双光子光聚合技术及其研究进展

本文对双光子光聚合技术进行了比较全面系统的综述,主要介绍了双光子光聚合的基本原理,国内外双光子光聚合光敏引发体系和具有大的双光子吸收截面有机分子的研究现状以及双光子光聚合技术的潜在应用领域.     

噻吩基卟啉衍生物的单光子和双光子吸收性质的理论研究

本文理论上研究了两个系列的噻吩基卟啉衍生物,这种衍生物在可见光区具有大的双光子吸收截面。用密度泛函理论和ZINDO-SOS方法,计算了分子的几何构型、电子结构,单光子和双光子吸收性质。结果显示噻吩单元的数目影响分子的单光子和双光子吸收性质。具有两个或三个噻吩基团的噻吩基卟啉衍生物在较大范围内具有可用于实际应用中的双光子吸收响应,这一性质有利于这类分子在光限幅中的应用。插入乙炔基有利于扩大共轭范围,增加分子的双光子吸收截面。同时,乙炔基团的加入导致了单光子和双光子波长的红移。从高透明性和相对大的非线性光学响应考虑,噻吩基卟啉衍生物是一类有应用前景的双光子吸收材料。     

新型双光子吸收化合物的合成、光物理及其在固态分散体系中的性质

通过多步反应制备了三个新型的双光子吸收化合物,测试了它们的光物理性质,发现该系列化合物具有较大的双光子吸收截面,并且随温度降低其双光子吸收截面增大.尤其是化合物TMVDB,其量子效率为0.83,常温时的双光子吸收截面达到1164GM,其双光子吸收截面除以分子量为2.08,表现出了优良的双光子吸收发光性能.进一步将TMVDB掺杂到固体材料中,得到强双光子诱导发光的固体材料.     

取代基对二噻吩并噻吩衍生物的双光子吸收性质的影响

利用ZINDO/SOS方法, 从理论上研究了对称和不对称取代两种情况下, 取代基对二噻吩并噻吩衍生物单双光子吸收性质的影响. 结果表明, 所设计的噻吩类分子具有较大的双光子吸收截面, 且双受体取代比双给体取代更有利于增大分子的双光子吸收截面. 同时发现, 此类分子受体取代可以显著增加波长较短的双光子峰附近的双光子吸收, 而给体取代则可以改善波长较长吸收峰附近的双光子吸收.     

含1,3,5-三嗪和三苯胺的二苯乙烯类双光子材料

合成了以三苯胺为电子给体、1,3,5-三嗪为电子受体的新型二苯乙烯类化合物．用吸收光谱、荧光光谱、飞行质谱、核磁共振氢谱和碳谱进行了表征。这些化合物具有大的双光子吸收截面和强的频率上转换荧光,其中,由三个D-π-A结构的发色团形成的三枝状八偶极分子具有最大的双光子吸收截面和最强的双光子荧光。     

新型香豆素酮类不对称双光子染料的合成及其光物理性质

本文以二苯乙烯和香豆素为共轭桥,二乙氨基为电子给体,羰基为电子受体,合成了一个具有D-π₁-A-π₂-D结构的香豆素酮类双光子染料C3.用紫外-可见光谱、荧光光谱研究了该化合物的光物理性质.发现在光作用下C3很容易发生分子内电荷转移,进而转变为扭曲的分子内电荷转移,产生很大的偶极矩变化.以飞秒脉冲激光为激发光源,用上转换荧光法测定了其双光子吸收截面.在激发波长为850 nm时,新化合物的双光子吸收截面值达1292 GM,比同系列香豆素酮衍生物C1、C2的双光子吸收截面值高一到两个数量级.     

