Polarization and p-type doping effects on photoresponse of separate absorption and multiplication AlGaN solar-blind avalanche photodiodes

The photoresponse characteristics of separate absorption and multiplication (SAM) AlGaN solar-blind avalanche photodiodes (APDs) were investigated in detail. The p-i-n-i-n avalanche photodiodes were examined using the newly designed model of avalanche photodiodes in AlGaN. The research results showed that the dark current density was about 3.51 × 10^?8 A/cm², the light current density was 5.86 × 10^?5 A/cm² under near-zero bias, and the avalanche breakdown occurred at about 135.0 V under reverse bias, which were all consistent with the experimental data. To investigate the effects influencing the photoresponse characteristics of the APDs, their photo responsivity spectra under different biases were simulated. The APD featured a window region over the wavelength range from 260 to 280 nm with a high rejection ratio on the short-wavelength side. Meanwhile, the dependence of APD responsivity on the polarization charge revealed that the negative polarization charges strongly affected the responsivity. Increased negative polarization charges at the Al_0.4Ga_0.6N/Al_0.6Ga_0.4N interface markedly lowered the responsivity, whereas charges of the same polarity at the GaN/Al_0.4Ga_0.6N interface enhanced the responsivity. Furthermore, the dependence of responsivity on p-type doping was analyzed by comparison with the effects of negative polarization charges on the conduction band of the APDs. Finally, the inversion layer models are used to interpret the effects of these on the APD responsivity. This research is useful for exploring polarization and p-type doping effects in SAM AlGaN structures and realization of high responsivity solar-blind APDs.     

Synthesis of blue-shifted luminescent colloidal GaN nanocrystals through femtosecond pulsed laser ablation in organic solution

We demonstrate the synthesis of GaN nanocrystals (NCs) with the sizes of less than the doubled exciton Bohr radius leading quantum confinement effects via a single-step technique. The generation of colloidal GaN nanoparticles (NPs) in organic solution through nanosecond (ns) and femtosecond (fs) pulsed laser ablation (PLA) of GaN powder was carried out. Ns PLA in ethanol and polymer matrix resulted in amorphous GaN-NPs with the size distribution of 12.4 ± 7.0 and 6.4 ± 2.3 nm, respectively, whereas fs PLA in ethanol produced colloidal GaN-NCs with spherical shape within 4.2 ± 1.9 nm particle size distribution. XRD and selected area electron diffraction analysis of the product via fs PLA revealed that GaN-NCs are in wurtzite structure. Moreover, X-ray photoelectron spectroscopy measurements also confirm the presence of GaN nanomaterials. The colloidal GaN-NCs solution exhibits strong blue shift in the absorption spectrum compared to that of the GaN-NPs via ns PLA in ethanol. Furthermore, the photoluminescence emission behavior of fs PLA-generated GaN-NCs in the 295–400 nm wavelength range is observed with a peak position located at 305 nm showing a strong blue shift with respect to the bulk GaN.     

Design and fabrication of single-crystal GaN nano-bridge on homogeneous substrate for nanoindentation

This study reports a simple method to design and fabricate a freestanding GaN nano-bridge over a homogeneous short column as supporting leg. Test samples were fabricated from MOCVD-grown single-crystal GaN films over sapphire substrate using a FIB milling to leave freestanding short spans. We also investigated the nanoindentation characteristics and the corresponding nanoscopic mechanism of the GaN nano-bridge and its short column with a conical indenter inside transmission electron microscopy. The stress–strain mechanical properties and Young’s modulus have also been examined and calculated as 108 GPa ± 4.8 % by the strain energy method. The significant slope switch of the L–D curve corresponds to the transition from the single-point bending indentation to the surface stretching indentation and has been interpreted with the evolution of TEM images. This freestanding fabrication and test have key advantages to characterize nanoscale behavior of one-dimensional bridge structure and greater ease of sample preparation over other micro-fabrication techniques.     

