The reaction of SF5Br with select 1,2-dihaloethylenes

SF₅Br reacts with 1,2-haloethylenes (F, Cl, Br) in distinct ways. In the case of F- and Cl-olefins, the expected addition occurs while with 1,2-dibromoethylene a metathetical reaction yielding in a clean reaction a 1:1 mixture of SF₅CHCHBr and CHBr₂CHBr₂ is found. The mechanism for this reaction is discussed.     

Synthesis of SF5benzene (SF5C6H5) by the SF5halide method

Several significant and useful syntheses of pentafluorothiobenzene (SF₅C₆H₅) from SF₅halides (SF₅X, X=Cl, Br) and cyclohexene or derivatives of cyclohexene are presented.     

Halogen displacement chemistry with silver and alkali metal salts: Preparation of SF5-esters, alcohols, aliphatic olefins, acids and an iodide

It has been found that treatment of SF₅-alkyl halides, especially SF₅(CH₂)₂Br, with silver salts such as CH₃C(O)OAg, p-CH₃C₆H₄SO₃Ag, CF₃SO₃Ag and AgNO₃ provides convenient pathways for preparing the following ester compounds: SF₅CH₂CH₂R (R = CH₃COO, TosO, CF₃SO₃, NO₃), SF₅(CH₂)₃OTos, and SF₅(CF₂)₄(CH₂)₂OAc. Important derivatives prepared from these esters include SF₅(CH₂)₂OH; SF₅(CF₂)₄(CH₂)₂OH. Several alkenes SF₅C(Br)CH₂ and SF₅CH₂(COOCH₃)CCHC(O)OCH₃ are obtained using silver salts. The use of alkali metals salts with SF₅(CH₂)₃Br is studied and yields SF₅(CH₂)₃I; also, a pathway has been developed that extends for SF₅(CH₂)₃₋ the chain by two-carbon atoms and also produces the first SF₅-containing malonic acid.     

The reactions of 3,7-dimethylenebicyclo[3.3.1]nonane, norbornadiene and cis,cis-1,5-cyclooctadiene with pentafluoro-λ-sulfanyl chloride

Radical transannular cyclizations of the non-conjugated dienes, such as 3,7-dimethylenebicyclo[3.3.1]nonane and norbornadiene with SF₅Cl upon UV-irradiation led to the corresponding SF₅-substituted 3,7-noradamantane and nortricyclanes with high yields. Radical reaction of cis,cis-1,5-cyclooctadiene with SF₅Cl led to a product of SF₅Cl addition to one of the diene double bonds either UV-irradiation or triethylborane were used for radical initiation.     

Synthesis and reactions of 2-SF5-butadiene

A stable and storable precursor of 2-SF₅-butadiene, 3-SF₅-3-sulfolene, has been synthesized and its reactivity studied with several olefinic compounds. When SF₅Br is added to sulfolene, 3-bromo-4-SF₅-sulfolane is formed and when reacted further with silver tosylate forms 4-SF₅-2-sulfolene. The 4-SF₅-2-sulfolene undergoes rearrangement with silicic acid to give 3-SF₅-3-sulfolene and when heated forms 2-SF₅-butadiene; in the absence of a dienophile, dimerization does occur. The new 2-SF₅-butadiene is a reactive diene undergoing a Diels-Alder reaction with olefinic sytems such as maleic anhydride, p-naphthoquinone, and methyl acrylate.     

Synthesis of 2-pentafluorosulfanylnaphthalene

A three step synthesis of 2-pentafluorosulfanylnaphthalene is reported. Initial addition of SF₅Cl to benzobarralene was followed by elimination to form 2-pentafluorosulfanylbenzobarralene. Heating of this compound with 3,6-bis-(2-pyridyl)-1,2,4,5-tetrazine led to elimination of the ethylene bridge via a sequence of cycloadditions and retro-cycloadditions to form the title compound.     

