离子束溅射薄膜光学常数表征的光斑效应

利用离子束溅射沉积制备了光学薄膜。基于椭圆偏振测量技术,研究了折射率、膜层厚度和表面层厚度与测试光斑大小的关系。研究结果表明,随着样品表面测试光斑尺寸的增加,薄膜折射率变小,膜层厚度、表面层厚度增加。使用反射光谱法和轮廓仪分别验证了各光学常数的光斑效应。研究结果表明,光学薄膜的折射率与膜层厚度具有弱横向非均匀性,采用大尺寸测量光斑能弱化这种非均匀性。     

分析光学薄膜的椭偏方程的计算方法

叙述了用测量到的椭偏角ψ及Δ来确定光学薄膜的折射率、厚度和消光系数的方法.该方法收敛较快并节省时间.     

测量介质膜折射率的实验方法

本文介绍利用布儒斯特定律测膜层折射率,其实验原理简单,仪器是教学实验室中常用的仪器,测量方法比干涉法简便,且测量精确度也可以满足研究光学薄膜的要求.本实验对提高学生分析问题和解决问题的能力有一定的帮助.一、原理薄膜的折射率和膜层的厚度(或薄膜引起的光程)的测量是光学薄膜研究的重要内     

PECVD制备光学薄膜材料折射率控制技术

渐变折射率光学薄膜用途广泛,PECVD技术在制备渐变折射率光学薄膜方面具有独特的优点。通过控制不同反应气体配比变化,分析了反应气体配比变化与所制备的薄膜折射率、消光系数和沉积速率之间的关系,讨论了薄膜折射率、消光系数和沉积速率变化的原因,研制了折射率可控的氟氧化硅(SiOxFy)、氮氧化硅(SiOxNy)、氮化硅(SixNy)等薄膜材料,获取了折射率在1.33~2.06之间的光学薄膜材料。     

不同沉积温度下非晶硅光学薄膜的光学特性研究

光学薄膜的光学特性是薄膜设计与制备的基础。硅材料是红外光学薄膜中一种重要的高折射率材料。研究了在不同沉积温度下非晶硅光学薄膜的折射率和消光系数的变化。结果表明,在200℃时,硅薄膜折射率最大,消光系数随温度升高而减小。     

光学薄膜参数椭偏测量中的多变量误差分析

本文采用多变量的误差分析方法给出光学薄膜参数对于椭偏角ψ,反射率R,入射角和吸收薄膜厚度的误差因子公式。由此便可确定出光学参数的测量精度。本文还利用误差因子与薄膜折射率,薄膜厚度和入射角的关系曲线,讨论了最佳测量条件和测量结构的选取。并且指出,在同时确定两个或多个未知参数时,不能只由可测量量随某一个参数变化的灵敏来讨论和确定此参数的测量精度。     

基底温度对电子束蒸发制备氧化铝薄膜的影响

为了考察基底温度对氧化铝薄膜折射率以及沉积厚度的影响情况,在不同基底温度环境下,通过离子辅助电子束蒸发方式,在玻璃基底上制备了同一Tooling因子条件下所监测到相同厚度的Al2O3薄膜,利用分光光度计测量光谱透过率,依据光学薄膜相关理论,计算了基底温度在25℃～300℃范围内获得的膜层实际物理厚度为275.611 nm～348.447 nm,以及膜层折射率的变化。通过对实验结果的数值计算和曲线模拟,给出了基底温度对于薄膜的折射率和实际厚度的影响情况。     

PECVD技术制备单层光学薄膜抗激光损伤特性研究

采用PECVD技术在BK7玻璃基底上沉积了不同厚度的单层SiO2（折射率为1.46）和SiNx（折射率为1.84）光学薄膜,并对这2种膜层进行抗激光损伤阈值（LIDT）测试,分析讨论了PECVD技术制备的单层光学薄膜与抗激光损伤特性之间的关系。实验结果表明:PECVD技术制备的单层SiO2薄膜有较高的LIDT,薄膜光学厚度在o/4~o/2之间时,在光学厚度为350 nm时,LIDT有最小值21.7 J/cm2,光学厚度为433 nm时,LIDT有最大值27.9 J/cm2。SiNx薄膜的LIDT随着光学厚度增加而减小,在光学厚度为o/4时,LIDT有最大值29.3 J/cm2,光学厚度为o/2时,LIDT有最小值4.9 J/cm2。     

多层光学薄膜周期厚度的双晶X射线掠入射研究

阐述了掠入射Ｘ射线测量薄膜厚度的条件，讨论和分析了掠入射Ｘ射线测量多层薄膜厚度的干涉原理和方法。利用双晶Ｘ射线衍射仪对多层光学薄膜的周期厚度进行了掠入射小角度测量，获得了令人满意的结果，测量值与设计值极好地吻合。     

椭偏测厚仪测量结果的计算机数据处理

本详尽介绍了椭偏术测量单层透明薄膜折射率和厚度的方法，采用一种数字迭代计算方法，由测量得到的起偏角A和检偏角P直接算出所测薄膜的折射率和厚度。经过数值试验及与标准值比对，由此编制的计算程序具有准确，快速，方便的特点。     

Optical parameters of epitaxial GaN thin film on Si substrate from the reflection spectrum

A method has been proposed for determining the optical properties of a thin film layer on absorbing substrates. The film optical parameters such as thickness, refractive index, absorption coefficient, extinction coefficient and the optical energy gap of an absorbing film are retrieved from the interference fringes of the reflection spectrum at normal incidence. The envelopes of the maxima of the spectrum E_M and of the minima E_m are introduced in analytical forms to find the reflectance amplitudes at the interfaces and approximate values of the thin film refractive index. Then, the interference orders and film thickness are calculated to get accurate values of the needed optical parameters. There are no complex fitting procedures or assumed theoretical refractive index dispersion relations. The method is applied to calculate the optical properties of an epitaxial gallium nitride thin film on a silicon (1 1 1) substrate. Good agreement between our results and the published data are obtained.     