末端基团对芴类衍生物分子非线性光学性质的影响

通过采用预估矫正的时域有限差分方法数值求解速率方程-光场强度方程,研究了纳秒激光脉冲在具有不同末端基团的对称性芴类衍生物分子2,7-双(4′-(二甲基氨基)苯乙烯基)-9-氢-芴(F1分子)和2,7-双(4′-硝基苯乙烯基)-9-氢-芴(F2分子)中的动力学传播过程以及光限幅效应,分析了两种分子的光限幅特性随传播距离(z)、粒子数密度(N)以及脉冲宽度(τ)的变化情况,并且拟合了两种分子的动态双光子吸收(TPA)截面。计算结果表明,该系列分子具有较大的双光子吸收截面以及较好的光限幅效应。此外,F2分子的末端基团―NO2与F1分子的末端基团―N(CH3)2相比具有更强的得电子能力,因而使得F2分子具有更大的跃迁偶极矩,双光子吸收截面增大,光限幅效应更为明显。     

具有双光子吸收特性的咪唑类衍生物的合成及其光物理性能研究

分子在强激光作用下能同时吸收两个光子的现象称为双光子吸收(TPA),具有大的双光子吸收截面(σ2)的分子有多种用途,是目前光电子材料研究领域的热点之一.双光子吸收材料可应用于上转换激射[1]、光限幅[2]、光稳幅、三维光存储[3]、三维微加工[4,5]以及光动力疗法[6]等.但由于一般材料的双光子吸收截面很小,大大限制和束缚了双光子吸收材料的发展应用.     

双光子吸收有机材料及其在三维数字光存储中的应用

信息技术的发展要求存储器件必须具备超高存储密度、超快存取速率以及长存储寿命.而目前普遍应用的光数据存储的存储密度已经接近其物理极限.双光子吸收技术以其强的穿透能力和高的空间分辨率能够实现多层存储,存储密度高达10~(12)bits/cm~3,但能否开发出具有大的双光子吸收截面的材料成为制约其发展的一个重要因素.本文在综述近年来双光子吸收有机材料研究的基础上,介绍了双光子吸收有机材料在三维数字光存储中应用研究的最新进展.     

DCM衍生物双光子吸收截面的溶剂效应

考察了以三苯胺基为给电子基团的4种不同DCM衍生物在有机溶剂中的单光子光物理性质(基态和激发态永久偶极矩差、光学跃迁偶极矩以及跃迁能量等), 并利用双光子诱导荧光法考察了溶剂对其双光子吸收截面(δtpa)的影响. 研究结果表明, DCM衍生物的光学跃迁具有显著的分子内电荷转移特性, 不同末端取代基主要影响其稳态光谱性质, 而分支结构数目主要影响其双光子吸收截面. 研究结果还发现, 双光子吸收截面随分子结构的变化趋势符合双能级模型, 拉电子基团为丙二腈和1,3-茚二酮的DCM衍生物的δtpa随溶剂介电常数的增加呈现不同的变化趋势.     

硫鎓盐产酸剂的合成及其产酸效率

合成了6种适用于248 nm光致抗蚀剂的硫鎓盐产酸剂,其中吩噻(噁)体系的产酸剂为自行设计合成. 利用IR、H NMR、UV等测试技术进行了结构表征和紫外吸收测定,各化合物的最大紫外吸收在250～285 nm之间,吸收域较宽,适用性较强.同时,利用酸敏染料罗丹明B遇酸异构变色的特点,使用紫外!可见分光光度计定量检测了6种产酸剂在乙腈溶剂中的产酸效率,其中硫杂蒽酮系列的产酸剂产酸性能最好. 最后使用荧光追踪法研究了溶剂极性对产酸效率的影响,发现产酸剂的产酸性能同溶剂的选取密切相关,随着溶剂极性的减小,产酸效率随之降低. 对6种硫鎓盐的产酸效率检测结果可以为产酸剂进一步用于248 nm光致抗蚀剂配方提供详细的参考.     

Enhanced Photophosphorylation of a Chloroplast‐Entrapping Long‐Lived Photoacid

Enhancing solar energy conversion efficiency is very important for developing renewable energy, protecting the environment, and producing agricultural products. Efficient enhancement of photophosphorylation is demonstrated by coupling artificial photoacid generators (PAGs) with chloroplasts. The encapsulation of small molecular long‐lived PAGs in the thylakoid lumen is improved greatly by ultrasonication. Under visible‐light irradiation, a fast intramolecular photoreaction of the PAG occurs and produces many protons, remarkably enhancing the proton gradient in situ. Consequently, compared to pure chloroplasts, the assembled natural–artificial hybrid demonstrates approximately 3.9 times greater adenosine triphosphate (ATP) production. This work will provide new opportunities for constructing enhanced solar energy conversion systems.     