New acrylate systems: derivatives of β-SF5-acrylic acid

Addition of pentafluorothio bromide, SF₅Br, to ethyl propiolate results in an 1:1 adduct, SF₅CHCBrC(O)OC₂H₅, and a small amount of a 1:2 adduct. The former is converted by reduction to the corresponding β-SF₅-acrylic ester, SF₅CHCHC(O)OC₂H₅. Treatment of SF₅CH₂CBr(CH₃)C(O)OCH₃ with base produces methyl-β-SF₅-methacrylate, SF₅CHC(CH₃)C(O)OCH₃. The preparation and characterization of these new compounds are described.     

Gas-phase reactions of SF5, SF2, and SOF with O(3 P): Their significance in plasma processing

Reactions of both SF₅ and SF₂ with O(³ P) and molecular oxygen have been studied at 295 K in a gas flow reactor sampled by a mass spectrometer. For reactions with O(³ P), rate coefficients of (2.0±0.5)×10^–11 cm³ s^–1 and (10.8±2.0)×10^–11 cm³ s^–1 were obtained for SF₅ and SF₂ respectively. The rate coefficients for reactions with O₂ are orders of magnitude lower, with an estimated upper limit of 5×10^–16 cm³ s^–1 for both SF₅ and SF₂. Reaction of SF₂ with O(³ P) leads to the production of SOF which then reacts with O(³ P) with a rate coefficient of (7.9±2.0)×10^–11 cm³ s^–1. Both SO and SO₂ are products in the reaction sequence initiated by reaction between SF₂ and O(³ P). Although considerable uncertainty exists for the heat of formation of SOF, it appears that SO arises only from reaction between SOF and O atoms which is also the source of SO₂. These results are discussed in terms of a reaction scheme proposed earlier to explain processes occurring during the plasma etching of Si in SF₆/O₂ plasmas. A comparison between the results obtained here and those reported earlier for reactions of both CF₃ and CF₂ with O and O₂ shows that there is a marked similarity in the free radical chemistry which occurs in SF₆/O₂ and CF₄/O₂ plasmas.     

Pentafluoro-λ-sulfanyl (SF5) perfluoroalkyl iodides-synthesis and reaction with ethylene and tetrafluoroethylene : Crystal structure of SF5(CF2)4CH2CH2I

A series of reactions between SF₅CF₂CF₂I and SF₅(CF₂)₄I with F₂CCF₂ was carried out in an effort to find the most effective methods for chain-extension. Also, for the first time, SF₅(CF₂)₈I and SF₅(CF₂)₁₀I have been prepared and isolated. The reaction conditions for the addition of H₂CCH₂ were also investigated. A determination of the crystal structure of the SF₅(CF₂)₄CH₂CH₂I has been carried out: the crystal system is monoclinic, with space group P2(1)/n and a=23.465(5) Å; b=6.0971(12) Å; c=44.892(9) Å; α=90°; β=99.38(3)°; γ=90°; Z=20.     

Site directed synthesis of mono and disubstituted SF5-polyfluoroalkyl benzenes

A novel method for the preparation of o-, m-, p-SF₅CF₂CFYC₆H₄X (Y = Br, F and X = m-Br, p-Br, Cl, CH₃, CF₃, NO₂, o-NO₂, F, CF₃, CH(CH₃)₂) derivatives was devised by a two-step reaction: SF₅Br-addition to o-, m-, p-CF₂CFC₆H₄X followed by reaction of AgBF₄ with the o-, m-, p-SF₅CF₂CFBrC₆H₄X adducts. Additional studies have been carried out with several derivatives and includes the preparation of SF₅CF₂C(O)C₆H₅, p-CF₃CFBrC₆H₄NO₂, SF₅CF₂CF₂C₆H₃(NO₂)₂, SF₅CF₂CF₂C₆H₃(NH₂)₂, and an SF₅CF₂CF₂-containing polyimide and dye. The complete characterization (IR, NMR, and MS) of these compounds is given.     

