Nanoscale patterning of flat carbon surfaces by scanning probe lithography and electrochemistry

We report the formation of carbon surfaces patterned at the nanoscale with organic functionalities. Thin (<10 nm) films are covalently grafted to the surface via the electrochemical reduction of aryl diazonium salts. Areas of the film are removed with an AFM tip, and a second modifier is electrochemically grafted to the exposed surface. The pattern can incorporate different chemical functionalities, or alternatively topographical patterns can be assembled, where the same functionality is present throughout the pattern.     

Microscale patterning of organic films on carbon surfaces using electrochemistry and soft lithography

We have demonstrated three simple strategies employing poly(dimethylsiloxane) (PDMS) molds for patterning carbon surfaces with two different modifiers in an 18 microm line pattern. The PDMS molds are patterned with microfluidic channels (approximately 22 microm wide and 49 microm deep) and form a reversible, conformal seal to the pyrolyzed photoresist film (PPF) and modified PPF surfaces. Modifiers are electrochemically grafted to the PPF surface by the reduction of aryl diazonium salts and the oxidation of primary amines. For the fill-in patterning approach, the first modifier is electrografted to the PPF surface exposed within the microchannels, and in a second grafting step after removal of the PDMS mold, the second modifier fills in the remaining surface. The selective conversion strategy involves electrografting a continuous film of the modifier to the PPF surface, sealing the PDMS mold to the modified surface and carrying out an irreversible electrochemical reaction of the modifier exposed within the microchannels. In the build-up patterning approach, the PDMS mold is sealed to the modified PPF surface, and a chemical coupling reaction is effected in the microchannels to build up the pattern. The patterns are characterized using SEM, optical microscopy, the formation of condensation figures, and SEM imaging after the assembly of Au nanoparticles.     

Adhesion of nonplanar wrinkled surfaces

Topological patterns on polymer surfaces can significantly alter and control adhesion. In this study, the effect of surface wrinkles on a spherical surface on adhesion has been studied. Surface wrinkling induced by swelling of a crosslinked polydimethylsiloxane elastomer constrained by a stiff, thin surface layer (silicate) is used to produce topographic features of various length scales over a large curved area. By controlling the properties of the stiff layer and the applied strain conditions, surface wrinkles of varying amplitude and wavelength are obtained. The effect of wrinkle morphology on adhesion is quantified, and the results display a transition from enhancement of adhesion to decrease depending upon wrinkle dimensions. A simple phenomenological model is proposed that describes the change of adhesion behavior as a function of wrinkle morphology. Our results provide a critical understanding toward tuning the adhesion behavior of nonplanar surfaces consisting of periodic topographic structures. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2011     

Aspects of prewetting at nonplanar surfaces

We employ Monte Carlo simulations in the grand canonical ensemble (GCEMC) to investigate the impact of nonplanarity of a solid substrate on the locus of the prewetting phase transition. The substrate is modelled as a periodic sequence of furrows of depth D and periodicity sx in the x direction; the furrows are infinitely long in the y direction. Our results indicate that a necessary prerequisite for a prewetting transition is the formation of a(n approximately) planar interface between molecularly thin films and an adjacent (bulk) gas. Thus, in general the prewetting transition is shifted to larger chemical potentials because the formation of a planar film-gas interface is more difficult next to a nonplanar compared with a planar solid surface. However, this shift turns out to be nonmonotonic depending on D on account of subtle packing effects manifested in the deviation of the local density Deltarho(x,Deltaz;D) at the nonplanar solid surface from that at a planar substrate. If D becomes sufficiently large prewetting as a discontinuous phase transition is suppressed because inside the furrow a highly ordered film forms that prevents a planar film-gas interface from forming.     

Three-dimensional colloidal crystal-assisted lithography for two-dimensional patterned arrays

In this paper, we report our recent work on preparing two-dimensional patterned microstructure arrays using three-dimensional colloidal crystals as templates, namely, colloidal crystal-assisted lithography. Two alternative processes are described and involved in colloidal crystal-assisted lithography. One is based upon imprinting the polymer films with three-dimensional silica colloidal crystals, and the other is based upon chemically depositing Ag microstructures on Au substrates covered by polymer colloidal crystals. By varying the experimental conditions in the colloidal crystal-assisted lithography process, we can intentionally control the morphologies of the resulting microstructures. The resultant Ag-coated Au substrates can be used as surface-enhanced Raman scattering substrates, and they would provide an ideal system for the mechanism study of surface-enhanced Raman scattering. We expect that colloidal crystal-assisted lithography will be a versatile approach which can be applied to patterning other materials such as functional molecules, polymers, oxides, and metals.     

