Si(CH3)3Cl分子电离电势和化学键能的测定

The photoionization spectroscopy of Si(CH3)3Cl in the range of 50 -130 nm was studied with synchrotron radiation source. The adiabatic ionization potentials of molecule Si(CH3)3Cl and radical Si(CH3)3 are 10.06 ±0.02 eV and 7.00±0.03 eV respectively. In addition, the appearance potentials of Si(CH3)2Cl+, Si(CH3)3+, SiCl+ and SiCH3+ were determined:
AP(Si(CH3)2Cl+) ＝10.49±0.02eV, AP(Si(CH3)3+) ＝ 11.91 ±0.02eV
AP(SiCl+) ＝ 18.64 ±0.06eV, AP(SiCH3+)＝ 18.62 ±0.02eV
From these, some chemical bond energies of Si(CH3)3Cl+ were calculated:
D(Si(CH3)2Cl+ - CH3) ＝0.43 ±0.02eV, D(Si(CH3)3+ - Cl) ＝ 1.85 ± 0.02eV
D(SiCH3+ - (2CH3 ＋ Cl)) ＝ 8.56 ± 0．06eV, D(SiCH3+ - 2CH3) ＝6.71±0．06eV
D(SiCl+ - 3CH3) ＝ 8.58 ± 0.06eV, D(SiCl＋- 2CH3) ＝ 8.15 ±0.06eV
D(SiCH3+- (CH3 ＋ Cl)) ＝8.13 ±0.06eV     

Why are SiX5(-) and GeX5(-) (X = F, Cl) stable but not CF5(-) and CCl5(-)?

The possible existence of the CF(5)(-), CCl(5)(-), SiF(5)(-), SiCl(5)(-), GeF(5)(-), and GeCl(5)(-) anions has been investigated using ab initio methods. The species containing Si and Ge as central atoms were found to adopt the D(3h)-symmetry trigonal bipyramidal equilibrium structures whose thermodynamic stabilities were confirmed by examining the most probable fragmentation channels. The ab initio re-examination of the electronic stabilities of the SiF(5)(-), SiCl(5)(-), GeF(5)(-), and GeCl(5)(-) anions [using the OVGF(full) method with the 6-311+G(3df) basis set] led to the very large vertical electron detachment (VDE) energies of 9.316 eV (SiF(5)(-)) and 9.742 eV (GeF(5)(-)), whereas smaller VDEs of 6.196 and 6.452 eV were predicted for the SiCl(5)(-) and GeCl(5)(-) species, respectively. By contrast, the high-symmetry and structurally compact anionic CF(5)(-) and CCl(5)(-) systems cannot exist due to the strongly repulsive potential predicted for the X(-) (F(-) or Cl(-)) approaching the CX(4) (CF(4) or CCl(4)). The formation of weakly bound CX(4)···X(-) (CF(4)···F(-) and CCl(4)···Cl(-)) anionic complexes (consisting of pseudotetrahedral neutral CX(4) with the weakly tethered X(-)) might be expected at low temperatures (approaching 0 K), whereas neither CX(5)(-) (CF(5)(-), CCl(5)(-)) systems nor CX(4)···X(-) (CF(4)···F(-) and CCl(4)···Cl(-)) complexes can exist in the elevated temperatures (above 0K) due to their susceptibility to the fragmentation (leading to the X(-) loss).     