Electric field gradients at 151Eu sites in GaN

The electric field gradients at Eu sites in GaN have been investigated in conversion electron Mössbauer spectroscopy (CEMS) in which ¹⁵¹Eu probe ions were implanted into an undoped GaN layer grown on a sapphire substrate. The sample was implanted with 120 keV ¹⁵¹Eu ions to a fluence of 1 × 10¹⁵, and annealed at 1,200 K. CEMS spectra of the ¹⁵¹Eu 21.6 keV transition were collected, of the GaN sample as well as of a Si sample implanted with overlapping profiles of ¹⁵¹Eu and O. The GaN spectra were fitted with two symmetric doublets, D1 and D2, with isomer shifts and quadrupole splittings of δ?=??0.27 mm/s (relative to Eu₂O₃), ΔE _Q?= 0.85 (3) mm/s; and δ?=?? 0.22 mm/s, ΔE _Q?= 2.90 (5) mm/s, respectively. D1 is attributed to Eu at substitutional Ga lattice sites; D2 to Eu at or near substitutional sites but with extensive lattice damage. The splittings of D1 and D2 correspond to quadrupole coupling frequency of 15 (2) and 50 (4) MHz, consistent with measurements of ⁶⁹Ga, ⁷¹Ga and ¹¹¹In in GaN.     

Synthesis and characterization of graphene-based nanocomposites with potential use for biomedical applications

In this paper, GaN nanoparticles were synthesized from the complex Ga(H₂NCONH₂)₆Cl₃ in the flow of NH₃ at a mild temperature (350 °C). Further purification was performed by the ethanol-thermal method. The ethanol-thermal method also prompted the GaN nanoparticles to grow into an anisotropic morphology. XRD patterns reveal that GaN nanoparticles have crystallized in a hexagonal wurtzite structure. TEM observation shows that the average size of the as-prepared nanoparticles is about 5–10 nm. The photoluminescence spectrum exhibits a broad green emission band with a peak at 510 nm. It can be known from the first-principle theoretic simulation by the TDDFT method that this fluorescence emission band is attributed to the hydride defects of V _N-H on the surface of GaN nanoparticles.     

Investigation of threshold switching mechanism based on Mn-doped ZnO/GaN heterojunction by photogenerated carrier injection

Highly c-axis oriented ZnO thin films have been prepared on n-type GaN-coated sapphire substrates by radio frequency reactive magnetron sputtering at 100 °C followed by thermal annealing at 740 °C for 2 h. The ZnO/GaN heterojunction devices show a steady threshold switching (TS) characteristic. In addition, Mn-doped ZnO (MZO)/GaN heterojunction has been prepared and it shows lower threshold voltage and higher on/off ratio than those of ZnO/GaN heterojunction. The formation of TS characteristic may be attributed to trapping and detrapping of electrons in heterojunction device. Furthermore, the devices are investigated by the injection of photogenerated carriers, it is illustrated that the external carrier injection may affect the rate of the trapping of electrons and results in the decrease of the threshold voltage.     

Strain modification of AlGaN layers using swift heavy ions

Epitaxial AlGaN/GaN layers grown by molecular beam epitaxy (MBE) on SiC substrates were irradiated with 150 MeV Ag ions at a fluence of 5×10¹² ions/cm². The samples used in this study are 50 nm Al_0.2Ga_0.8N/1 nm AlN/1 μ m GaN/0.1 μ m AlN grown on SI 4H-SiC. Rutherford backscattering spectrometry/channeling strain measurements were carried out on off-normal axis of irradiated and unirradiated samples. In an as-grown sample, AlGaN layer is partially relaxed with a small tensile strain. After irradiation, this strain increases by 0.22% in AlGaN layer. Incident ion energy dependence of dechanneling parameter shows E ^1/2 dependence, which corresponds to the dislocations. Defect densities were calculated from the E ^1/2 graph. As a result of irradiation, the defect density increased on both GaN and AlGaN layers. The effect of irradiation induced-damages are analyzed as a function of material properties. Observed results from different characterization techniques such as RBS/channeling, high-resolution XRD and AFM are compared and complemented with each other to deduce the information. Possible mechanisms responsible for the observations have been discussed in detail.     

