多孔硅表面钝化对其发光性能的影响

报道多孔硅（ＰＳ）的表面钝化对其光致发光（ＰＬ）和电致发光（ＥＬ）的影响,ＰＬ和ＥＬ谱表明,经钝化处理的ＰＳ的ＰＬ和ＥＬ强度明显增强,且发光峰位较大蓝移;存放实验表明,经钝化处理的ＰＳ的ＰＬ和ＥＬ发光强度和发光峰位具较好的稳定性;Ｉ～Ｖ曲线显示,经钝化处理的ＰＳ发光器件具有较低的劝电压,结结果表明：用钝化处理的方法是几ＰＬ和ＥＬ强度和稳定性及改善器件性能的有效途径。     

多孔硅的表面碳膜钝化

报道对多孔硅（ＰＳ）进行碳膜（ＣＦ）钝化处理的结果。红外吸收光谱表明,经钝化处理样品的表面由Ｓｉ－Ｃ、Ｓｉ－Ｎ和Ｓｉ－Ｏ键所覆盖;荧光我谱表明,经钝化处理的样品较未处理的样品发光强度提高４￣４．５倍,且发光峰位明显蓝移;存放实验显示,经钝化处理的样品发光强度稳定、发光峰位不变。这些结果表明正丁胺可以在多孔硅表面形成优良的钝化碳膜,是一种十分有效的多孔硅后处理途径。     

铜掺杂多孔硅的光致荧光猝灭

采用浸泡镀敷的方法在多孔硅表面形成了一铜镀层,通过对掺铜前后多孔硅的光致发光(PL)谱和傅里叶变换红外(FTIR)吸收光谱的研究,讨论了铜在多孔硅表面的吸附对其光致发光的影响。实验表明,掺铜对多孔硅的光致发光具有明显的猝灭效应,并使多孔硅的发光峰位蓝移。由于多孔硅表面铜的吸附使硅-氢键明显减少,而铜原子和硅的悬挂键成键会形成新的非辐射复合中心,从而使多孔硅的光致发光强度衰减。且浸泡溶液的浓度越高,这种猝灭效应越明显。而多孔硅发光峰位的蓝移,则是由于在发生金属淀积的同时伴随着多孔硅表面Si的氧化过程(纳米Si氧化为SiO2)的缘故。     

有机吸附物对多孔硅微腔发光的影响

理论上,采用Bruggeman有效介质近似,研究了有机吸附物对多孔硅微腔的折射率及其光致发光谱的影响.实验上,采用计算机控制的电化学腐蚀法制备了多孔硅微腔样品,并利用机械泵油的蒸气分子与该微腔样品进行相互作用.研究发现,多孔硅微腔发射的窄化光致发光谱对泵油蒸气分子的吸附与脱附很敏感,与之伴随的是该窄化光致发光谱发生明显的峰位移动(可达71nm)和强度变化.结合Bruggeman近似和表面态对多孔硅发光的影响,对实验结果进行了定性解释.实验结果与理论模拟结果符合较好. 关键词： Bruggeman近似 吸附物 多孔硅微腔 光致发光谱     

发光不衰减的多孔硅

用一种新的方法制备出了具有不同衰减的光致发光特性的多孔硅。如此制备的多孔硅新鲜样品,其发光峰位强度比普通多孔硅高２￣２．５倍,将样品在室温下暴露于空气中,其发光强度在前４个月中单调增加,然后达到饱和。在随后的８个月中,没有观察到发光衰减,发光峰位也没有发生变化,这种发光稳定性被归因子于多孔硅表面所形成的稳定的Ｆｅ－Ｓｉ键。文章探讨了发光不衰减、峰位不蓝移的机理,并为多孔硅发光的量子限域模型提供了强     

PVK三线态激基复合物的发光及其受紫外光辐照的影响

用不同溶剂中的前驱物旋涂成PVK层,制备了ITO/PEDOT:PSS/PVK/Ca:Al器件,以及相同结构不同PVK分子量的器件。通过测试分析认为:器件的电致发光谱中590nm波长处的发光峰来自于PVK三线态的激基复合物,并且发现其强度依赖于PVK的分子构型,即在PVK分子中相邻咔唑基团重叠程度。通过比较不同紫外辐照剂量后的PVK器件的发光,发现适度的UV辐照后的PVK分子构型中相邻咔唑基团处于全重叠的状态增加,在电致发光时会形成更多的三线态激子,因而提高了PLED器件的发光效率。     

