低压MOCVD生长参量对Ⅱ型InAs/GaSb超晶格材料表面形貌的影响

采用自制低压金属有机源化学气相沉积设备,在(100)面GaSb单晶衬底上生长了Ⅱ型InAs/GaSb超晶格材料.利用双晶X射线衍射、光学显微镜、原子力显微镜和光致发光谱等分析手段对材料特性进行了表征,获得了表面光亮的晶体质量较好的Ⅱ型InAs/GaSb超晶格材料,在77 K下得到光致发光谱峰值波长为3.25 μm.研究了生长温度、过渡层、界面层对其表面形貌的影响,得出生长温度在500 ℃～520 ℃,无过渡层,使用InAsSb界面层有利于改善材料的表面形貌.     

低压MOCVD生长参量对Ⅱ型InAs/GaSb超晶格材料表面形貌的影响

采用自制低压金属有机源化学气相沉积设备,在（100）面GaSb单晶衬底上生长了Ⅱ型InAs/GaSb超晶格材料.利用双晶X射线衍射、光学显微镜、原子力显微镜和光致发光谱等分析手段对材料特性进行了表征,获得了表面光亮的晶体质量较好的Ⅱ型InAs/GaSb超晶格材料,在77 K下得到光致发光谱峰值波长为3.25 μm.研究了生长温度、过渡层、界面层对其表面形貌的影响,得出生长温度在500 ℃~520 ℃,无过渡层,使用InAsSb界面层有利于改善材料的表面形貌.     

GaSb衬底外延InAs薄膜及光学性质研究

利用分子束外延技术在GaSb(100)衬底上先生长作为缓冲层以降低薄膜失配度的低Sb组分的三元合金InAsSb,再生长InAs薄膜.在整个生长过程中通过反射高能电子衍射仪进行实时原位监测.InAs薄膜生长过程中,电子衍射图案显示了清晰的再构线,其薄膜表面具有原子级平整度.利用原子力显微镜对InAs薄膜进行表征,结果显示较低Sb组分的InAsSb缓冲层上外延InAs薄膜的粗糙度比较高Sb组分的InAsSb缓冲层上外延InAs薄膜的粗糙度降低了约2.5倍.通过对不同Sb组分的三元合金InAsSb缓冲层上外延的InAs薄膜进行X射线衍射测试及对应的模拟,结果表明在较低Sb组分的InAsSb缓冲层上外延InAs薄膜的衍射峰半高峰宽较小,说明低Sb组分的InAsSb作为缓冲层可以降低InAs薄膜的内应力,提高InAs薄膜的结晶质量.利用光致发光光谱对高结晶质量的InAs薄膜进行发光特性研究,10 K下InAs的发光峰位约为0.418 eV,为自由激子发光.     

晶格匹配InAs/AlSb超晶格材料的分子束外延生长研究

InAs/GaSb超晶格是量子级联激光器(quantum cascade lase,QCL)和带间级联激光器(interband cascade lasers,ICL)结构中重要的组成,特别是作为ICL的上下超晶格波导层是由大量的超薄外延层(纳米量级)交替生长而成,细微的晶格失配便会直接导致材料晶体质量变差,而且每层的厚度和组分变化会强烈影响材料结构性能.论文研究验证了InAs/GaSb超晶格材料生长的最佳温度约在420℃.通过在衬底旋转的情况下生长40周期短周期GaSb/AlSb和InAs/GaSb超晶格,并采用XRD测量拟合获得了GaSb和AlSb层厚分别为5.448 nm和3.921 nm,以及InAs和GaSb层厚分别为8.998 nm和13.77 nm,误差在10%以内,获得了InAs/AlSb超晶格的生长最优条件.在GaSb衬底上生长晶格匹配的40周期的InAs/AlSb超晶格波导层,充分考虑飘逸As注入对InAs/AlSb超晶格平均晶格常数的影响,在固定SOAK时间为3 s的条件下,通过变化As压为1.7×10^-6 mbar来调整个超晶格的平均晶格常...     

