TEM and X-ray investigations of defect structure of PbSnTe crystal

The Pb_0.8Sn_0.2Te single crystal grown by the Bridgman technique was examined by X-ray and TEM methods. The X-ray reflection topography revealed that the PbSnTe crystal consisted of monocrystallinic blocks with linear dimensions of 1–5 mm separated by low angle boundaries of tilt-twist character. “As grown” defects observed by TEM method have been identified as single perfect dislocations and dislocation pairs. A mean density of dislocations inside the crystal blocks was no more than 10³ cm⁻². Except “as grown” defects rows of mobile dislocations were observed. All of dislocations lines were characterized by the same type of Burgers vector, i.e. b = 1/2a〈110〉.     

Plastische Verformung von Siliziumeinkristallen unterschiedlicher Ausgangsversetzungsdichte im Streckgrenzenbereich

Floating-zoned Silicon crystals orientated for single slip both dislocation-free and with grown-in dislocations (EPD₀ = 6,5 · 10⁴ cm⁻²) were dynamically deformed in compression in the temperature range 1120 … 1300 K up to the lower yield point. The dislocation structure of plastically deformed crystals (T = 1138 K; a₀ = 1,45 · 10⁻⁴ s⁻¹) was examined by etching and high-voltage electron microscopy. The crystals exhibit essential differences in deformation behaviour and in the resulting dislocation structure. Typical for the dislocation-free basic material are (i) an inhomogeneous deformation in the range of the upper yield point (ii) a greater portion of sessile lomer dislocations at the lower yield point in relation to the crystal with grown-in dislocations. The measured stresses were related to those values calculated from structure data by employing plasticity theory of diamond-like semiconductors.     

Temperature and Strain Rate Effects on Work-Hardening of KCl Single Crystals

The influence of temperature and strain rate on work hardening of a KCl crystal has been investigated. Using the experimental data on flow stress relaxation, the activation “volume” for dislocation motion and internal counteracting stresses have been calculated in the temperature range of 300 to 40 K. Estimation has been carried out for the variation of a number of mobile dislocations ϱ₂/ϱ₁, when the strain rate is changed by a factor of four.     

Effects of the Crystal Diameter on the Dislocation Density in KCl Crystals Grown by the Czochralski Method

The dependence of dislocation density on the crystal diameter of the Czochralski grown KCl crystals (both pure and Sr doped) was investigated by the method of the etch pit and X-ray topograph. (1) The dislocation density drastically decreased with the decrease in diameter (D) for small D (D < 2 mm, Fig. 2). (2) The dislocation density in the Sr doped crystal was lower than that of pure component in the diameter examined. (3) Many helical dislocations and dislocation loops were observed in the thin crystals (D ∼ 0.5 mm) of the pure KCl and Sr doped one, respectively, by X-ray projection topography. These results were discussed in connection with the dislocation generation mechanisms due to thermal stresses or supersaturated point defects.     

Dislocation density in heteroepitaxial indium arsenide layers

In As layers have been grown by CVD on (111)B-oriented GaAs substrates. The dislocation density (N_D) distribution through the layer thickness has been studied. N_D is dependent on the mole fraction of AsCl₃ in the gaseous phase and, consequently, on the current carriers concentration. This results in the supposition that the decreasing of N_D in the layers after a “critical” thickness is due to the “pinning” of dislocations at impurity atoms which form stronger bonds with the host In or As atoms than the bond In–As, an effect which is known for bulk GaAs and InP crystals.     

Effects of the dislocation collective behaviour in plasticity of single crystals

An analysis has been carried out of the motion of a pair of sign-similar edge dislocations under a constant shear stress in a simplest nonuniform field of internal stresses τ_i with a constant gradient. The influence is shown of the dislocation interaction and τ_i on the activation „volume”︁ of the average velocity of a dislocation pair, which is measured by the flow stress relaxation. The experimentally revealed anomalies of the activation „volume”︁ measured by the flow stress relaxation are regarded as corroborating the analysis and as manifestations of the collective effects of the elastic interaction of sign-similar mobile dislocations.     

