A thin-film transistor with a very thin a-Si:H layer and its application for an LC panel

One of the disadvantages of applying an a-Si:H thin-film transistor (TFT) to an active matrix-addressed liquid crystal (LC) panel is that a TFT with an a-Si:H has a very large photo-leakage current because of the high photo-conductivity of an a-Si:H itself.We have tried decreasing the photo-leakage current by varying the thickness of an a-Si:H layer (L) in TFTs and investigated the characteristics of TFTs, mainly drain voltage versus drain current containing photo-leakage current (I _ph).As a result, it is shown that lnI _ph is proportional to InL, and its gradient is 1.5–2.0. We assume that the thinner an a-Si:H layer is, the more effective the recombination of carriers at the interface states is forI _ph.We have applied TFT with a very thin a-Si:H layer (30nm) to a full-color active matrix-addressed LC panel for a moving picture display and realized a display of good quality under illuminated condition of 5×10⁴lx without a shading layer in it.     

A poly-Si thin film transistor fabricated by new excimer laser recrystallization employing floating active structure

We fabricated a high-performance polycrystalline silicon (poly-Si) thin film transistor (TFT) by new excimer laser annealing (ELA) method employing floating active structure. The new simple ELA method produces large lateral grains exceeding 4 μm. A novel poly-Si TFT that exhibits very high mobility (μ_FE=331 cm²/V s) and low leakage current has been successfully fabricated by single laser irradiation on selectively floating a-Si layer. Uniform lateral grains have been obtained with wide ELA process window.     

尺寸可控的纳米硅的生长模型和实验验证

基于经典热力学理论，对a-SiN_x/a-Si:H/a-SiN_x三明治结构或a-Si:H/a-SiN_x多层膜结构中纳米硅成核，以及从球形到鼓形的生长过程进行了研究. 建立了限制性晶化理论模型：在纳米硅生长过程中，由于界面能增大将导致生长停止，给出限制性晶化条件——a-Si:H子层厚度小于34 nm. 在激光晶化和常规热退火两种方法形成的a-SiN_x/nc-Si/a-SiN_x三明治结构和nc-Si/a-SiN_x多层膜结构中验证了该理论模型. 关键词： 非晶硅 纳米硅 激光辐照 结晶     

A study of the density of gap states in amorphous semiconductors from thermostimulated conductivity spectra

A theoretical analysis of thermostimulated conductivity spectra _TSC(T) has been applied to determine the density of gap states g(E) in a-Si: H and a-Si: H/a-SiN _x : H multilayer structures. The results for g(E) are consistent with the results deduced from Fritzsche's analytical approach as well as other methods. A comparison has been made between the two different analytical approaches for _TSC(T). We discuss the relationship between the energy of maximum thermostimulated current emission E _m and quasi-Fermi level E _q. We demonstrate that E _q could be a better parameter than E _m in the general theoretical treatment of thermostimulated conductivity.     

a-Si:H结的横向光生伏特效应

本文通过理论分析研究了a-Si:H结中横向光生伏特效应的定态与瞬态特性。所得结果表明理论与实验非常符合。值得注意的是,按理论关系应用常规不掺杂a-Si:H特性值估算的两个重要参数(样品中的薄层电阻1/σ_s和传输时间T_m)均比由实验得出的值大得多。基于合理的分析。我们认为在a-Si:H层中平行于结输运的电子可能具有异乎寻常高的载流子迁移率。 关键词：     

a-Si ∶H/SiO2多量子阱材料制备及其光学性能和微结构研究

利用等离子体增强化学气相沉积技术制备了a-Si ∶H/SiO₂多量子阱结构材料.对a-Si ∶H/SiO₂多量子阱样品分别进行了3种不同的热处理,其中样品经1100 ℃高温退火可获得尺寸可控的nc-Si:H/SiO₂量子点超晶格结构,其尺寸与非晶硅子层厚度相当.比较了a-Si ∶H/SiO₂多量子阱材料与相同制备工艺条件下a-Si ∶H材料的吸收系数,在紫外/可见短波段前者的吸收系数明显增大,光学吸收边蓝移,说明该材料 关键词： 多量子阱 量子限制效应 光学吸收 能带结构     

a-Si:H/a-SiNx:H超晶格薄膜光致发光性质的研究

本文报道了a-Si:H/a-SiNx:H超晶格薄膜光致发光某些性质的研究。实验发现,这种超晶格薄膜光致发光的强度和峰值能量随交替层a-Si:H厚度,测量温度及光照时间等而变化。同时还发现,在阴、阳两极上,利用GD法沉积的样品,发光强度和峰值能量也有所不同。文中对这些实验结果作了初步解释。     

