Reflecting single attosecond pulse by periodic Mo/Si multilayer mirrors with different layers

The reflecting of single attosecond pulse from a periodic Mo/Si multilayer was investigated. With changing the number of bi-layers, the periodic multilayer showed greatly different spectral and temporal responses of the attosecond pulse reflection, which has been discussed in detail in this paper. The capability of attosecond pulse reflection of the periodic multilayers with different bi-layer numbers has been evaluated using suitable temporal parameters. In addition, the condition for obtaining high-efficiency reflected pulses has been analyzed by comparing the pulse responses of the periodic multilayer with different layers. The transfer-matrix method together with the fast Fourier transform has been used in our simulation.     

Reflecting a single attosecond pulse by using periodic Mo/Si multilayer mirrors with different layers

The reflecting of a single attosecond pulse from a periodic Mo/Si multilayer was investigated. By changing the number of bi-layers, the periodic multilayer showed greatly different spectral and temporal responses of the attosecond pulse reflection, which has been discussed in detail in this paper. The capability of attosecond pulse reflection of the periodic multilayers with different bi-layer numbers has been evaluated using suitable temporal parameters. In addition, the condition for obtaining high-efficiency reflected pulses has been analyzed by comparing the pulse responses of the periodic multilayer with different layers. The transfer-matrix method together with the fast Fourier transform has been used in our simulation.     

磁控溅射制备横向梯度分布的Mo/Si周期多层膜

 采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65 mm长度范围内,多层膜周期从8.21 nm线性减小到6.57 nm,周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置,能反射在13.3~15.9 nm波段范围内不同波长的极紫外光,反射率为60%~65%。     

磁控溅射制备横向梯度分布的Mo/Si周期多层膜

采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65 mm长度范围内,多层膜周期从8.21 nm线性减小到6.57 nm,周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置,能反射在13.3~15.9 nm波段范围内不同波长的极紫外光,反射率为60%~65%。     

Mo/Si多层膜小角X射线衍射结构表征

为了实现对Mo/Si多层膜的结构表征,测量了多层膜样品的小角X射线衍射谱。介绍了小角X射线衍射谱的分析方法,包括Bragg峰值拟合法,傅里叶变换法,反射谱拟合法。Bragg峰值拟合法和反射谱拟合法得到多层膜的周期厚度为7.09nm,两种模型的反射谱拟合法得到界面的粗糙度(扩散长度)为0.40～0.41nm(Si在Mo上),0.52～0.70nm(Mo在Si上),前者要比后者小,这与透射电镜法(TEM)得到的结果0.40nm(Si在Mo上),0.6～0.65nm(Mo在Si上)是一致的。通过基于扩散模型的反射谱拟合法得到的折射率剖面也与由高倍率透射电镜(HRTEM)积分得到的灰度值剖面在趋势上是一致的。通过X射线衍射谱和TEM图像对Mo/Si多层膜进行综合表征,得到了多层膜的精细结构信息,这对多层膜制备工艺的优化具有十分重要的意义。     

Low-fluence femtosecond-laser interaction with a Mo/Si multilayer stack

Nanostructural damage caused by low-fluence, non-ablating femtosecond laser irradiation of Mo/Si multilayer stacks is studied by cross-sectional transmission electron microscopy. A laterally homogeneous modification of the multilayer structure is observed including a complete intermixing of silicon and molybdenum in the depth range between 0 and 20 nm. Below this amorphous layer, molybdenum layers become more and more stable until below 80 nm depth, the pristine microstructure of the non-processed multilayer is observed. PACS 61.80.Ba; 68.37.Lp; 68.65.Ac     

质子辐照下Mo/Si多层膜反射镜的微观结构状态

利用透射电子显微镜对质子辐照前后空间太阳望远镜Mo/Si多层膜的微观结构进行了表征, 并对其辐照前后反射率的变化进行了测量.研究表明, Mo/Si多层膜经质子辐照后形成了一些缺陷结构,局部区域Mo/Si的周期性遭到破坏, Mo层与Si层的宽度发生了变化,多层膜层与层之间的界面也比辐照前更为粗糙,部分层状结构由于质子辐照发生了明显的扭曲和折断等现象;此外,质子辐照导致了Mo/Si多层膜反射率的下降,这些微观缺陷的形成是光学性能降低的直接诱因. 关键词： 空间太阳望远镜 Mo/Si多层膜 微观结构 反射率     

EUV damage threshold measurements of Mo/Si multilayer mirrors

We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ??60?% lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiation-induced change of reflectivity upon damage of a multilayer mirror.     

