NO dissociation on Cu(111) and Cu2O(111) surfaces: a density functional theory based study

NO dissociation on Cu(111) and Cu(2)O(111) surfaces is investigated using spin-polarized density functional theory. This is to verify the possibility of using Cu-based catalyst for NO dissociation which is the rate limiting step for the NO(x) reduction process. The dissociation of molecularly adsorbed NO on the surface is activated for both cases. However, from the reaction path of the NO-Cu(2)O(111) system, the calculated transition state lies below the reference energy which indicates the possibility of dissociation. For the NO-Cu(111) system, the reaction path shows that NO desorption is more likely to occur. The geometric and electronic structure of the Cu(2)O(111) surface indicates that the surface Cu atoms stabilize themselves with reference to the O atom in the subsurface. The interaction results in modification of the electronic structure of the surface Cu atoms of Cu(2)O(111) which greatly affects the adsorption and dissociation of NO. This phenomenon further explains the obtained differences in the dissociation pathways of NO on the surfaces.     

Adsorption of H2O, OH, and O on CuCl(111) Surface: A Density Functional Theory Study

运用广义梯度密度泛函理论(GGA)的PW91方法结合周期平板模型研究了H2O在CuCl (111)表面上的吸附及分解. 通过构型优化参数的计算和比较发现：对于O和OH,三重穴位吸附较为稳定,吸附能分别为309.5和416.5 kJ/mol;水分子与预吸附氧的表面作用时分解成为OH,并放热180.1 kJ/mol. 同时对于吸附前后的吸附O与表面Cu的伸缩振动频率、态密度以及吸附质与底物的电荷转移情况进行了计算和分析,并给出了可能的分解反应机理.     

First-principles study of Ar adsorptions on the （111） surfaces of Pd, Pt, Cu, and Rh

In the present paper we give a detailed report on the results of our first-principles investigations of Ar adsorptions at the four high symmetry sites on M （111） （M =Pd, Pt, Cu, and Rh） surfaces. Our studies indicate that the most stable adsorption sites of Ar on Pd （111） and Pt （111） surfaces are found to be the fcc-hollow sites. However, for Ar adsorptions on Cu （111） and Rh （111） surfaces, the most favorable site is the on-top site. The density of states （DOS） is analyzed for Ar adsorption on M （111） surfaces, and it is concluded that the adsorption behavior is dominated by the interaction between 3s, 3p orbits of Ar atoms and the d orbit of the base metal atoms.     

NO adsorption and thermal behavior on Pd surfaces. A detailed comparative study

The adsorption and thermal behavior of NO on ‘flat’ Pd(111) and ‘stepped’ Pd(112) surfaces has been investigated by temperature programmed desorption (TPD), high resolution electron energy loss spectroscopy (HREELS), and electron stimulated desorption ion angular distribution (ESDIAD) techniques. NO is shown to molecularly adsorb on both Pd(111) and Pd(112) in the temperature range 100–373 K. NO thermally desorbs predominantly molecularly from Pd(111) near 500 K with an activation energy and pre-exponential factor of desorption which strongly depend on the initial NO surface coverage. In contrast, NO decomposes substantially on Pd(112) upon heating, with relatively large amounts of N₂ and N₂O desorbing near 500 K, in addition to NO. The fractional amount of NO dissociation on Pd(112) during heating is observed to be a strong function of the initial NO surface coverage. HREELS results indicate that the thermal dissociation of NO on both Pd(111) and Pd(112) occurs upon annealing to 490 K, forming surface-bound O on both surfaces. Evidence for the formation of sub-surface O via NO thermal dissociation is found only on Pd(112), and is verified by dissociative O₂ adsorption experiments. Both surface-bound O and sub-surface O dissolve into the Pd bulk upon annealing of both surfaces to 550 K. HREELS and ESDIAD data consistently indicate that NO preferentially adsorbs on the (111) terrace sites of Pd(112) at low coverages, filling the (001) step sites only at high coverage. This result was verified for adsorption temperatures in the range 100–373 K. In addition, the thermal dissociation of NO on Pd(112) is most prevalent at low coverages, where only terrace sites are occupied by NO. Thus, by direct comparison to NO/Pd(111), this study shows that the presence of steps on the Pd(112) surface enhances the thermal dissociation of NO, but that adsorption at the step sites is not the criterion for this decomposition.     

