Visible light emission from Si/SiO2 superlattices in optical microcavities

Bright quantum confined luminescence due to band-to-band recombination can be obtained from Si/SiO₂ superlattices. Placing them in a one-dimensional optical microcavity results in a pronounced modulation of the photoluminescence (PL) intensity with emission wavelength, as a consequence of the standing wave set up between the substrate and top interfaces. For a Si substrate, absorption of light reduces the PL efficiency, but for an Al-coated glass substrate the PL intensity is twice that of a quartz substrate case. The addition of a broad-band high reflector to the superlattice surface results in enhanced narrow-band emission. These results show that a suitably designed planar microcavity can not only considerably increase the external efficiency of luminescence in Si/SiO₂ superlattices but can also be used to decrease the bandwidth and selectively tune the peak wavelength.     

Photoexcited charge carrier dynamics in silicon nanocrystal/SiO2 superlattices

We report in detail on the dynamics of photoexcited charge carriers in size-controlled silicon nanocrystals in silicon nanocrystal/SiO₂ superlattices. The samples were prepared using plasma enhanced chemical vapor deposition and subsequent thermally induced phase separation. This unique approach allows preparation of well-defined Si nanocrystals. Experimental techniques of time-resolved absorption and photoluminescence were used to monitor the carrier dynamics on a wide time scale from picoseconds to milliseconds for a set of samples with different parameters (nanocrystal size, hydrogen annealing). The initial fast decay (tens of picoseconds) dependent on pump intensity for excitation levels exceeding one electron–hole pair per nanocrystal can be interpreted in terms of the bimolecular recombination with constant B=(2–3)×10⁻¹⁰ cm³ s⁻¹. The slow pump intensity independent decay (microseconds) can be reproduced well by a stretched-exponential function. The dependence of stretched-exponential parameters on photoluminescence photon energy and sample properties agrees well with the picture of trapped carriers.     

Optical properties of Si/CaF2 superlattices

We present a first-principle theoretical study of the dielectric functions of Si/CaF₂ superlattices. In particular, we investigate how the optical response depends on the thickness of the Si layers. Our results show that for very thin Si slabs (well width less than 20 Å) optical excitation peaks are present in the visible range. These peaks are related to strong transitions between localized states. Moreover, the static dielectric costant is considerably reduced. From the comparison made with recent experimental data on similar systems we conclude that the quantum confinement, a good surface passivation and the presence of localized states are the key ingredients in order to have photoluminescence in confined silicon based systems.     

The influence of the annealing conditions on the photoluminescence of ion-implanted SiO2:Si nanosystem at additional phosphorus implantation

The influence of P ion doping on the photoluminescence (PL) of the system of nanocrystals in SiO₂ matrix (SiO₂:Si) both without annealing and after annealing at various temperatures (provided before and after additional P implantation) is investigated. The Si and P implantation was carried out with ion energies of 150 keV and doses Φ_Si=10¹⁷ cm⁻² and Φ_P=(0.1–300)×10¹⁴ cm⁻² (current density j3 μAcm⁻²). The system after Si implantation was formed at 1000°C and 1100°C (2 h). For the case of SiO₂:Si system as-implanted by P, the intensity of PL was drastically quenched, but partially retained. As for the step-by-step annealing (at progressively increased temperatures) carried out after P implantation, the sign and degree of doping effect change with annealing temperature. The possible mechanisms of these features are discussed.     

Optical band gap of Si nanoclusters

We discuss the nature of the optical transitions in porous silicon and in Si nanoclusters in the light of recent theoretical calculations. The accuracy of the different techniques used to calculate the band gap of Si nanoclusters is analyzed. We calculate the electronic structure of crystallites in the Si-III (BC8) crystalline phase which is known to have a direct gap and we examine the effect of quantum confinement on clusters of SiGe alloy and amorphous silicon. The comparison with the experiments for all the systems suggests the possibility of different channels for the radiative recombination.     

Amorphous Si/insulator multilayers grown by vacuum deposition and electron cyclotron resonance plasma treatment

a-Si/insulator multilayers have been deposited on (0 0 1) Si by electron gun Si evaporation and periodic electron cyclotron resonance plasma oxidation or nitridation. Exposure to an O or N plasma resulted in the formation of a thin SiO₂ and SiN_x layer whose thickness was self-limited and controlled by process parameters. For thin-layer (2 nm) Si/SiO₂ and Si/SiN_x multilayers no visible photoluminescence (PL) was observed in most samples, although all exhibited weak “blue” PL. For the nitride multilayers, annealing at 750°C or 850°C induced visible PL that varied in peak energy with Si layer thickness. Depth profiling of a-Si caps on thin insulating layers revealed no detectable contamination for the SiN_x layers, but substantial O contamination for the SiO₂ films.     