氮化硅介质中双层纳米硅薄膜的两级电荷存储

研究镶嵌在超薄非晶氮化硅(a-SiN_x)层之间的双层纳米硅(nc-Si)的电荷存储现象.利用等离子体增强化学气相淀积(PECVD)技术在硅衬底上制备a-SiN_x/a-Si/a-SiN_x/a-Si/a-SiN_x多层薄膜结构.采用常规热退火方法使非晶硅(a-Si)层晶化，形成包含双层nc-Si的金属-氮化物-半导体(MIS)结构.通过电容电压(C-V)特性测量，观测到该结构中由于电荷存储引起的C-V回滞现象，并在室温下成功观察到载流子基于Fowler-Nordheim(F-N)隧穿注入到第一层、第二层nc-Si的两级电荷存储状态.结合电流电压(I-V)特性的测量，对电荷存储的机理进行了深入分析. 关键词： 纳米硅 氮化硅 电容电压法 电流电压法     

Thermal behavior of gamma-irradiated low-density polyethylene/paraffin wax blend

The thermal properties of low-density polyethylene (LDPE)/paraffin wax blends were studied using differential scanning calorimetry (DSC), thermogravimetric analysis (TGA) and melt flow index (MFI). Blends of LDPE/wax in ratios of 100/0, 98/2, 96/4, 94/6, 92/8, 90/10 and 85/15 (w/w) were prepared by melt-mixing at the temperature of 150°C. It was found that increasing the wax content more than 15% leads to phase separation. DSC results showed that for all blends both the melting temperature (T_m) and the melting enthalpy (ΔH_m) decrease linearly with an increase in wax content. TGA analysis showed that the thermal stability of all blends decreases linearly with increasing wax content. No clear correlation was observed between the melting point and thermal stability. Horowitz and Metzger method was used to determine the thermal activation energy (E_a). MFI increased exponentially by increasing the wax content. The effect of gamma irradiation on the thermal behavior of the blends was also investigated at different gamma irradiation doses. Significant correlations were found between the thermal parameters (T_m, ΔH_m, T₅%, E_a and MFI) and the amount of wax content and gamma irradiation.     

Understanding of a-Si:H(p)/c-Si(n) heterojunction solar cell through analysis of cells with point-contacted p/n junction

We fabricated point-contacted a-Si:H(p)/c-Si(n) heterojunction solar cells using patterned SiO₂ and investigated their electrical properties using the light current–voltage (I–V) curve and Suns-V_oc measurements. The light I–V curves showed bias-dependent changes according to the applied voltage in the point-contacted cells, especially in the samples with a long distance between the point-contacted junctions. The Suns-V_oc measurements showed that the bias-dependence of the light I–V curves did not originate from the recombination in the SiO₂/Si or a-Si:H(p)/c-Si(n) interface, but from the series resistances. It is possible to explain the bias-dependent light I–V curve in terms of the conductivity of a-Si:H(p) and difference in the electrical contact properties between a-Si:H(p), ZnO and c-Si(n). These results mean that the electrical properties of the a-Si:H(p) layer and the contact properties with this layer are also critical to obtain a high J_sc and fill factor in n-type based Si heterojunction solar cells.     

a-Si/SiN<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> multilayered light absorber for solar cell

40 alternate a-Si/SiN _x multilayer are incorporated as an absorber layer in a p–i–n solar cell. The device is fabricated using hot-wire chemical vapor deposition (HWCVD) technique. The structure of the multilayer film is examined by high resolution transmission electron microscopy (HR-TEM) which shows distinct formation of alternate a-Si and SiN _x layers. The a-Si and SiN _x layers have thickness of ~3.5 and 4 nm, respectively. The photoluminescence (PL) of multilayer film shows bandgap energy of ~2.52 eV, is larger than that of the c-Si and a-Si. Dark and illuminated current–voltage (I–V) characterization of the ML films shows that these ML are photosensitive. In the present work, it is seen that the p–i–n structure with i-layer as ML quantum well (QW) structures show photovoltaic effect with relatively high open-circuit voltage (V _OC). The increment of bandgap energy in PL and high V _OC of the device is attributed to the quantum confinement effect (QCE).     

Heterogeneous crystallization of amorphous silicon expedited by external force fields: a molecular dynamics study

Applying a molecular dynamics simulation technique with the Tersoff potential, we investigate the isothermal crystallization processes of amorphous silicon (a-Si). To obtain a realistic amorphous structure, a rapid quenching process from liquid-phase at 3500 K to solid-phase at 500 K is simulated at a rate of 10¹² K/s and the Voronoi analysis is conducted to observe atomic structural changes during this cooling process. This amorphous structure is utilized to simulate the crystallization processes at various process temperatures with and without external force fields. While homogeneous crystallization of a-Si could not be achieved readily, it is shown that the heterogeneous crystallization can be significantly accelerated by external force fields. This enhancement is owing to increased molecular jumping frequencies associated with the molecular potential energies being increased by external excitations, rather than due to thermal mechanisms normally found in conventional solid-phase crystallization processes.     

B掺杂a-SiC:H/本征a-Si:H异质结中的B扩散

本文用 ¹¹B(p,a)⁸ Be(E_{r=163keV)核反应分析方法,研究不同生长温度和退火温度对a-SiC:H(B)/a-Si:H异质结构中B原子浓度剖面分布的影响,由B原子浓度剖面分布的变化,分别估算了B在a-Si:H生长和退火过程中的扩散系数,结合电导率随膜厚度变化的测量,并依据最新提出的热平衡缺陷观点,对B的扩散过程作了分析。 关键词：}     

Effects of hydrogen plasma annealing on the luminescence from a-Si:H/SiO2 and nc-Si/SiO2 multilayers

Effects of post-hydrogen plasma annealing (HPA) on a-Si:H/SiO₂ and nc-Si/SiO₂ multilayers have been investigated and compared. It is found that photoluminescence (PL) from hydrogen-passivated samples was improved due to the reduction of non-radiative recombination defects. Some interesting difference is that during HPA, atomic hydrogen can directly passivate defects of a-Si:H/SiO₂, which results in the reappearance of luminescence band at 760 nm, while for nc-Si/SiO₂, hydrogen passivation requires additional thermal annealing after nc-Si/SiO₂ multilayer was treated by HPA. It is indicated that higher atomic mobility is needed to passivate defects at nc-Si/SiO₂ interface compared with a-Si:H/SiO₂ interface.     

Spinon thermal conductivity of-(CuO2)-spin chains in LiCuVO4

The thermal conductivity κ ^b_tot of the quasi-one-dimensional (S=1/2) Heisenberg antiferromagnet LiCuVO₄ with uniform (-CuO₆-) spin chains aligned parallel to the b axis in a crystal with an orthorhombically distorted inverse spinel structure is measured in the temperature range 10–300 K. The spinon component κ ^chain_m of the thermal conductivity is separated out.

     

Phase transition and high temperature thermoelectric properties of copper selenide Cu2-x Se （0 ≤ x ≤ 0.25）

With good electrical properties and an inherently complex crystal structure, Cu_2-xSe is a potential “phonon glass electron crystal” thermoelectric material that has previously not attracted much interest. In this study, Cu_2-xSe (0 ≤ x ≤ 0.25) compounds were synthesized by a melting-quenching method, and then sintered by spark plasma sintering to obtain bulk material. The effect of Cu content on the phase transition and thermoelectric properties of Cu_2-xSe were investigated in the temperature range of 300 K—750 K. The results of X-ray diffraction at room temperature show that Cu_2-xSe compounds possess a cubic structure with a space group of Fm3m (#225) when 0.15 < x le 0.25, whereas they adopt a composite of monoclinic and cubic phases when 0 ≤ x ≤ 0.15. The thermoelectric property measurements show that with increasing Cu content, the electrical conductivity decreases, the Seebeck coefficient increases and the thermal conductivity decreases. Due to the relatively good power factor and low thermal conductivity, the nearly stoichiometric Cu₂Se compound achieves the highest ZT of 0.38 at 750 K. It is expected that the thermoelectric performance can be further optimized by doping appropriate elements and/or via a nanostructuring approach.     

Elastic properties of monoclinic telluric acid ammonium phosphate,Te(OH)6·2NH4H2PO4·(NH4)2HPO4, near the paraelectric-ferroelectric transition

The elastic constants of Te(OH)₆·2NH₄H₂PO₄·(NH₄)₂HPO₄, TAAP, point symmetrym, have been measured by ultrasonic resonance methods passing through the paraelectric-ferroelectric transition at ca. 320 K. In the range between 273 and 340 K the elasticity tensor exhibits only a slight anisotropy. No discontinuity of the elastic constants is observed. However, some temperature derivatives of the elastic constants show slight anomalies within the range 310 to 325 K. The strongest effect occurs with the longitudinal elastic resistancec ₂₂. The thermal expansion which varies only slightly between 263 and 340 K, is highly anisotropic in contrast to the thermoelastic behaviour. A strong negative thermal expansion is observed in a direction within the mirror plane, ca. 45° apart from the direction of spontaneous polarization.This effect is not accompanied by a corresponding thermoelastic anomaly. The interactions connected with the transition are of the totally symmetric type. Like many other properties the elastic and thermoelastic behaviour of TAAP resembles that of triglycine sulphate (TGS). Larger differences between TAAP and TGS are found in the pressure dependence of various properties. For example the pressure dependence of the transition temperatureT is negative for TAAP (–3.8 K/kbar) and positive for TGS (3.9 K/kbar).Dedicated to Prof. Dr. H.E. Müser on the occasion of his 60th birthday     

Quantum emission efficiency of nanocrystalline and amorphous Si quantum dots

The paper presents the comparison of emission efficiencies for crystalline Si quantum dots (QDs) and amorphous Si nanoclusters (QDs) embedded in hydrogenated amorphous (a-Si:H) films grown by the hot wire-CVD method (HW-CVD) at the variation of technological parameters. The correlations between the intensities of different PL bands and the volumes of Si nanocrystals (nc-Si:H) and/or an amorphous (a-Si:H) phase have been revealed using X-ray diffraction (XRD) and photoluminescence (PL) methods. These correlations permit to discuss the PL mechanisms in a-Si:H films with embedded nc-Si QDs. The QD parameters of nc-Si:H and a-Si:H QDs have been estimated from PL results and have been compared (for nc-Si QDs) with the parameters obtained by the XRD method. Using PL and XRD results the relations between quantum emission efficiencies for crystalline (η_cr) and amorphous (η_am) QDs have been estimated and discussed for all studied QD samples. It is revealed that a-Si:H films prepared by HW-CVD with the variation of wire temperatures are characterized by better passivation of nonradiative recombination centers in comparison with the films prepared at the variation of substrate temperatures or oxygen flows.     

Model of current and optical conductivity switching in YBa2Cu3O7−x films

A model is proposed for the thermal and electrical responses of films of the high-T _c superconducting material YBa₂Cu₃O7_7−x to current and optical pulses. Numerical calculations are compared with experimental data for current pulses of duration 100 μs and laser pulses of duration 0.1 ns; this yields improved data on the thermal conductivity of thin YBa₂Cu₃O7_7−x films (1.5–2 W/m·K) and thermal resistance of the film-substrate contact (5×10⁻⁸m²·K/W) in the neighborhood of the superconducting transition. This model can be used for optimizing the film structure parameters and control regimes for switching elements for pulses lasting longer than 0.1 ns. Zh. Tekh. Fiz. 69, 77–82 (October 1999)     

High-pressure effect on the ferroelectric-paraelectric transition in PbTiO<Subscript>3</Subscript>

The crystal structure of lead titanate PbTiO₃ was investigated by energy dispersive X-ray diffraction at high pressures up to 4 GPa in a temperature range of 300–950 K. At the ambient conditions, the PbTiO₃ structure is tetragonal with the space group P4mm (ferroelectric phase). A structural phase transition into the cubic phase with a space group Pm[`3]mPm\bar 3m is observed at T = 747 K. It was found that the phase transition temperature decreases upon applying the high pressure with the coefficient dT _C /dP = -65 K/GPa. Dependences of parameters and volume of the unit cell on the pressure and temperature was found, and the bulk modulus and thermal expansion coefficients for the tetragonal and cubic phases of lead titanate have been calculated.