稀土掺杂硅基薄膜的高效发光特性

测量了在不同离子注入剂量,不同退火条件下的Nd注入Si基晶片室温光致发光谱,结果表明它们均具有蓝、紫发光峰,且发光稳定。在一定范围内发光效率随掺杂浓度的增加而增大,随退火条件的不同而改变。在实验室条件下,对掺杂硅片和单晶硅片进行电化学腐蚀制成多孔硅样片,同时用适当配比的HNO3对以单晶硅为基底的多孔硅进行处理,测试了腐蚀后各类样品的光致发光（PL）谱。发现掺稀土Nd的多孔硅和用HNO3处理的多孔硅的发光效率有显著提高。     

Ag纳米颗粒对富Ag二氧化硅薄膜电致发光谱的影响

利用磁控溅射和热退火在硅衬底上制备了Ag纳米颗粒镶嵌的氧化硅薄膜(SiO2∶ Ag),制作了电致发光结构ITO/SiO2∶Ag/p-Si,观测到了可见区的电致发光.发现薄膜中的Ag纳米颗粒不仅成倍地提高器件的发光强度,还明显地移动电致发光的峰位.Ag含量越高,颗粒越大,发光峰位越红移.氧化硅中的发光中心与纳米Ag间的电...     

富硅a-SiOxNy：H薄膜的电致发光特性

采用甚高频等离子体增强化学气相沉积方法制备富硅氮氧化硅(a-SiO_0.35N_0.59:H)薄膜,以这层薄膜作为有源层构建发光二极管。实验结果表明器件在室温下可观测到强的电致红光发射,发光峰在715 nm附近,与其光致发光峰位一致。电致发光谱测量还表明器件开启电压为8 V,器件的电致发光强度随注入电流的增大呈线性递增关系。电流-电压特性分析表明器件的载流子输运机制以Pool-Frenkel(P-F)发射模型为主。结合发光有源层的微结构分析,初步认为电致红光发射来自于电子和空穴通过有源层的带尾态的辐射复合。     

多孔硅的制备条件对其光致发光特性的影响

不同的实验条件下制备的多孔硅的光致发光(PL)特性是不同的,这是许多研究产生分歧的主要原因。对比分析了阳极氧化电流密度、阳极氧化时间、溶液浓度以及自然氧化时间对多孔硅光致发光光谱的影响。认为在一定的范围内,多孔硅的发光峰位会随电流密度的增大而蓝移,要获得较强的发光,需要选择合适的电流密度;随着腐蚀时间的延长,多孔硅的发光峰位也发生蓝移。当HF酸的浓度较小时,峰位随浓度的增大表现为向低能移动;而当HF酸的浓度较大时,峰位随浓度的增大则表现为移向高能。多孔硅在空气中自然氧化,其发光峰位发生蓝移,而发射强度随放置时间的延长而降低。并用量子限制模型和发光中心模型对实验结果进行解释。     

A comparison study of electroluminescence from Au/native oxide/p-Si and Au/porous Si diodes

Visible electroluminescence (EL) has been observed from a Au/native oxide/p-Si diode and has been studied in comparison with the EL from a Au/porous Si diode. Both diodes share similarities in current-voltage characteristics, EL spectra, and electrical input power dependence of integrated EL intensity. However, Au/porous Si exhibits quite strong photoluminescence (PL) while Au/native oxide/p-Si does not show any measurable PL. For the Au/native oxide/p-Si diode, when the native oxide layer was removed in 1% HF solution, no detectable EL has been observed. These experimental results indicate that the native oxide layer plays a key role in light emission from the Au/native oxide/p-Si diode, and show that the luminescence mechanism for Au/native oxide/p-Si diodes is similar to that for the Au/porous Si diode. This comparative study may aid in elucidation of the EL mechanism of porous silicon.     