Quantum confined Stark effect in single self-assembled GaN/AlN quantum dots

We have experimentally and theoretically investigated quantum confined Stark effect in hexagonal self-assembled GaN/AlN quantum dots. We have observed a blueshift of up to 100 meV for vertical electric field applied against the built-in electric field while we have observed a redshift for the electric field along the built-in field. The experimental result is compared with a charge self-consistent effective mass calculation, taking into account strain, piezoelectric charge, and pyroelectric charge. The tunability of the emission energy and the exciton binding energy is discussed.     

Structural, optical and intraband absorption properties of vertically aligned In0.32Ga0.68As/GaAs quantum dots superlattices

The self-organization growth of In_0.32Ga_0.68As/GaAs quantum dots (QDs) superlattices is investigated by molecular beam epitaxy. It is found that high growth temperature and low growth rate are favorable for the formation of perfect vertically aligned QDs superlattices. The aspect ratio (height versus diameter) of QD increases from 0.16 to 0.23 with increase number of bi-layer. We propose that this shape change play a significant role to improve the uniformity of QDs superlattices. Features in the variable temperature photoluminescence characteristics indicate the high uniformity of the QDs. Strong infrared absorption in the 8–12 μm was observed. Our results suggest the promising applications of QDs in normal sensitive infrared photodetectors.     

Strong visible photoluminescence in amorphous SiOx and SiOx : H thin films prepared by thermal evaporation of SiO powder

Amorphous SiO_x and SiO_x : H films were prepared by thermal evaporation of SiO powder in ultrahigh vacuum or under a flow of hydrogen ions onto silicon substrates maintained at 100°C. Photoluminescence (PL) can be seen in the visible range with the naked eye on the as-deposited samples without post-treatments. Composition and structure investigations were performed by infrared and Raman spectrometry experiments on films annealed at different temperatures. Hydrogen and oxygen bonding was studied by infrared spectrometry. The PL is attributed to the quantum confinement of excitons in a-Si clusters embedded in the a-SiO_x matrix. Our results demonstrate that oxygen creates an efficient potential barrier and no further passivation by hydrogen is necessary.     

Bandgap calculation in Si quantum dot arrays using a genetic algorithm

In this work we present a fast and accurate genetic algorithm to determine the envelope functions and eigenenergies of the ground states of electrons and holes in low-dimensional complex semiconductor structures. We have developed the theoretical formalism of the algorithm in a general way in order to make it easy to include arbitrary nonparabolic and anisotropic band profiles in the calculations. From these results, calculation of the bandgaps of nanostructures can be carried out efficiently.Besides presenting and testing the algorithm, we calculate the ground state of electron and holes in two-dimensional quantum dot arrays, taking nonparabolicity and anisotropy into account.     

SiO/SiO2超晶格结构界面发光的研究

利用热蒸发技术在硅衬底上制备了层厚不同的SiO/SiO2超晶格样品.对其光致发光谱进行研究发现,随着SiO/SiO2超晶格中SiO层厚度的增加,发光峰在400～600 nm之间移动.研究表明,样品的发光中心来自于SiO/SiO2界面处的缺陷发光(界面态发光).即在样品沉积的过程中,在SiO/SiO2的界面处由于晶格的不连续性,会形成大量的Si-O悬挂键,这些悬挂键本身相互结合可以形成一定数量的缺陷,同时由于O原子容易脱离Si原子的束缚而产生扩散,因此,这些悬挂键可以与扩散的O原子结合,随着SiO层厚度的增加,在SiO/SiO2的界面处先后出现WOB(O3<≡Si-O-O·),NOV(O3≡Si-Si≡O3),E'中心(O≡Si·),NBOHC(O3≡Si-O·)等缺陷,这些缺陷在SiO层厚度增大的过程中对发光先后起到主导作用,从而使得发光峰产生红移.     

Magneto-optical studies of CdTe/CdMnTe semimagnetic semiconductor superlattices under high pressure

Abstract

The photoluminescence (PL) of a CdTe/CdMnTe superlattice has been studied at pressures up to 4.1GPa, where the phase transition occurs. PL is observed up to this pressure, and it moves to higher energy with pressure at 66meV/GPa. This result is consistent with theory. Magnetic fields decrease the band-gap of the semimagnetic CdMnTe barriers and this reduces the PL energy. The pressure dependence of this effect is expected to provide a stringent test of the theory of semimagnetic materials and of superlattices.     

