Photoconductivity in amorphous thin films of Ge22Se78−xBix

Temperature and intensity dependence of photoconductivity is studied in amorphous thin films of Ge₂₂Se_78−x Bi_x with x = 0, 2 and 10. Transient photoconductivity measurements have also been made on the same samples. Our results show that photosensitivity decreases as Bi concentration is increased from x = 0 to x = 2. However, at high concentration of Bi(x = 10), photosensitivity again increases. Transient photoconductivity also show a different behaviour at low and high concentration of Bi. Results have been explained in terms of defect states produced due to Bi incorporation in GeSe system.     

Some optical properties of Ge–S amorphous thin films

Amorphous Ge_xS_1−x films (x=0.27, 0.32, 0.36 and 0.4) were prepared by thermal evaporation. The values of the refractive index, the optical gap and the parameters of the Wemple–DiDomenico single oscillator model were determined. Using Miller's generalized rule the values of the third-order non-linear susceptibility were also estimated. Thermally induced bleaching was observed for films studied. Photobleaching was observed for sulfur rich and nearly stoichiometric films (x=0.27, 0.32) while for a germanium rich film (x=0.4) no response to the illumination was observed. The differences in photobleaching are attributed to the role of p-lone pair states and to an overall network rigidity of the films.     

Determination of the thickness and optical constants of amorphous Ge–Se–Bi thin films

The effect of varying bismuth concentration on the optical constants of amorphous Ge₂₀Se_{80? x} Bi _x (where x = 0, 3, 6, 9 and 12 at%) thin films prepared by thermal evaporation has been investigated. The transmission spectra T(λ) of the films at normal incidence were obtained in the spectral region from 400 to 2500 nm. An analysis proposed by Swanepoel [J. Phys. E: Sci. Instrum. 16 (1983) p.1214], based on the use of the maxima and minima of the interference fringes, was applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Increasing bismuth content was found to affect the refractive index and extinction coefficient of the Ge₂₀Se_{80? x} Bi _x films. Optical absorption measurements show that the fundamental absorption edge is a function of composition. With increasing bismuth content, the refractive index increases while the optical band gap decreases.     

The optical properties of MgxZnl-xO thin films

Mg_xZn_1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of Mg_xZn_1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400--760\,nm at the incident angle of 70℃. Both absorption coefficients and optical band gaps of Mg_xZn_1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of Mg_xZn_1-xO films shift to higher energies and band gaps linearly increase from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important information for the design and modelling of ZnO/ Mg_xZn_1-xO heterostructure optoelectronic devices.     

Effect of 60Co γ-irradiation on structural and optical properties of thin films of Ga10Se80Hg10

Thin films of Ga₁₀Se₈₀Hg₁₀ have been deposited onto a chemically cleaned Al₂O₃ substrates by thermal evaporation technique under vacuum. The investigated thin films are irradiated by ⁶⁰Co γ-rays in the dose range of 50–150 kGy. X-ray diffraction patterns of the investigated thin films confirm the preferred crystallite growth occurs in the tetragonal phase structure. It also shows, the average crystallite size increases after γ-exposure, which indicates the crystallinity of the material increases after γ-irradiation. These results were further supported by surface morphological analysis carried out by scanning electron microscope and atomic force microscope which also shows the crystallinity of the material increases with increasing the γ-irradiation dose. The optical transmission spectra of the thin films at normal incidence were investigated in the spectral range from 190 to 1100 nm. Using the transmission spectra, the optical constants like refractive index (n) and extinction coefficient (k) were calculated based on Swanepoel’s method. The optical band gap (E_g) was also estimated using Tauc’s extrapolation procedure. The optical analysis shows: the value of optical band gap of investigated thin films decreases and the corresponding absorption coefficient increases continuously with increasing dose of γ-irradiation.     

Structural,electrical and optical properties of Cdx Zn1−xSe thin films

X-ray diffraction and electron diffraction techniques indicate that Cd_x Zn_1–xSe thin films on glass substrates have a polycrystalline nature, with sphalerite structure for x0.5 and wurtzite structure for x0.6. The crystalline size in each composition increases with increasing the film thickness. The room temperature dark resistivity varies from one composition to another showing a transition at x=0.55The temperature dependence of of the deposited films revealed two conduction mechanisms, one below 352 K due to shallow levels, surface states, and defects introduced during the film growth, and over 352 K due to deep-level ionization following the ordinary semiconducting behaviour.The thermal activation energy of the free charge carriers decreases linearly with increasing the molar fraction x of the CdSe content up to x=0.55, above which it increases with increasing x.The optical constants of Cd_x Zn_1–xSe thin films of different compositions were determined in the spectral range 400–2000 nm. The analysis of the absorption coefticient at and near the absorption edge indicates the existence of allowed direct transition energy gaps decreasing with increasing x.     

On the properties and stability of thermally evaporated Ge–As–Se thin films

Thin films of Ge–As–Se chalcogenide glasses have been deposited by thermal evaporation from bulk material and submitted to thermal treatments. The linear refractive index and optical band-gap for as-deposited and annealed films have been analyzed as function of the deposition parameters, chemical composition and mean coordination number (MCN). The chemical composition of the films was found to be directly affected by deposition rate, with low rates producing films with elevated Ge and reduced As content, whilst at high rates the Ge content was generally reduced and As levels increased compared with the bulk starting material. As a result films with close to the same stoichiometry as the bulk glass could be obtained by choosing appropriate deposition conditions. As-deposited films with MCN in between 2.44 and 2.55 showed refractive indices and optical band-gaps very close to those of the bulk glass whereas outside this range the film indices were higher and the optical gaps lower than those of the bulk glass. Upon annealing at close to their glass transition temperature, high MCN films evolved such that their indices and band-gaps approached the bulk glass values whereas at low MCN films resulted in no changes to the film properties.     

Radiation effects on the optical properties of Se85−x Te15Sb x thin films

The optical absorption of the as-deposited and γ-irradiated (doses of 3, 10, 12, 15 Mrad) thermally evaporated Se_85?x Te₁₅Sb _x (x=0, 6, 9) films was measured. The refractive index n and the extinction coefficient k of the films were calculated using an analytical method developed by Zheng et al. The Urbach relation was used in the fundamental edge region to calculate the width of the band tail states. The behavior of the composition with high concentration of antimony (x=9) was attributed to the produced Se–Sb bonds and an excess of Te–Te bonds, which break the chain structure of the Se–Te system and generate defects in the film. The related optical parameters were also calculated and discussed.     

Investigation of structural and optical properties of 100 MeV F7+ ion irradiated Ga10Se90-xAlx thin films

Present work focuses on the effect of swift heavy ion (SHI) irradiation of 100 MeV F⁷⁺ ions by varying the fluencies in the range of 1 × 10¹² to 1 × 10¹³ ions/cm² on the morphological, structural and optical properties of polycrystalline thin films of Ga₁₀Se_90-xAl_x (x = 0, 5). Thin films of ~300 nm thickness were deposited on cleaned Al₂O₃ substrates by thermal evaporation technique. X-ray diffraction pattern of investigated thin films shows the crystallite growth occurs in hexagonal phase structure for Ga₁₀Se₉₀ and tetragonal phase structure for Ga₁₀Se₈₅Al₅. The further structural analysis carried out by Raman spectroscopy and scanning electron microscopy verifies the defects or disorder of the investigated material increases after SHI irradiation. The optical parameters absorption coefficient (α), extinction coefficient (K), optical band gap (E_g) and Urbach’s energy (E_U) are determined from optical absorption spectra data measured from spectrophotometry in the wavelength range 200–1100 nm. It was found that the values of absorption coefficient and extinction coefficient increase while the value of optical band gap decreases with the increase in ion fluence. This post irradiation change in the optical parameters was interpreted in terms of bond distribution model.     

Physical and optical properties of amorphous Ge x As20S80– x thin films

We report the effect of replacement of sulfur by germanium on the optical constants and some other physical parameters of chalcogenide Ge _x As₂₀S_{80– x} (where x?=?0, 5, 10, 15 and 20 at%) thin films. Increasing germanium content affected the average heat of atomization, average coordination number, number of constraints and the cohesive energy. Films with thicknesses 800–820?nm of Ge _x As₂₀S_{80– x} were prepared by thermal evaporation of bulk samples. Transmission spectra, T(λ), of the films at normal incidence were obtained in the region from 400 to 2500?nm. A straightforward analysis proposed by Swanepoel [J. Phys. E Sci. Instrum. 16 (1983) p 1214], based on the use of maxima and minima of the interference fringes, has been applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Optical absorption measurements showed that the fundamental absorption edge is a function of composition. Optical absorption is due to allowed non-direct transition and the energy gap decreases while the refractive index increases with increasing germanium content. The chemical-bond approach has been applied to obtain the excess of S–S homopolar bonds and the cohesive energy of the Ge _x As₂₀S_{80– x} system.     

Effect of NaF on optical and structural properties of CdxZn1−xS nano crystalline films

This work investigates the effect of NaF on optical and structural properties of nano crystalline Cd_xZn_1?xS films. The Cd_xZn_1?xS films are prepared through chemical bath deposition (CBD) technique in aqueous alkaline bath and their subsequent condensation on substrates. The as-obtained samples are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–VIS absorption spectroscopy. Micro structural features, obtained from XRD analysis confirm the formation of cubic phase of undoped as well as NaF doped Cd_xZn_1?xS nano particles while SEM observations depict non-uniform distribution of grains. These results show the average grain size of pure as well as NaF doped samples to range from 50 to 90 nm. Tauc's plots, extracted from absorption spectra exhibit absorption to be dominating mainly in blue-green region of visible spectrum. The room-temperature photoluminescence (PL) spectra of Cd_xZn_1?xS samples show a peak around 425 nm, which gets blue shifted for doped sample indicating improvement in PL properties on its addition.     

Optical properties of ternary ZnS x Se1−x polycrystalline thin films

Ternary ZnS_xSe_1–x polycrystalline thin films were prepared by evaporation in vacuum of 10^–5 Torr. The molecular fractionx varied in the region ox1. The optical constants (the refractive indexn, the absorption indexk, and the absorption coefficient) were determined in the wavelength range 300–1600nm. A plot representing ₂=f(hv) shows that the ZnS_xSe_1–x polycrystalline thin films of different compositions have two direct transitions corresponding to the energy gapsE andE+. The variation in eitherE orE+ withx indicates that this system belongs to the amalgamation type. Such variation follows a quadratic equation. The bowing parameter was found to be 0.456 eV, roughly equal to the calculated value 0.60 eV using the empirical pseudopotential method based on the virtual-crystal approximation, in which the disorder effect has not been taken into account.     

Electrical and optical properties of a-SexTe100–x thin films

The dc electrical conductivity of as deposited thin films of a-Se_xTe_100?x (x=3, 6, 9 and 12) is measured as a function of temperature range from 298 to 383 K. It is observed that the dc conductivity increases exponentially with the increase in temperature in this glassy system. The value of activation energy calculated from the slope of ln σ_dc vs. 1000/T plot, is found to decrease on incorporation of dopant (Se) content in the Te system. On the basis of pre-exponetial factor (σ₀), it is suggested that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges. The optical absorption measurements show an indirect optical band gap in this system and it decreases on increasing Se concentration. The optical constants (extinction coefficient (k) and refractive index (n)) do change significantly with the photon energy and also with the dopant Se concentration. The decrease in optical band gap may be due to the decrease in activation energy in the present system. It is also found that the real and imaginary parts of dielectric constants show a significant change with the photon energy as well as with the dopant concentration. With large absorption coefficients and compositional dependence of optical band gap and optical constants (n and k), these materials may be suitable for optical disk applications.     

Temperature dependent structural and optical properties of nanocrystallineCdO thin films deposited by sol–gel process

Nanocrystallites of cadmium oxide (CdO) thin films were deposited by sol–gel dip coating technique on glass and Si substrates. XRD and TEM diffraction patterns confirmed the nanocrystalline cubic CdO phase formation. TEM micrograph of the film revealed the manifestation of nano CdO phase with average particle size lying in the range 1.6–9.3 nm. UV–Vis spectrophotometric measurement showed high transparency (nearly 75% in the wavelength range 500–800 nm) of the film with a direct allowed bandgap lying in the range 2.86–3.69 eV. Particle size has also been calculated from the shift of bandgap with that of bulk value for the films for which the particles sizes are comparable to Bohr exitonic radius. The particle size increases with the increase in annealing temperature and also the intensity of XRD peaks increases which implies that better crystallinity takes place at higher temperature.This revised version was published online in August 2005 with a corrected issue number.     

Investigation of the crystallinity,structural, and optical properties in hydrotreating of Li–W co-doped ZnO thin films

The hydrotreated Li–W co-doped ZnO (LWZO:H) thin films was prepared on quartz glass substrates by RF magnetron sputtering at substrate temperature 100 °C with varied hydrogen flow ratios. The X-ray diffraction spectra indicated that the hydrotreating Li–W co-doped ZnO films showed a preferred orientation toward the c-axis. The chemical compositions of all samples were confirmed by X-ray photoelectron spectroscopy, which clearly showed the existence of W as a doping element into ZnO crystal lattice. The surface morphology of LWZO:H thin films changed with the increasing R value can clearly be seen. The average transmittance of the films was found to be almost 85 % for the wavelength range of 400–1,200 nm. Meanwhile, the optical band gap increase of the films may be attributed to the band Burstein–Moss effect.