GaSb/AlSb/GaAs应变层结构的分子束外延生长

本文以反射式高能电子衍射(RHEED)和其强度振荡为监测手段,在半绝缘GaAs衬底上成功地生长GaSb/AlSb/GaAs应变层结构,RHEED图样表明,GaSb正常生长时为Sb稳定的C(2×6)结构,AlSb为稳定的(1×3)结构,作者观察并记录GaSb,AlSb生长时的RHEED强度振荡,并利用它成功地生长10个周期的GaSb/AlSb超晶格,透射电子显微镜照片显示界面平整、清晰,采用较厚的AlSb过渡层及适当的生长条件,可在半绝缘GaAs衬底上生长出质量好的GaSb外延层,其X射线双晶衍射半峰宽小于 关键词：     

InAs/GaInSb超晶格薄膜结构与电学性能

采用分子束外延(MBE)方法, 调节生长温度、Ⅴ/Ⅲ束流比等参数在(001)GaAs衬底上生长了InAs/GaInSb超晶格薄膜.结果表明:InAs/GaInSb超晶格薄膜的最佳生长温度在385~395 ℃, Ⅴ/Ⅲ束流比为5.7 :1~8.7 :1.高能电子衍射仪(RHEED)原位观测到清晰的GaAs层(4×2)、GaSb层(1×3)和InAs层(1×2)再构衍射条纹.获得的超晶格薄膜结构质量较好.随着温度的升高, 材料的载流子浓度和迁移率均上升.     

在6H-SiC衬底上用低压MOVPE法生长AlN和GaN的过程中用(AlN/GaN)多层缓冲层来控制残余应力

人们已提出用BAlGaN四元系材料制备紫外光谱区的光发射器件.GaN和AlN二元系是这种四元材料在器件应用中的基础材料.6H-SiC衬底在氮化物生长中因其晶格失配小是一大优势,而且SiC衬底的热膨胀系数也和AlN的很接近.然而,对于AlN外延层来说,需要控制其中的残余应力,因为在SiC衬底上直接生长的AlN外延层中存在着因晶格失配所产生的压缩应力.另一方面,在SiC衬底上直接生长的GaN外延层中存在着拉伸应力.这种拉伸应力起源于GaN比衬底有着更大的热膨胀系数.本文讨论了在6H-SiC衬底上生长的氮化物外延层中残余应力的类型、数量及控制.为此目的,提出了在6H-SiC衬底上,无论是生长AlN,还是生长GaN,都可以采用(GaN/AlN)多层缓冲层的办法,作为控制残余应力的有效方法.我们还讨论了AlN和GaN外延层的结晶质量和残余应力间的关系.     

InAs和InAs/GaSb异质结的MOCVD生长和表征

以三甲基铟(TMIn)、砷烷(AsH3)、三甲基镓(TMGa)和三甲基锑(TMSb)为源,用水平常压MOCVD技术,在较低的Ⅴ/Ⅲ比的条件下(1.5～4)于GaAs和GaSb衬底上成功地生长了InAs合金和InAs/GaSb异质结。实验表明,生长温度在500℃～620℃范围内,InAs外延生长是扩散控制的。在Ⅴ/Ⅲ比为2.5时,生长效率(相对Ⅲ族源)为3×103μm/mol.不掺杂InAs外延层为n型的,室温迁移率为2000cm2/V.s.InAs/GaSb异质结的12KPL谱为一个在375meV处较宽的与杂质相关的跃迁峰,和一个在417meV附近的几乎被杂质峰湮没的带边峰.     

采用AlSb缓冲层生长2.3μm InGaAsSb/AlGaAsSb多量子阱结构

针对常见的GaSb衬底的InGaAsSb/AlGaAsSb多量子阱结构进行了设计和外延生长。样品通过X-射线测试,有多级衍射卫星峰出现,表明量子阱结构的均匀性和界面质量较好,引入AlSb缓冲层可以降低衬底与外延层之间的界面自由能,使AlSb起到了一个滤板的作用,抑制了位错的扩散。光荧光谱测试表明,室温下量子阱结构中心发光波长在2.3μm附近。     

GaAs/Ge的MOCVD生长研究

用常压MOCVD在Ge衬底上外延生长了GaAs单晶层,研究了GaAs和6e的极性与非极性材料异质外延生长,获得了质量优良的GaAs/Ge外延片,GaAs外延层X射线双晶衍射回摆曲线半高宽达16弧秒.10K下PL谱半峰宽为7meV.讨论了极性与非极性外延的界面反相畴问题和GaAs-Ge界面的Ga、Ge原子互扩散问题.     

