Metal (Cu; Pd) adsorption on MgO: investigations with MIES and UPS

MgO films (2-nm thick) were grown on W(110) while metastable impact electron (MIES) and photoelectron (UPS(HeI)) spectra were collected in situ; apart from the valence-band emission no additional spectral features could be detected. The oxide surface was exposed to metal atoms (Cu; Pd) (substrate at 300 K). For Cu, but not for Pd/MgO, a characteristic initial decrease of the surface work function by about 0.4 eV is observed for small exposures. Metal-induced intensity develops above the top of the O2p valence band in UPS caused by 3dCu (4dPd) emission. The emission seen for Cu/MgO in the MIES spectra above the 2pO valence band is attributed to the ionization of Cu4s states of neutrally adsorbed Cu species; the shape of the MIES spectra suggests island growth even at the lowest studied exposures. For Cu/MgO the critical coverage for the transition from 2D to 3D island growth, as determined with MIES, is estimated as 0.15 monolayers. PACS 79.20; 79.60.Dp; 73.22.-f; 82.80.Pv     

A comparative analysis of electron spectroscopy and first-principles studies on Cu(Pd) adsorption on MgO

Ultrathin MgO films were grown on a W(1 1 0) substrate while metastable impact electron (MIES) and photoelectron (UPS) spectra were measured in situ; apart from the valence band emission, no additional spectral features were detected. The oxide surface was exposed to metal atoms (Cu, Pd) at RT. A comparison with the DOS extracted from first-principles DFT calculations shows that the metal-induced intensity developing above the top of the O 2p valence band in the UP spectra under Cu(Pd) exposure is caused by Cu 3d (Pd 4d) emission. The emission seen in the MIES spectra is attributed to the ionization of Cu 3d and 4s states of adsorbed neutral Cu atoms in an Auger process, Auger neutralization, involving two electrons from the surface, at least one of them from the metal adsorbate. The shape of the MIES spectra suggests metallic island growth even at the lowest studied exposures, which is supported by the first-principles calculations.     

Deposition of iron on MgO(100): Reaction of CO and H2

Ultraviolet photoelectron spectroscopy (UPS), electron energy loss spectroscopy (EELS) and surface extended energy loss fine structure (SEELFS) were used to study the deposition of Fe on MgO(100) and to identify the surface compounds formed after reaction of CO/H₂ (1:1). The clean MgO(100) surface was characterized using the above techniques and the effect of argon ion bombardment damage to the surface was investigated. With the deposition of iron, metallic characteristics appear in the photoemission spectrum; the electron energy loss peaks of the MgO(100) substrate diminish in intensity with no significant shifts in loss energies. Fine structure analysis of the oxygen K-edge of the MgO(100) surface with less than 2 monolayers (ML) of iron suggests that the iron atoms bond with the oxygen at the surface of the MgO(100) lattice. For less than 4 ML of iron, the EEL spectra show that the deposited iron is oxidized after reaction of CO/H₂. Higher iron coverages result in carburization of the surface. Carbon deposition was observed with CO for all Fe coverages. Measurement of the fine structure above the carbon K-edge suggests that the types of carbide formed depend on the iron coverage; one carbide has a short CFe distance of 1.78 Å and the other a distance of 2.06 Å (high metal coverage).     

Adsorption of thiophene on Al(1 1 1) and deposition of aluminum on condensed thiophene

The adsorption of thiophene on clean Al(1 1 1) at 90 and 130 K has been studied with X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) and work function measurements. Relatively weak chemisorption compared to adsorption on transition metals is indicated by minor changes in the valence spectrum in progressing from monolayer to multilayer thiophene, a modest work function change of −0.50 eV due to saturation dosing, and return of the work function and valence spectrum to that of clean Al(1 1 1) upon annealing at 210 K. The complementary experiment in which aluminum is thermally deposited on multilayer thiophene condensed on gold at 130 K has also been performed. XPS peak area analysis shows that metal doses less than 14×10¹⁵ atoms/cm² result in penetration through the physisorbed thiophene, but higher doses lead to the gradual build up of metal throughout the organic layer. Persistence of the thiophene UPS valence features for metal doses of 50×10¹⁵ atoms/cm² is consistent with penetration and aluminum island formation. For aluminum deposition on thiophene, charge transfer from aluminum is evidenced by metal-induced low binding energy components in the C 1s and S 2p spectra at 282.6 and 162.5 eV, respectively, and a shift in the Al 2p spectrum of 0.5 eV to higher binding energy compared to metallic aluminum. UPS also indicates progression of the frontier orbital toward the Fermi level as aluminum is deposited.     

