinetic evidence of the formation of [Co(NH₃)₅NCSAg₃]⁵⁺ in the interaction of [Co(NH₃]⁵NCS]²⁺ with Ag⁺ in aqueous solution, with pseudo-first-order formation rate constant k = 0.158 s⁻¹ for the forward reaction in the following equation at 25°C and [Ag⁺] in the range of 1.23–5.0 × 10⁻² mol dm⁻³ and 0.10 ionic strength (NaClO₄):

Full-size image

Additionally, the formation constant, β₂, for [Co(NH₃)₅NCSAg₂]⁴⁺ has been determined to be log β₂ = 4.717. For the [Rh(NH₃)₅I]²⁺-Ag⁺ reaction there is evidence of an outer-sphere interaction with rate constants of k₂ = 670 dm³ mol⁻¹ s⁻¹ at 25°C and 0.10 ionic strength. This outer-sphere species undergoes further reaction to give the silver ion containing intermediates of the aquation reactions.     

不饱和糖功能单体接枝聚氨酯膜的制备及其血液相容性

通过葡萄糖、丙烯酸羟乙酯和丁二胺反应,制备了含不饱和双键的糖基功能单体。 采用傅里叶红外光谱和核磁共振氢谱对合成的产物进行结构表征确定。 采用紫外光引发接枝聚合技术,将制备的不饱和糖单体接枝聚合到聚氨酯膜的表面,以衰减全反射模式下傅里叶红外光谱对表面接枝反应进行了确认。 通过静态水接触角实验和血小板黏附实验,分别对改性聚氨酯膜表面的亲水性和血液相容性进行了研究,结果表明,改性聚氨酯膜表面的接触角从86°降低到45°,血小板的粘附量由14.36×10³ cells/mm²减少到2.57×10³ cells/mm²,亲水性明显增强,血液相容性显著改善。     

A New Mechanism for the Formation of the Ozone Hole in the Earth Atmosphere

It is generally accepted that the Earth ozone layer is depleted by chlorine atoms produced via solar photolysis of chlorofluorocarbons (CFCs) in the upper stratosphere^[1]. This photodissociation model predicts an ozone depletion maximum at an altitude between 30 and 40 km and negligible ozone depletion below 20 km^[1]. However, the Antarctic/Arctic ozone hole appearing in each spring is observed to be located at an altitude of about 15 km^[2]. The formation of the ozone hole has been attributed to heterogeneous reactions on the surface of polar stratosphere clouds (PSCs) consisting mainly of condensed water ice:HCl+ClONO₂→Cl₂+HNO₃^[3,4]. Recently, it has been observed that dissociation of CFCs by capture of low-energy electrons is enhanced by several orders of magnitude when CFCs are adsorbed on the surfaces of ice films of polar molecules such as H₂O and NH₃^[5,6]. This enhancement is due to transfer of electrons in precursors of solvated states in polar molecular ice to CFCs that then dissociate^[7]. This effect should be most efficient in the lower stratosphere of about 15 km, where low-energy electrons can be produced by cosmic-ray ionization and localized in precursors of solvated electrons in PSCs^[8]. Strong and straightforward evidence of this new mechanism for ozone depletion has also been found in data obtained from field measurements (satellites, balloons, etc.)^[8]. In this talk, we will present the data from both field and laboratory measurements and discuss the new mechanism for the formation of the ozone hole.     

酸浸蚀Al-Si合金制备锂离子电池高性能多孔硅负极材料

本文首次提出利用酸浸蚀Si-Al（含Al 80%）合金粉末的方法制备多孔硅材料. 分析表明制得的多孔硅材料为晶体,并具有由纳米颗粒结集成的海绵状多孔结构,其粒径约20 μm,比表面102.7 m²·g^-1. 多孔硅电极按多孔硅:导电碳:粘结剂 = 1:1:1（by mass）涂成. 在添加15%氟化碳酸乙烯酯（FEC）的1 mol·L^-1 LiPF₆/EC + DMC（1:1,by volume）电解液,在100 mA·g^-1电流密度充放电,多孔硅电极的首次放电比容量2072 mAh·g^-1 Si. 经237次充放电循环后,其放电容量仍可保持在1431 mAh·g^-1 Si,显示了相当高的充放电稳定性. 这归因于其海绵状多孔结构有足够的微空间以承受充电过程中硅的急剧膨胀. 硅微粒的纳米尺寸有利于锂在Li-Si合金中的扩散. 纳米硅微粒可牢固地联成一整体,不易因膨胀、收缩而粉化断裂. 这种构筑多孔硅负极材料的新方法操作简便、成本低廉,有着很好的应用前景.