Masterless soft lithography: patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces

A novel microreactor-based photomask capable of effecting high resolution, large area patterning of UV/ozone (UVO) treatments of poly(dimethylsiloxane) (PDMS) surfaces is described. This tool forms the basis of two new soft lithographic patterning techniques that significantly extend the design rules of decal transfer lithography (DTL). The first technique, photodefined cohesive mechanical failure, fuses the design rules of photolithography with the contact-based adhesive transfer of PDMS in DTL. In a second powerful variation, the UVO masks described in this work enable a masterless soft lithographic patterning process. This latter method, UVO-patterned adhesive transfer, allows the direct transfer of PDMS-based polymer microstructures from a slab of polymer to silicon and other material surfaces. Both methods exploit the improved process qualities that result from the use of a deuterium discharge lamp to affect the UVO treatment to pattern complex, large area PDMS patterns with limiting feature sizes extending well below 1 microm (> or = 0.3 microm). The use of these structures as resists is demonstrated for the patterning of metal thin films. A time-of-flight secondary ion mass spectroscopy study of the process provides new insights into the mechanisms that contribute to the chemistry responsible for the interfacial adhesion of DTL transfers.     

A new patterning method using photocatalytic lithography and selective atomic layer deposition

We report a new patterning method using photocatalytic lithography of alkylsiloxane self-assembled monolayers and selective atomic layer deposition of thin films. The photocatalytic lithography is based on the fact that the decomposition rate of the alkylsiloxane monolayers in contact with TiO2 is much faster than that with SiO2 under UV irradiation in air. The photocatalytic lithography, using a quartz plate coated with patterned TiO2 thin films, was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. A ZrO2 thin film was selectively deposited onto the monolayer-patterned Si substrate by atomic layer deposition.     

Sub-micrometer patterning of proteins by electric lithography

We report in this paper an electric lithographic (EL) technique to generate protein patterns with sub-micrometer resolution on a poly(N-tBOC-2-aminoethyl methacrylate) surface. In the EL process, an electric potential is applied between metal patterns on a mask and the poly(N-tBOC-2-aminoethyl methacrylate) layer to electrochemically induce the dissociation of the tBOC from the amine functional groups. Proteins are then selectively attached to the amine functional groups in the modified polymer surface areas to form protein patterns. This technique can reliably generate high-resolution protein patterns down to approximately 300 nm on the polymer surface at a high speed with a simple process/system.     

Controlled electrophoretic patterning of polyaniline from a colloidal suspension

We present a method for controlled deposition of polyaniline from colloidal suspensions. Stable suspensions of polyaniline colloids (approximately 115 nm in diameter) were formed by dispersing polyaniline/formic acid solution into acetonitrile. It was demonstrated that the positively charged polyaniline colloids can be electrophoretically deposited onto various substrate materials such as platinum and ITO, forming continuous ultrathin films. We examined the film morphology, as well as the effects of process parameters, such as deposition time, colloid concentration, and applied voltage, on the deposition efficiency. Furthermore, the efficacy of the technique was illustrated by electrophoretically patterning polyaniline thin films onto selected individual micrometer-scale sensing elements within a microfabricated sensor array, and by further demonstrating its sensitivity to gaseous analytes including water and methanol.     

Self-assembly patterning of silica colloidal crystals

We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO2 particle assemblies. This result is a step toward the realization ofnano/micro periodic structures for next-generation photonic devices by a self-assembly process.     

Influence of salt on colloidal lithography of albumin

We investigate the influence of salt on colloidal lithography of biomolecular patterns. Albumin labeled with fluorescein isothiocyanate (FITC) was adsorbed on polyelectrolyte-coated glass substrates covered by negatively charged colloids using fluorescence microscopy. After removing the colloids, a well-defined albumin pattern remains, and we study how the pattern changes upon adding salt to the protein solution. The proposed method is simple and cheap and can be used to create stable one- and two-dimensional biomolecular arrays.     