Neutral pentacoordinate silicon fluorides derived from amidinate, guanidinate, and triazapentadienate ligands and base-induced disproportionation of Si2Cl6 to stable silylenes

Pentacoordinate silicon fluorides L(1)SiF(3) (2a), L(2)SiF(3) (2b), and (L(3)SiF(2))(2) (2c)(2) based on amidinate (L(1) = PhC(N(t)Bu)(2)), guanidinate (L(2) = 1,3,4,6,7,8-hexahydro-2H-pyrimido[1,2-a]pyrimidinate), and triazapentadienate (L(3) = NC(NMe(2))NC(NMe(2))NAr; Ar = 2,6-(i)Pr(2)C(6)H(3)) ligands were prepared by fluorination of the corresponding chlorosilanes L(1)SiCl(3) (1a), L(2)SiCl(3) (1b), and L(3)SiCl(2) (1c) with Me(3)SnF at ambient temperature. Compounds 1b, 1c, 2a, 2b, and (2c)(2) were characterized by (1)H, (13)C, (19)F, and (29)Si NMR spectroscopic studies. Molecular structures of 1b, 1c, 2a, and (2c)(2) were determined by single crystal X-ray structural analysis. Invariom refinement involving non-spherical scattering factors of the Hansen-Coppens multipole model was performed for 1b. Compound L(3)SiF(2) (2c) is dimeric both in the solid state and in solution, whereas its chloro-analogue 1c is monomeric. The attempted synthesis of diamidinatotetrachlorodisilane by reaction of lithium amidinate with Si(2)Cl(6) led to the formation of the silane (1a) and the silylene L(1)SiCl (3). Reaction of Si(2)Cl(6) with N-heterocyclic carbenes (NHC) afforded NHC adducts of dichlorosilylene and SiCl(4). A one pot method for the preparation of base-stabilized silylenes from Si(2)Cl(6) is discussed.     

Si(CH3)2Cl2分子的电离电势和化学键能的测定

有机硅化合物是半导体工业中产生硅元件的基本原料和有机合成中的重要试剂，是多年来大家研究较多的分子体系之一．本文报导了用同步辐射加速器产生的真空紫外光，电离St（CH3hCI。分子．在50－120n－m波长范围内，测量了各种离子产物与真空紫外光波长的关系，推算得它的绝热电离电势和离子中几个化学键的键能．1实验装置和方法本工作在国家同步辐射实验室光化学实验站进行．进行分子真空紫外光电离研究的实验系统已在文献山中详细描述．同步辐射加速器产生的真空紫外光波长用Ne气的电离势标定，其误差＜士0－Inln．单色仪的分辨率为河凸…     

Flattening a puckered cyclohexasilane ring by suppression of the pseudo-Jahn-Teller effect

We report the experimental and theoretical characterization of neutral Si(6)X(12) (X = Cl, Br) molecules that contain D(3d) distorted six-member silicon rings due to a pseudo-Jahn-Teller (PJT) effect. Calculations show that filling the intervenient molecular orbitals with electron pairs of adduct suppresses the PJT effect in Si(6)X(12), with the Si(6) ring becoming planar (D(6h)) upon complex formation. The stabilizing role of electrostatic and covalent interactions between positively charged silicon atoms and chlorine atoms of the subject [Si(6)Cl(14)](2-) dianionic complexes is discussed. The reaction of Si(6)Cl(12) with a Lewis base (e.g., Cl(-)) to give planar [Si(6)Cl(14)](2-) dianionic complexes presents an experimental proof that suppression of the PJT effect is an effective strategy in restoring high Si(6) ring symmetry. Additionally, the proposed pathway for the PJT suppression has been proved by the synthesis and characterization of novel compounds containing planar Si(6) ring, namely, [(n)Bu(4)N](2)[Si(6)Cl(12)I(2)], [(n)Bu(4)N](2)[Si(6)Br(14)], and [(n)Bu(4)N](2)[Si(6)Br(12)I(2)]. This work represents the first demonstration that PJT effect suppression is useful in the rational design of materials with novel properties.     

