Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter

A photoplotter, based on a digital micromirror device as real-time reconfigurable mask, is designed to direct-write microstructures in different photosensitive materials. Binary and multilevel elements, such as computer generated holograms with 2, 4 and 8 phase levels and planar optical waveguide structures with tapers and/or long period gratings, are fabricated in a single processing step. Direct parallel write into different photosensitive materials with attractive optical properties is proposed and first results are shown in a commercially available organic-inorganic hybrid material.     

长周期光纤光栅光谱控制及其在EDFA增益平坦中的应用

从理论上分析了长周期光纤光栅光谱的控制方法,并且进行了实验研究.结果表明,选择合适周期的振幅模板,通过控制曝光量和光栅长度,可以实现对长周期光纤光栅的中心波长、峰值和带宽的控制.用此技术制作的四个不同中心波长、峰值和带宽的长周期光纤光栅级联,实现了EDFA在35.6 nm范围内增益波动小于±0.6 dB.     

一种新颖的取样光纤光栅振幅版的研制

提出了一种新颖的用于制作取样光纤光栅的取样振幅版的设计方案,其特点是具有渐变的取样周期和不变的占空比,利用这种振幅版可以简单灵活地制作出反射峰波长间隔不同的取样光栅梳状滤波器,有利于提高取样光栅的制作灵活性并降低成本.对这种方法可能存在的不足也进行了分析.利用制作出的取样光栅,基于全光纤结构实现了具有游标尺式波长调谐机理的可选波长光纤激光器. 关键词： 取样光纤光栅 梳状滤波器 可选波长光纤激光器 振幅版     

一种新颖的取样光纤光栅振幅版的研制

提出了一种新颖的用于制作取样光纤光栅的取样振幅版的设计方案，其特点是具有渐变的取样周期和不变的占空比，利用这种振幅版可以简单灵活地制作出反射峰波长间隔不同的取样光栅梳状滤波器，有利于提高取样光栅的制作灵活性并降低成本.对这种方法可能存在的不足也进行了分析.利用制作出的取样光栅，基于全光纤结构实现了具有游标尺式波长调谐机理的可选波长光纤激光器.     

Inverse symmetric Dammann gratings

Inverse symmetric Dammann grating is a special grating, whose transition points are reflection symmetric about the midpoint with inverse phase offset in one period. It can produce even-numbered or odd-numbered array illumination when the phase modulations are π or a specific value. Numerical solutions optimized by the steepest-descent algorithm for binary phase and multilevel phases with splitting ratio from 1 × 4 to 1 × 14 are given. Fabrication of 1 × 6 array without the zero-order intensity and 1 × 7 array with the zero-order intensity are made from the same amplitude mask. A 6 × 6 output without the crossed zero-orders was achieved by crossing two one-dimensional 1 × 6 inverse symmetric Dammann gratings. This grating may have potential value for practical applications.     

Fabrication of submicron gratings in fused silica by F<Subscript>2</Subscript>-laser ablation

Submicron surface-relief gratings were fabricated on fused silica by F₂-laser ablation with nanosecond duration pulses from a high-resolution 157-nm optical processing system. A 157 nm wavelength projection mask was prepared by ArF-laser ablation to form a 20-μm period grating of equal lines and spaces. A 25-fold demagnification of the mask by a Schwarzschild objective generated gratings of an 830-nm period and a 250 nm modulation depth, as characterized by SEM, AFM and HeNe-laser beam diffraction. Received: 24 April 2002 / Accepted: 25 April 2002 / Published online: 4 December 2002 RID="*" ID="*"Corresponding author. Fax: +49-551/503 599, E-mail: jihle@llg.gwdg.de     

Birefringent azopolymer long period fiber gratings induced by 532 nm polarized laser

Based on the photoinduced birefringence in azo materials, the model of the birefringent long period fiber gratings (BLPFGs) has been proposed and the transmission of such birefringent fiber gratings was further simulated by the coupled mode theory. In order to obtain the optimum condition for making birefringent azopolymer optical fiber (APOF) gratings the photoinduced birefringence of azo dye and methyl methacrylate (MMA) copolymers was systematically studied. After photosensitivity study of azo samples, using Teflon technique, azo dye containing single mode polymer optical fiber (POF) was fabricated. Finally, BLPFGs can be fabricated in azopolymer fiber using polarized 532 nm laser. A 120 μm LPFG with a 50% duty cycle has been successfully written within the core of the fiber with 532 nm laser by an amplitude mask method. Under polarized microphotography, the grating was observed when the optical axis was set at 45° with the direction of the first polarizing lens of the polarization microscope.     