Charge transfer and polarization screening in organic thin films: phthalocyanines on Au(100)

Core hole screening effects at organic/metal interfaces were studied by core level X-ray photoemission spectroscopy (XPS), X-ray excited Auger electron spectroscopy (XAES), and valence band ultraviolet photoemission spectroscopy (UPS). The comparison of energetic shifts in XPS and XAES enables the estimation of electronic relaxation energy (screening ability). Magnesium phthalocyanine (MgPc) and zinc phthalocyanine (ZnPc) evaporated on single crystalline Au(100) were used as model molecules. Two different features in the Mg KLL spectra can be clearly separated for (sub-)monolayer coverages, while only minor changes of the shape of Mg 1s are observed. Applying a dielectric continuum model, the major screening mechanism cannot be described sufficiently by polarization screening due to mirror charges, significant contributions by charge transfer screening have to be considered. In contrast, small screening effects in the bulk material can be explained by surface polarization.     

Potassium adsorption on graphite(0001)

Potassium adsorption on graphite has been studied with emphasis on the two-dimensional K adlayer below one monolayer. Data are presented for the work function versus coverage, high-resolution electron energy loss spectroscopy (HREELS) vibrational spectra of K-adlayers, low energy electron diffraction and ultraviolet photoemission spectroscopy (UPS) spectra at different coverages. The data provide information regarding the vibrational properties of the K-adlayer, the metallization of the adlayer at submonolayer coverages, and the charge transfer from the K adatoms to the graphite substrate. Analysis of the work function, HREELS, and UPS data provides a qualitatively consistent picture of the charge state of the K adatoms, where at low coverages, below a critical coverage θ_c (θ_c=0.2–0.3), the K adatoms are dispersed and (partially) ionized, whereas at θ>θ_c islands of a metallic 2×2 K phase develops that coexist with the dispersed a K adatoms up to θ=1. We show that it is possible to understand the variation of the work function data based on a two-phase model without invoking a depolarization mechanism of adjacent dipoles, as is normally done for alkali-metal adsorption on metal surfaces. Similarly, the intensity variation as a function of coverage of the energy loss peak at 17 meV observed in HREELS, and the photoemission peak at E_b=0.5 eV seen in UPS can be understood from a two-phase model. A tentative explanation is presented that connects apparent discrepancies in the literature concerning the electronic structure of the K adlayer. In particular, a new assignment of the K-induced states near the Fermi level is proposed.     

CO adsorption on alkali-metal covered Ni(100)

The effect of preadsorbed alkali metal atoms Na, K and Cs on CO adsorption on Ni(100) has been studied using Auger spectroscopy and thermal desorption. It was found that the presence of alkali metals causes an appearance of several more tightly bound states in the CO thermal desorption spectra. The observed difference in carbon and oxygen Auger peak line shape on a bare and alkali modified Ni(100) is indicative that the presence of alkali adatoms induces CO decomposition on the Ni(100) surface. The fraction of dissociated CO increases with the amount of alkali adatoms present. At the same overlayer coverage the dissociation probability increases in the sequence Na, K, Cs. A comparison of the strength of the promoting effect on CO dissociation with the changes in the surface electron density in the presence of alkali adatoms has shown that at low overlayer coverages the electronic factor plays a major role in explaining the action of the surface modificators.     

Mechanisms of formation and the electronic properties of the Yb-Si(100) thin-film system

The formation and properties of the Yb-Si(100) thin-film system were studied by high-resolution photoelectron spectroscopy with synchrotron radiation, Auger electron spectroscopy, the contact potential difference technique, and low-energy electron diffraction measurements over a wide range of coverages and at different temperatures. It was established that the formation of the Yb-Si(100) system prepared by solid-phase epitaxy occurs through a mechanism close to the Stranski-Krastanow mechanism. It was shown that, at submonolayer coverages, it is primarily these two-dimensional (2D) 2 × 3 and 2 × 6 structures that are formed, while at higher coverages a three-dimensional Yb silicide film grows. Data on the morphology and phase composition of the silicide film and on the electronic state of the Si atoms and the valence state of the Yb atoms in the silicide and the 2D structures, as well as on the atomic structure of these films, were obtained. The components of the Si 2p spectra were studied for different coverages. The relation between the shape of these spectra obtained for multilayer Yb silicide films and their phase composition was revealed.     

Direct observation of surface potential change due to hydrogen termination of CVD diamond surface by metastable-induced electron spectroscopy

Metastable-induced electron spectroscopy (MIES) together with ultraviolet photoemission spectroscopy (UPS) was applied to the analysis of the surface electronic structure of chemical-vapor-deposited diamond films. The films were grown in a microwave plasma, and their surfaces were terminated by hydrogen. The MIES spectrum measured at an as-deposited surface contains peaks due to adsorbates. When this surface was annealed at 400 °C, those peaks were depressed, and the spectrum showed a similar structure to that of UPS. Once the surface was re-hydrogenated, the MIES spectrum rose up at lower energies than the UPS spectrum did for surfaces annealed at lower temperatures. Finally after annealing at 1000 °C, the cutoff energies of MIES and UPS converged at nearly the same values. The result demonstrates that the MIES detects a surface potential which changes locally at the hydrogen-terminated surfaces.     

Adsorption of CH3Cl on clean and Cl-dosed Pd(100) surfaces

The adsorption of methyl chloride on a Pd(100) surface has been investigated by ultraviolet photoelectron spectroscopy (UPS), electron energy loss spectroscopy (in the electronic range, EELS), temperature-programmed desorption (TPD) and work function change. CH₃Cl adsorbs with high sticking probability at 80–100 K. UPS and TDS spectra suggest that the adsorption of CH₃Cl is molecular at 100 K, with a little distortion of the corresponding gas-phase molecular electronic structure. No dissociation of CH₃Cl was observed even up to 550 K. By means of TPD, we distinguished two adsorption states with desorption energies of 46.9 and 33.4 kJ/mol. The formation of a condensed layer at 105–110 K was also observed. Adsorption of CH₃Cl caused a significant work function decrease, Δ = −0.91 eV, indicating a dipole with positive end pointed away from the surface. The effects of electronegative additives, preadsorbed Cl and O were also examined. Preadsorbed Cl caused a slight destabilization of adsorbed CH₃Cl at lower concentration, prevented the adsorption of CH₃Cl at higher concentration and facilitated the formation of a condensed layer. No such effect was experienced in the presence of preadsorbed O.     

Density of states and the problem of Sm valence

Density of states for Sm metal has been calculated in DFT/GGA approximation using the same treatment for f and s-d bands. It is concluded that the 4f electrons of Sm must be considered as valence electrons, not shallow core states. Therefore the 4f-5d transition cannot change the valence of Sm, which may be characterized (if necessary) by the sum of all electrons in the s-d-f valence bands. The possibility of alternative interpretation of UPS spectra of Sm adsorbed films is illustrated by calculations of DOS (density of states) for oxygen-contaminated Sm crystal.     

Initial oxidation of Mn surface studied by ultraviolet photoelectron spectroscopy and metastable induced electron spectroscopy

Metastable induced electron spectroscopy (MIES) was combined to ultraviolet photoelectron spectroscopy (UPS) to study the initial steps of manganese oxidation. Oxygen exposure directly led to the formation of MnO with no intermediate states. The MnO feature saturation observed by MIES and UPS techniques showed noticeable differences and proved the formation of several oxide layers. The oxidation kinetics was studied by measuring MnO features by UPS, which depend on the surface coverage by oxygen. We observe a decrease of oxygen adsorption probability with oxygen exposure. Oxidation proceeds by oxygen dissolution into the first layers to form a three-dimension MnO. This hypothesis was confirmed by our work function measurements.     

Co:BaTiO3/Si(100)纳米复合薄膜制备、微结构及其紫外光电子能谱研究

采用脉冲激光气相沉积(PLD)方法，在Si(100)晶面上制备了Co:BaTiO₃纳米复合薄膜.采用X射线衍射(XRD)结合透射电镜(TEM)方法研究了两种厚度Co:BaTiO₃纳米复合薄膜的晶体结构，当薄膜厚度约为30 nm时，薄膜为单一择优取向；当薄膜厚度约为100nm时，薄膜呈多晶结构.原子力显微镜(AFM)分析表明，当膜厚为30nm时，薄膜呈现明显的方形晶粒.采用紫外光电子能谱(UPS)研究了Co的价态和Co:BaTiO₃纳米复合薄     

Co:BaTiO3/Si(100)纳米复合薄膜制备、微结构及其紫外光电子能谱研究

采用脉冲激光气相沉积(PLD)方法,在Si(100)晶面上制备了Co:BaTiO₃纳米复合薄膜.采用X射线衍射(XRD)结合透射电镜(TEM)方法研究了两种厚度Co:BaTiO₃纳米复合薄膜的晶体结构,当薄膜厚度约为30 nm时,薄膜为单一择优取向;当薄膜厚度约为100nm时,薄膜呈多晶结构.原子力显微镜(AFM)分析表明,当膜厚为30nm时,薄膜呈现明显的方形晶粒.采用紫外光电子能谱(UPS)研究了Co的价态和Co:BaTiO₃纳米复合薄 关键词： 3')" href="#">BaTiO₃ 纳米复合薄膜 紫外光电子能谱     

Oxidation of cerium and titanium studied by photoelectron spectroscopy

Cerium and titanium are examples of reactive metals that form protective oxide films on their surfaces upon exposure to oxygen. In order to study the building up of these oxide films we have undertaken photoemission measurements with X-ray and ultraviolet radiation (ESCA and UPS). Cerium and titanium levels were studied using ESCA on freshly in situ evaporated metal films. These levels, as well as the O 1s level, were studied after different oxygen exposures. In order to vary the probing depth, spectra have been recorded at two different electron emission angles. All measurements were performed at room temperature. Effects of oxygen exposures upon core levels were quite different in the two metals. In the Ce 3d spectrum a strong peak related to the oxide was observed at an exposure of only 2 L. Such a strong peak was not observed in the Ti 2p spectrum even after an exposure of 3000 L. The valence band spectrum of Ti as observed both by UPS and ESCA measurements, however, changed significantly at much smaller exposures.     

The adsorption of oxygen and water on Ca and CaO films studied with MIES, UPS and XPS

Metastable induced electron spectroscopy (MIES), Ultraviolet photoelectron spectroscopy (UPS), and X-ray photoelectron spectroscopy (XPS) are employed to study the adsorption of water on Ca and CaO films as well as the adsorption of oxygen on Ca films. Ca films are prepared by evaporation of Ca onto clean Si(1 0 0) substrates. CaO films are produced by Ca evaporation in an oxygen atmosphere at a substrate temperature of 400 °C. Gas adsorption on the Ca films at room temperature, both for oxygen and water, is initiated by complete dissociation of the impinging molecules leading to the formation of Ca–O bonds. Exposure to water furthermore leads to the formation of hydroxyl groups via hydrogen abstraction from water forming a complete surface layer. Hydroxyl groups are also formed upon exposure of CaO films to water, but to a significantly smaller amount compared to Ca films exposed to water.     