Photodissociation of propargyl bromide and photoionization of the propargyl radical

Velocity map imaging was used to study the 193 nm photodissociation of propargyl bromide C(3)H(3)Br as well as the photoionization dynamics of the resulting propargyl radical C(3)H(3). Images were recorded by using single-photon vacuum ultraviolet ionization of the propargyl radical and by using two-photon resonant, three-photon ionization of the ground state Br((2)P(32)) and spin-orbit excited Br(*)((2)P(12)) atoms. Analysis of these data allowed the determination of the branching ratio Br:Br(*) as well as the photofragment angular distributions. Images of C(3)H(3) produced by the photodissociation of both C(3)H(3)Br and C(3)H(3)Cl were recorded at several energies between 8.97 and 9.12 eV, as well as at 9.86 eV, and showed no obvious internal energy dependence of the relative photoionization cross sections.     

Optical control of ground-state atomic orbital alignment: Cl(2P3/2) atoms from HCl(v=2,J=1) photodissociation

H(35)Cl(v=0,J=0) molecules in a supersonic expansion were excited to the H(35)Cl(v=2,J=1,M=0) state with linearly polarized laser pulses at about 1.7 microm. These rotationally aligned J=1 molecules were then selectively photodissociated with a linearly polarized laser pulse at 220 nm after a time delay, and the velocity-dependent alignment of the (35)Cl((2)P(32)) photofragments was measured using 2+1 REMPI and time-of-flight mass spectrometry. The (35)Cl((2)P(32)) atoms are aligned by two mechanisms: (1) the time-dependent transfer of rotational polarization of the H(35)Cl(v=2,J=1,M=0) molecule to the (35)Cl((2)P(32)) nuclear spin [which is conserved during the photodissociation and thus contributes to the total (35)Cl((2)P(32)) photofragment atomic polarization] and (2) the alignment of the (35)Cl((2)P(32)) electronic polarization resulting from the photoexcitation and dissociation process. The total alignment of the (35)Cl((2)P(32)) photofragments from these two mechanisms was found to vary as a function of time delay between the excitation and the photolysis laser pulses, in agreement with theoretical predictions. We show that the alignment of the ground-state (35)Cl((2)P(32)) atoms, with respect to the photodissociation recoil direction, can be controlled optically. Potential applications include the study of alignment-dependent collision effects.     

Electron attachment to gas-phase uracil

We present results about dissociative electron attachment (DEA) to gas-phase uracil (U) for incident electron energies between 0 and 14 eV using a crossed electron/molecule beam apparatus. The most abundant negative ion formed via DEA is (U-H)-, where the resonance with the highest intensity appears at 1.01 eV. The anion yield of (U-H)- shows a number of peaks, which can be explained in part as being due to the formation of different (U-H)- isomers. Our results are compared with high level ab initio calculations using the G2MP2 method. There was no measurable amount of a parent ion U-. We also report the occurrence of 12 other fragments produced by dissociative electron attachment to uracil but with lower cross sections than (U-H)-. In addition we observed a parasitic contaminating process for conditions where uracil was introduced simultaneously with calibrant gases SF6 and CCl4 that leads to a sharp peak in the (U-H)- cross section close to 0 eV. For (U-H)- and all other fragments we determined rough measures for the absolute partial cross section yielding in the case of (U-H)- a peak value of sigma (at 1.01 eV)=3 x 10(-20) m2.     

Electron ionization of SiCl4

Relative partial ionization cross sections (PICS) for the formation of fragment ions following electron ionization of SiCl(4), in the electron energy range 30-200 eV, have been determined using time-of-flight mass spectrometry coupled with an ion coincidence technique. By this method, the contributions to the yield of each fragment ion from dissociative single, double, and triple ionization, are distinguished. These yields are quantified in the form of relative precursor-specific PICS, which are reported here for the first time for SiCl(4). For the formation of singly charged ionic fragments, the low-energy maxima appearing in the PICS curves are due to contributions from single ionization involving predominantly indirect ionization processes, while contributions to the yields of these ions at higher electron energies are often dominated by dissociative double ionization. Our data, in the reduced form of relative PICS, are shown to be in good agreement with a previous determination of the PICS of SiCl(4). Only for the formation of doubly charged fragment ions are the current relative PICS values lower than those measured in a previous study, although both datasets agree within combined error limits. The relative PICS data presented here include the first quantitative measurements of the formation of Cl(2) (+) fragment ions and of the formation of ion pairs via dissociative double ionization. The peaks appearing in the 2D ion coincidence data are analyzed to provide further information concerning the mechanism and energetics of the charge-separating dissociations of SiCl(4) (2+). The lowest energy dicationic precursor state, leading to SiCl(3) (+) + Cl(+) formation, lies 27.4 ± 0.3 eV above the ground state of SiCl(4) and is in close agreement with a calculated value of the adiabatic double ionization energy (27.3 eV).     