Spectral ellipsometry as a method for characterization of nanosized films with ferromagnetic layers

Nanosized films with ferromagnetic layers are widely used in nanoelectronics, sensor systems and telecommunications. Their properties may strongly differ from those of bulk materials that is on account of interfaces, intermediate layers and diffusion. In the present work, spectral ellipsometry and magnetooptical methods are adapted for characterization of the optical parameters and magnetization processes in two- and three-layer Cr/NiFe, Al/NiFe and Сr(Al)/Ge/NiFe films onto a sitall substrate for various thicknesses of Cr and Al layers. At a layer thickness below 20 nm, the complex refractive coefficients depend pronouncedly on the thickness. In two-layer films, remagnetization changes weakly over a thickness of the top layer, but the coercive force in three-layer films increases by more than twice upon remagnetization, while increasing the top layer thickness from 4 to 20 nm.     

Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness

A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5 nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4 nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers. This transition results in the variation of the refractive index (density variation) of the Mo layers, as observed by X-ray reflectivity (XRR) at a wavelength of 0.154 nm. Combining X-ray emission spectroscopy (XES) and XRR, the parameters (composition, thickness and roughness) of the interfacial layers formed by the interaction between the Mo and Si layers are determined. However, these parameters do not evolve significantly as a function of the Mo thickness. It is observed by diffuse scattering at 1.33 nm that the lateral correlation length of the roughness strongly decreases when the Mo thickness goes from 2 to 3 nm. This is due to the development of Mo crystallites parallel to the multilayer surface.     

Mo/Si多层膜在质子辐照下反射率的变化

为了检验应用在极紫外波段空间太阳望远镜上Mo/Si多层膜反射镜在空间辐射环境下反射率的变化情况, 模拟了部分空间太阳望远镜运行轨道的辐射环境, 利用不同能量和剂量的质子对Mo/Si多层膜反射镜进行辐照实验.辐照前后反射率测量结果显示,由于带电粒子的辐照损伤,质子辐照会使Mo/Si多层膜反射镜的反射率降低,且质子能量越低、剂量越大,对多层膜的反射率影响越明显. 当质子能量E=160keV,剂量＝6×10¹¹/mm²时,反射率降低4.1%;能量E=100keV,剂量=6×10¹¹/mm²时, 反射率降低5.7%;能量E=50keV,剂量=8×10¹²/mm²时,反射率降低10.4%. 用原子力显微镜测量辐照后Mo/Si多层膜反射镜的表面粗糙度比辐照前明显增加,致使散射光线能量逐渐增大并最终导致反射率的降低. 关键词： 质子辐照 Mo/Si多层膜反射镜 辐照损伤     

Spin-glass state of Fe/Cr multilayer structures with ultrathin iron layers

The evolution of the magnetic properties of Fe/Cr superlattices with a decrease in the nominal thickness of the iron layers down to atomic dimensions at which these layers are not continuous has been analyzed. Investigations have been carried out with multilayer samples with Fe-layer thicknesses in a range of 2–6 Å and Cr-layer thicknesses of 10 and 20 Å. It has been found that the system with various Fe-layer thicknesses and at various temperatures exhibits various magnetic phases—superparamagnetic, magnetically ordered, and nonergodic—characterized by the dependence of the magnetization of the sample on its magnetic prehistory. It has been shown that the observed nonergodic phase has the properties of a spin glass. A qualitative phase diagram of the magnetic states of the system has been obtained.     

Sub-ps laser microstructuring of soft X-ray Mo/Si multilayer gratings

The sub-picosecond laser microstructuring of multilayer gratings is presented in this paper. A micromachining system operating with a 0.5 ps KrF laser at 248 nm was used to etch grating structures with a groove width of 1–2 μm in Mo/Si and Si/Mo multilayers. Atomic force microscopy, scanning electron microscopy and X-ray reflectivity were used to characterize the microetched patterns. The ω-scans around the 1st Bragg maximum show symmetric satellites up to 3rd order, with positions corresponding to the grating period. The use of sub-picosecond laser pulses minimizes the thermally affected zone and enhances the quality of the etched features. Short pulse laser processing is advantageous for the fabrication of high spatial resolution microstructures required in X-ray optics. Received: 21 May 2002 / Accepted: 19 August 2002 / Published online: 15 January 2003 RID="*" ID="*"Corresponding author. Email: dpapa@iesl.forth.gr     