D‐π‐a‐type oxime sulfonate photoacid generators for cationic polymerization under UV–visible LED irradiation

Four D‐π‐A‐type nonionic oxime sulfonate photoacid generators (PAGs) have been designed and synthesized for use in light‐emitting diode (LED) excitable cationic photoinitiators, in which N,N‐diphenylamino was used as electron donor with trifluoroacetophenone‐based oxime sulfonates (trifluoromethanoesulfonate and p‐toluenesulfonate) as electron acceptor and substituted fluorene and biphenyl groups as the π‐conjugated systems. PAG‐Ben‐Tol (with biphenyl and p‐toluenesulfonate) and PAG‐Flu‐Tol (with fluorene and p‐toluenesulfonate) showed high quantum yields of photoacid generation (0.33–0.50) and very good thermal stability (over 250 °C). The absorbance spectra of these PAGs were consistent with the emission spectra of commercially gained UV–visible LED light sources. The potential of these PAGs for cationic photoinitiators was tested in two cationic monomer systems. These PAGs needed low light intensity and low concentration for photopolymerization with high conversions of monomer, for example, over 80%, gained at 3.0 mW cm⁻² from 365 to 470 nm LEDs. The photochemical mechanisms of these PAGs are comprehensively investigated and discussed in detail. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018 , 56, 1146–1154     

Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base‐catalyzed cross‐linking reactions

Most of the photopatterning materials based on epoxy resins utilize photoacid generators (PAGs), which generate superacids as catalysts. They have been used for high aspect ratio photoresists in the fabrication of MEMS devices. However, there is a drawback, in that the acidic species from PAGs will induce metal corrosion. One of the approaches to overcome this problem is the use of photobase generators (PBGs) because organic bases would induce no corrosion. Although there have been many previous investigations of PBGs, only a few articles have mentioned photoreactive materials relying on PBGs because of their low photosensitivity. We report here highly sensitive photopatterning materials comprising PBGs and an epoxy resin bearing carboxylic acid groups. As a result, the photopatterning materials showed higher photosensitivity than conventional epoxy resin systems. We obtained high‐photosensitivity (up to 900 mJ/cm²), high‐resolution (10‐μm line‐and‐space) patterning materials in films, 10 μm in thickness.     

Effects of C3-aromatic heterocycles on 1,3,5-triaryl-2-pyrazoline sulfonium salt photoacid generators as light-emitting diode-sensitive cationic photoinitiators

Four 1,5-diphenyl-3-aromatic heterocyclyl-2-pyrazoline-based sulfonium salt photoacid generators (PAGs) with different aromatic heterocycles substituted on C3 atom and dimethyl sulfonium group on C5 atom were synthesized. These PAGs were highly photosensitive in the 365–425 nm light-emitting diode region, and the intramolecular charge transfer from the pyrazoline ring to sulfonium salts induced efficient photolysis and high Φ_H⁺. The heterocycles as well as their substituted positions significantly influenced the energy of the S₂ orbital, which was determined by the electrochemical and absorption properties of the PAGs. The raising of the S₂ orbital energy enlarged the energy gap of S₀–S₂ and S₁–S₂, resulting in blue shift of the absorption spectra and increase in the quantum yield of photoacid generation (Φ_H⁺), respectively. When the energy of excited electrons was higher than that of the S₂ orbital, the transition from S₀ to S₂ (π–π*) occurred before the C-S cleavage on S₁ and the PAGs showed high Φ_H⁺ values (0.52–0.72). The transition from S₀ to S₁ (π–σ*) occurred when the energy of electrons is lower than that of the S₂ orbital, and the PAGs showed low Φ_H⁺ value. The photopolymerization kinetics demonstrated that these PAGs were highly efficient cationic photoinitiators.     

Iodonium zwitterions

The first example of a diaryl zwitterionic iodonium compound having the anionic function directly on the aromatic ring is described. Compound 2, Ph-I(+)-C₆H₄-4-SO₂N(−)SO₂CF₃, is obtained in excellent yield and its X-ray structure was determined. 2 and the many analogues that can be prepared have excellent potential as photoacid generators (PAGs) in microlithography.     