Tunable light emission and decaying process of photoluminescence from a nanostructured Si-in-SiNx film

Strong photoluminescence (PL) covering the green-violet band was measured at room temperature in an as-deposited amorphous Si-in-SiN_x film, which was prepared by plasma-enhanced chemical vapor deposition on cold (below 60 °C) Si(1 0 0) wafer. With an increase in photon energy of excitation, the PL shifts its peak position from 510 to 416 nm at yet-comparable intensities, thus allowing an energy-selected excitation in practical application. Also, a time-resolved analysis was performed for the emissions at various wavelengths, which showed a decay time shorter than 1.0 ns. These results indicate that the nanostructured Si-in-SiN_x can be a promising candidate material for the fabrication of silicon-based optical interconnections and switches.     

Electrical peculiarities in Al/Si/Ge/…/Ge/Si and Al/SiGe/Si structures

The current–voltage (I–V) and capacitance–voltage (C–V) behaviour of different Si/Ge multilayers and SiGe single layers prepared on p-type Si substrates by magnetron sputtering and annealing, has been studied in the temperature range of 80–320 K by using Al Schottky contacts as test structures. Although a significant influence of the microstructure of the Si/Ge multilayers and SiGe layers was obtained on the electrical behaviour of the structures, the structures exhibited similar specific features.     

Y2O2S:Eu nanocrystals, a strong quantum-confined luminescent system

Trivalent europium-doped yttrium oxysulfide nanocrystals synthesized using sol-gel thermolysis show significant blue shifts in the excitation bands corresponding to fundamental absorption, charge-transfer absorption. A significant blue shift observed in the fundamental absorption edge for the nanocrystals having an average crystallite size (φ) in the range 9-15 nm indicates a strong quantum confinement with a Bohr exciton radius of 5-13 nm. Also, the diffuse reflectance spectra and the corresponding Kubelka-Munk plot indicate the possibility of profound decrease in the absorption coefficient of Eu³⁺-ligand charge-transfer species necessitating further studies in this wide-gap semiconductor nanocrystalline system.     

Photoluminescence studies on porous silicon/polymer heterostructure

Hybrid devices formed by filling porous silicon with MEH-PPV or poly [2-methoxy-5(2-ethylhexyloxy-p-phenylenevinylene)] have been investigated in this work. Analyses of the structures by scanning electron microscopy (SEM) demonstrated that the porous silicon layer was filled by the polymer with no significant change of the structures except that the polymer was infiltrated in the pores. The photoluminescence (PL) of the structures at 300 K showed that the emission intensity was very high as compared with that of the MEH-PPV films on different substrates such as crystalline silicon (c-Si) and indium tin oxide (ITO). The PL peak in the MEH-PPV/porous silicon composite structure is found to be shifted towards higher energy in comparison with porous silicon PL. A number of possibilities are discussed to explain the observations.     

Radiative processes in bulk crystalline silicon

For the luminescence from optical centres in bulk silicon to be of use in opto-electronic devices the silicon should emit at room temperature at a well-defined wavelength, with a minimum of heat generation, and with a high quantum efficiency. These criteria are not satisfied. The reasons are reviewed in terms of the intrinsic properties of typical centres and of effects which are extrinsic to the centres.     

Amorphization and recrystallization of ion implanted Si nanocrystals probed through their luminescence properties

In this paper the amorphization of Si nanocrystals (nc) by ion beam irradiation and the subsequent recrystallization are investigated in detail. The luminescence properties of Si nanocrystals embedded within a SiO₂ matrix are used as a probe of the damaging effects generated by high-energy ion beam irradiation. Samples have been irradiated with 2 MeV Si⁺ ions at different doses, in the range between 1×10⁹ and 1×10¹⁶ cm⁻². By increasing the ion dose, the nc-related photoluminescence (PL) strongly decreases after a critical dose value. It is shown that the lifetime quenching alone cannot quantitatively explain the much stronger PL drop, but the total number of emitting centers has to diminish too. Moreover, we studied the recovery of the amorphized Si nc by performing thermal annealings. It is demonstrated that the recovery of the PL properties of completely amorphized Si nc is characterized by a single activation energy, whose value is 3.4 eV. Actually, this energy is associated to the transition between the amorphous and the crystalline phases of each Si grain. The recrystallization kinetics of Si nanostructures is demonstrated to be very different from that of a bulk system.     

含纳米硅微粒的富硅二氧化硅的蓝色薄膜交流电致发光

用磁控射频反应溅射制备了含纳米硅微粒的富硅ＳｉＯ２薄膜并获得蓝色的交流薄膜电致发光，通过热退火结合喇曼散射等手段判定蓝色发光谱带与富硅ＳｉＯ２薄膜的纳米硅晶粒有关。