Ir(Fppy)_3掺杂PVK体系发光特性的研究

对蓝色磷光材料Ir(Fppy)3不同浓度掺杂PVK薄膜的光致发光(PL)和电致发光(EL)特性进行了研究。并制备了结构为ITO/PEDOT:PSS/PVK:Ir(Fppy)3/BCP/Alq3/LiF/Al的蓝色磷光有机电致发光器件。实验结果发现,磷光材料掺杂浓度不同,器件发光特性不同。当Ir(Fppy)3掺杂浓度比较低时,EL光谱中可以观察到PVK较弱的发光;当Ir(Fppy)3掺杂浓度较高时,会发生浓度猝灭;当Ir(Fppy)3掺杂浓度比较适中时,EL光谱中观察不到PVK的发光,只有Ir(Fppy)3的发光。通过I-V-L特性的比较,当掺杂浓度为4%时,器件的光电特性最好。     

Influence of injection current and temperature on electroluminescence in InGaN/GaN multiple quantum wells

Electroluminescence (EL) spectra of blue InGaN/GaN multiple-quantum-well light-emitting diode (LED) have been investigated over a wide range of injection current (0.001–200 mA) and at various temperatures (6–300 K). Surprisingly, with increasing the injection current the EL peak energy shows an initial blueshift accompanied by a broadening of the EL linewidth at low temperatures (below 30 K). This trend differs from the usual photoluminescence (PL) measurement results, which have shown that with increasing the optical excitation power the PL peak energy gave an initial blueshift accompanied by a narrowing of the PL linewidth at low temperatures. The anomalous current behavior of the EL spectra may be attributed to electron leakage results in the failure of Coulomb screening effect and the relative enhancement of the low-energetic localized state filling at low temperatures and low currents. The electron leakage for the LED is further confirmed by both the current dependence of the EL intensity and the temperature dependence of the EL efficiency.     

Structure and photoluminescence properties of ZnS films grown on porous Si substrates

ZnS films were deposited on porous silicon (PS) substrates with different porosities. With the increase of PS substrate porosity, the XRD diffraction peak intensity decreases and the surface morphology of the ZnS films becomes rougher. Voids appear in the films, due to the increased roughness of PS structure. The photoluminescence (PL) spectra of the samples before and after deposition of ZnS were measured to study the effect of substrate porosity on the luminescence properties of ZnS/PS composites. As-prepared PS substrates emit strong red light. The red PL peak of PS after deposition of ZnS shows an obvious blueshift. As PS substrate porosity increases, the trend of blueshift increases. A green emission at about 550 nm was also observed when the porosity of PS increased, which is ascribed to the defect-center luminescence of ZnS. The effect of annealing time on the structural and luminescence properties of ZnS/PS composites were also studied. With the increase of annealing time, the XRD diffraction peak intensity and the self-activated luminescence intensity of ZnS increase, and, the surface morphology of the ZnS films becomes smooth and compact. However, the red emission intensity of PS decreases, which was associated with a redshift. White light emission was obtained by combining the luminescence of ZnS with the luminescence of PS.     

掺杂DCJTB聚合物电化学池（LEC）的发光性质

通过在聚合物电化学池(LEC)发光器件的发光材料MEH-PPV中掺杂红光染料DCJTB,对LEC器件的发光性质进行研究。基于器件结构为ITO/MEH-PPV PEO LiCF3SO3/Al的薄膜LEC器件,其电致发光峰在570nm左右,通过在MEH-PPV与PEO的混合膜中掺杂不同比例的红光染料DCJTB,随着掺杂比例的增加,器件的发光峰由570nm向红光波段移动,通过控制DCJTB的掺杂比例制备了发光峰在570~650nm连续变化的LEC电致发光器件。对其分析认为从LEC主体发光聚合物MEH-PPV到染料DCJTB间发生了良好的能量传递。     

Effects of a prestrained InGaN interlayer on the emission properties of InGaN/GaN multiple quantum wells in a laser diode structure

The electroluminescence (EL) and photoluminescence (PL) spectra of InGaN/GaN multiple quantum wells (MQWs) with a prestrained InGaN interlayer in a laser diode structure are investigated. When the injection current increases from 5 mA to 50 mA, the blueshift of the EL emission peak is 1 meV for the prestrained sample and 23 meV for a control sample with the conventional structure. Also, the internal quantum efficiency and the EL intensity at the injection current of 20 mA are increased by 71% and 65% respectively by inserting the prestrained InGaN interlayer. The reduced blueshift and the enhanced emission are attributed mainly to the reduced quantum-confined Stark effect (QCSE) in the prestrained sample. Such attributions are supported by the theoretical simulation results, which reveal the smaller piezoelectric field and the enhanced overlap of electron and hole wave functions in the prestrained sample. Therefore, the prestrained InGaN interlayer contributes to strain relaxation in the MQW layer and enhancement of light emission due to the reduction of QCSE.     