Edge misfit dislocations in the GeSi/Si(001) pair: Conditions and specific features of high-quantity generation

Dislocation structure of Ge_xSi_1?x films (x=0.4?0.8) grown by molecular-beam epitaxy on Si(001) substrates was studied by means of transmission electron microscopy. It was found that the density of edge MDs formed at the early stage of plastic strain relaxation in the films could exceed the density of 60° MDs. In our previous publications, a predominant mechanism underlying the early formation of edge misfit dislocations (MD) in Ge_xSi_1?x/Si films with x>0.4 was identified; this mechanism involves the following processes. A 60° glissile MD provokes nucleation of a complementary 60° MD gliding on a mirror-like tilted plane (111). A new edge MD forms as a result of interaction of the two complementary 60° MDs, and the length of the newly formed edge MD can then be increased following the motion of the “arms” of the complementary 60° MDs. Based on this scenario of the edge MD generation process, we have calculated the critical thickness of insertion of an edge MD into GeSi layers of different compositions using the force balance model. The obtained values were found to be more than twice lower than the similar values for 60° MDs. This result suggests that a promising strategy towards obtaining dislocation arrays dominated by 90° dislocations in MBE-grown Ge_xSi_1?x/Si films can be implemented through preliminary growth on the substrate of a thin, slightly relaxed buffer layer with 60° MDs present in this layer. The dislocated buffer layer, acting as a source of threading dislocations, promotes the strain relaxation in the main growing film through nucleation of edge MDs in the film/buffer interface. It was shown that in the presence of threading dislocations penetrating from the relaxed buffer into the film nucleation of edge MDs in the stressed film can be initiated even if the film thickness remains small in comparison with the critical thickness for insertion of 60° MDs. Examples of such unusual MD generation processes are found in the literature.     

Mesoscopic and microscopic aspects of the PSB formation mechanism in fatigued FCC monocrystals

Persistent zones of plastic strain localization (PSBs) can be observed in fatigued fee monocrystals above the “nucleation cycle number” N_n and the “nucleation stress” amplitude τ_n, respectively. They follow after temporary strain localizations existing at N < N_n and being discernible by oscillations of the relative shape of the hysteresis loops (V_H) or by strain bursts. Using a simple rheological model the frequency of internal stresses of mesoscopic wave length (“mesoscopic stresses”) was determined for Ni monocrystals fatigued at four different plastic strain amplitudes up to N_n. A “mesoscopic threshold stress” τ* has been found to be exceeded within the whole volume of the dislocation-dense regions (DRs) at N ≧ N_n. By comparison of τ* with the stress for the operation of Frank-Read sources of the segment lengths l₀ at the border of the DRs, it might be assumed that above N_n and τ_n respectively a mechanism of dislocation sources acts, compensating the high annihilation rate of movable dislocations in the zones of strain localization. In so doing the formation of persistent zones of strain localization becomes possible, in which the “ladder-like” dislocation structure of the final PSBs develops successively.     

TEM-Untersuchungen von Gitterfehlern in ZnSiP2-Einkristallen

Results are dealt with concerning TEM investigations of lattice defects in ZnSiP₂ single crystals. After the crystal growth dislocations or stacking faults were found in a few cases only. More frequently twins were present in the microstructure. The crystallographic elements of twinning are {112} 〈111〉. After plastic deformation by bending at 900 °C local dislocation arrangements with high defect density (N_v ≈ 10⁶…︁ 10⁷ cm⁻²) were observed. By means of the diffraction contrast one Burgers vector b = 1/2 〈111〉 could be identified. In some cases the crystals also contained wide deformation stacking faults, which were limited by partial dislocations. The density of twins was not increased under the conditions of deformation reported here. As it can be concluded from investigations of Oettel et al. and from the results of the twin analysis, slip and generation of stacking faults take place on {112}-planes in ZnSiP₂ crystals. Crystallographic considerations on both processes are dealt with.     