C-Cl bond fission dynamics and angular momentum recoupling in the 235 nm photodissociation of allyl chloride

The photodissociation dynamics of allyl chloride at 235 nm producing atomic Cl((2)P(J);J=1/2,3/2) fragments is investigated using a two-dimensional photofragment velocity ion imaging technique. Detection of the Cl((2)P(1/2)) and Cl((2)P(3/2)) products by [2+1] resonance enhanced multiphoton ionization shows that primary C-Cl bond fission of allyl chloride generates 66.8% Cl((2)P(3/2)) and 33.2% Cl((2)P(1/2)). The Cl((2)P(3/2)) fragments evidenced a bimodal translational energy distribution with a relative weight of low kinetic energy Cl((2)P(3/2))/high kinetic energy Cl((2)P(3/2)) of 0.097/0.903. The minor dissociation channel for C-Cl bond fission, producing low kinetic energy chlorine atoms, formed only chlorine atoms in the Cl((2)P(3/2)) spin-orbit state. The dominant C-Cl bond fission channel, attributed to an electronic predissociation that results in high kinetic energy Cl atoms, produced both Cl((2)P(1/2)) and Cl((2)P(3/2)) atomic fragments. The relative branching for this dissociation channel is Cl((2)P(1/2))/[Cl((2)P(1/2))+Cl((2)P(3/2))]=35.5%. The average fraction of available energy imparted into product recoil for the high kinetic energy products was found to be 59%, in qualitative agreement with that predicted by a rigid radical impulsive model. Both the spin-orbit ground and excited chlorine atom angular distributions were close to isotropic. We compare the observed Cl((2)P(1/2))/[Cl((2)P(1/2))+Cl((2)P(3/2))] ratio produced in the electronic predissociation channel of allyl chloride with a prior study of the chlorine atom spin-orbit states produced from HCl photodissociation, concluding that angular momentum recoupling in the exit channel at long interatomic distance determines the chlorine atom spin-orbit branching.     

Time-slice velocity-map ion imaging studies of the photodissociation of NO in the vacuum ultraviolet region

The time-slice velocity-map ion imaging and the resonant four-wave mixing techniques are combined to study the photodissociation of NO in the vacuum ultraviolet (VUV) region around 13.5 eV above the ionization potential. The neutral atoms, i.e., N((2)D(o)), O((3)P(2)), O((3)P(1)), O((3)P(0)), and O((1)D(2)), are probed by exciting an autoionization line of O((1)D(2)) or N((2)D(o)), or an intermediate Rydberg state of O((3)P(0,1,2)). Old and new autoionization lines of O((1)D(2)) and N((2)D(o)) in this region have been measured and newer frequencies are given for them. The photodissociation channels producing N((2)D(o)) + O((3)P), N((2)D(o)) + O((1)D(2)), N((2)D(o)) + O((1)S(0)), and N((2)P(o)) + O((3)P) have all been identified. This is the first time that a single VUV photon has been used to study the photodissociation of NO in this energy region. Our measurements of the angular distributions show that the recoil anisotropy parameters (β) for all the dissociation channels except for the N((2)D(o)) + O((1)S(0)) channel are minus at each of the wavelengths used in the present study. Thus direct excitation of NO by a single VUV photon in this energy region leads to excitation of states with Σ or Δ symmetry (ΔΩ = ±1), explaining the observed perpendicular transition.     

Comparison of hexamethyldisiloxane dissociation processes in plasma

Different hexamethyldisiloxane (HMDSO) dissociation processes are investigated by means of absorption spectroscopy and mass spectrometry. All of these processes are expected to occur in plasma containing Ar-HMDSO gas mixture. We successively study interactions of the HMDSO molecule with electrons (energy ranges from 15 to 70 eV), with Ar((3)P(2)) metastable species (internal energy 11.55 eV) and with VUV photon (7.3 to 10.79 eV). The studies of HMDSO interactions with Ar((3)P(2)) and VUV photon provide new results concerning the dissociation pathways and the collision cross-sections. In the case of Ar((3)P(2)), the dissociation mechanisms result mainly in Si-C or Si-O bond breaking, producing SiMe(2,1) radicals. Less efficient mechanisms involve also Si-C and Si-O bond breaking producing Me, Si(2)Me(5)O, or SiMe(3), on one hand, and, on the other hand, Si-C and C-H bond breaking producing Si(2)Me(4)OH. In the case of photon interaction, the dissociation process is more selective and mainly produces Si(2)OMe(5) pentadisiloxane and methyl radicals due to Si-C bond breaking. Si-O bond breaking produces also SiMe(3) in a lower concentration. Dissociation cross-section values of HMDSO ranging from σ = 45 × 10(-20) m(2) to 180 × 10(-20) m(2) and from σ = 0.7 × 10(-22) m(2) to 18.3 × 10(-22) m(2), correspond to a global dissociation mechanism by Ar((3)P(2)) collision and to a selective dissociation mechanism (producing Si(2)OMe(5) and Me) by VUV photon interaction, respectively. All results are compared and discussed.     

Electronic states of F2CO as studied by electron energy-loss spectroscopy and ab initio calculations

This paper reports on the first measurements of the electron impact electronic excitation cross-sections for carbonyl fluoride, F(2)CO, measured at 30 eV, 10° and 100 eV, 5° scattering angle, while sweeping the energy loss over the range 5.0-18.0 eV. The electronic-state spectroscopy has been investigated and the assignments are supported by quantum chemical calculations. The energy bands above 9.0 eV and the vibrational progressions superimposed upon it have been observed for the first time. Vibronic coupling has been shown to play an important role dictating the nature of the observed excited states, especially for the low-lying energy region (6.0-8.0 eV). New experimental evidence for the 6(1)B(2) state proposed to have its maximum at 12.75 eV according to the vibrational excitation reported in this energy region (11.6-14.0 eV). The n = 3 members of the Rydberg series have been assigned converging to the lowest ionization energy limits, 13.02 eV ((2)B(2)), 14.09 eV ((2)B(1)), 16.10 ((2)B(2)), and 19.15 eV ((2)A(1)) reported for the first time and classified according to the magnitude of the quantum defects (δ).     

An investigation of nonadiabatic interactions in Cl(2Pj) + D2 via crossed-molecular-beam scattering