ZnS薄膜参数对有机/无机复合发光器件特性的影响

半导体量子点(QDs)具有发光效率高和发光波长可调等特点。采用胶体CdSe QDs作电致发光器件的有源材料,TPD(N,N′-biphenyl-N,N′-bis-(3-methylphenyl)-1,1′-biphenyl-4,4′-diamine)作空穴传输层,ZnS作电子传输层,研究了有机/无机复合发光器件ITO/TPD/CdSe QDs/ZnS/Ag的电致发光特性。TPD和CdSe QDs薄膜采用旋涂方法、ZnS薄膜采用磁控溅射方法沉积,器件表面平整。CdSe QDs的光致发光和电致发光谱峰位波长均位于～580 nm,属于量子点的带边激子发光。我们与以前的ITO/ZnS/CdSe QDs/ZnS/Ag发光器件结构进行了对比,发现新的器件结构的电致发光谱没有观察到QDs表面态的发光,而且新器件的发光强度是ITO/ZnS/CdSe QDs/ZnS/Ag结构的～10倍。发光效率的提高归因于碰撞激发与载流子注入两种发光机制并存的结果：一方面电子经过ZnS 层加速后,碰撞激发CdSe QDs发光;另一方面,空穴从TPD层注入CdSe QDs 与QDs中激发的电子复合发光。我们进一步研究了ZnS电子加速层厚度对发光特性的影响,选择ZnS薄膜的厚度分别是80,120 和160 nm,发现随着ZnS层厚度增大,器件启亮电压升高,EL强度增大,但是击穿电压降低。EL峰位随着ZnS厚度的减小发生明显蓝移,对上述实验现象进行了机理解释。     

Er-doped edge emitting devices with a SiGe waveguide

Er-doped Si edge emitting devices have been fabricated using layer structures grown by molecular beam epitaxy (MBE). Both oxygen and carbon were used as co-dopant in the Er-doped layer. In order to achieve a waveguiding effect, a SiGe layer has been placed next to the Er-doped layer. Intense electroluminescence (EL) at 1.54 μm has been observed from edge emission of such a device at room temperature and even up to 50°C at low excitation power under reverse bias. The value of an activation energy (125 meV) for dominating luminescence intensity quenching, as derived from temperature-dependent EL measurements, was 30 meV lower than that observed from our previous Er/O-doped structures (155 meV), which is likely caused by the band gap narrowing induced by C-doping. The estimated external quantum efficiency of these Er-doped Si edge emitting LEDs is 5×10⁻⁵ at room temperature.     

基于ZnSe的有机-无机异质结电致发光器件

以电子束蒸发的方法制备硒化锌(ZnSe)薄膜，研究了基于ZnSe的有机-无机异质结电致发光器件.在双层器件ITO/ZnSe(50nm)/Alq₃(12nm)/Al中看到了峰值位于578nm的ZnSe电致发光，却很难得到单层器件ITO/ZnSe(50—120nm)/Al的电致发光；在此基础上进一步引入有机空穴传输层(HTL)，通过改变器件的结构，讨论了ZnSe对有机-无机异质结器件ITO/HTL/ZnSe/Alq₃/Al电致发光特性的影响.其电致发光光谱的研究结果证实了ZnSe在器件中的作用：ZnSe既起传输电子的作用，也起到传输空穴的作用，还作为发光层.并对ZnSe的发光机理进行了讨论. 关键词： 硒化锌 有机-无机异质结 电致发光 空穴传输层     

Transport and luminescence phenomena in electroformed silicon nitride-based light emitting diode

Abstract

Hydrogenated amorphous silicon nitride-based heterojunction pin diode was electroformed under sufficiently high forward bias stress leading to its instant nanocrystallization at room temperature. In order to investigate the origin of the accompanying bright visible light emission, current-voltage and electroluminescence (EL) characteristics of the electroformed diode were scanned over temperature. Electrical transport mechanism was analysed in the low, medium and high electric field regimes. Temperature and field dependence of thermal activation energy were discussed. EL characteristics were studied using the spectral energy distribution and the injection current dependence of its intensity. Thermal quenching data of EL and photoluminescence intensities were compared. Finally, the relationship between the electrical transport and luminescence phenomena was attempted to be interpreted within the frame of a self-consistent model.