From superamphiphobic to amphiphilic polymeric surfaces with ordered hierarchical roughness fabricated with colloidal lithography and plasma nanotexturing

Ordered, hierarchical (triple-scale), superhydrophobic, oleophobic, superoleophobic, and amphiphilic surfaces on poly(methyl methacrylate) PMMA polymer substrates are fabricated using polystyrene (PS) microparticle colloidal lithography, followed by oxygen plasma etching-nanotexturing (for amphiphilic surfaces) and optional subsequent fluorocarbon plasma deposition (for amphiphobic surfaces). The PS colloidal microparticles were assembled by spin-coating. After etching/nanotexturing, the PMMA plates are amphiphilic and exhibit hierarchical (triple-scale) roughness with microscale ordered columns, and dual-scale (hundred nano/ten nano meter) nanoscale texture on the particles (top of the column) and on the etched PMMA surface. The spacing, diameter, height, and reentrant profile of the microcolumns are controlled with the etching process. Following the design requirements for superamphiphobic surfaces, we demonstrate enhancement of both hydrophobicity and oleophobicity as a result of hierarchical (triple-scale) and re-entrant topography. After fluorocarbon film deposition, we demonstrate superhydrophobic surfaces (contact angle for water 168°, compared to 110° for a flat surface), as well as superoleophobic surfaces (153° for diiodomethane, compared to 80° for a flat surface).     

A soft lithography method to generate arrays of microstructures onto hydrogel surfaces

Materials bearing microscale patterns on the surface have important biomedical applications such as scaffolds in tissue engineering, drug delivery systems, sensors, and actuators. Hydrogels are an attractive class of materials that has excellent biocompatibility, biodegradability, and tunable mechanical properties that meet the requirements of the aforementioned applications. Generating patterns of intricate microstructures onto the hydrogel surfaces, however, is challenging due to properties such as the crosslinking density, low mechanical strength, adhesion, or chemical incompatibility of hydrogels with various molds. Here, we report the use of a soft lithography technique to successfully transfer arrays of micropillars onto a poly(2‐hydroxyethyl methacrylate)‐based hydrogel. The swelling of the hydrogel in solvents, such as phosphate‐buffered saline, deionized water, 60% ethanol, and absolute ethanol, facilitates the reproducible replication of the pattern. Furthermore, the micropillar pattern promotes the attachment of HeLa cells onto this hydrogel which is not inherently adhesive when unpatterned. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2018 , 56, 1144–1157     

Ag/DNQ-novolac-based nanocomposite films for controllable UV lithography morphological patterning

In this study, the detailed characterisation of silver (Ag) nanoparticles/polymer nanocomposite chemical structure and morphology of grating has been carried out. Scanning electron microscopy measurements show spherical shape of Ag nanoparticles (40–80 nm in diameter) prepared in chloroform by reduction of silver nitrate. In the positive photoresist based on 2-diazo-2H-naphthalen-1-one (DNQ)–novolac, Ag nanoparticles were deposited from organic colloidal solution. The content of nanoparticles in the polymer matrix was varied by increasing the concentration of Ag colloidal solution. Grating was formed by contact lithography. The quantification of Ag nanoparticles and chemical analysis of Ag/DNQ-novolac-based nanocomposite was performed by means of energy dispersive X-ray analyzer and SEM/EDS. In order to study the effect of Ag nanoparticles on the DNQ-novolac-based nanocomposite structure, investigations with Fourier transform infrared spectroscopy were conducted. Ag nanoparticles cause changes associated with substituent-sensitive out-of-plane C–H bending vibrations of aromatic ring. Ag/DNQ-novolac-based nanocomposite film surface morphology and grating topography imaging were performed using atomic force microscopy. Added Ag nanoparticles change the geometrical parameters of the gratings. The split of corrugations was achieved in Ag/DNQ-novolac-patterned films. Their morphology can be tailored by altering the content of Ag nanoparticles.     

Mold design rules for residual layer-free patterning in thermal imprint lithography

We present the mold design rules for assuring residual layer-free patterning in thermal imprint processes. Using simple relations for mass balance, structural stability, and work of adhesion, we derive the conditions with respect to the given single or multigeometrical feature of the mold, which are compared with simple thermal imprint experiments using soft imprint molds. Our analysis could serve as a guideline for designing the optimum mold geometry and selecting mold material in residual layer-free thermal imprint processes.     

