Macroscopic superconducting current through a silicon surface reconstruction with indium adatoms: Si(111)-(√7 × √3)-In

Macroscopic and robust supercurrents are observed by direct electron transport measurements on a silicon surface reconstruction with In adatoms [Si(111)-(√7 × √3)-In]. The superconducting transition manifests itself as an emergence of the zero resistance state below 2.8 K. I-V characteristics exhibit sharp and hysteretic switching between superconducting and normal states with well-defined critical and retrapping currents. The two-dimensional (2D) critical current density J(2D,c) is estimated to be as high as 1.8 A/m at 1.8 K. The temperature dependence of J(2D,c) indicates that the surface atomic steps play the role of strongly coupled Josephson junctions.     

Nucleation and growth of Si on Pb monolayer covered Si(111) surfaces

With a scanning tunneling microscope (STM), we study the initial stage of nucleation and growth of Si on Pb monolayer covered Si(111) surfaces. The Pb monolayer can work as a good surfactant for growth of smooth Si thin films on the Si(111) substrate. We have found that nucleation of two-dimensional (2D) Pb-covered Si islands occurs only when the substrate temperature is high enough and the Si deposition coverage is above a certain coverage. At low deposition coverages or low substrate temperatures, deposited Si atoms tend to self-assemble into a certain type of Si atomic wires, which are immobile and stable against annealing to ~ 200 °C. The Si atomic wires always appear as a double bright-line structure with a separation of ~ 9 Å between the two lines. After annealing to ~ 200 °C for a period of time, some sections of Si atomic wires may decompose, meanwhile the existing 2D Pb-covered Si islands grow laterally in size. The self-assembly of Si atomic wires indicate that single Si adatoms are mobile at the Pb-covered Si(111) surface even at room temperature. Further study of this system may reveal the detailed atomic mechanism in surfactant-mediated epitaxy.     

Exchanges between Si and Pb adatoms on Si(111)

Real-time observation by high-temperature scanning tunneling microscopy of exchanges between Si and Pb atoms on a Si(111)-√3 × √3 surface is reported. The exchange rate is obtained as a function of the temperature. The activation energy of the exchange is about 1.2 eV, and the prefactor, shown to depend on the Pb coverage, is from 2 × 10¹⁰ to 8 × 10¹¹ s⁻¹. This prefactor is much larger than that for the exchange between Pb and Ge adatoms on a Ge(111)-c(2 × 8) surface, indicating that the adatom arrangement greatly influences the exchange mechanism. We also report that metastable 9 × 9 reconstruction appears during Pb desorption.     

Features of atomic processes at the formation of a wetting layer and nucleation of three-dimensional Ge islands on Si(111) and Si(100) surfaces

The intermediate stages of the formation of a Ge wetting layer on Si(111) and Si(100) surfaces under quasiequilibrium grow conditions have been studied by means of scanning tunneling microscopy. The redistribution of Ge atoms and relaxation of mismatch stresses through the formation of surface structures of decreased density and faces different from the substrate orientation have been revealed. The sites of the nucleation of new three-dimensional Ge islands after the formation of the wetting layer have been analyzed. Both fundamental differences and common tendencies of atomic processes at the formation of wetting layers on Si(111) and Si(100) surfaces have been demonstrated. The density of three-dimensional nuclei on the Si(111) surface is determined by changed conditions for the surface diffusion of Ge adatoms after change in the surface structure. Transition to three-dimensional growth on the Si(100) surface is determined by the nucleation of single {105} faces on the rough Ge(100) surface.     

A new method of surface structure-analysis by medium energy electron diffraction: distinction between T4 and H3 models for the Si(111)√3 × √3 -In surface

A new method (named GB-MEED) of medium-energy electron diffraction has been invented. This method is used to measure back-scattering medium-energy electron diffraction patterns with a grazing-incident electron beam. It is demonstrated that GB-MEED is sensitive to the structural change of only a few upper layers of the Si(111) surface. A simple model of single-scattering cluster calculation similar to that for X-ray photoelectron diffraction has been applied to analyze presently measured GB-MEED patterns for the Si(111)√3 × √3-In surface. The distinction between T₄ and H₃ models for the Si(111)-√3 × √3-In surface has been made by making the best use of forward focusing of electron-scattering at a medium energy of 1 keV.     

Growth mechanism and morphology of Ge on Pb covered Si(111) surfaces

We study the mechanism and surface morphology in epitaxial growth of Ge on Pb covered Si(111) using a scanning tunneling microscope (STM). We find that Ge adatoms have a very large diffusion length at room temperature. The growth is close to perfect layer-by-layer for the first two bilayers. Surface roughness increases gradually with the film thickness, but no 3D islands are found at room temperature. For growth at 200°C, 3D Ge islands appear after completion of the second bilayer. At room temperature, we believe, the Pb layer enhances surface diffusion and the descending-step motion of Ge adatoms, but the ascending-step motion is hindered and thus 3D island growth is suppressed.     

Electronic stabilization of the Si(111)5 × 2-Au surface: Pb and Si adatoms

Using scanning tunneling microscopy/spectroscopy (STM/STS), angle resolved photoemission spectroscopy (ARPES) and first-principles density functional theory (DFT), we study the structural and the electronic properties of the Si(111)5 × 2-Au surface decorated with Pb adatoms. The STM topography data reveal that Pb adatoms form a similar superstructure to that observed in the case of Si adatoms on a bare Si(111)5 × 2-Au surface. The DFT calculations show that preferential adsorption sites of Pb atoms are located near the double Au chain. Bias dependent STM topography and spectroscopy together with the DFT calculations allow us to distinguish Pb from Si adatoms. Both the Si and Pb adatoms modify the electronic properties in the same way, which confirms the electronic origin of the stabilization of the surface.     

Role of the Metal/Semiconductor interface in quantum size effects: Pb /Si(111)

Self-organized islands of uniform heights can form at low temperatures on metal/semiconductor systems as a result of quantum size effects, i.e., the occupation of discrete electron energy levels in the film. We compare the growth mode on two different substrates [Si(111)- (7x7) vs Si(111)- Pb(sqrt[3]xsqrt[3] )] with spot profile analysis low-energy electron diffraction. For the same growth conditions (of coverage and temperature) 7-step islands are the most stable islands on the (7x7) phase, while 5-step (but larger islands) are the most stable islands on the (sqrt[3]xsqrt[3] ). A theoretical calculation suggests that the height selection on the two interfaces can be attributed to the amount of charge transfer at the interface.     

Interface behavior of Mn/PbTe(111) studied by scanning tunneling microscopy and X-ray photoemission spectroscopy

Mn overlayers growth on PbTe(111) have been investigated by using scanning tunneling microscopy (STM) and X-ray photoemission spectroscopy (XPS). The strong chemical interactions were found during the formation of Mn/PbTe(111) interface. At the initial deposition of Mn, one part of Mn adatoms substitute Pb atoms on the PbTe(111) surface, forming a (√3 × √3)R30° MnTe phase, and the other part of Mn adatoms, together with the kicked-out Pb atoms, nucleate at the boundaries of the MnTe islands, forming loop islands around the MnTe islands as an intermediate state. Finally, they develop into regular 3D Pb capped Mn islands upon further Mn deposition. For Mn growth on the PbTe surface where Pb atoms are almost completely substituted by Mn, the deposited Mn atoms either cooperate into the 3D Pb capped Mn islands promoting the upright growth of the 3D Pb capped Mn islands, or nucleate and grow on the MnTe superstructure areas. Free Pb layer always floats on the top of surface, indicating that Pb layer has smaller surface energy, and Mn adatoms always exchange the positions with the underneath Pb atoms during the growth.     

Vertical friedel oscillations in interface-induced surface charge modulations of ultrathin quantum islands

Two-dimensional Pb islands of a few atomic layers are grown on the incommensurate Si(111)-Pb surface at low temperatures. Among them, two types of islands having different stacking with the substrate are observed. These islands, respectively, display an alternating image contrast with their thickness. Besides, the contrasts of the islands of different types are complementary to each other layer by layer. These intriguing behaviors do not show significant bias dependence throughout the range from -3 to +3 V and can be explained by the vertical charge oscillation with the growth of a new layer. The charge oscillation in the out-of-plane direction originates from electron scattering by the in-plane potential variation at the Pb/Si interface.     

Electronic structure of Ag adsorbed on Si(111); experiment and theory

Experimental results (low energy electron loss spectroscopy) and band structure calculations relating to the early stages of Ag growth on a Si(111) surface are presented. Crystallography and thermal desorption kinetics studies of this interface, previously published, gave rise to the following conclusions. At room temperature and below 200°C, two-dimensional (2D) (111) epitaxial layers develop on top of a first ordered layer (√3 × √3), while at higher temperatures three-dimensional (3D) clusters develop over this first layer. Low energy electron loss experiments were performed at various surface coverages θ. They display different evolutions according to the growth modes. For the 2D epitaxial growth, one observes the disappearance of the peaks characteristic of a Si surface and the onset of Ag induced peaks located at 7.1 and 4.6 eV at completion of the √3 layer. These peaks narrow and shift to the bulk Ag excitation energies at 7.5 and 4 eV when a second Ag layer is deposited. In order to explain these results, we present a theoretical calculation of the electronic density of states of the interface using a tight binding approximation. This calculation accounts for the development of the Ag d band from the √3 coverage range to the (111) epitaxial Ag planes. The evolution of the spectra when θ is increased is discussed in view of these results.     

Monte carlo simulations of growth modes of Pb nanoislands on Si(111) surface

The growth of Pb islands on a Si(111) surface exhibits many interesting properties. For example, the self-assembled process results in a homogeneous distribution of Pb islands with uniform height. The dependence of this height on coverage and temperature can be expressed as a phase diagram [1]. In this paper we develop a model of the growth process that reflects the main features of the experimental observations and determines the key processes of quantum dot formation in a Pb/Si(111) system. The growth of islands is simulated by the Monte Carlo method. With suitably chosen parameters the model is able to reconstruct the phase diagram, via the dependence of the dynamics of Pb atoms on area and height. These dependencies are attributed to stress energy and quantum size effects.     

Growth and ordering of Ni(II) diphenylporphyrin monolayers on Ag(111) and Ag/Si(111) studied by STM and LEED

The room temperature self-assembly and ordering of (5,15-diphenylporphyrinato)nickel(II) (NiDPP) on the Ag(111) and Ag/Si(111)-(√3 × √3)R30° surfaces have been investigated using scanning tunnelling microscopy and low-energy electron diffraction. The self-assembled structures and lattice parameters of the NiDPP monolayer are shown to be extremely dependent on the reactivity of the substrate, and probable molecular binding sites are proposed. The NiDPP overlayer on Ag(111) grows from the substrate step edges, which results in a single-domain structure. This close-packed structure has an oblique unit cell and consists of molecular rows. The molecules in adjacent rows are rotated by approximately 17° with respect to each other. In turn, the NiDPP molecules form three equivalent domains on the Ag/Si(111)-(√3 × √3)R30° surface, which follow the three-fold symmetry of the substrate. The molecules adopt one of three equivalent orientations on the surface, acting as nucleation sites for these domains, due to the stronger molecule-substrate interaction compared to the case of the Ag(111). The results are explained in terms of the substrate reactivity and the lattice mismatch between the substrate and the molecular overlayer.     

Ga- and As-Adatom phases on the Ge(111) and Si(111) surfaces: analogies and differences

The (1 × 1) and (√3 × √3)R30° (T4) structures of Ga and As adatoms on the Ge(111) and Si(111) surfaces are studied using first-principles calculations. The surface energetics predicts, in some cases, a transformation of the T4 structure (surface covered with 1/3 monolayer (ML) of adatoms) into domains of the 1-ML covered (1 × 1) structure and areas of clean reconstructed suface. For As adatoms, such phase separation is favored on both substrates, while for Ga adatoms, it is only preferred on the Ge(111) surfaces. These results compare well with experimental observations.     

Quantum size effect on the diffusion barriers and growth morphology of Pb/Si(111)

An intriguing growth morphology of Pb islands on a Si(111) surface is observed in our STM experiments: the growth of a Pb layer on Pb islands with unstable heights starts from the periphery and moves towards the center, while the nucleation of the next layer on stable Pb islands starts away from the periphery. Using first-principles total energy calculations, we have studied the diffusion barriers of Pb adatoms on a freestanding Pb(111) film as a function of film thickness. The diffusion barriers are found to be very low (<60 meV), and a bi-layer oscillation due to the quantum size effect (QSE) is observed, with a lower barrier on the odd-layered, relatively unstable Pb films. The diffusion barrier difference between the odd- and even-layered film is as large as 40 meV. The observed unusual growth can be attributed to this big difference in the diffusion barriers due to QSE.     

Si_3N_4/Si表面Si生长过程的扫描隧道显微镜研究

利用原位扫描隧道显微镜和低能电子衍射分析了Si的纳米颗粒在Si3N4 /Si(111)和Si3N4 /Si(10 0 )表面生长过程的结构演变 .在生长早期T为 35 0— 10 75K范围内 ,Si在两种衬底表面上都形成高密度的三维纳米团簇 ,这些团簇的大小均在几个纳米范围内 ,并且在高温退火时保持相当稳定的形状而不相互融合 .当生长继续时 ,Si的晶体小面开始显现 .在晶态的Si3N4 (0 0 0 1) /Si(111)表面 ,Si的 (111)小面生长比其他方向优先 ,生长方向与衬底Si(111)方向一致 .最后在大范围内形成以 (111)为主的晶面 .相反 ,在非晶的Si3N4 表面 ,即Si3N4 /Si(10 0 ) ,Si晶体的生长呈现完全随机的方向性 ,低指数面如 (111)和 (10 0 )面共存 ,但它们并不占据主导地位 ,大部分暴露的小面是高指数面如 (113)面 .对表面生长过程进行了探讨并给出了合理的物理解释     

Initial growth process and surface structure of Ag on Si(111) studied by low-energy Ion-Scattering Spectroscopy (ISS) and LEED-AES

The growth process of silver on a Si(111) substrate has been studied in detail by low-energy ion-scattering spectroscopy (ISS) combined with LEED-AES. Neon ions of 500 eV were used as probe ions of ISS. The ISS experiments have revealed that the growth at room temperature and at high temperature are quite different from each other even in the submonolayer coverage range. The following growth models have been proposed for the respective temperatures. At room temperature, the deposited Ag forms a two-dimensional (2D) island at around 2/3 monolayer (ML) coverage, where the Ag atoms are packed commensurately with the Si(111)1 substrate. One third of the substrate Si surface remains uncovered there. Then it starts to develop into Ag crystal, and at a few ML coverage a 3D island of bulk Ag crystal grows directly on the substrate. An intermediate layer, which covers uniformly the whole surface before the growth of Ag crystal, does not exist. At high temperatures (>~200°C), the well-known Si(111)√3-Ag layer is formed as an intermediate layer, which consists of 2/3 ML of Ag atoms and covers the whole surface uniformly. These Ag atoms are embedded in the first double layer of the Si substrate. It is concluded that the formation of the √3 structure needs relatively high activation energy which may originate from the large displacement of Si atoms owing to the embedment of the Ag atoms, and does not proceed below about 200°C. The most stable state of the Ag atoms on the outermost Si layer is in the shape of an island, both for the Si(111) surface and for the Si(111)√3-Ag surface.     

Self-alignment of Co adatoms on in atomic wires by quasi-one-dimensional electron-gas-meditated interactions

Low-density Co atoms are found to self-align on the Si(111)-(4 x 1)-In surface in the direction of In atomic wires at incommensurate adsorption sites. Indirect interaction between a pair of Co adatoms is investigated through a site distribution function of adatoms determined with scanning tunneling microscopy. In the direction of self-alignment, the potential of the mean force between two Co adatoms is long-range and oscillatory with multiple frequencies, which correlate strongly to the electronic scattering vectors of the surface-state bands at the Fermi level. We thus attribute the Co-Co interaction to that mediated by a quasi-one-dimensional electron gas confined within the In atomic wires.     

Intermixing at the interface of the system Nb/Fe(1 1 0) investigated by STM

The growth of niobium on the Fe(1 1 0) surface at a deposition temperature between room temperature (RT) and 680 K was studied using in situ STM and LEED. At RT we observe no indication of intermixing. Although a final roughness of only 1.7 Å is reached, the crystalline quality is low. At elevated growth temperatures the development of a surface alloy was observed, whose formation is ascribed to an exchange mechanism through which Nb adatoms are incorporated into the Fe surface. These Nb atoms arrange themselves in chains along the [0 0 1] direction. The expelled Fe atoms form islands on the Nb/Fe-alloy substrate. At higher coverage additionally a Nb wetting layer and intermixed 3D islands evolve.     

Modifying Quantum Well States of Pb Thin Films via Interface Engineering

We demonstrate the importance of interface modification on improving electron confinement by preparing Pb quantum islands on Si（111） substrates with two different surface reconstructions, i.e., Si（111）-7 ×7 and Si（111）- Root3×Root3-Pb （hereafter, 7 ×7 and R3）. Characterization with scanning tunneling microscopy/spectroscopy shows that growing Pb films directly on a 7 × 7 surface will generate many interface defects, which makes the lifetime of quantum well states （QWSs） strongly dependent on surface locations. On the other hand, QWSs in Pb films on an R3 surface are well defined with small variations in linewidth on different surface locations and are much sharper than those on the 7 × 7 surface. We show that the enhancement in quantum confinement is primarily due to the reduced electron-defect scattering at the interface.