Study of chemisorption on copper low-index and stepped surfaces

Adsorption of CHCl₃, O₂, and hydrocarbons has been studied on Cu(111) and stepped surfaces using LEED, AES, and UPS at room temperature. We find that ordered Cl overlayers form upon Cu(111), Cu[3(111) × (100)], and Cu[5(111) × (100)] surfaces upon exposure to CHCl₃. Exposure to O₂ results in rearrangement of the Cu[5(111) × (100)] surface to hill-and-valley regions with large (111) areas, whereas Cu[2(111) × (100)] is stable for the same exposure. The photoemission spectra show new energy levels due to C1 above and below the Cu d band region and a small splitting of the halogen p orbitals. Effects consistent with interaction with the Cu d band are observed. Similar effects are observed with oxygen adsorption. The initial rate of Cl or O₂ chemisorption as measured by photoemission is proportional to the density of steps on these surfaces. Apparently, structural effects play an important role in chemisorption on metals (such as copper) with low density of states at the Fermi energy.     

H_2在Ni,Pd与Cu表面的解离吸附

用EAM方法(embeded-atommethod)研究H_2在Ni,Pd与Cu的(100),(110)与(111)面上的解离吸附.首先通过拟合单个H原子在Ni,Pd与Cu不同表面上的吸附能和吸附键长,得到H与这些金属表面相互作用的EAM势,然后计算H_2在这些表面上以不同方式进行解离吸附时的活化势垒E_a,吸附热q_(ad)与吸附键长R.并给出H_2在(110)面上解离吸附的势能曲线.计算结果表明H_2的解离吸附与衬底种类、衬底表面取向及解离方式有关.H_2在Ni表面上解离时活化势垒很低,而在Cu表面解 关键词：     

A first principle study on the magnetic properties of Cu2O surfaces

Spin-polarized density functional theory calculations were performed to investigate the magnetism of bulk and Cu₂O surfaces. It is found that bulk Cu₂O, Cu/O-terminated Cu₂O(111) and (110) surfaces have no magnetic moment, while, the O-terminated Cu₂O(100) and polar O-terminated Cu₂O(111) surfaces have magnetism. For low index surfaces with cation and anion vacancy, we only found that the Cu vacancy on the Cu₂O(110) Cu/O-terminated surface can induce magnetism. For atomic and molecular oxygen adsorption on the low index surfaces, we found that atomic and molecular oxygen adsorption on the Cu-terminated Cu₂O(110) surface is much stronger than on the Cu/O-terminated Cu₂O(111) and Cu-terminated Cu₂O(100) surfaces. More interesting, O and O₂ adsorption on the surface of Cu/O terminated Cu₂O(111) and O₂ adsorption on the Cu-terminated Cu₂O(110) surface can induce weak ferromagnetism. In addition, we analysis origin of Cu₂O surfaces with magnetism from density of state, the surface ferromagnetism possibly due to the increased 2p–3d hybridization of surface Cu and O atoms. This is radically different from other systems previously known to exhibit point defect ferromagnetism, warranting a closer look at the phenomenon.     

A density functional theory study on the adsorption of CO and O₂ on Cu-terminated Cu₂O（111） surface

The adsorptions of CO and O2 molecules individually on the stoichiometric Cu-terminated Cu2O(111) surface are investigated by first-principles calculations on the basis of the density functional theory.The calculated results indicate that the CO molecule preferably coordinates to the Cu2 site through its C atom with an adsorption energy of -1.69 eV,whereas the O2 molecule is most stably adsorbed in a tilt type with one O atom coordinating to the Cu2 site and the other O atom coordinating to the Cu1 site,and has an adsorption energy of -1.97 eV.From the analysis of density of states,it is observed that Cu 3d transfers electrons to 2π orbital of the CO molecule and the highest occupied 5σ orbital of the CO molecule transfers electrons to the substrate.The sharp band of Cu 4s is delocalized when compared to that before the CO molecule adsorption,and overlaps substantially with bands of the adsorbed CO molecule.There is a broadening of the 2π orbital of the O2 molecule because of its overlapping with the Cu 3d orbital,indicating that strong 3d-2π interactions are involved in the chemisorption of the O2 molecule on the surface.     

Quantum-resolved angular distributions of neutral products in electron-stimulated processes: NO desorption from and NO2 dissociation on Pt(111)

We present the first quantum-resolved angular distributions of ground-state neutral molecules which are products of electron stimulated desorption (ESD) and electron stimulated dissociation. Laser resonance-enhanced multiphoton ionization (REMPI) and two-dimensional imaging have been used to obtain angular distributions of NO desorbed by 350 eV electrons from O-precovered Pt(111). In a similar fashion, we have measured angular distributions for the NO product of NO₂ dissociation on clean and O-precovered Pt(111). In all cases, we observe narrow widths which are roughly the same as ion distributions determined by ESDIAD (ESD ion angular distributions). The angular distribution for NO ESD is sharply peaked (7° half-width at half maximum) along the surface normal for an O coverage (θ_o) of 0.25 monolayer (ML). The angular distribution of the NO product from dissociation of side-bonded NO₂ on clean Pt(111) is unexpectedly peaked about the surface normal, and thus does not reflect dissociative forces parallel to the surface or the 25° off-normal ground-state bond direction. On O-precovered Pt(111), where NO₂ is N-bonded, 6° off-normal beams are observed. When the substrate is precovered with θ_o > 0.5 ML, local disorder creates asymmetric site geometries which result in multiple peaked angular distributions with both normal and off-normal (9–10°) components; similar effects for NO ESD are observed. In all these studies, the NO angular distributions are invariant to rotational or vibrational state. This implies that the lateral translational degrees of freedom are essentially de-coupled from the internal modes of the molecule. The results are discussed in terms of desorption mechanisms, dissociative forces, site geometries, and disordered coadsorbate layers.     

Cu 表面性质的第一性原理分析

采用第一性原理赝势平面波方法, 计算并详细分析了面心立方Cu晶体及其 (100), (110) 和 (111) 这3个低指数表面的原子结构、 表面能量及表面电子态密度. 表面能的计算结果表明, Cu (111) 表面的结构稳定性最好, Cu (100) 表面次之, Cu (110)表面的结构稳定性最差. 3个表面的表面原子弛豫量随着层数的增加而逐渐减弱. Cu (110) 表面的最表层原子相对收缩最大, Cu (100)表面次之, Cu (111) 表面的最表层原子相对收缩最小. 表面原子弛豫不仅引起表面几何结构的变化, 而且使表面层原子的电子态密度峰形相对晶体内部发生变化, 这是表面能产生的主要原因, 而Cu (110)表面相对于Cu (100)与Cu (111)表面具有高表面活性的主要原因则源于其表面层原子电子态密度在高能级处的波峰相对晶体内部显著的升高. 关键词： Cu 晶体 表面结构 表面能 态密度     

Exploring the molecular mechanisms of reactions at surfaces

The study of the molecular mechanism of chemical reactions occurring at solid surfaces is of primary importance to understand heterogeneous catalysis from a microscopic point of view. The present paper reviews the state of the art methods of electronic structure and the surface models currently used in this type of studies by making use of three different examples. Those are the decomposition of azomethane on Pt(111), the study of the different selectivity of Cu(111) and Ag(111) towards ethene partial oxidation and the comparative study of NO dissociation on Rh(111) and bimetallic RhCu(111) surfaces. These examples illustrate the power of the electronic structure computational approaches to predict the structure and stability of different intermediates and to unravel the molecular mechanism of these surface reactions.     

Molecular and atomic adsorption states of oxygen on Cu(111) at 100–300 K

Adsorption states of oxygen on Cu(111) at 100–300 K were investigated by means of HREELS. Two molecular species were characterized by different OO stretching frequencies (v(OO)) at 610 cm⁻¹ and 820–870 cm⁻¹, which are assigned to the peroxo-like species (O²⁻₂) adsorbed in a bridged form and the one in a bidentate form bound on an atop site, respectively. The bridged peroxo species is preferred at the low coverage and the atop peroxo species becomes dominant at the higher coverage. In addition to the peaks due to the molecular oxygen, a peak assigned to v(CuO) of atomic oxygen was observed at 370 cm⁻¹ at the high coverage. The frequency of this mode was higher than the frequency reported for Cu(111) exposed to oxygen above 300 K, indicating that the adsorption state of atomic oxygen formed at 100 K is different from that above 300 K. The v(OO) modes became faint after annealing to 170 K because of O₂ dissociation. The v(CuO) mode of the atomic oxygen formed at 100 K remained up to 230 K and disappeared after annealing to 300 K. No desorption of O₂ was detected on annealing to 300 K. It was also found that vibrational spectra for adsorbed NH₃ are influenced by the adsorption states of atomic oxygen on Cu(111).     

Al吸附在Pt,Ir和Au的(111)面的低覆盖度研究

应用密度泛函理论,系统研究了Al原子在Pt(111),Ir(111)和Au(111)表面的桥位、顶位、三重面心立方(fcc)洞位和六角密排(hcp)洞位这四个典型位置的吸附情况. 主要计算了三吸附体系的几何结构、平均结合能和差分电荷密度,并系统讨论了相关原子的密立根电荷布居数和投影态密度.研究发现,对于Pt(111)和Ir(111)表面,Al原子在hcp洞位最稳定,但是对于Au(111)表面,Al原子在fcc洞位最稳定. 关键词： 吸附 密度泛函理论 结合能 电子结构     

Classical trajectory study of the dissociation of hydrogen on copper single crystals: II. Cu(100) and Cu(110)

We report a second series of classical trajectory calculations for the activated dissociation of hydrogen on copper single crystals. We have modified the empirical interaction potential surface used previously by raising the energy requirements for dissociation, thereby lowering the dissociation probabilities and bringing their magnitudes in line with experiment. Dissociation probabilities on both a Cu(100) and Cu(110) surface for H₂ and D₂ are computed. The results, while in reasonable magnitude agreement with experiment, still do not fit the experimental translational energy dependence well and do not predict the correct isotope effect for Cu(110). A detailed comparison of the differences between the ground and first vibrationally excited states for the (100) and (110) surfaces suggest that within the approximations of this model calculation, the potential surfaces employed have underestimated the effects of surface roughness in determining the incident energy and angle dependence of the dissociation probabilities.     

Oxygen dissociation at Pt steps

Using scanning tunneling microscopy, thermal energy atom scattering, and density functional theory we have characterized O (2) dissociation on Pt(111) stepped surfaces at the atomic scale. The most reactive site is at the top of the Pt steps. In both the molecular precursor state (MPS) and the transition state (TS), the O (2) has its axis aligned parallel to the step edge. Controlled step decoration with Ag monatomic chains was used to locally tune the reactivity of Pt step sites. The enhanced reactivity at the Pt step sites is not caused by a decrease of the local dissociation barriers from the MPS but is related to a stabilization of both the MPS and TS.     

Role of the 2D surface state continuum and projected band gap in charge transfer in front of a Cu(111) surface

Electron capture by Li+ and H projectiles in grazing scattering from Cu(111) and Cu(110) surfaces is studied experimentally and theoretically. Whereas data for Cu(110) can be described by established theoretical methods treating resonant charge transfer with a free-electron metal, data for Cu(111) show pronounced deviations from this approach. We interpret our observations by the effect of the projected L-band gap of the Cu(111) surface. In particular, the quantum states of reduced dimension (2D surface state continuum) play a dominant role in electron transfer.     

Cu台阶面多层弛豫的第一性原理研究

采用基于密度泛函理论的第一性原理赝势平面波方法对Cu(311),(511),(331)和(221)四个高指数台阶表面的弛豫结构和弛豫后表面各层的电子特性进行了系统研究.发现四个台阶面的层间弛豫规律依次为-+-…,--+-…,--+-…和---+-…,与其平台-阶梯n(hkl)×(uvw)的表示法2(100)×(111),3(100)×(111),3(111)×(111)和4(111)×(111)中的原子排数n相关,即     

First principles calculations of relationship between the Cu surface states and relaxations

In this paper the relationship between the surface relaxations and the electron density distributions of surface states of Cu(100), Cu(110), and Cu(111) surfaces is obtained by first-principles calculations. The calculations indicate that relaxations mainly occur in the layers at which the surface states electrons are localized, and the magnitudes of the multilayer relaxations correspond to the difference of electron density of surface states between adjacent layers. The larger the interlayer relaxation is, the larger the difference of electron density of surface states between two layers is.     

Ar adsorptions on Al (111) and Ir (111) surfaces: a first-principles study

We investigate the adsorptions of Ar on Al (111) and Ir (111) surfaces at the four high symmetry sites, i.e., top, bridge, fcc- and hcp-hollow sites at the coverage of 0.25 monolayer (ML) using the density functional theory within the generalized gradient approximation of Perdew, Burke and Ernzerhof functions. The geometric structures, the binding energies, the electronic properties of argon atoms adsorbed on Al (111) and Ir (111) surfaces, the difference in electron density between on the Al (111) surface and on the Ir (111) surface and the total density of states are calculated. Our studies indicate that the most stable adsorption site of Ar on the Al (111) surface is found to be the fcc-hollow site for the (2 × 2) structure. The corresponding binding energy of an argon atom at this site is 0.538 eV/Ar atom at a coverage of 0.25 ML. For the Ar adsorption on Ir (111) surface at the same coverage, the most favourable site is the hcp-hollow site, with a corresponding binding energy of 0.493 eV. The total density of states (TDOS) is analysed for Ar adsorption on Al (111) surface and it is concluded that the adsorption behaviour is dominated by the interaction between 3s, 3p orbits of Ar atom and the 3p orbit of the base Al metal and the formation of sp hybrid orbital. For Ar adsorption on Ir (111) surface, the conclusion is that the main interaction in the process of Ar adsorption on Ir (111) surface comes from the 3s and 3p orbits of argon atom and 5d orbit of Ir atom.     

Catalytic active sites on sputtered metal interfaces

By the use of Hartree-Fock-Slater (HFS) cluster calculations, the symmetry of adatom induced electronic states and their possible role in catalytic processes have been investigated. For iron adsorbed on a close packed iron single crystal surface we find an increased density of occupied “π” as well as “σ” states at the Fermi level. Simple group theoretical arguments give that the “π” states, which represent the highest occupied molecular orbitais (HOMO) will mix with the lowest unoccupied molecular orbital (LUMO) of CO, 2π¹, assuming CO bound normal to the surface in a terminal position with respect to the adatom. Such a system with an adsorbed atom on a flat surface is a model for a sputtered surface and these “π” states may thus explain the experimentally observed high rate of dissociation for CO on sputtered iron surfaces. A comparative study shows that no such increased density of states (DOS) is found when the Fe adatom is replaced by potassium. Finally for Cu adsorbed on Cu(111) only 4s derived “σ” states are introduced close to the Fermi level.