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1.
由溶胶-凝胶法制得的Ni-La化合物经热分解制备了纳米尺度NiLa2O4尖晶石,在750o C焙烧后形成了结晶良好的尖晶石结构.采用差热分析、X射线衍射、透射电镜、扫描电镜和粒度分布分析等手段表征了该尖晶石的物理化学性质.结果表明,该纳米颗粒有规则的外形和确定的晶面,由平均粒径为40 nm的规整半球晶粒组成.精修的晶胞参数a=3.861205和c=12.6793.在NaBH4选择还原亚胺制相应仲胺的反应中,该新型纳米NiLa2O4尖晶石可用作高效多相催化剂,得到了较高的产物产率.所有反应可在室温和相对较短的时间内完成.在优化的反应条件下,均可得到带有不同芳基的,包括带有吸电子和供电子基团的仲胺.该催化剂回收简便,重复使用4次,其催化活性未见明显下降.  相似文献   

2.
在催化剂作用下,红霉素6,9-亚胺醚经KBH4还原制备阿奇霉素前体--氮红霉素.考察了催化剂的活性组分、载体及其制备条件对催化性能的影响.最佳催化剂为:以Pt为活性组分[w(Pt)=1%],未经处理的活性炭(C)为载体,Pt/C用水合肼还原.以1%Pt/C催化还原反应,转化率93%,收率70%.  相似文献   

3.
本文首次研究了以H2为氢源、纳米多孔钯催化亚胺化合物的加氢还原反应.结果表明:在氢气压力为101.325 kPa,溶剂为无水乙醇,反应温度为30℃,反应时间24 h,催化剂物质的量分数为5%的条件下,纳米多孔钯可以高效催化亚胺化合物的加氢还原反应,高选择性、高产率地生成一系列仲胺,仲胺的产率在93%~96%之间.该反应官能团兼容性好,底物范围广,带有甲基、甲氧基、氰基和羟基等基团的亚胺都可以顺利发生还原反应生成相应的仲胺.催化剂重复使用5次后,活性未出现明显降低.  相似文献   

4.
甲烷部分氧化制合成气的La2O3助Ni/MgAl2O4催化剂   总被引:19,自引:2,他引:19  
 用MgO与载体Al2O3在高温下焙烧成MgAl2O4尖晶石,防止了Ni在反应过程中与载体形成NiAl2O4, 促进了Ni在载体表面的分散. 应用CODEX软件优化了La2O3在Ni/MgAl2O4催化剂中的加入量和活化温度. La2O3助Ni/MgAl2O4在本文实验条件下经100 h反应后活性和选择性均未发生变化. 程序升温烧碳结果表明,催化剂表面仅存在一种较高温度下才可除去的碳物种,它可能是石墨碳. XRD和BET结果证实,催化剂具有较高的结构稳定性. 荧光分析结果表明,在100 h的反应过程中活性组分未发生明显流失. 根据脉冲反应结果对以Niδ+-(La2O4-x)δ-作为氧的活性位和Ni0作为甲烷的活性位的直接氧化反应机理进行了初步探讨.  相似文献   

5.
研究了共沉淀分解法制备的ZnCo2O4纳米粒子的光学和可见光催化性能,并对其晶体结构和微观结构用X射线衍射、热重/差热分析、透射电镜和高分辨透射电镜等手段进行了表征.结果表明,制备的纳米粒子为纯相的ZnCO2O4,平均粒径约为10-20 nm.紫外-可见吸收光谱估计出ZnCo2O4纳米粒子的能带隙为3.39和2.09 eV.可见光(λ>420 nm)照射下,纳米粒子表现出降解亚甲基蓝溶液的光催化活性.ZnCo2O4纳米粒子的光催化活性可以归结为紫外和可见光下纳米粒子吸收光子(能量大于能带隙)的能力,以及它们的纳米尺寸,基于实验结果,本文提出了ZnCO2O4可能的能带结构.  相似文献   

6.
尖晶石LiMn2O4纳米粉的合成 及其交流阻抗性能研究   总被引:1,自引:0,他引:1  
以LiOH和电解二氧化锰(EMD)为原料,葡萄糖为还原剂,制备了粒径为200nm左右的球状尖晶石LiMn2O4纳米粒子,并用X射线衍射(XRD)和扫描电镜(SEM)对样品进行了结构和形貌的表征.在循环伏安测试(CV)峰电位下研究了该材料嵌脱锂相变过程中的交流阻抗(EIS)图谱,并提出一种新的等效电路对EIS图谱进行拟合...  相似文献   

7.
通过预还原的LaNiO3,La4Ni3O10,La3Ni2O7和La2NiO4催化分解CH4可以制备大量高度石墨化的碳纳米管。还原前后的催化剂的结构和组分通过X射线衍射(XRD)测定。所制得的碳纳米管由扫描电镜(TEM)、X射线光电子能谱(XPS)表征。碳纳米管在空气在的热氧化性由热重实验(TG)测定。实验结果表明不同催化剂前驱中的La/Ni比会影响碳纳米管的管径分布和石墨化程度。La/Ni比越小,碳纳米管的管径越大,石墨化程度越高。  相似文献   

