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根据EACVD系统的实际几何特点和工艺参数建立了该系统的三维流场有限元模型,研究了衬底温度及摆动周期、热丝参数、进气口参数对衬底表面流场均匀性的影响.结果表明:衬底低速摆动情况下摆动周期的变化对衬底表面流场的分布没有影响,衬底温度,热丝参数,进气口参数对衬底表面流场都有一定的影响,其中,热丝的排列方式以及进气口气体流量对衬底表面流场的影响最大.最后,采用一组优化的沉积参数进行金刚石膜衬底表面流场的仿真计算,结果表明:采用优化的沉积参数可以使衬底表面气体流速和流场的均匀性都得到很大提高,此研究结果为制备高质量金刚石膜提供理论依据. 相似文献
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辅助方法对热丝CVD金刚石生长速率的影响 总被引:1,自引:1,他引:0
在热丝化学气相沉积金刚石系统中,通过双灯丝间的热阴极放电产生等离子体,对衬底施加正负偏压形成电子促进,比较分析了它们及其组合的各种辅助方法对金刚石生长速率的影响.结果表明,在以丙酮为碳源、灯丝总功率不变的情况下,等离子体可明显增强金刚石的生长,其生长速率约为纯热丝法的三倍;而正偏压对等离子体辅助沉积金刚石不仅没有增强形核作用,而且抑制金刚石的生长;电子促进法可以显著提高金刚石的成核密度,但并不能提高金刚石生长速率. 相似文献
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研究了通过热丝CVD法在施加了Ni-P/Cu复合中间过渡层的W18Cr4V高速钢衬底表面进行金刚石涂层的沉积技术以及不同压力条件对沉积出的CVD金刚石涂层质量的影响.最后通过扫描电镜分别对Cu、Ni-P以及不同反应压力下沉积的金刚石涂层的表面形貌进行了检测分析,通过XRD、拉曼光谱仪、洛氏硬度仪对金刚石涂层性能进行检测分析.结果表明:Ni-P/Cu复合中间过渡层可以明显的抑制Fe、Co的催石墨化作用.在此基础上通过沉积参数的优化,在W18Cr4V高速钢衬底表面成功沉积出高质量的CVD金刚石涂层.压力为4 kPa条件下沉积的CVD金刚石涂层较5 kPa的金刚石颗粒晶型明显、分布致密. 相似文献
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本综述分析了微波等离子化学气相沉积(MPCVD)单晶金刚石生长及其电子器件近年来的研究进展,并对其进行展望.详细介绍了金刚石宽禁带半导体特性、生长原理、生长设备、衬底处理.研究了影响MPCVD单晶金刚石生长的关键因素,为获得最优生长条件提供指导.分析了横向外延、拼接生长、三维生长等关键性生长技术,逐步提高单晶金刚石的质量和面积.在金刚石掺杂的研究中,详细介绍了n型和p型掺杂的研究进展.通过对金刚石肖特基二极管、氢终端金刚石场效应晶体管、紫外探测器的研究,展现了金刚石在电子器件领域的成果和进展.最后总结了MPCVD单晶金刚石生长及其电子应用过程中面临的挑战,展望了金刚石在电子器件领域的巨大应用前景. 相似文献
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采用微波等离子体化学气相沉积(MPCVD)技术制备的大尺寸、高质量单晶金刚石材料具备卓越的物理化学性能,在珠宝、电子、核与射线探测等消费品、工业和国防科技领域极具应用前景。研究发现在化学气相沉积单晶金刚石生长过程中,在衬底与外延层之间,以及生长中途停止-继续生长的生长层之间出现明显的界面区。本文采用偏光显微镜、拉曼光谱、荧光光谱(PL)等手段对界面区域进行了测试分析,界面区在偏光显微镜下表现出因应力导致的亮区,且荧光光谱(PL)及其线扫描显示该区域的NV色心含量远高于衬底及其前后外延层,表明该界面区具有较高的缺陷和杂质含量。结果表明在生长高品质单晶金刚石初期就应当采取一定手段进行品质调控,并尽量在一个生长周期内完成制备。 相似文献
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本文通过高分辨X射线衍射(HRXRD)、激光拉曼光谱(Raman)、晶格畸变检测等测试分析方法对多组高温高压(HTHP) Ⅰb、HTHP Ⅱa和化学气相沉积(CVD)型(100)面金刚石单晶样品进行对比研究。HRXRD和Raman的检测结果均表明HTHP Ⅱa型金刚石单晶的结晶质量接近天然金刚石,其XRD摇摆曲线半峰全宽和Raman半峰全宽分别为0.015°~0.018° 和1.45~1.85 cm-1。晶格畸变检测仪的检测结果表明,HTHP Ⅱa型金刚石单晶的应力分布主要有两种:一种几乎无明显应力分布,另一种沿<110>方向呈对称的放射状分布,其他区域无晶格畸变。HTHP Ⅰb和CVD型金刚石单晶应力分布均相对分散,晶格畸变复杂,与其HRXRD和Raman的检测结果相符。进一步利用等离子体刻蚀法对三种类型金刚石单晶(100)面位错缺陷进行对比分析,结果表明,HTHP Ⅱa型金刚石位错密度为三者中最低,仅为1×103 cm-2。本研究为制备高质量大尺寸CVD金刚石单晶的衬底选择提供了实验依据。 相似文献
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I. A. Prokhorov V. G. Ralchenko A. P. Bolshakov A. V. Polskiy A. V. Vlasov I. A. Subbotin K. M. Podurets E. M. Pashaev E. A. Sozontov 《Crystallography Reports》2013,58(7):1010-1016
Structural features of diamond single crystals synthesized under high pressure and homoepitaxial films grown by chemical vapor deposition (CVD) have been analyzed by double-crystal X-ray diffractometry and topography. The conditions of a diffraction analysis of diamond crystals using Ge monochromators have been optimized. The main structural defects (dislocations, stacking faults, growth striations, second-phase inclusions, etc.) formed during crystal growth have been revealed. The nitrogen concentration in high-pressure/high-temperature (HPHT) diamond substrates is estimated based on X-ray diffraction data. The formation of dislocation bundles at the film-substrate interface in the epitaxial structures has been revealed by plane-wave topography; these dislocations are likely due to the relaxation of elastic macroscopic stresses caused by the lattice mismatch between the substrate and film. The critical thicknesses of plastic relaxation onset in CVD diamond films are calculated. The experimental techniques for studying the real diamond structure in optimizing crystal-growth technology are proven to be highly efficient. 相似文献
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借助专业晶体生长模拟软件FEMAG和自主开发的对流、传质、过饱和度及生长速率预测等有限元模块研究了物理气相传输法(PVT)同质外延生长氮化铝(AlN)单晶工艺时的初始传热及传质过程,并分析了不同形状籽晶台对生长室内的温度场、流场、过饱和度及生长速率的影响。温度场模拟结果表明籽晶台侧部角度改变可影响籽晶表面轴向及径向温度梯度,流场及传质模拟表明籽晶台侧部角度变化对籽晶台周边的传质有巨大影响。传质及过饱和度模拟结果表明,当籽晶台侧部角度为130°时,籽晶表面温度梯度较小且可以完全抑制籽晶台侧部多晶沉积,有利于通过同质外延工艺生长出无寄生、无裂纹的高质量氮化铝单晶锭。 相似文献
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金刚石因其优异的物理性质被视为下一代半导体材料,然而其极高的硬度、脆性和耐腐蚀性导致其加工困难,尤其是对于大尺寸的化学气相沉积(chemical vapor deposition, CVD)单晶金刚石(SCD)晶片而言,目前还缺乏一种高效、低成本的磨抛加工方法。本文提出一种基于工件自旋转的同心双砂轮磨抛一体化加工技术,在一次装夹中,先采用金刚石磨料的陶瓷内圈砂轮磨削单晶金刚石晶片表面,将单晶金刚石表面迅速平坦化,后采用金刚石与CuO混合磨料的外圈溶胶-凝胶(sol-gel,SG)抛光轮抛光单晶金刚石晶片表面,使其在较短时间内完成从原始生长面(Sa约46 nm)到原子级表面精度(Sa<0.3 nm)的加工。磨削加工中,硬质金刚石磨料的陶瓷砂轮高速划擦金刚石晶片表面,在强机械作用下获得较大的材料去除以及纳米级的光滑单晶金刚石表面,同时引起进一步的表面非晶化;SG抛光加工中,硬质金刚石磨料高速划擦单晶金刚石表面形成高温高压环境,进一步诱导CuO粉末与单晶金刚石表面的非晶碳发生氧化还原反应,实现反应抛光。磨抛一体化的加工技术为晶圆级的单晶、多晶金刚石的工业化生产提供借鉴。 相似文献
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优质立方六面体金刚石大单晶的生长研究 总被引:1,自引:2,他引:1
高温高压静压触媒法合成的金刚石单晶,往往呈现六八面体形貌,因为立方六面体单晶{100}面的生长区间相对较小.本研究利用高温高压温度梯度法,自制Fe-Ni合金触媒,通过对合成组装和工艺进行合理调整后,控制晶体在相对低温适合{100}面生长区域内生长,得到的晶体均呈现完整立方六面体形貌;同时为抑制包裹体和其他杂质的进入,人为的提高晶体的径向平铺生长速度,抑制其轴向生长速度.以在33 h内合成的优质立方六面体晶体为例,晶体最大方向尺寸达到7.3 mm,重1.2克拉,其径向生长速度达到0.22 mm/h,轴向生长速度仅为0.08 mm/h,增重速度为7.3 mg/h. 相似文献
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作为天然金刚石生长环境的碳酸盐,研究其掺杂对人造金刚石晶体生长行为的影响具有重要的学术价值。本文运用高温高压下的温度梯度法,将碳酸钙(CaCO3)按照不同比例掺杂到金刚石合成腔体内的碳源中,用以研究其掺杂对金刚石分别沿(100)或(111)晶面生长行为的影响。利用光学显微成像对掺杂合成金刚石晶体形貌的表征表明:随着碳酸钙掺量的增加,沿(100)面生长的金刚石晶形由塔状变为板状且出现了裂晶、连晶现象,晶体颜色先变浅再变黑,内部出现了包裹体;同样,沿(111)面生长的金刚石晶形由板状逐渐变为塔状且出现了裂晶、孪晶现象,晶体颜色逐渐变黑,内部包裹体增多。用激光拉曼光谱对掺杂金刚石晶体质量的表征表明:随着碳酸钙掺量的增加,沿(100)或(111)面生长的掺杂金刚石的拉曼峰位偏移量均增大,半峰全宽均变大。这说明碳酸钙掺杂使得金刚石晶格畸变增加、内应力变大。本文对碳酸钙掺杂影响沿两不同面生长金刚石的晶形、颜色、内部质量等行为的成因进行了分析,为本课题后续研究奠定了基础。 相似文献
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In the present study, the temperature and gas density field inside the hot filament chemical vapor deposition (HFCVD) reactor, which play a determinate role on the growth rate and quality of as-deposited diamond films, are simulated using the finite volume method, and the influence of the size and arrangement of filaments and inlets are investigated. Firstly, the correctness of the simulation model is verified by comparing the temperature data obtained from the simulation with that measured in an actual depositing process, and the results show that the error between them is less than 3%. Thereafter, the deposition parameters are optimized using this model as N(filament number)=6, r(filament radius)=0.4 mm, D(filament separation)=16–18 mm, H(substrate–filament distance)=8–9 mm, and 25 inlets. Finally, diamond films are deposited on silicon (100) wafers using above parameters and the results of characterization by SEM and Raman spectrum exhibit that the deposited diamond films appear homogeneous surface with fine-faceted crystals. 相似文献
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R. J. P. Eder E. K. Schmitt J. Grill S. Radl H. Gruber‐Woelfler J. G. Khinast 《Crystal Research and Technology》2011,46(3):227-237
This study investigates the effects of seed loading on the mean crystal size of the model substance, acetylsalicylic acid, crystallized from ethanol in a continuously seeded tubular crystallizer. A hot, highly concentrated ethanolic acetylsalicylic acid solution was mixed with an acetylsalicylic acid‐ethanol seed suspension. Subsequent cooling of the slurry in the tubing promoted supersaturation and hence crystal growth. The tubular shape of the 15 m‐long crystallizer with an inner diameter of 2 mm enabled narrow residence time distributions of the crystals in the pipe and excellent temperature control in the radial direction and along the tubing. Crystals entering the crystallizer had both identical growth conditions in each section and about the same time for crystal growth. Narrow crystal size distributions were achieved with decreasing differences in the volume‐mean‐diameter sizes of the seed and product crystals as seed loadings increased. Decreasing the seed size had a similar effect as increasing the seed loading, since in that case the same amount of seed mass resulted in more individual seed particles. Altering the arrangement of the coiled crystallizer with respect to spatial directions (horizontal, vertical) did not lead to a significantly different outcome. All experiments produced considerably larger product crystals in comparison to the seeds despite relatively short crystallization times of less than 3 min. Moreover, product mass gains of a few hundred percent at a g/min‐scale were achieved. Similarities in product crystal samples taken at different times at the outlet of the crystallizer showed that steady‐state conditions were rapidly reached in the continuous flow crystallization device. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献