We have determined limits on the cross section for both electronically nonadiabatic excitation and quenching in the Cl((2)P(j)) + D(2) system. Our experiment incorporates crossed-molecular-beam scattering with state-selective Cl((2)P(12,32)) detection and velocity-mapped ion imaging. By colliding atomic chlorine with D(2), we address the propensity for collisions that result in a change of the spin-orbit level of atomic chlorine either through electronically nonadiabatic spin-orbit excitation Cl((2)P(32)) + D(2)-->Cl(*)((2)P(12)) + D(2) or through electronically nonadiabatic spin-orbit quenching Cl(*)((2)P(12)) + D(2)-->Cl((2)P(32)) + D(2). In the first part of this report, we estimate an upper limit for the electronically nonadiabatic spin-orbit excitation cross section at a collision energy of 5.3 kcal/mol, which lies above the energy of the reaction barrier (4.9 kcal/mol). Our analysis and simulation of the experimental data determine an upper limit for the excitation cross section as sigma(NA)< or =0.012 A(2). In the second part of this paper we investigate the propensity for electronically nonadiabatic spin-orbit quenching of Cl(*) following a collision with D(2) or He. We perform these experiments at collision energies above and below the energy of the reaction barrier. By comparing the amount of scattered Cl(*) in our images to the amount of Cl(*) lost from the atomic beam we obtain the maximum cross section for electronically nonadiabatic quenching as sigma(NA)< or =15(-15) (+44) A(2) for a collision energy of 7.6 kcal/mol. Our experiments show the probability for electronically nonadiabatic quenching in Cl(*) + D(2) to be indistinguishable to that for the kinematically identical system of Cl(*) + He.     

Ultraviolet photodissociation of iodine monochloride (ICl) at 235, 250, and 265 nm

ICl photolysis in the ultraviolet region of the spectrum (235-265 nm) is studied using the Slice Imaging technique. The Cl?((2)P(1/2))/Cl((2)P(3/2)) and the I?((2)P(1/2))/I((2)P(3/2)) branching ratio between the I((2)P(3/2)) + Cl((2)P(3/2))∕Cl?((2)P(1/2)) and I?((2)P(1/2)) + Cl((2)P(3∕/2))∕Cl?((2)P(1/2)) channels is extracted from the respective iodine and chlorine photofragment images. We find that ground state chlorine atoms (Cl((2)P(3/2))) are formed nearly exclusively with excited state iodine atoms (I?((2)P(1/2))), while excited spin-orbit chlorine atoms (Cl?((2)P(1/2))) are concurrently produced only with ground state iodine atoms (I((2)P(3/2))). We conclude that photolysis of ICl in this UV region is a relatively "clean" source of spin-orbit excited chlorine atoms that can be used in crossed molecular beam experiments.     

Methyl Iodide Photodissociation at 193 nm: The I((2)P(1/2)) Quantum Yield

Methyl iodide photolysis at 193 nm has been studied through probing the I((2)P(1/2)-(2)P(3/2)) transition in the atomic iodine photofragment using diode laser spectroscopy. The I((2)P(1/2)) quantum yield has been determined through two different diode laser techniques and then compared. Frequency-modulated diode laser based absorption spectroscopy was used to extract nascent Doppler lineshapes from which an I((2)P(1/2)) quantum yield of unity is inferred. However when diode laser gain/absorption measurements were made, an I((2)P(1/2)) quantum yield of 0.68 ± 0.04 was found. The reason for this discrepancy is shown to lie in the diode laser gain/absorption method. Molecular iodine is found to be formed during the experiment via atomic iodine recombination and then in turn dissociates to produce both I((2)P(1/2)) and I((2)P(3/2)), thus distorting the returned quantum yield. This conclusion is supported both by the reduction of the I((2)P(1/2)) quantum yield with number of photolysis laser shots when measured using this technique and by the presence of fluoresence which is shown to have excited-state lifetimes and quenching rates that are consistent with those previously measured for the D and D' states of molecular iodine.     

Dissociation of sulfur dioxide by ultraviolet multiphoton absorption between 224 and 232 nm

Multiphoton excitation and dissociation of SO(2) have been investigated in the wavelength range from 224 to 232 nm. Strong evidence is found for two-photon excitation to the H Rydberg state, followed by dissociation to SO + O and ionization of the SO product by absorption of a third photon. The two-photon excitation is resonantly enhanced via the C (1)B(2) intermediate state, and the two-photon yield spectrum thus bears a strong resemblance to the spectrum of this intermediate. Imaging of the O((3)P(2)), S((1)D(2)), and SO products suggests that, following dissociation of SO(2) from the H state, SO is produced in the A and B electronic states. S((1)D(2)) is produced both from two-photon dissociation of SO(2) to give S((1)D(2)) + O(2) and by single-photon dissociation of SO(+). In the former process, the O(2) is likely formed in all of its lowest three electronic states.     

Electron-impact ionization of silicon tetrachloride (SiCl4)

We measured absolute partial cross sections for the formation of various singly charged and doubly charged positive ions produced by electron impact on silicon tetrachloride (SiCl4) using two different experimental techniques, a time-of-flight mass spectrometer (TOF-MS) and a fast-neutral-beam apparatus. The energy range covered was from the threshold to 900 eV in the TOF-MS and to 200 eV in the fast-neutral-beam apparatus. The results obtained by the two different experimental techniques were found to agree very well (better than their combined margins of error). The SiCl3(+) fragment ion has the largest partial ionization cross section with a maximum value of slightly above 6x10(-20) m2 at about 100 eV. The cross sections for the formation of SiCl4(+), SiCl+, and Cl+ have maximum values around 4x10(-20) m2. Some of the cross-section curves exhibit an unusual energy dependence with a pronounced low-energy maximum at an energy around 30 eV followed by a broad second maximum at around 100 eV. This is similar to what has been observed by us earlier for another Cl-containing molecule, TiCl4 [R. Basner, M. Schmidt, V. Tamovsky, H. Deutsch, and K. Becker, Thin Solid Films 374 291 (2000)]. The maximum cross-section values for the formation of the doubly charged ions, with the exception of SiCl3(++), are 0.05x10(-20) m2 or less. The experimentally determined total single ionization cross section of SiCl4 is compared with the results of semiempirical calculations.     

Strong fragmentation processes driven by low energy electron attachment to various small perfluoroether molecules

Negative ion formation in the three perfluoroethers (PFEs) diglyme (C(6)F(14)O(3)), triglyme (C(8)F(18)O(4)) and crownether (C(10)F(20)O(5)) is studied following electron attachment in the range from ～0 to 15?eV. All three compounds show intense low energy resonances at subexcitation energies (<3?eV) decomposing into a variety of negatively charged fragments. These fragment ions are generated via dissociative electron attachment (DEA), partly originating from sequential decompositions on the metastable (μs) time scale as observed from the MIKE (metastable induced kinetic energy) scans. Only in perfluorocrownether a signal due to the non-decomposed parent anion is observed. Additional and comparatively weaker resonances are located in the energy range between ～10 and 17?eV which preferentially decompose into lighter ions. It is suggested that specific features of perfluoropolyethers (PFPEs) relevant in applications, e.g., the strong bonding to surfaces induced by UV radiation of the substrate or degradation of PFPE films in computer hard disc drives can be explained by their pronounced sensitivity towards low energy electrons.     

Polylithiated tetraaminosilanes: synthesis and characterization of (Et2O.Li)4[Si(Nnaph)4] and X-ray structure of (THF.Li3[Si(NiPr)3(NHiPr)])2

The treatment of SiCl4 with 4 equiv of Li2(Nnaph) (naph = 1-naphthyl) in diethyl ether gives (Et2O.Li)4[Si(Nnaph)4] (4), which, upon reaction with excess tBuNH3Cl or MeO3SCF3, generates Si[N(H)naph]4 (5) or Si[N(Me)naph]4 (6), respectively. The centrosymmetric dimer (THF.Li3[Si(NiPr)3(NHiPr)])2 (7), formed via trilithiation of Si[N(H)iPr]4 with n-butyllithium, consists of a bis-THF-solvated Li6(NiPr)6 cyclic ladder bicapped by two SiN(H)iPr units. Crystal data for 7: C32H74Li6N8O2Si2, monoclinic, P2(1)/n, a = 10.661(7) A, b = 16.964(5) A, c = 12.405(4) A, beta = 93.22(4) degrees, V = 2239.9(15) A3, and Z = 2.