8.
开发高活性的顺酐加氢制丁二酸酐和γ-丁内酯催化剂具有重要的工业意义.顺酐加氢多采用Cu基和Ni基催化剂,但一般Cu基和Ni基催化剂存在反应温度高(170–260℃)和稳定性差等缺点,很有必要开发高活性的顺酐加氢催化剂.我们以拟薄水铝石作为Al2O3载体的前驱体,采用浸渍法制备了一系列镍铝尖晶石型衍生的不同Ni含量的Ni/Al2O3催化剂,并研究了它们在顺酐加氢反应中的催化性能.还原前Ni/Al2O3催化剂的X射线衍射结果表明,催化剂含有NiAl2O4物种.氮吸附结果显示,不同Ni含量的催化剂均具有介孔结构.氢-程序升温还原研究发现,Ni/Al2O3催化剂经750℃还原2 h后,其表面上NiAl2O4物种能被高效还原.X射线粉末衍射结果表明,750℃还原的Ni/Al2O3催化剂中金属Ni颗粒尺寸随着Ni负载量升高而增大.利用一氧化碳-程序升温脱附对750℃还原的Ni/Al2O3催化剂进行研究,发现750℃还原的催化剂上金属Ni物种含量从高到低依次为:Ni(7.5%)/Al2O3>Ni(5%)/Al2O3>Ni(2.5%)/Al2O3.采用CO化学吸附获得的Ni(2.5%)/Al2O3,Ni(5%)/Al2O3和Ni(7.5%)/Al2O3催化剂上金属Ni颗粒尺度分别为8.0,12.8和15.7 nm.活性研究结果表明,750℃还原的Ni(5%)/Al2O3催化剂具有最高的催化活性,这可能是由于Ni(5%)/Al2O3催化剂具有较多的Ni活性位点和较合适的Ni颗粒粒度所致.进一步研究发现,在650–750℃还原温度下,Ni(5%)/Al2O3催化剂的还原度随着还原温度的升高而升高,Ni分散度随着还原温度的升高而降低.活性结果研究表明,700℃还原的Ni(5%)/Al2O3催化剂具有较多的Ni活性位点和较合适的Ni颗粒粒度,具有最高的加氢催化活性,其在120℃,H2压力为0.5 MPa和质量空速为2 h?1的反应条件下,能获得近100%的顺酐转化率和90%的丁二酸酐选择性,同时该催化剂具有优良的稳定性.以上结果表明,尖晶石型衍生的Ni/Al2O3催化剂是一个十分有应用前景的顺酐加氢催化剂.  相似文献   

9.
利用溶胶-凝胶法合成纳米NiCo2O4,并利用X射线衍射和透射电镜分析其结构和表面形貌. 结果表明NiCo2O4具有尖晶石结构, 平均粒径约为15 nm. 利用电势线性扫描和恒电势法测定了其对H2O2在碱性溶液中电化学还原反应的催化性能. 发现NiCo2O4对H2O2电化学还原具有高的催化活性和稳定性, 在H2O2浓度低于0.6 mol·L-1时, 其电化学还原反应主要通过直接还原途径进行. 以NiCo2O4为阴极催化剂的Al-H2O2半燃料电池在室温下的开路电压达1.6 V; 在1.0 mol·L-1 H2O2溶液中, 峰值功率密度达209 mW·cm-2, 此时电流密度为220 mA·cm-2.  相似文献   

10.
11.
Sodium borohydride supported on alumina reduces imines to the corresponding secondary amines in high to excellent isolated yields under solvent-free conditions. Noteworthy is that highly chemoselective reactions were achieved in the presence of other functional groups such as halogen, nitro, and cyano groups.  相似文献   

12.
Journal of Thermal Analysis and Calorimetry - A series of LiMn2O4 samples with nominal Li/Mn molar ratio=1/2 has been synthesized at 700 and 750°C by the ceramic procedure from Mn2O3 and...  相似文献   

13.
In this study, the immobilization of sulfonic acid on silica‐layered magnetite was carried out by the reaction of ClSO3H with silica‐layered magnetite. The prepared magnetic nanoparticles of Fe3O4@SiO2‐SO3H were then characterized using scanning electron microscopy, energy dispersive X‐ray spectroscopy, X‐ray diffraction, Fourier transform infrared spectroscopy, vibrating sample magnetometry, and transmission electron microscopy. The sulfonated nanocomposite exhibited excellent catalytic activity and reusability in the reduction of various aldoximes and ketoximes with NaBH3CN in the presence of ZrCl4. All reactions were carried out under solvent‐free conditions (r.t. or 75–80°C) within 3–70 min to afford amines in high to excellent yields.  相似文献   