Vickers indentation hardness of Hg1−xCdxTe

The Vickers indentation hardness of Hg_1−xCd_xTe has been measured as a function of composition x using monocrystalline samples of Bridgman and THM crystals and polycrystalline starting material at room temperature. The microhardness varied between 220 MPa (x=0) and 440 MPa (x=1), showing a maximum of 850 MPa at x ∼ 0.75, and was different between monocrystalline and polycrystalline samples. The “hardening rate” dH/dx is strongly dependent on the composition range and is discussed in context with solid solution hardening due to elastic interactions of solute atoms with gliding dislocations and ordering effects.     

Dislocations in magnetic garnet crystals

1. Dislocations in magnetic flux-grown garnet crystals (Y₃Fe₅O₁₂ and others) have been observed. As a rule, {110} growth pyramids have more defects than {211} ones. 2. The highest content of defects (dislocation density 10³–10⁴ cm⁻²) is observed in Y₃Fe₅O₁₂ that grows on crucible walls adjacent to the free surface of the solution where the flow of heat is not uniform to the greatest degree. Bottom grown crystals usually have less dislocations. Far fewer dislocations are in wall grown crystals, least of all dislocations are contained in crystals that grow inside the solution. The solution pouring off at the end of the crystallization period increases dislocation density by some dozens. 3. Heat treatment decreases dislocation density. The less dislocation content and the lower ordering are in the initial crystal, the higher heat treatment effectiveness.     

Effect of the defect structure character in calcite single crystals on X-ray diffraction

The paper presents experimental results for the dependence of the integral intensity of anomalous transmission T_i and Laue reflection R_i of X-rays on the structural quality of calcite single crystals as obtained by a two-crystal spectrometer. The relation between X-ray dynamic and kinetic scattering as a function of the sample thickness, densities of perfect dislocations in perfect CaCO₃ crystals and of atom-vacancy complexes in calcite crystals with „background”︁ has been found. Distortions due to perfect grown-in dislocations in calcite are shown to exceed those produced in crystals with „background”︁. The latter appear to be more X-ray transparent. A comparison with results of twin layer thickening experiments on CaCO₃ crystals of different qualities again points to the different nature of these distortions. In CaCO₃ crystals with the dislocation density of up to 2 × × 10³ cm⁻², the X-ray scattering, in our experiments, was consistent with the dynamic diffraction theory, while at higher dislocation densities, the X-ray scattering markedly differs from it.     

Sub-boundaries on (002) cleavages of Li2CO3 single crystals

Linear arrays of dislocations (straight, terminating and curved) are observed on etching with 2% citric acid (002) cleavages of lithium carbonate (Li₂CO₃) single crystals, grown by zone melting technique. As the dislocations are non-uniformly spaced and disappear on successive etching, they may not be revealing low-angle grain boundary, nor slip traces as they are terminating and curved meaning crystallographically non-oriented. On the observation of experiments on successive etching and etching of matched pairs, it is concluded that the arrays of etch pits reveal dislocation walls (dislocation density 1.1 × 10⁶ — 1.5 × 10⁷ pits cm⁻²) probably created due to the localized thermal stresses released as a result of high temperature annealing of the crystal during growth. The implications are discussed.     

Single‐crystal sapphire microstructure for high‐resolution synchrotron X‐ray monochromators

We report on the growth and characterization of sapphire single crystals for X‐ray optics applications. Structural defects were studied by means of laboratory double‐crystal X‐ray diffractometry and white‐beam synchrotron‐radiation topography. The investigations confirmed that the main defect types are dislocations. The best quality crystal was grown using the Kyropoulos technique. Therein the dislocation density was 10²–10³ cm⁻² and a small area with approximately 2*2 mm² did not show dislocation contrast in many reflections. This crystal has suitable quality for application as a backscattering monochromator. A clear correlation between growth rate and dislocation density is observed, though growth rate is not the only parameter impacting the quality.     

Propagation behavior of threading dislocations during physical vapor transport growth of silicon carbide (SiC) single crystals

The dislocation formation and propagation processes in physical vapor transport (PVT) grown 4H silicon carbide (4H–SiC) single crystals have been investigated using defect selective etching and transmission electron microscopy (TEM). It was found that while the growth initiation process generally increased the density of threading dislocations in the grown crystal, for certain areas of the crystal, threading dislocations were terminated at the growth initiation. Foreign polytype inclusions also introduced a high density of dislocations at the polytype boundary. In the polytype-transformed areas of the crystal, almost no medium size hexagonal etch pits due to threading screw dislocations were observed, indicating that the foreign polytype inclusions had ceased the propagation of threading screw dislocations. Based on these results, we argued the formation and propagation of the threading dislocations in PVT grown SiC crystals, and proposed the dislocation conversion process as a plausible cause of the density reduction of threading dislocations during the PVT growth of SiC single crystals.     

Nucleation of Cracks in CdS during Ultrasonic Treatment

High amplitude ultrasonic vibrations with frequencies f_r ∼ 90 kHz and vibration amplitudes ε ⩽ 3.4. 10⁻⁴ were used to obtain oscillatory stresses σ ⩽ 14 MPa in CdS single crystals. Such treatment leads to the nucleation of cracks in annealed samples and to the formation of dislocations in as-grown samples. The different behaviour can be explained by the reduction of the free dislocation segment lengths due to the diffusion of point defects towards the dislocation lines during the annealing treatment.     

Characterization of dislocations in a LiNbO3 single crystal grown by micro pulling down method

LiNbO₃ single crystals grown by the micro pulling down (μ-PD) method have been revealed to be as free of dislocations and subgrain boundaries up to 500 μm in diameter. On the other hand, μ-PD LiNbO₃ single crystals grown along the x-axis in diameter of 800 μm were observed to be dislocated due to the size effect of crystal. The Burgers vectors of dislocations were determined to be [22 01], [101 1], and [01 11] by X-ray topography.     

Specific features of formation and propagation of 60° and 90° misfit dislocations in GexSi1−x/Si films with x>0.4

The dislocation structure at the initial stage of relaxation of Ge_xSi_1−x films (x∼0.4–0.8) grown on Si (0 0 1) substrates tilted at 6° to the nearest (1 1 1) plane is studied. The use of Si substrates tilted away from the exact (0 0 1) orientation for epitaxial growth of Ge_xSi_1−x films (x≥0.4) allowed finding the basic mechanism of formation of edge dislocations that eliminate the mismatch stresses. Though the edge dislocations are defined as sessile dislocations, they are formed in accordance with the slipping mechanism proposed previously by Kvam et al. (1990). It is highly probable that a 60° misfit dislocation (MD) propagating by the slipping mechanism provokes the nucleation of a complementary 60° MD slipping in a mirror-like tilted plane (1 1 1). The reaction between these dislocations leads to the formation of an edge MD that ensures more effective reconciliation of the discrepancy. Comparative estimation of the slip velocities of the primary and induced 60° MDs and also of the resultant 90° MD is fulfilled. The slip velocity of the induced 60° MD is appreciably greater than the velocity of the primary 60° MD. Therefore, the induced MD “catches up” with the second front of the primary MD, thus forming a 90° MD propagating to both sides due to slipping of the 60° MDs forming it. The propagation velocity of the 90° MD is also greater than the slip velocity of a single 60° MD. For these reasons, 90° MDs under certain conditions that favor their formation and propagation can become the main defects responsible for plastic relaxation of GeSi films close to Ge in terms of their composition.     

The defect structure of ammonium sulphate single crystals

The defect structure of larger ammonium sulphate crystals, grown from aqueous solutions, has been studied by means of X-ray diffraction topography after Lang's method. Several types of dislocations were identified. Moreover it was found that no relationship exists between growth rate and dislocation density, which implies that crystal growth proceeds via two-dimensional nucleation. No difference was found in the defect structure of crystals grown from pure water solutions and from aqueous solutions with 10 – 20% glycerine as additive: In both cases neither growth bands nor sector boundaries were found. On the other hand, crystals grown in aqueous solutions contaminated with Mn²⁺ and Fe³⁺ revealed growth bands and for Fe³⁺ a mosaic-like structure.     

On the delay of thermally activated motion of pyramidal dislocations in zinc

The effect of shear stress and temperature on the delay time, t_i, of thermally activated motion of dislocations in the {112 2} 〈112 3〉 slip system in Zn single crystals is studied. The delay is associated with a higher density of crystal defects at the initial path of dislocation motion.