Ni/Ag Schottky contacts on Al0.11Ga0.89N grown on Si (1 1 1) substrate by plasma-assisted MBE

Al_0.11Ga_0.89N/GaN samples are grown by plasma-assisted molecular beam epitaxy method on (1 1 1) silicon substrates. High purity gallium (7N) and aluminum (6N5) were used to grow Al_0.11Ga_0.89N, GaN, and AlN, respectively. The surface morphology, structural and optical properties of the sample has been investigated by scanning electron microscope (SEM), and high-resolution X-ray diffraction (HR-XRD), respectively. HR-XRD measurement showed that the sample has a typical diffraction pattern of hexagonal Al_0.11Ga_0.89N/GaN heterostructures. Ni/Ag bilayers are deposited on Al_0.11Ga_0.89N as the Schottky contacts. The effect of annealing in oxygen ambient on the electrical properties of Ni/Ag/Al_0.11Ga_0.89N is studied by current–voltage measurement. The annealing at a temperature of 700 °C for 10?min results in an increase in the ideality factor from 1.033 to 1.042 and an increase in the Schottky barrier height from 0.708 to 0.811 eV. Furthermore, the annealing in oxygen ambient also leads to an increase in the surface roughness of the contacts from 0.0098 to 0.1360 μm which is in agreement with the SEM results.     

Simulations of nanograting-assisted light coupling in GaN planar waveguide

The numerical simulations of nanogratings integrated with gallium nitride (GaN) planar waveguides as well as the experimental in-coupling results are presented. A simulation tool based on the eigenmode expansion method and advanced boundary conditions provided a rigorous model of 400-nm-period grating couplers. A full-vectorial Maxwell solver allowed performing a number of simulations with varying grating parameters, where coupling efficiency, reflection and transmission characteristics of device were calculated. Gratings with different etch depths and arbitrary shapes were simulated using a staircase approximation, with an optimized number of steps per single slope. For the first time, an impact of dry etch processing on GaN coupler efficiency was evaluated, due to the inclusion of the sloped sidewalls, with regard to the technological constrains. Finally, the experimental results in the visible spectrum region (?? = 633 nm), for 400-nm-deep gratings etched in GaN waveguide, were presented together with theoretical data for binary and trapezoidal profiles of a grating, for different optical mode profiles ( ${{\rm TE}_{0}\div {\rm TE}_{3}\,{\rm modes}}$ ).     

Surface spherical crown arrays structure increases GaN-based LED efficiency

To increase the light extraction efficiency of GaN-based light-emitting diode (LED) with nano-spherical hexagonal arrays, the finite-difference time-domain method was used to optimize the structure parameters such as radius and height of GaN, $\text{ SiO}_{2}$ and ZnO spherical crown. The light extraction efficiency (LEE) of the GaN spherical crown hexagonal arrays with a radius of 473 nm and a height of 250 nm over the LED surface exhibited 5.7 times the enhancement compared with that of the planar LED, and better than the LEE of the same type of structures with other parameters.     

Characterization and comparison between Ig(Vgs) structures HEMT AlInN/GaN and AlGaN/GaN

In this paper, we have studied the Schottky contact of two structures AlInN/GaN and AlGaN/GaN in transistors HEMTs. The current–voltage Igs(Vgs) of AlInN/GaN and AlGaN/GaN structures were investigated at room temperature. The electrical parameters such as ideality factor (2.3 and 1.96), barrier height (0.72 and 0.71 eV) and series resistance (33 and 153 $\Omega $ ) were evaluated from I–V data. The comparison of the performance of the two structures AlInN/GaN and AlGaN/GaN in transistors HEMTs have been analyzed and discussed.     

Evidence for a transition in deformation mechanism in nanocrystalline pure titanium processed by high-pressure torsion

Nanocrystalline titanium with an average grain size of about 60–70 nm was prepared by high-pressure torsion. The results of hardness and structural evolutions indicate that a strain-induced hardening–softening–hardening–softening behaviour occurs. For coarse-grained titanium, 〈a〉-type dislocation multiplication, twinning and a high pressure-induced α-to-ω phase transformation play major roles to accommodate deformation, leading to a significant strain hardening. As deformation proceeds, dynamic recrystallisation leads to a decrease in dislocation density, especially for 〈a〉-type dislocations, leading to a slight strain softening. The 〈c〉-component dislocation multiplication dominates the deformation when the grain size decreases to 100 nm and 〈c〉-component dislocation multiplication, grain refinement and the α-to-ω phase transformation contribute to the second strain hardening. The following strain softening is attributed to dynamic recovery.     

Optical excitation study on the efficiency droop behaviors of InGaN/GaN multiple-quantum-well structures

Efficiency droop is generally observed in electroluminescence under high current injection. Optical characterization on efficiency droop in InGaN/GaN multiple-quantum-well structures has been conducted at 12 K. Clear droop behaviors were observed for the sample excited by above-bandgap excitation of GaN with pulse laser. The results show that dislocation is not the crucial factor to droop under high carrier density injection, and Auger recombination just slightly affects the efficiency. The radiative recombination may be mainly affected by a multi-carrier-related process (diffusion and drift with a factor of n ^3.5 and n ^5.5) at the interface between GaN barrier and InGaN well.     

An improved EEHEMT model for kink effect on AlGaN/GaN HEMT

In this paper, a new current expression based on both the direct currect(DC) characteristics of the AlGaN/GaN high election mobility transistor(HEMT) and the hyperbolic tangent function tanh is proposed, by which we can describe the kink effect of the AlGaN/GaN HEMT well. Then, an improved EEHEMT model including the proposed current expression is presented. The simulated and measured results of I–V, S-parameter, and radio frequency(RF) large-signal characteristics are compared for a self-developed on-wafer AlGaN/GaN HEMT with ten gate fingers each being 0.4-μm long and 125-μm wide(Such an AlGaN/GaN HEMT is denoted as AlGaN/GaN HEMT(10 × 125 μm)). The improved large signal model simulates the I–V characteristic much more accurately than the original one, and its transconductance and RF characteristics are also in excellent agreement with the measured data.     

Optical properties of type-II InGaN/GaAsN/GaN quantum wells

Optical properties of type-II InGaN/GaNAs QW light-emitting diodes are investigated by using the multiband effective mass theory. These results are compared with those of conventional InGaN/GaN QW structures. The type-II InGaN/GaNAs/GaN QW structure shows much larger spontaneous emission and optical gain than that of a conventional QW structure. This can be explained by the fact that, in the case of the type-II QW structure, the effective well width is greatly reduced. A type-II QW structure shows that the peak position at a high carrier density is similar to that (530 nm) at a low carrier density. On the other hand, in the case of a conventional QW structure, the peak position is largely blueshifted at a high carrier density.     

High vertical breakdown strength in with low specific on‐resistance AlGaN/AlN/GaN HEMTs on silicon

Off‐state and vertical breakdown characteristics of AlGaN/AlN/GaN high‐electron‐mobility transistors (HEMTs) on high‐resistivity (HR)‐Si substrate were investigated and analysed. Three‐terminal off‐state breakdown (BV_gd) was measured as a function of gate–drain spacing (L_gd). The saturation of BV_gd with L_gd is because of increased gate leakage current. HEMTs with L_gd = 6 µm exhibited a specific on‐resistance R_DS[ON] of 0.45 mΩ cm². The figure of merit (FOM = BV_gd²/R_DS[ON]) is as high as 2.0 × 10⁸ V² Ω^–1 cm^–2, the highest among the reported values for GaN HEMTs on Si substrate. A vertical breakdown of ～1000 V was observed on 1.2 µm thick buffer GaN/AlN grown on Si substrate. The occurrence of high breakdown voltage is due to the high quality of GaN/AlN buffer layers on Si substrate with reduced threading dislocations which has been confirmed by transmission electron microscopy (TEM). This indicates that the AlGaN/AlN/GaN HEMT with 1.2 µm thick GaN/AlN buffer on Si substrate is promising candidate for high‐power and high‐speed switching device applications. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Role of substrate temperature on structure and magnetization of Cr-implanted GaN thin film