The application of novel methodology for the synthesis of o-, m-, and p-(SF5-perfluoroethyl) benzene derivatives

The reaction of o-, m-, and p-F₂CCFC₆H₄X with SF₅Br produces an intermediate adduct, F₅SCF₂CFBrC₆H₄X, which, on treatment with AgBF₄, affords the first useful, high yield preparation of o-, m-, and p-F₅SCF₂CF₂C₆H₄X.     

S 2p photoabsorption of the SF5CF3 molecule: Experiment,theory and comparison with SF6

The S 2p core excitation spectrum of the SF₅CF₃ molecule has been measured in the total ion yield mode. It resembles a lot the analogous spectrum of SF₆, also recorded in this study, displaying intense transitions to the empty molecular orbitals both below and above the S 2p ionization potential (IP) and weak transitions to the Rydberg orbitals. The S 2p photoabsorption spectra of SF₆ and SF₅CF₃ have been calculated using time-dependent density functional theory, whereby the spin–orbit coupling was included for the transitions below the S 2p IP. The agreement between experiment and theory is good for both molecules, which allows us to assign the main S 2p absorption features in SF₅CF₃.     

New aromatic pentafluoro-λ-sulfanyl (SF5) derivatives, m-SF5(CF2)2C6H4X: (X = N3, Br, OC(O)CHCH2, CHCH2)

Preparation of the following new m-SF₅CF₂CF₂C₆H₄X derivatives has been achieved: X=N₃(2), Br(3), OC(O)CHCH₂(4), CHCH₂(5). The compounds were characterized by their respective IR, NMR, mass spectra (MS) and high resolution mass spectrometry (HRMS). An improved yield of SF₅(CF₂)₂C₆H₅ (1) is also reported along with the synthesis of the polyacrylate (6) and polystyrene (7) from their respective monomers.     

Theoretical study of the thermochemistry and the kinetics of the SFxCl (x = 0-5) series

A systematic thermodynamic and kinetic study of the entire SF_xCl (x = 0-5) series has been carried out. High-level quantum chemical composite methods have been employed to derive enthalpy of formation values from calculated atomization and isodesmic energies. The resulting values for the SCl, SFCl, SF₂Cl(C₁), SF₃Cl(C_s), SF₄Cl(C_s) and SF₅Cl molecules are 28.0, −36.0, −64.2, −134.3, −158.2 and −237.1 kcal mol⁻¹. A comparison with previous experimental and theoretical values is presented. Statistical adiabatic channel model/classical trajectory, SACM/CT, calculations of selected complex-forming and recombination reactions of F and Cl atoms with radicals of the series have been performed between 200 and 500 K. The reported rate coefficients span over the normal range of about 6 × 10⁻¹² and 5 × 10⁻¹¹ cm³ molecule⁻¹ s⁻¹ expected for this type of barrierless reactions.     

DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products

Polycrystalline silicon wafers were etched in dc discharges of SF₆. SF_x species were extracted from the discharges and measured with a mass spectrometer. A systematic procedure was used to measure the SF _x ⁺ signals such that they are indicators of events in the discharge close to the sample undergoing etching. The picture that emerges is remarkably simple and shows the relative stability of several SF_x species including SF₆, SF₄, SF₂, and SF which are shown to be extracted from the discharge both in the presence and absence of the silicon sample. When silicon is being etched on the cathode of the discharge cell, the only significant additional products are SiF₄ and S₂F₂. A comparison of blank and sample data for opposite substrate polarities shows that there is only a small cation-assisted etching effect and suggests that ions do not play an important role in the etching of silicon by SF₆ discharges.     

Use of 1,3-dipolar reactions for the preparation of SF5-substituted five-membered ring heterocycles. Pyrroles and thiophenes

In situ-generated unsubstituted, “parent” azomethine and thiocarbonyl ylides are used to prepare a large variety of 3-aryl- and alkyl-substituted, 4-pentafluorosulfanylpyrroles and 3-aryl-substituted, 4-pentafluorosulfanylthiophenes, the latter of which are to our knowledge the first reported SF₅-substituted thiophenes. The 1,3-cycloadditions of these ylides with aryl and alkyl, SF₅-alkynes produce dihydro-pyrroles and thiophenes, which without isolation can then be oxidatively aromatized to the respective pentafluorosulfanylpyrroles and thiophenes in good yield.     