13 nm窄带Si/Mo/C多层膜反射镜

基于多层膜准单色覆盖50~1500 eV能谱的多能点发射光谱测量系统可获得聚龙一号装置Z-pinch等离子体X射线源的能谱结构和总能量等信息。考虑装置的条件,在13 nm处的多层膜需要工作在掠入射角60。常规的Mo/Si多层膜尽管反射率最高,但其带宽较大,不能满足多层膜准单色的要求。因此提出将Mo和C共同作为多层膜的吸收层材料与Si组成Si/Mo/C多层膜,可使反射率降低较小而带宽明显减小。采用磁控溅射方法制备了Si/Mo/C多层膜,其掠入射X射线反射测量表面多层膜的结构清晰完整,同步辐射工作条件下反射率测量,得到Si/Mo/C多层膜在13 nm处和掠入射角60时的反射率为56.5%,带宽为0.49 nm（3.7 eV）。     

Magnetism of Co layers in a Co/Si multilayer film

The magnetic properties of Co/Si multilayer films produced through rf ion sputtering were studied in the temperature range 4.2–300 K. The dependences of the spontaneous magnetization and hysteresis characteristics of the films on the thicknesses of the magnetic layers and nonmagnetic spacers are established. It is shown that these dependences are determined to a large extent by interlayer interfaces, in which the effective magnetic moment of the Co atoms and the exchange interaction decrease and magnetic-anisotropy dispersion arises. A probable cause of the interface formation is interlayer mixing (which is estimated to penetrate to a depth of 15 Å) and the strong effect of Si on the Co electronic structure.     

Radiation characteristics of multilayer periodic dielectric structures

Radiation characteristics of multilayer periodic dielectric structures are investigated by the method which combines the building block approach of multimode network theory with the rigorous mode matching procedure. The multilayer periodic structure is composed of uniform dielectric layers and single periodic layers. Two examples are given in this paper; first, radiation property of the double dielectric grating antenna is analyzed. The results indicate that the double dielectric grating antenna has relatively smaller dimensions than that of the single one. It is undoubtly of great importance in the case that the limitation of the weight and the volume of the system is strictly required. Secondly, some curved profile grating antennas are analyzed by combining the present method with the staircase approximation. In such a way, the effects of groove profile on the performance of the grating antennas are systemetically studied and some useful guidelines for the design of the dielectric grating antennas are thereby suggested.     

磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜

为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求,采用基板扫掠过矩形靶材表面的镀膜方法,在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率,极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量,结果表明,在直径120 mm范围内,Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率,结果表明,在直径120 mm范围内,多层膜的膜层厚度均匀,在入射角10°时13.75 nm波长处平均反射率为 66.82%。     

磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜

为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求,采用基板扫掠过矩形靶材表面的镀膜方法,在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率,极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量,结果表明,在直径120 mm范围内,Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率,结果表明,在直径120 mm范围内,多层膜的膜层厚度均匀,在入射角10°时13.75 nm波长处平均反射率为66.82%。     

Comprehension of the effects of proton on reflectivity of Mo/Si multilayer

Wavelength dependent reflectivity is crucial relationship in determining the physical property of optic system. The first object of this work is to search for the applicable method of using wavelength to predict the reflectivity of Mo/Si multilayer mirror before and after irradiation with proton. Predicated on the principle of non-linear curve fitting, a typical numerical method is highlighted because the wavelength-dependent reflectivity of Mo/Si multilayer irradiated by proton with different energies and flux are quantitative analyzed by this method. The simulations agree very well with the observed spectroscopy of 6 curves for reflectivity versus wavelength. The minimum value of correlation coefficients between actual and calculated data is 0.994. The other objects of this work are to find the optic band gap of Mo/Si multilayer and check the influences of proton on it using reflectivity spectra. In the light of the calculated results by Tauc method, the optic band gap is theoretically explained successfully via the relationship between band gap and absorption coefficient. The estimated results by both theoretical and experimental data demonstrate that the optic band gap of Mo/Si multilayer is not sensitive to proton radiation.     

Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation

Mo/Si multilayers are fabricated by electron-beam evaporation in UHV at different temperatures (30° C, 150° C, 200° C) during deposition. After completion their thermal stability is tested by baking them at temperatures (T _bak) between 200° C and 800° C in steps of 50° C or 100° C. After each baking step the multilayers are characterized by small angle Cu_K-X-ray diffraction. Additionally, the normal incidence soft-X-ray reflectivity for wavelengths between 11 nm and 19 nm is determined after baking at 500° C. Furthermore, the layer structure of the multilayers is investigated by means of Rutherford Backscattering Spectroscopy (RBS) and sputter/Auger Electron Spectroscopy (AES) technique. While the reflectivity turns out to be highest for a deposition temperature of 150° C, the thermal stability of the multilayer increases with deposition temperature. The multilayer deposited at 200° C stands even a 20 min 500° C baking without considerable changes in the reflectivity behaviour.