苝四甲酸二酐有机单晶纳米结构的制备及形成机理的研究

在分子束外延(MBE)系统中, 利用物理气相沉积(PVD)的方法在阳极氧化铝(AAO)模板上制备了有机 染料分子苝四甲酸二酐(PTCDA)的不同纳米结构; 并使用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、 高分辨透射电子显微镜(HRTEM)以及选区电子衍射(SAED)技术进行了系统的研究. 结果发现, 当衬底温度(T_s)为330 ℃时得到的是纳米丝、针、带以及棒; T_s为280 ℃, 230 ℃, 180 ℃时得到的主要是纳米棒, 并且纳米棒的长度随T_s的降低而变短; T_s为50 ℃时只能得到连续的PTCDA薄膜. HRTEM以及SAED结果证实了纳米针与棒为单晶. 依据SEM结果, 提出纳米结构的生成主要受T_s以及衬底表面曲率的影响.     

氮化镓/蓝宝石异质结构中极性的研究

用低压金属有机气相外延方法设备在蓝宝石衬底两个相反取向的C面上同时生长六方相氮化镓薄膜,对此进行了扫描电子显微镜、透射电子显微镜的分析和研究.发现当衬底表面是向籽晶面时,生长的六方相氮化镓薄膜为(0001)取向,而当衬底表面是背籽晶面时,生长的氮化镓薄膜则为(0001)取向.     

Growth and characterization of InAsSb alloys by metalorganic chemical vapour deposition

Low pressure metalorganic chemical vapour deposition (LP-MOCVD) growth and characteristics of InAsSb on (100) GaSb substrates are investigated. Mirror-like surfaces with a minimum lattice mismatch are obtained. The samples are studied by photoluminescence spectra, and the output is 3.17μm in wavelength. The surface of InAsSb epilayer shows that its morphological feature is dependent on buffer layer. With an InAs buffer layer used, the best surface is obtained. The InAsSb film shows to be of n-type conduction with an electron concentration of 8.52×10¹⁶cm^-3.     

Influence of Ⅴ/Ⅲ ratio on the structural and photoluminescence properties of In0.52AlAs/In0.53GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy

A series of metamorphic high electron mobility transistors （MMHEMTs） with different Ⅴ/Ⅲ flux ratios are grown on CaAs （001） substrates by molecular beam epitaxy （MBE）. The samples are analysed by using atomic force microscopy （AFM）, Hall measurement, and low temperature photoluminescence （PL）. The optimum Ⅴ/Ⅲ ratio in a range from 15 to 60 for the growth of MMHEMTs is found to be around 40. At this ratio, the root mean square （RMS） roughness of the material is only 2.02 nm; a room-temperature mobility and a sheet electron density are obtained to be 10610.0cm^2/（V.s） and 3.26×10^12cm^-2 respectively. These results are equivalent to those obtained for the same structure grown on InP substrate. There are two peaks in the PL spectrum of the structure, corresponding to two sub-energy levels of the In0.53Ga0.47As quantum well. It is found that the photoluminescence intensities of the two peaks vary with the Ⅴ/Ⅲ ratio, for which the reasons are discussed.     

Epitaxial growth of high quality β-FeSi2 layers on Si(1 1 1) under the presence of an Sb flux

β-FeSi₂ layers were grown on Si(1 1 1) substrates by Fe deposition and simultaneous reaction with Si under the presence of an Sb flux. High quality epitaxial layers were obtained at the substrate temperature of 650°C with smooth interface between the reactive resultant β-FeSi₂ layers and Si substrates, in comparison to the layers grown by conventional reactive deposition epitaxy (RDE). Sb/Fe flux ratio dependence of the structural property was examined using X-ray diffraction (XRD) measurements, transmission electron microscopy (TEM) and scanning electron microscopy (SEM). Photoluminescence spectra were also measured at low temperature.     