Chromium ions implantation was performed into metal–organic chemical vapor deposition grown GaN thin film of thickness about 2 µm at 5 × 10¹⁶ cm^?2 fluence. Implantation was performed at various substrate temperatures (RT, 250, 350 °C). Rapid thermal annealing was employed at 900 °C to remove implantation-induced damages as well as for activation of dopant. Structural study was performed by Rutherford backscattering and channeling spectrometry and high-resolution X-ray diffraction. To confirm magnetic properties at room temperature, hysteresis loops were obtained using alternating gradient magneto-meter. Well-defined hysteresis loops were achieved at 300 K in implanted and annealed samples. Temperature-dependent magnetization indicated magnetic moment at 5 K and retain up to 380 K.     

高电子迁移率晶格匹配InAlN/GaN材料研究

文章基于蓝宝石衬底采用脉冲金属有机物化学气相淀积(MOCVD)法生长的高迁移率InAlN/GaN材料,其霍尔迁移率在室温和77 K下分别达到949和2032 cm²/Vs,材料中形成了二维电子气(2DEG). 进一步引入1.2 nm的AlN界面插入层形成InAlN/AlN/GaN结构,则霍尔迁移率在室温和77 K下分别上升到1437和5308 cm²/Vs. 分析样品的X射线衍射、原子力显微镜测试结果以及脉冲MOCVD生长方法的特点,发现InAlN/GaN材料的结晶质量较高,与GaN晶格匹配的InAlN材料具有平滑的表面和界面. InAlN/GaN和InAlN/AlN/GaN材料形成高迁移率特性的主要原因归结为形成了密度相对较低(1.6×10¹³-1.8×10¹³ cm^-2)的2DEG,高质量的InAlN晶体降低了组分不均匀分布引起的合金无序散射,以及2DEG所在界面的粗糙度较小,削弱了界面粗糙度散射. 关键词： InAlN/GaN 脉冲金属有机物化学气相淀积 二维电子气 迁移率     

GaN基异质结缓冲层漏电分析

通过对GaN基异质结材料C-V特性中耗尽电容的比较,得出AlGaN/GaN异质结缓冲层漏电与成核层的关系.实验结果表明,基于蓝宝石衬底低温GaN成核层和SiC衬底高温AlN成核层的异质结材料比基于蓝宝石衬底低温AlN成核层异质结材料漏电小、背景载流子浓度低.深入分析发现,基于薄成核层的异质结材料在近衬底的GaN缓冲层中具有高浓度的n型GaN导电层,而基于厚成核层的异质结材料的GaN缓冲层则呈高阻特性.GaN缓冲层中的n型导电层是导致器件漏电主要因素之一,适当提高成核层的质量和厚度可有效降低GaN缓冲层的背景载流子浓度,提高GaN缓冲层的高阻特性,抑制缓冲层漏电. 关键词： AlGaN/GaN异质结 GaN缓冲层 漏电 成核层     

Power scaling of a side-pumped Nd:YLF laser based on DBMC technology

This work demonstrates the power scalability of double-beam-mode controlling, a technique that has generated the highest optical efficiency reported so far for Nd:YLF lasers. We analyze two types of power scaling possibilities by numerical simulations: multiplication of intracavity pump modules and MOPA configuration. About 44 W of TEM₀₀ output power at 1053 nm was experimentally demonstrated with a beam-parameter product of 1.07 × 1.15. The results show great ease of power scaling without sacrificing beam quality.