Identification of corona discharge-induced SF6 oxidation mechanisms using SF6/18O2/H2 16O and SF6/16O2/H2 18O gas mixtures

The absolute yields of gaseous oxyfluorides SOF₂, SO₂F₂, and SOF₄ from negative, point-plane corona discharges in pressurized gas mixtures of SF₆ with O₂ and H₂O enriched with¹⁸O₂ and H₂ ¹⁸O have been measured using a gas chromatograph-mass spectrometer. The predominant SF₆ oxidation mechanisms have been revealed from a determination of the relative¹⁸O and¹⁶O isotope content of the observed oxyfluoride by-product. The results are consistent with previously proposed production mechanisms and indicate that SOF₂ and SO₂F₂ derive oxygen predominantly from H₂O and O₂, respectively, in slow, gas-phase reactions involving SF₄, SF₃, and SF₂ that occur outside of the discharge region. The species SOF₄ derives oxygen from both H₂O and O₂ through fast reactions in the active discharge region involving free radicals or ions such as OH and O, with SF₅ and SF₄.     

Electron scattering and dissociative attachment by SF6 and its electrical-discharge by-products

Discrete electron-molecule processes relevant to SF₆ etching plasmas are examined. Absolute, total scattering cross sections for 0.2–12-eV electrons on SF₆, SO₂, SOF₂, SO₂F₂, SOF₄, and SF₄, as well as cross sections for negative-ion formation by attachment of electrons, have been measured. These are used to calculate dissociative-attachment rate coefficients as a function ofE/N for SF₆ by-products in SF₆.     

Real-time monitoring traces of SF6 in near-source ambient air by ion mobility spectrometry

The leakage of sulphur hexafluoride (SF₆) gas threats the global climate changes and personnel safety. Monitoring the concentration of SF₆ in its application places is an industry regulation. In this study, ion mobility spectrometry (IMS) was developed for fast monitoring traces of SF₆ in near-source ambient air. Due to the water is an important part of the natural air and affects most atmospheric measurements, the operating parameters of IMS monitoring SF₆ were optimised for quantitative analysis of SF₆ at different relative humidity (RH). It is discovered two main product ions SF₆^? and SOF₄^? by IMS at different RH. The calibration curves of SF₆ were investigated by its relationship with the peak intensity of SOF₄^– for real application. The time resolution of the measurement was obtained less than 1 s and the limit of detection (LOD) achieved 0.16–0.68 ppm with a data averaging of 30 times. At last, the simulated application of monitoring SF₆ leakage was tested in the fume hood of our lab. The results showed a great potential application prospect of IMS in monitoring SF₆ in the ambient air of its application places.     

Gas-phase combination reactions of SF4 and SF5 with F in plasmas of SF6

Reactions of both SF₄ and SF₅ with F have been studied at 295 K in a gas-flow reactor sampled by a mass spectrometer. The rate coefficient for the combination reaction of F with SF₄ to produce SF₅ was found to increase from (0.9 to 3.0)×10^–12 cm³ s^–1 when the helium bath gas number density was increased from (2 to 26)×10¹⁶ cm^–3. The values obtained here are three orders of magnitude higher than a recent estimate of the high-pressure value based on the modelling of photochemical studies. The experimental results have been compared with RRKM and master equation calculations in which a simplified Gorin model has been used to determine the structure of the transition state. These calculations show that reasonable agreement can be obtained between the experimental data and the calculation if a small (2 KJ/mol) activation energy is assumed. The rate coefficient for the reaction between SF₅ and F to produce SF₆ was found to be independent of helium bath gas number density within the range given above. The value obtained for the rate coefficient was 9×10^–12 cm³ s^–1 with an uncertainty of a factor of 2. This value is close to that of 1×10^–11 cm³ s^–1 computed from the simplified Gorin model and to the value of 1.7×10^–11 cm³ s^–1 deduced from modelling of photochemical experiments.