Subsurface As-layer formation in Au films deposited on GaAs(001)

Au deposited at room temperature on MBE grown GaAs (001) has been studied by UPS, XPS and AES. At Au coverages below ～2Å the adsorption interaction spreads the Au (6s) states density over the width of the GaAs valence band, while at higher coverages the Au overlayer has metallic properties. For the thick Au overlayers a subsurface As-rich region is established. It is suggested that this has a stabilizing influence on the continuous Au overlayer.     

TPD, HREELS and UPS study of the adsorption and reaction of methyl nitrite (CH3ONO) on Pt(111)

The adsorption and reaction of methyl nitrite (CH₃ONO, CD₃ONO) on Pt(111) was studied using HREELS, UPS, TPD, AES, and LEED. Adsorption of methyl nitrite on Pt(111) at 105 K forms a chemisorbed monolayer with a coverage of 0.25 ML, a physisorbed second layer with the same coverage that desorbs at 134 K, and a condensed multilayer that desorbs at 117 K. The Pt(111) surface is very reactive towards chemisorbed methyl nitrite; adsorption in the monolayer is completely irreversible. CH₃ONO dissociates to form NO and an intermediate which subsequently decomposes to yield CO and H₂ at low coverages and methanol for CH₃ONO coverages above one-half monolayer. We propose that a methoxy intermediate is formed. At least some C–O bond breaking occurs during decomposition to leave carbon on the surface after TPD. UPS and HREELS show that some methyl nitrite decomposition occurs below 110 K and all of the methyl nitrite in the monolayer is decomposed by 165 K. Intermediates from methyl nitrite decomposition are also relatively unstable on the Pt(111) surface since coadsorbed NO, CO and H are formed below 225 K.     

Infrared and photoelectron spectroscopy study of vapor phase deposited poly (3-hexylthiophene)

Poly (3-hexylthiophene) (P3HT) was thermally evaporated and deposited in vacuum. Infrared spectroscopy was used to confirm that the thin films were indeed P3HT, and showed that in-situ thermal evaporation provides a viable route for contaminant-free surface/interface analysis of P3HT in an ultrahigh-vacuum (UHV) environment. Ultraviolet photoelectron spectroscopy (UPS) as well as X-ray photoelectron spectroscopy (XPS) experiments were carried out to examine the frontier orbitals and core energy levels of P3HT thin films vapor deposited in UHV on clean polycrystalline silver (Ag) surfaces. UPS spectra enable the determination of the vacuum shift at the polymer/metal interface, the valence band maximum (VBM), and the energy of the π-band of the overlayer film. The P3HT vacuum level decreased in contrast to that of the underlying Ag as the film thickness increased. XPS and UPS data confirmed the chemical integrity (stoichiometry) of the polymer at high coverage, as well as the shift of the C 1s and S 2p binding energy peaks and the secondary-electron edge with increasing film thickness, indicating that band bending is present at the P3HT/Ag interface and that the measured onset of the valence band is about 0.8 ± 0.05 eV relative to the Fermi level.     

Cl2 adsorption on MgO(001) surface supported sodium monolayers: a density functional theory study

The adsorption of Cl₂ Na monolayers supported on the MgO(001) surface has been studied by the density functional method using cluster models embedded in a large array of point charges (PCs). The value of PCs was determined by charge self-consistent technique. The results indicate that Na-promoted MgO(001) surface is an efficient catalyst toward Cl₂ adsorptive decomposition. Besides, it was found that the role of the MgO(001) surface is not passive, which is different from CO adsorption on MgO(001) surface supported Na metal monolayers. The analysis of band and projected density of states indicates that the electron transfer from the surface Mg 3s valence orbital and Na 3s valence orbital to the anti-bonding σ^∗ orbital of Cl₂ is the source of the Cl₂ bond weakening. This is also different from the CO adsorption on MgO(001) surface supported Na metal monolayers, where only the electrons from the Na valence orbital are transferred to the anti-bonding π^∗ orbital of adsorbed CO. Our study suggests that the essence of catalysis is different for CO and Cl₂ adsorption on Na metal monolayers supported an MgO(001) surface.