用相位掩模法制作光纤光栅的技术

准分子激光照射相位掩模后,在近场形成周期的条纹分布,利用近场光强对光敏光纤进行曝光,可以在纤芯中写人光栅。对光纤光栅折射率分布进行合理假设,运用耦合模理论计算了光纤光栅的反射率,对其反射率与相关参数的关系进行了讨论,并且分析了用相位掩模技术制造光纤光栅的影响因素,得出要获得窄带宽高反射率光栅需有适当的折射率调制和大的光纤光栅长度的结论。另外还导出了掩模板后表面的近场光强分布和光纤光栅的周期公式。     

振幅掩膜紫外写入的长周期光纤光栅特性研究

振幅掩膜紫外写入的长周期光纤光栅的纤芯折射率分布函数为矩形波。以三层阶跃折射率光波导结构基础，用弱导标量近似和标量耦合模理论分析折射率调制类型为矩形波的长周期光纤光栅的特性。详细地给出耦合模方程近似处理的方法，并说明了其合理性。用数学软件Matlab进行了数值模拟计算，发现折射率调制类为矩形波的光栅传输谱不是由它的各次余弦光栅谱的线性叠加而成的。还研究了外部环境折射率、包层半径、栅占空比等光栅结构参量对矩形折射率调制的光栅传输谱的影响。同时指出了每阶包层模的双谐振峰位置随栅参量的变化规律。刊■刊『_型，刿j1     

光纤光栅带内色散特性的离散时域分析

采用多层介质的离散传输线模型表型光纤光栅响应特性，并利用数字信号处理方法对光纤光栅的相位特性进行了分析，研究了用于密集波分复用窄带滤波的变迹光纤光栅的带内色散特性，表明对称变迹光纤光栅的幅度响应与相位响应之间满足希尔伯特变换关系，幅度响应越接近理想的矩形，带内色散越大。并采用耦合模理论数值计算了对称变迹的光纤光栅的反射相位响应和带内群时延情况，验证了分析结果。     

Changing photo-written Bragg wavelengths of fiber gratings via one phase mask and four mirrors

A phase mask interferometer is developed to photo-write long gratings with arbitrary Bragg wavelengths. In this system, the fiber Bragg grating is photo-written by UV interference stripes of 193 nm reflected from two rotatable mirrors and two fixed mirrors, where the phase mask is not only used as a beam splitter, but also initialized the reference quantity of Bragg wavelength; the fixed mirrors are used for reducing the incident angle; the rotatable mirrors are used for adjusting the corresponding photo-written Bragg wavelength. It is worth noting that the photo-written length is fourfold as high as the length in the Talbot interferometer with the same mirror size.     

Visualization of type II fiber Bragg gratings induced in a birefringent fiber with an elliptical stress cladding

Experimental results on visualization of type II fiber Bragg gratings induced in a birefringent fiber with an elliptical stress cladding are presented. The gratings are recorded by a single pulse of an excimer KrF-laser by means of the phase-mask method. Images of the gratings are obtained in a bright field using contrasting techniques such as differential interference contrast and dark field. It is shown that single-pulse recording forms several type II Bragg gratings in the optical fiber. The spatial profile of these gratings corresponds to the phase mask period. Microcracks due to which type II gratings are induced are localized both on the boundaries between the fiber core and claddings surrounding it and at some distance from them.     

Heterodyne polarimetry for mapping defects in lithography masks

A new optical technique based on the heterodyne polarimetry is developed for fast inspection of uniformity of lithography masks in semiconductor industry. Sub-wavelength periodical structure of a sample acts as a wire-grid polarizer, making both the amplitude and phase of the reflected laser beam dependent on geometrical dimensions and optical properties of the mask pattern. The heterodyne technology based on the cross-polarized two-frequency Zeeman laser is used to simultaneously measure the amplitude and the phase of the reflected laser beam. A two-dimensional map of spatial variations can be obtained via point-by-point scanning of the sample. The technique is applicable not only to exact periodical structures like diffraction gratings, but also to double-periodical patterns consisting of large number of periodically distributed small areas of sub-wavelength gratings. Theoretical background, simulation, and experimental results are presented.     