CdTe epilayers for uses in optical waveguides

CdTe epilayers have been grown by vapor phase epitaxy (VPE) on glass, MgO, sapphire, LiNbO₃ and mica substrates. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) studies show the good structural quality of the epilayers. In these epilayers, a few optical modes were excited with a 1.33-μm laser. The measured propagation losses were in the range between 5 dB/cm and less than 0.5 dB/cm. From dark-mode m-lines, the epilayer thickness was found to be in the 1–3 μm range, in good accord with that obtained by SEM measurements. The refractive index obtained from the fitting is also in good accord with that of bulk CdTe. Received: 7 October 1999 / Accepted: 13 March 2000 / Published online: 5 July 2000     

Comparison between atomic layer epitaxy grown and molecular beam epitaxy grown CdTe/MnTe superlattices: a structural and optical study

Atomic layer epitaxy (ALE) is investigated for the growth of CdTe/MnTe superlattices. A systematic structural characterization (X-ray diffraction, transmission electron microscopy), together with a magneto-optical study (reflectivity and photoluminescence), demonstrate that: for MnTe ALE, all deposited Mn atoms are incorporated, so that no autoregulated growth mode can be obtained, in contrast with CdTe ALE, atomic layer epitaxy allows well-controlled CdTe/MnTe superlattices to be achieved but does not prevent the exchange between Cd and Mn atoms which occurs at the interfaces between CdTe and MnTe, as observed in CdTe/MnTe superlattices grown by conventional molecular beam epitaxy.     

Effect of Al mole fraction on structural and electrical properties of AlxGa1−xN/GaN heterostructures grown by plasma-assisted molecular beam epitaxy

The effect of Al mole fractions on the structural and electrical properties of Al_xGa_1−xN/GaN thin films grown by plasma-assisted molecular beam epitaxy (PA-MBE) on Si (1 1 1) substrates has been investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and current-voltage (I-V) measurements. X-ray results revealed that the AlGaN/GaN/AlN was epitaxially grown on Si substrate. By applying Vegard's law, the Al mole fractions of Al_xGa_1−xN samples were found to be 0.11, 0.24, 0.30 and 0.43, respectively. The structural and morphology results indicated that there is a relatively larger tensile strain for the sample with the smallest Al mole fraction; while a smaller compressive strain and larger grain size appear with Al mole fraction equal to 0.30. The strain gets relaxed with the highest Al mole fraction sample. Finally, the linear relationship between the barrier height and Al mole fraction was obtained.     

New design of nozzle structures and its effect on the surface and crystal qualities of thick GaN using a horizontal HVPE reactor

High-quality thick GaN films without cracks were achieved by using a new nozzle structure in the reactor grown by the hydride vapor phase epitaxy on sapphire substrates. Optical contrast microscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray double diffraction (XRD) and cathodoluminescence (CL) were carried out to reveal the surface, crystal and optical properties of the GaN epilayer. It was found that the nozzle structure in the reactor has a large effect on the growth rate, surface flat, crystal quality, and the uniformity of the growth. Compared with the old one, the new nozzle structure (denoted as multi-layers nozzle) can improve dramatically the properties of thick GaN. Mirror, colorless and flat GaN thick film was obtained and its (0 0 0 2) FWHM results were reduced from 1000 to 300 arcsec when the new nozzle was used. AFM result revealed a step flow growth mode for GaN layer with the new nozzle. Room-temperature CL spectra on the GaN films showed a strong near-band-edge peak for the new nozzle, but there is only weak emitting peak for the old nozzle. New nozzle structure can improve the uniform of flow field near the surface of substrates compared with the old one, which leads to the improvement of properties of GaN thick film by hydride vapor phase epitaxy (HVPE).     

图形衬底量子线生长制备与荧光特性研究

报道了在V型槽图形衬底上利用分子束外延技术外延生长的GaAs/AlGaAs量子线.外延截面在扫描电子显微镜下可以看到在V型槽底部形成了弯月型量子线结构,量子线尺寸约为底边60 nm高14 nm的近三角形.低温87 K下光致发光谱测试在793.7和799.5 nm处出现峰值,验证了量子线的存在.理论近似计算结果显示,相比等宽度量子阱有8 meV的蓝移正是由于横向量子限制引起的. 关键词： V型槽图形衬底 量子线 GaAs