14.
A combination of sodium borohydride and a catalytic amount of indium(Ⅲ) chloride in acetonitrile reduces imines formed in-situ from aldehydes and amines to the corresponding functionalised secondary and tertiary amines in moderate to good yields. Noteworthy is that highly chemoselective reactions were achieved in the presence of other functional groups such as halogens, carbon-carbon double bonds and hydroxyl groups.  相似文献   

15.
The general synthesis and a novel intramolecular nucleophilic aromatic substitution (SNAr) reaction of 2-carboxamido-3-arylquinazolin-4-ones, a potentially useful scaffold in the field of medicinal chemistry, are described. The synthetic utility of the SNAr reaction as a tool for the synthesis of secondary aryl amines, including diaryl amines, is also demonstrated.  相似文献   

16.
Catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)(2)Cl](2) with diethylsilane as reductant. The stepwise reduction to secondary amine proceeds through an imine intermediate that can be isolated when only 2 equiv of silane is used. This system requires low catalyst loading and shows high efficiency (up to 1000 turnovers at room temperature with 99% conversion have been attained) and an appreciable level of functional group tolerance.  相似文献   

17.
用尖晶石型化合物NiCo2O4和复合镀技术制备析氧电极   总被引:2,自引:0,他引:2  
为减少析氧电位、提高电极的稳定性、降低能耗和成本,人们一直在努力合成各种过渡金属复合氧化物作为析氧的电催化材料[1].研究表明,尖晶石型化合物NiCo2O4对氧的析出有较高的催化活性[2].但因其制备方法多为喷涂热解法,需400℃以上温度,因此易发生...  相似文献   

18.
为提高镍基催化剂的干法重整活性,采用溶液燃烧法、等体积浸渍法、胶体磨循环浸渍法和水热-沉积法制备了SCM、IMP、T310和HTP四种催化剂,在800 ℃考察了其在CO2-CH4重整反应中的催化性能,并结合ICP-AES、N2吸附-脱附、XRD、H2-TPR和TEM等表征手段对催化剂进行分析。结果表明,水热-沉积法和胶体磨循环浸渍法制备的催化剂比表面积较大,分别为190.83和182.21 m2/g,可为反应提供较多的接触面积,进而提高催化剂的初始活性(HTP试样CH4和CO2初始转化率相对较高,分别达85.15%和90.84%);而溶液燃烧法和等体积浸渍法制备的催化剂具有较多的NiAl2O4尖晶石,其还原峰面积占总还原峰面积90%以上,还原后可获得更多晶粒粒径更小的稳定活性组分Ni(SCM和IMP试样稳定性更好,反应50 h后活性超过HTP和T310试样,100 h后CH4转化率方降至50%以下)。因此,决定催化剂稳定活性的更重要的因素应该是活性组分Ni晶粒粒径的大小及其抗烧结能力的强弱。  相似文献   

19.
Advanced integrated gasification combined cycle (IGCC) power generation systems require the development of high-temperature,regenerable,desulfurization sorbents capable of removing hydrogen sulfide from coal gasifier gas to very low levels.As a sort of effective desufurizer,such as Fe2O3,ZnO and ZnFe2O4,it will endure strong reducing atmosphere in desulfurization process.The reduced degree of desufurizer can have an effect on its desulfurization reactivity.In this paper,Fe2O3,ZnO and ZnFe2O4 were synthesized by precipitation or co-precipitation at constant pH.After aging,washing and drying,the solids were calcined at 800℃.The reduction behaviors of sample were characterized by temperature-programmed reduction (TPR).It is found that there are two reduction peaks for Fe203 in TPR,and whereas no reduction peaks for ZnO are found.The reduction process of ZnFe2O4 prepared by co-precipitation is different from that of Fe2O3.ZnFe2O4 is easier to be reduced than Fe2O3.The activation energy of reduction process for Fe2O3 and ZnFe2O4 is obtained at different reduction periods.  相似文献   

20.
"Ice polishing single silicon wafers with nano-sized Al2O3 abrasives can be known as ice fixed abrasives chemical mechanical polishing (IFA-CMP). TAn abrasive slurry was made of nano-sized Al2O3 particles dispersed in de-ionized water with a surfactant and the slurry was frozen to form an ice polishing pad. Then polishing tests of blanket silicon wafers with the above ice polishing pad were carried out. The morphologies and surface roughness of the polished silicon wafers were observed and examined on an atomic force microscope. The subsurface damage was assessed by means of cross-section transmission electron microscopy. The surface chemical constituents of the polished silicon wafers were characterized using X-ray photoelectron spectroscopy in order to gain insight into the chemical mechanisms in the process. Scratch resistance of the single silicon wafer was measured by nanoscratching using a nanoindenter to explore the mechanical removal mechanism. The results show that a super smooth surface with an average roughness of 0.367 nm is obtained within 1000 nm£1000 nm and there is a perfect silicon diamond structure without any microcracks in the subsurface. The removal of material is dominated by the coactions of ductile regime machining and chemical corrosion. In the end, a model of material removal of IFA-CMP is built."  相似文献   

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