Selective phase masking to reduce material saturation in holographic data storage systems

Emerging networks and applications require enormous data storage. Holographic techniques promise high-capacity storage, given resolution of a few remaining technical issues. In this paper, we propose a technique to overcome one such issue: mitigation of large magnitude peaks in the stored image that cause material saturation resulting in readout errors. We consider the use of ternary data symbols, with modulation in amplitude and phase, and use a phase mask during the encoding stage to reduce the probability of large peaks arising in the stored Fourier domain image. An appropriate mask is selected from a predefined set of pseudo-random masks by computing the Fourier transform of the raw data array as well as the data array multiplied by each mask. The data array or masked array with the lowest Fourier domain peak values is recorded. On readout, the recorded array is multiplied by the mask used during recording to recover the original data array. Simulations are presented that demonstrate the benefit of this approach, and provide insight into the appropriate number of phase masks to use in high capacity holographic data storage systems.     

Demonstration of a spatial-spectral holographic LIDAR range-Doppler processor

We present a new approach to laser interferometric Doppler and ranging (LIDAR) processing using spatial-spectral holography (SSH). In this approach, broadband optical signals from a random noise or frequency-modulated laser are transmitted and reflected off remote targets. The return signals interfere spatially and spectrally with a local copy of the original transmit signal in an SSH medium, resulting in spectral gratings that have a spectral period inversely proportional to the LIDAR target's range and a position proportional to the target's Doppler (or velocity). These gratings are subsequently read out by a slowly chirped source onto a parallel detector array, and the velocity and range of the targets are inferred. We present the theoretical framework that describes the function of the LIDAR processor, as well as proof-of-concept experimental results.     

大面积10000线/毫米软X射线金属型透射光栅的设计、制作与检测

基于严格的矢量耦合波理论,优化设计了用于13.4nm软X射线干涉光刻的透射型双光栅掩模版. 采用电子束光刻技术,在国内首次成功制作了周期为100nm的大面积金属型透射光栅.光栅面积为1.5mm ×1.5mm,Cr浮雕厚度为50nm,Gap/period为0.6,衬底Si₃N₄厚度为100nm. 此光栅将用于上海光源软X射线干涉光刻实验站.利用其1级衍射光和2级衍射光将可以经济高效地制作周期为50和25nm的大面积周期结构.最后,测量了该光栅对波长为13.4nm 同步辐射光的衍射光强度,并且推算得出该光栅的1级和2级衍射效率分别为4.41%和0.49%,与理论设计值比较符合.实验结果与理论模拟结果的对比表明该光栅侧壁陡直,Gap/period的控制也与设计值符合. 关键词： 软X射线金属型透射光栅 严格耦合波方法 衍射效率 软X射线干涉光刻     

Inscription of high contrast volume Bragg gratings in fused silica with femtosecond laser pulses

We present volume Bragg gratings (VBGs) with a period of 1.075 μm inscribed in fused silica using a femtosecond laser and a phase mask. The femtosecond-inscribed VBGs can be used as reflecting elements with reflectivities of about 80% for a 1-mm-long grating. Due to the non-sinusoidal refractive-index shape, higher order Bragg resonances up to the 7th reflection order could be measured. Therefore, the Bragg gratings also reflect light in the visible-wavelength range.     

Characteristics of filament induced Dammann gratings fabricated using femtosecond laser

To establish optimal processing conditions for direct write fabrication of diffractive optical elements such as gratings, waveguides, lenses, we have investigated the effect of process parameters such as scan speed, numerical aperture (NA) of objective lens, pulse energy on the characteristics of the filament induced inside fused silica with a femtosecond Ti:sapphire laser. The optimum process parameters were used to fabricate a number of Dammann gratings, 6×6 array, having different thicknesses and number of layers. The performance of these optical elements was evaluated by measuring their diffraction efficiencies. All gratings fabricated were strongly birefringent, the zero order spot with high intensity was not separated from the spot array, and the intensity distribution of 6×6 spot array exhibited some degree of nonuniformity. The single layer Dammann grating fabricated with a thickness of 80 μm attained a maximum diffraction efficiency of 38.8%.     

长周期光纤光栅传感器温度和应变灵敏度分析

从耦合模理论出发,分析了长周期光纤光栅的温度和应变灵敏度.结果表明,长周期光纤光栅的温度和应变灵敏度不仅与光栅周期和纤芯参数有关,还强烈依赖于包层参数.通过选择适当的参数,可以制成对温度(或应变)不敏感的应变(或温度)长周期光纤光栅传感器,从而可以解决光纤光栅传感器的温度和应变交叉敏感问题.同时,利用基模与不同包层模耦合时温度和应变灵敏度的不同,可以用一根长周期光纤光栅传感器同时测量温度和应变.