Theoretical study of the normal-incidence reflective spectra for determining the thickness and refractive index of dielectric film

We theoretically study and propose the design concept of a new non-contact measurement method of the thickness and refractive index of dielectric film. The needed measurement set-up includes a probe, an optical detection head and a spectrometer. The probe is composed of two patches of dielectric substrates, and the optical detection head is used to detect the reflective spectra. After depositing a testing dielectric film on the two patches, the coating film thickness and refractive index can be determined by analyzing the normal-incidence reflective spectra of the two dielectric substrates. This method has two requirements. First, the coating dielectric films on the two substrates must be the same. Second, the two dielectric substrates respectively have higher and lower refractive indices than the testing dielectric film.     

System for measuring optical admittance of a thin film stack

A new method based on the polarization interferometer structure has been applied to measure the optical admittance, the refractive index and thickness of a thin film. The structure is a vibration insensitive optical system. There is one Twyman-Green interferometer part to induce a phase difference and one Fizeau interferometer part to induce the interference in the system. The intensities coming from four different polarizers were measured at the same time to prevent mechanical vibration influence. Using the polarization interferometer, the optical admittance, the refractive index and thickness of a single layer of Ta₂O₅ thin film has been measured. The measurement results were compared with the results obtained by ellipsometer. The results meet reasonable values in both refractive index and thickness.     

Optical constants of thin oxide films on titanium

Thin oxide films on titanium formed by heating were studied by the ellipsometric method. To obtain the complex refractive index and film thicknesses, the ellipsometric measurements were performed by means of the immersing method: each sample was measured first in air and then in a liquid of known refractive index (in our case CCl₄). The optical constants and the oxide film thickness were computed by means of a computer from two pairs of ellipsometric values. To state the optical constants of clean titanium surface the graphic-computational method was proposed and applied. The measurements were carried out at two wavelengths on oxide films grown in air and dry oxygen by thermal oxidation at temperatures from 150 to 700 °C. It has been shown that when increasing the film thickness the refractive index of the film decreases, whereas the absorption coefficient is independent on the film thickness. Optical constants of oxide films growing in dry oxygen are smaller than those growing in air.     

聚焦法测量塑料光纤折射率分布的可行性研究

结合理论分析和实验验证,探讨了聚焦法测量塑料光纤纤芯的折射率分布的可行性。结果表明,对GI-POF而言,聚焦法是一种简单可行的技术.但是对SI-POF,由于入射光线在光纤边界处发生交叉,聚焦法不能精确测量其折射率分布.     

Optimized procedure for the manufacture of thin film filter prototypes

A simple procedure to minimize the number of trial-and-error high-vacuum depositions required to manufacture a thin film filter prototype is presented. For optical coatings obtained by thermal evaporation, the main difficulty is the accurate characterization (refractive index and thickness) of the layers under the actual deposition conditions. The proposed method is able to describe dispersion as well as inhomogeneity in the refractive index of the component layers. It requires only a suitable substrate holder attachment and standard thin film measurement equipment: a spectrophotometer and a three wavelength ellipsometer. The technique is illustrated with the development of an anti-reflection (AR) coating for glass which also includes an inhomogeneous layer.     

基于透射谱的GaN薄膜厚度测量

通过对蓝宝石衬底异质外延GaN薄膜光学透射谱的分析，结合晶体薄膜的干涉效应原理并考虑折射率随光子波长变化的影响，从理论上推导出了实用的薄膜厚度计算方法. 实际应用表明，该方法是一种快速准确的GaN薄膜厚度测量方法. 关键词： GaN 透射谱 厚度测量     

光波导技术同步测量棱镜及波导薄膜参数

依据全反射理论和棱镜耦合原理,实现了对棱镜折射率及波导薄膜材料折射率和厚度的同步测量。使用高准直半导体激光器激光入射到棱镜内部与波导膜的分界面上,逐步旋转棱镜或改变棱镜的入射角,得到棱镜耦合M线,曲线前面几组的波谷为波导模激发,在M线左侧收尾处有一个不完整波峰,其反射光强随入射角迅速衰减,为全反射时的临界点,由此可实现棱镜及波导薄膜参数的同步测量;用此法测量了棱镜耦合一体化平面波导棱镜的折射率和聚甲基丙烯酸甲酯(PMMA)聚合物波导薄膜的折射率和厚度。测量棱镜折射率精度为±1.9×10-4,波导薄膜折射率和厚度的精度分别为±6.2×10-4 μm和±1.6×10-2 μm。     

Effect of the transition layer on ellipsometric measurement of nanodimensional layers

The results of numerical simulation of a nanodimensional film-transition layer-absorbing substrate structure are presented. It is found that the transition layer affects the accuracy of determining the refractive index and thickness of the nanodimensional coating. It is shown that the introduction of the effective values of the refractive index and absorption coefficient of the substrate improves the accuracy of ellipsometric measurements of the nanodimensional film parameters. Physical (full-scale) and numerical experiments demonstrate that, when the thickness and refractive index of a nanodimensional film on a substrate with an unknown transition layer comparable in thickness with the film are measured, it is appropriate to replace the substrate-transition layer structure by a substrate with effective optical parameters. It is found that a change in the thickness of the transition layer does not noticeably affect the accuracy of determining the thickness and refractive index of the film deposited when the effective values of the refractive index and absorption coefficient of the substrate are used.