Direct patterning of polysilanes and polygermanes using interference lithography

The direct patterning of poly(p‐methoxyphenylmethylsilane) (PMPMS) and poly(p‐methoxyphenylmethylgermane) (PMPMG) by interference lithography is reported. Copyright © 2011 John Wiley & Sons, Ltd.     

Electrokinetic patterning of colloidal particles with optical landscapes

We demonstrate an opto-electrokinetic technique for non-invasive particle manipulation on the surface of a parallel-plate indium tin oxide (ITO) electrode that is biased with an alternating current (AC) signal and illuminated with near-infrared (1064 nm) optical landscapes. This technique can generate strong microfluidic vortices at higher AC frequencies (>100 kHz) and dynamically and rapidly aggregate and pattern particle groups at low frequencies (<100 kHz).     

Patterned assembly of colloidal particles by confined dewetting lithography

We report the assembly of colloidal particles into confined arrangements and patterns on various cleaned and chemically modified solid substrates using a method which we term "confined dewetting lithography" or CDL for short. The experimental setup for CDL is a simple deposition cell where an aqueous suspension of colloidal particles (e.g., polystyrene spheres) is placed between a floating deposition template (i.e., metal microgrid) and the solid substrate. The voids of the deposition template serve as an array of micrometer-sized reservoirs where several hydrodynamic processes are confined. These processes include water evaporation, meniscus formation, convective flow, rupturing, dewetting, and capillary-bridge formation. We discuss the optimal conditions where the CDL has a high efficiency to deposit intricate patterns of colloidal particles using polystyrene spheres (PS; 4.5, 2.0, 1.7, 0.11, 0.064 microm diameter) and square and hexagonal deposition templates as model systems. We find that the optimization conditions of the CDL method, when using submicrometer, sulfate-functionalized PS particles, are primarily dependent on minimizing attractive particle-substrate interactions. The CDL methodology described herein presents a relatively simple and rapid method to assemble virtually any geometric pattern, including more complex patterns assembled using PS particles with different diameters, from aqueous suspensions by choosing suitable conditions and materials.     

Negative dielectrophoretic patterning with colloidal particles and encapsulation into a hydrogel

Microparticle patterns have been fabricated on a nonconductive glass substrate and a conductive indium tin oxide (ITO) substrate using negative dielectrophoresis (n-DEP). The patterned microparticles on the substrate were immobilized by covalent bonding or embedded into polymer sheets or strings. The patterning device consisted of an ITO interdigitated microband array (IDA) electrode as the template, a glass or ITO substrate, and a polyester film (10-microm thickness) as the spacer. A suspension of 2-microm-diameter polystyrene particles was introduced into the device between the upper IDA and the bottom glass or ITO support. An ac electrical signal (typically 20 Vpp, 3 MHz) was then applied to the IDA, resulting in the formation of line patterns with low electric field gradient regions on the bottom support. When the glass substrate was used as the bottom support, the particles aligned under the microband electrodes of the IDA within 5 s because the aligned areas on the support were regions with the weakest electric field; however, for the ITO support, the particles were directed to the regions under the electrode gap and aligned on the support because these regions had the weakest electric field. The width of the particle lines could be roughly controlled by regulating the initial concentration of the suspended particles. The particles forming the line and grid patterns with single-particle widths were immobilized by using a cross-linking reaction between the amino groups on the aligned particles and N-hydroxysuccinimide-activated ester on the glass substrate activated by succinimidyl 4-(p-maleimidophenyl)-butyrate (SMPB). The patterned particles were also embedded in a photoreactive hydrogel polymer. A prepolymer solution of poly(ethylene glycol) diacrylate (PEG-DA) was used as the suspension medium to maintain the particle patterns in the polymerized hydrogel sheet and string following photopolymerization. The hydrogel sheets with particle patterns were fabricated by ultraviolet (UV) irradiation through the ITO-IDA template for 120 s. Hydrogel strings with the aligned particles were fabricated by using a conductive ITO support and a Pt-IDA template. Pt-IDA was used as a template as well as a photomask to block UV transmission. The present procedure affords extremely simple, rapid, and highly reproducible fabrication of particle arrays. The reusability of the template IDA electrode is also a substantial advantage over previous methods.     

Sub-100 nm patterning of supported bilayers by nanoshaving lithography

Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 nm. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of approximately 55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy.