MOVPE growth and characterization of GaInAs(P) on (001) InP using diethyltertiarybutylarsine (DEtBAs) and tertiarybutylphosphine (TBP) as the group-V sources

We report on low pressure MOVPE results of (GaIn)As grown with the arsenic precursor DEtBAs as well as (GaIn)(AsP) grown on InP using the precursor combinations DEtBAs/TBP, DEtBAs/PH₃ which we carefully compared with samples grown in the standard system (AsH₃/PH₃). Lattice matched (GaIn)As layers have been obtained at a growth temperature of 600°C, a V/III ratio of 3 and at a growth rate of 1 μm/h at a reactor pressure of 50 mbar. Changing the As precursor from AsH₃ to DEtBAs simultaneously alters the incorporation coefficient ratio k_Ga/k_In from 1.15 to 1. At room temperature n-type mobilities of 9060 cm²/V s have been achieved for (GaIn)As grown with DEtBAs at a V/III ratio of 2. Besides the excitonic luminescence at 802 meV a lower energy peak appears in the photoluminescence (PL) spectra at 753 meV (carbon-carbon donor-acceptor pair). The excitonic luminescence peak has a FWHM of about 9 meV. The (GaIn)(AsP) layers have been grown at a growth temperature of 625°C and V/III ratios of 15–25 with DEtBAs/TBP and about 60 with DEtBAs/PH₃. Layers grown with higher V/III ratios show an enhanced As content. However, considering the P incorporation we have observed a qualitative difference between the standard hydride system and systems using alternative group-V precursors. Even in the system DEtBAs/PH₃ the phosphorus incorporation is much higher than in the AsH₃/PH₃ system indicating the influence of vapor phase exchange reactions.     

Characterization of porous InP(001) layers by triple-crystal X-ray diffractometry

The structure of porous layers fabricated on the surface of an InP(001) semiconductor wafer by electrochemical oxidation has been studied by triple-crystal X-ray diffractometry. It is shown that, depending on the probe potential (current density), column-shaped pores of two types with different orientations with respect to the substrate are formed. It is established that, at a probe potential of ～6 V, pores are extended along the current lines (CLO pores) and directed normally to the sample surface. With a decrease in the potential to ～3 V, the longitudinal axes of pores are oriented at an angle of ζ = 52° ± 2° to the sample surface (CO pores). The average diameter and length of pores are determined (～80 and 300–900 nm, respectively) and the porosity of the samples is evaluated (P ～ 40–60%). The obtained data on the pore parameters are in satisfactory agreement with the scanning electron microscopy data.     

Liquid phase epitaxy set‐up designed for in situ X‐ray study of SiGe island growth on (001) Si substrates

In situ X‐ray examination at a synchrotron beamline of the solution growth of self‐assembled SiGe structures on silicon (001) substrates through the backside has been realized by a specific heating equipment and a suitable growth assembly. The furnace allows heating of the growth assembly up to 600 °C. The temperature field and the gas flow in the furnace have been numerically modeled. In this way a meaningful estimate about the power consumption and the thermal gradient across the sample has been reached. Despite its low heat capacity and, thus, fast heating and cooling ability the furnace can be stabilized to ± 0.1 K by a high‐performance temperature controller. The growth assembly has been prepared within three separate stages carried out in conventional slideboat liquid phase epitaxy equipment. Such growth assembly allows carrying out then intended experiments without H₂ as normally used in liquid phase epitaxy in favor of N₂, meeting the demand of minimized risks at beamlines. The equipment ensures an easy handling of the growth assembly. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Selectively embedded growth by chemical beam epitaxy for the fabrication of InGaAs/InP double-heterostructure lasers

In order to fabricate InGaAs/InP double-heterostructure (DH) lasers, a novel selectively embedded one-step growth by chemical beam epitaxy (CBE) was adopted. Before the selective CBE growth, 6–8 μm wide channels on an n-InP substrate were undercut by wet chemical etching through a 170 nm thick SiO₂ film mask. A 6 μm wide stripe-geometry DH laser structure with an active layer of 0.14 μm thickness was grown selectively with good planarity into the channels and operated by a pulse.     

Zinc-blende MnAs thin films directly grown on InP (001) substrates as possible source of spin-polarized current

We have directly grown zinc-blende (zb)-type MnAs thin films on InP (001) substrates without the aid of any buffer layer using molecular beam epitaxy (MBE). From the High-resolution X-ray diffraction (XRD) data, assuming face-centered cubic (fcc) MnAs structure, the average lattice constants values were calculated to be 6.068 and 6.060 Å for growth temperatures of 250 and 300 °C, respectively. High-resolution transmission electron microscopy (TEM) investigations and selected-area electron-diffraction (SAD) verified the successful growth of zb-type cubic MnAs coexisting with the NiAs-type hexagonal MnAs. The saturation magnetization was estimated to be 300 emu/cm³ determined from the magnetic field dependence of the magnetization curves. From the temperature dependence of magnetization, the Curie temperature was found to be approximately 308 K. Success in the growth of zb-type MnAs thin films could be reasonably explained by the existence of a monolayer of InAs at the interface between the MnAs and InP substrates.     

Room temperature epitaxial growth of (001) CeO2 on (001) LaAlO3 by pulsed laser deposition

The room temperature epitaxial growth of CeO₂ on lattice matched (001) LaAlO₃ substrates by using pulsed laser deposition (PLD) method under various oxygen partial pressure (Po₂) is demonstrated. X‐ray diffraction analysis with 2‐Theta/rocking curve/Phi‐scan, cross‐sectional transmission electron microscopy with selected‐area diffractions are used to characterize structural of grown films. The epitaxial (001) CeO₂ can be achieved at room temperature under Po₂ less than 2 × 10⁻³ Torr. The best quality of grown film is obtained under Po₂ = 2 × 10⁻⁵ Torr and degraded under Po₂ = 2 × 10⁻⁶ Torr due to oxygen deficiency in structure. The epitaxial relationship between CeO₂ and LAO is confirmed to be (001)CeO₂ //(001)LAO, [100]_CeO2//[110]_LAO and [010]_CeO2//[10]_LAO. No obvious reduction reaction occurred, from Ce⁺⁴ turned into Ce⁺³ states, as reducing oxygen partial pressure during growth by PLD.     

Studies in the growth of ZnSe on GaAs(001)

This paper reports a study of the molecular beam epitaxial (MBE) growth of ZnSe on GaAs substrates using elemental sources. Growth rates of ZnSe as a function of Se:Zn flux ratio for constant Zn flux were determined over a wider range of values than previously reported. Careful measurements of atomic fluxes and sample thickness lead to a determination of the sticking coefficients of Zn and Se which are at variance with many previously reported values. The temperature dependence of the sticking coefficients of Zn and Se has been measured carefully and provides evidence for a greater desorption of Zn from the growing surface than previously thought, an effect which persists at low growth temperatures. Measurements at high flux ratios support the use of a precursor model to describe MBE growth of ZnSe on GaAs substrates.     

Effect of growth interruptions on ultra-thin InAs/InP quantum wells grown by chemical beam epitaxy

We have studied the effect of growth interruptions on 2 monolayer thick InAs/InP strained quantum wells (QWs) grown by chemical beam epitaxy. The main feature is the formation of up to 8 monolayer thick InAs islands during As₂ annealing of the QW. Their formation is characterized by a two- to three-dimensional transition of the reflection high energy electron diffraction (RHEED) pattern and by multiple-line photoluminescence spectra. This interpretation of the data is confirmed by transmission electron microscopy (TEM).     

Growth of vertical and defect free InP nanowires on SrTiO3(001) substrate and comparison with growth on silicon

We present a study of the molecular beam epitaxy of InP nanowires (NWs) on (001) oriented SrTiO₃ (STO) substrates using vapor liquid solid mechanism and gold–indium as metal catalyst. The growth direction of InP NWs grown on STO(001) is compared with NWs grown on (001) and (111) oriented silicon substrates. Gold–indium dewetting under a flux of indium results in the majority of InP NWs growing vertically from the surface of STO(001). With the growth parameters we have used the NWs have a pure wurtzite structure and are free of stacking faults and cubic segments. The structural quality of the NWs is confirmed by micro-photoluminescence measurements showing a narrow peak linewidth of 6.5 meV.     

Growth mechanism in atomic layer epitaxy (III) reevaporation of Cd and Te from CdTe (111) surfaces and thick elemental deposits monitored by quadrupole-mass spectrometry

Quadrupole-mass spectroscopical (QMS) studies on isothermal reevaporation of Cd and Te species from the CdTe (111) surface have been performed in two extreme cases. The first concerns the reevaporation of thick, bulk-like non-crystalline Cd and Te films deposited in high vacuum at room temperature on the (111) surface, whereas in the second case evaporation of the constituent species from the bare single crystalline (111) surface has been investigated. The fluxes of the species desorbing in high vacuum (10⁻⁶ Pa) have been monitored with QMS and the desorption temperatures have been measured with a thermocouple mounted as near as possible to the sample surface. The following values E_a(Cd)_bulk = 1.13 ± 0.12 eV, E_a(Te)_bulk = 1.64 ± 0.18 eV and E_a(Cd)₍₁₁₁₎ = 1.13 ± 0.06 eV, E_a(Te)₍₁₁₁₎ = 1.92 ± 0.13 eV of the activation energies for these two cases have been determined from the slopes of the Arrhenius plots. Using these experimental values, the numbers of atomic bonds N_Cd and N_Te occurring in the atomic aggregates of quasi-gas molecules forming the near surface quasi-gas transition layers have been estimated. For Cd quasi-gas molecules 2 ≤ N_Cd ≤ 5, whereas for Te molecules 3 ≤ N_Te ≤ 10. However, no prediction concerning the number of atoms creating the quasi-gas molecules could be made on the basis of the QMS investigations. It has also been shown that Cd atoms evaporate from the bare single crystalline CdTe (111) surface with an activation energy that is equal (in the limits of the experimental error) to the activation energy for sublimation of Cd atoms from pure, non-crystalline, bulk Cd pieces. The analogous activation energy measured for Te atoms is about 20% larger than that of the relevant sublimation process. This result confirms the fact that Te atoms are bound much stronger in the CdTe crystal lattice than Cd atoms.     

InGaAs/InAlAs in-plane superlattices grown on slightly misoriented (110) InP substrates by molecular beam epitaxy

InGaAs/InAlAs in-plane superlattices (IPSLs) composed of InAs/GaAs and InAs/AlAs monolayer superlattices were grown using molecular beam epitaxy. The substrates were misoriented (110) InP tilting 3° toward the [00 ] direction. We grew half monolayers of AlAs and GaAs and single monolayers of InAs alternately, keeping regular arrays of single monolayer steps. The structures were evaluated by transmission electron microscopy (TEM). In a transmission electron diffraction pattern from the ( 10) cross-section, we observed two types of superstructure spot pairs double-positioned in the [001] direction, indicating the formation of the intended IPSL structures. In a cross-sectional TEM dark-field image, we observed the InGaAs/InAlAs superlattice structures formed almost in the [001] direction. The mean period of the superlattices was approximately 4 nm, which was comparable to the terrace width expected from the substrate tilt angle. However, IPSL structures were not completely formed, i.e., the lateral interfaces meandered along the growth direction, and partial disorderings were often observed. The photoluminescence spectrum from the IPSL had a peak corresponding to the InGaAs (2 nm thick)/InAlAs (2 nm thick) superlattice in addition to a peak corresponding to the In_0.5Al_0.25Ga_0.25As alloy.     

Transmission electron microscopy study of an AlN nucleation layer for the growth of GaN on a 7-degree off-oriented (0 0 1) Si substrate by metalorganic vapor phase epitaxy

We have investigated the morphology of the high-temperature-grown AlN nucleation layer and its role in the early stage of GaN growth, by means of transmission electron microscopy. The nitride was selectively grown on a 7-degree off-oriented (0 0 1) patterned Si substrate by metalorganic vapor phase epitaxy. AlN was deposited on the inclined unmasked (1 1 1) facet in the form of islands. The size of the islands varied along the slope, which is attributable to the diffusion of the growth species in the vapor phase. The GaN nucleation occurred at the region where rounded AlN islands formed densely. The threading dislocations were observed to generate in the GaN nucleated region.     

The mercury pressure dependence of arsenic doping in HgCdTe, grown by organometallic epitaxy (direct alloy growth process)

The effect of Hg partial pressure on arsenic doping of HgCdTe is studied. It is found that control of Hg partial pressure is very important in obtaining reproducible doping, and use of high Hg pressure is the key to obtain heavily doped layers. Typically, a factor of 4 increase in the partial pressure of Hg is found to increase the acceptor concentration by about this same magnitude. In addition, arsine doping results in almost uncompensated layers, even though high concentration of Hg vacancies are present. A mechanism is proposed by which As is incorporated as a Cd-As complex, so that it substitutes preferentially on Te sites.     

On the correlation of lattice defects to HUBER-etch pit morphologies on (001) surface of InP

Various analytical techniques (defect etching, optical microscopy, X-ray topography (XRT), cathodoluminescence (CL) were combined to get information about the real structure of Sn- and S-doped LEC InP. The S-pits, produced by the HUBER -etch, were not only caused by microdefects, as it was described in literature. We found a correlation between S-pits and special types of dislocations.     

Generation mechanism of CuAu-I type ordered structures in InGaAs crystals grown on (110) InP substrates by molecular beam epitaxy

The generation mechanism for CuAu-I type ordered structures in InGaAs grown on (110) InP substrates by molecular beam epitaxy is discussed. On the basis of previous work together with considerations of the atomic arrangement of the ordered structure and surface reconstruction on the (110) plane, we propose four possible models for the ordering. Through precise evaluation of these models, two models are selected as the most probable ones: these involve formation of the ordered structures on surfaces dominated by two monolayer steps. This model have been experimentally proven by the analyses of electron diffraction patterns from different crystals grown on different growth surfaces.     

Anisotropic lateral growth in GaAs MOCVD layers on (001) substrates

For metalorganic chemical vapor deposition, a fast lateral growth rate is observed for the first time on (001) GaAs having round mesas. The lateral growth rate is greater than the vertical growth rate by a factor of 3–5. The lateral growth rates have anisotropy with respect to the crystallographic directions on the (001) surfaces. The fastest growth direction is the [110] and the slowest one is the [ 10]. The [110] and [ 10] growth rates were found to be strongly dependent on growth conditions, though the vertical one is independent. The [110] growth rate decreases with decreasing As pressure, while the [ 10] remains constant. As growth temperature increases, both the [110] and the [ 10] growth rates decrease. A simple model for the lateral growth mechanism is proposed from the consideration of atomic arrangements and the number of dangling bonds at [110] and [ 10] step sites. According to the model, the lateral growth rate is proportional to the number of bonds available for binding Ga atoms at step sites. The model can explain well the anisotropy in the lateral growth rate and its dependence on the growth conditions.     

GaAs initial growth on InAs(001) vicinal surfaces observed by scanning tunneling microscopy

GaAs initial growth on InAs surfaces misoriented by 2° toward the [110] and [1 0] directions was investigated by scanning tunneling microscopy (STM). In the STM images of both InAs vicinal surfaces after GaAs deposition, white lines running in the [1 0] direction, corresponding to the grown GaAs surface, were observed. Almost all of the lines were attached only to steps running in the [110] direction (B-type steps) on both InAs surfaces; that is, the lines were seldom attached to steps running in the [1 0] direction (A-type steps). These results indicate that the B-type steps are more favorable for the sticking of deposited Ga atoms than the A-type steps during GaAs initial growth on InAs vicinal surfaces.     

The influence of substrate temperature on the growth of sexiphenyl on mica(001)

Sexiphenyl thin films were grown by Hot Wall Epitaxy on air‐cleaved mica (001) surfaces at substrate temperatures between 293 K and 440 K. For the entire temperature range, organic thin films show nano‐needle like morphology. The nano‐needles grown at low substrate temperature (293 K) are shortest, and their growth is accompanied by a simultaneous formation of flat islands which disturbs the growth of nano‐needles. On the contrary, unusually long nano‐needles with typical lengths up to the mm range evolve during the growth at a substrate temperature close to the material's thermal desorption temperature at about 440 K. X‐ray diffraction reveals two different crystalline orientations for nano‐needles in the entire temperature range. At low substrate temperatures dominantly the (11 ) plane of the β‐phase is formed parallel to the mica (001) surface. At elevated temperatures another strong texture becomes dominant which is close to the (11 ) crystal orientation. In contrast to this, crystallites with the preferred orientation (001) parallel to the surface of the substrate are formed at low substrate temperature (293 K). This crystal orientation can be associated with flat islands observed in the early growth stage. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

On the growth of Au on clean and contaminated GaAs(001) surfaces

Auger analysis and transmission electron microscope (TEM) analysis have been used to determine the influence of contamination on the structural properties of Au films grown on different chemically treated (001)GaAs surfaces. The Au films were evaporated on to the (001)GaAs surfaces at 320°C in a vacuum of 10^-8 Torr after an initial bake-out of 500°C for 1 h. The results revealed that carbon contamination of the surfaces resulted in completely polycrystalline Au overgrowth while clean surfaces resulted in perfectly alligned epitaxial Au overgrowths. The epitaxial relationship is given by (100)_Au 6(100)_GaAs and <100 > _Au6 <100 > _GaAs which is equivalent to a misfit of 32.24%.