Effect of Ba substitution for Sr in Bi2Sr2CaCu2O y superconducting films prepared by rf-sputtering method

In order to investigate the effect of the distance between the CuO₂ layer and the SrO layer, d _Cu-Sr, on the superconductivity in the Bi₂Sr₂CaCu₂O _y system, we have substituted Ba for Sr. Bi-(Sr, Ba)-Ca-Cu-O superconducting thin films were prepared by the rf-magnetron sputtering method. Rietveld analysis was employed to estimate d _Cu-Sr. Samples with various d _Cu-Sr were obtained by changing the post-annealing temperature as well as the Ba concentration. T_c was found to increase with increasing d _Cu-Sr.     

The effect of microstructure on the laser-induced transverse voltage in Pb-doped Bi2Sr2Co2O y thin films on tilted substrates

Pb-doped Bi₂Sr₂Co₂O _y thin films were prepared on tilted LaAlO₃(001) by using the chemical solution deposition technique under different annealing temperatures and its laser-induced transverse voltage effect was investigated by using a 308 nm pulsed radiation. The shape of the laser-induced voltages in these films depended strongly on the film microstructure. Films with a larger grain size and better crystalline quality had a voltage signal with greater amplitude and faster response time. The experimental results can be explained by a mechanism involving the transverse thermoelectric effect as well as the transport theory of thermoelectric materials.     

The effect of thickness and annealing condition on the microstructure and magnetic properties of Fe/Pt multilayer thin films

[Fe(0.5 nm)/Pt(0.5 nm)]₄₀, [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ multilayer were prepared by DC magnetron sputtering. By conventional furnace annealing (CA) at 270–600 °C for various time, all of the films still remained the disordered structure with the soft magnetic phase. By rapid thermal annealing (RTA) at 500 °C for various time, we obtained the [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ films with L1₂ ordered FePt₃ phase which was almost ferromagnetic at room temperature. However, the [Fe(0.5 nm)/Pt(0.5 nm)]₄₀ films was still disordered state even under RTA. Compared with CA, RTA exposed an outstanding effect on accelerating the phase transition when the film thickness is over [Fe(0.5 nm)/Pt(0.5 nm)]₄₀.     

退火对TiO2薄膜形貌、结构及光学特性影响

利用射频磁控溅射技术在熔融石英基片上制备TiO<,2>薄膜,采用X射线衍射、扫描电子显微镜(SEM)、拉曼光谱以及透过谱研究了退火温度和退火气氛对TiO<,2>薄膜的结构、形貌和光学特性的影响.实验结果表明:在大气环境下退火,退火温度越.高,薄膜晶化越好,晶粒明显长大,温度高于700℃退火的薄膜,金红石相已明显形成.实验还发现,退火气氛对金红石相的形成是非常重要的,拉曼光谱反应出Ar气氛退火,抑制了金红石晶相的发育,薄膜仍以锐钛矿相为主.Ar气氛退火的薄膜在可见光范围内的透过率比大气退火的要低,并且由透过率曲线推知:金红石的光学带隙约为2.8 eV,比锐钛矿的光学带隙小0.2 eV.     

The influence of substrate material and annealing procedure on the properties of superconducting thin films

Thin layers YBa₂Cu₃O_7–x. are deposited by a laser ablation technique using a pulsed excimer laser operating at 308 nm. The influence of the substrate material and the annealing procedure on the superconducting behaviour of the 123 film and the reactions between the film and the substrate are studied by resistance, X-ray patterns and TEM measurements. The best results are obtained for deposition on (100) SrTiO₃ substrates. The resistance of the 1 m thick film shows a metallic behaviour, an onset in superconductivity at a temperature of 90 K, and has zero resistance at 86 K. The 123 material has a preferential oriented c-axis perpendicular to the surface plane.     

二氧化钒薄膜的低温制备及其性能研究

针对VO₂薄膜在微测辐射热计上的应用，采用射频反应溅射法，在室温下制备氧化钒薄膜；研究了氧分压对薄膜沉积速率、电学性质及成分的影响.通过调节氧分压，先获得成分接近VO₂的非晶化薄膜，再在400℃空气中氧化退火，便可制得高电阻温度系数，低电阻率的VO₂薄膜，电阻温度系数约为-4%/℃，薄膜方块电阻为R_□为100—300kΩ；薄膜在室温下沉积，400℃下退火的制备方法与微机电加工(micro electromechanic 关键词： 二氧化钒 电阻温度系数 氧分压 射频反应溅射法     

The effect of post-metal annealing on the electrical performance and stability of two-step-annealed solution-processed In2O3 thin film transistors

In this work, solution-processed indium oxide (In₂O₃) thin film transistors (TFTs) were fabricated by a two-step annealing method. The influence of post-metal annealing (PMA) temperatures on the electrical performance and stability is studied. With the increase of PMA temperatures, the on-state current and off-state current (I_on/I_off) ratio is improved and the sub-threshold swing (SS) decreased. Moreover, the stability of In₂O₃ TFTs is also improved. In all, In₂O₃ TFT with post-metal annealing temperature of 350°С exhibits the best performance (a threshold voltage of 4.75 V, a mobility of 13.8 cm²/V, an I_on/I_off ratio of 1.8 × 10⁶, and a SS of 0.76 V/decade). Meanwhile, the stability under temperature stress (TBS) and positive bias stress (PBS) also show a good improvement. It shows that the PMA treatment can effectively suppress the interface trap and bulk trap and result in an obviously improvement of the In₂O₃ TFTs performance.     

Al_2O_3从CaIrO_3结构转变为U_2S_3结构的相变对其高压下光学性质的影响

采用基于密度泛函理论(DFT)的第一性原理方法,计算了Al_2O_3晶体在高压下的光学性质.结果表明:(1)Al_2O_3从CaIrO_3结构转变为U_2S_3结构:将使得其吸收谱主峰值强度增强、副峰值强度显著减弱、主副谱峰均红移以及光谱吸收边出现巨大的红移.(2)结构相变将引起Al_2O_3折射率谱峰值强度减弱和谱峰数增加;同时,在波长为400-2000 nm的范围内,结构相变将导致Al_2O_3折射率显著增大.本文的计算结果为未来进一步的实验研究提供了参考信息.