Enhanced dissolution of copolymers bearing photobase- or photoacid-generating groups in polar solvents by photochemical formation of ionic pairs

Solubility changes in the irradiation of copolymers bearing photoacid- or photobase-generating groups and low molecular weight photobase generators (PBGs) or photoacid generators (PAGs) were investigated. Copolymers bearing acyloxyimino (AOI) groups were used as those generating pendant amino groups photochemically. Copolymers bearing o-nitrobenzyloxycarbonyl and imino sulfonate groups were used as those generating carboxy and sulfo groups, respectively. The solubility of copolymers bearing AOI groups into polar solvents was enhanced by added PAGs such as β-keto sulfones or imino sulfonates after irradiation. A similar enhancement was observed in copolymers bearing o-nitrobenzyloxycarbonyl groups in the presence of PBGs such as oxime esters or o-nitrobenzyl carbamates. These results showed that the formation of acid–base pairs on irradiation was effective for dissolution into polar solvents. Copolymers bearing imino sulfonate groups showed a high solubility, and no such enhancement was observed by PBG. Films of copolymers bearing β-keto sulfone groups became insoluble because of crosslinking. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 1708–1715, 2001     

Efficient Self‐Contained Photoacid Generator System Based on Photochromic Terarylenes

A series of highly sensitive neutral photoacid generators (PAGs) based on photochromic terarylenes was prepared. Like the example presented herein, these compounds show a subsequent thermal elimination of a Brønsted acid after a light‐triggered 6π‐electrocyclization, concomitant with the hexatriene aromatization. A novel type of molecular systems was developed, in which one thiazolyl moiety was replaced by a thienyl group. Depending on the solvents and on the nature of the acid source, the quantum yield (QY) for acid generation could reach up to 0.6. Comparative studies on the acid source clearly showed that aromatic leaving groups tend to extinguish the molecular system photoefficiency. A second type was also prepared, in which the nature of the hetero‐aromatic rings were identical to our previous example, but their sequence was modified. Therefore, a second level of improvement was achieved in nonpolar solvents, pushing the QY value up to 0.7. Finally, we demonstrated the mesylic acid‐releasing PAG as a photocatalyst in a chemically amplified positive resist system.     

Signal-Induced Release of Guests from a Photolatent Metal–Phenolic Supramolecular Cage and Its Hybrid Assemblies

The coordination chemistry of plant polyphenols and metal ions can be used for coating various substrates and for creating modular superstructures. We herein explored this chemistry for the controlled release of guests from mesoporous silica nanoparticles (MSNs). The selective adsorption of tannic acids (TAs) on MSN silica walls opens the MSN mesoporous channels without disturbing mass transport. The channel may be closed by the coordination of TA with Cu^II ions. Upon exposure to light, photolysis of Trojan horse guests (photoacid generators, PAGs) leads to acid generation, which enables the release of payloads by decomposing the outer coordination shell consisting of TA and Cu^II. We also fabricated a modular assembly of MSNs on glass substrates. The photoresponsive release characteristics of the resulting film are similar to those of the individual MSNs. This method is a fast and facile strategy for producing photoresponsive nanocontainers by non-covalent engineering of MSN surfaces that should be suitable for various applications in materials science.     

Signal‐Induced Release of Guests from a Photolatent Metal–Phenolic Supramolecular Cage and Its Hybrid Assemblies

The coordination chemistry of plant polyphenols and metal ions can be used for coating various substrates and for creating modular superstructures. We herein explored this chemistry for the controlled release of guests from mesoporous silica nanoparticles (MSNs). The selective adsorption of tannic acids (TAs) on MSN silica walls opens the MSN mesoporous channels without disturbing mass transport. The channel may be closed by the coordination of TA with Cu^II ions. Upon exposure to light, photolysis of Trojan horse guests (photoacid generators, PAGs) leads to acid generation, which enables the release of payloads by decomposing the outer coordination shell consisting of TA and Cu^II. We also fabricated a modular assembly of MSNs on glass substrates. The photoresponsive release characteristics of the resulting film are similar to those of the individual MSNs. This method is a fast and facile strategy for producing photoresponsive nanocontainers by non‐covalent engineering of MSN surfaces that should be suitable for various applications in materials science.