温度对纳米ZnO膜电学光学性质影响的研究

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ZnO:Fe薄膜制备、光学与电学性质研究

用双靶磁控溅射设备制备了ZnO:Fe薄膜。分析了铁靶溅射功率对薄膜的光学及电学性质的影响。X射线衍射(XRD)和原子力显微镜(AFM)图像表明:ZnO:Fe薄膜为六角纤锌矿结构,且具有非常好的沿垂直于衬底的c轴择优取向。当铁靶功率小于250W时,沉积速率随铁靶功率的增加而增加。随着铁靶功率的增加,透射光谱的吸收边有微弱蓝移,透过率在可见光区超过75%。掺铁后薄膜的电阻率只有10-2Ω.cm,远小于纯氧化锌的电阻率。通过实验得到ZnO:Fe薄膜的最佳制备条件。     

短脉冲激光打靶用溅射防护薄膜的光学性质

针对短脉冲激光打靶用溅射防护聚合物薄膜做了初步研究。研究了氟化乙丙共聚物(FEP)、全氟烷氧基共聚物和乙烯-四氟乙烯共聚物三种厚度均为25 m的聚合物薄膜的透过率,结果表明FEP薄膜在355 nm处光透过率达93%,有望用于激光打靶的溅射防护。进一步对FEP聚合物薄膜的波前畸变、激光损伤阈值进行了研究,结果表明80 mm的聚合物薄膜在632.8 nm处的透射波前畸变的峰谷值（PV值）为波长的1.006倍; 在采用输出波长355 nm,脉冲宽度9.3 ns的Nd:YAG激光为照射光源波长处,薄膜零损伤概率时的最高激光能量密度为10.35 J/cm2, 100%损伤概率时的最低激光能量密度为11.48 J/cm2。     

短脉冲激光打靶用溅射防护薄膜的光学性质

针对短脉冲激光打靶用溅射防护聚合物薄膜做了初步研究。研究了氟化乙丙共聚物(FEP)、全氟烷氧基共聚物和乙烯-四氟乙烯共聚物三种厚度均为25μm的聚合物薄膜的透过率,结果表明FEP薄膜在355nm处光透过率达93%,有望用于激光打靶的溅射防护。进一步对FEP聚合物薄膜的波前畸变、激光损伤阈值进行了研究,结果表明φ80mm的聚合物薄膜在632.8nm处的透射波前畸变的峰谷值(PV值)为波长的1.006倍;在采用输出波长355nm,脉冲宽度9.3ns的Nd:YAG激光为照射光源波长处,薄膜零损伤概率时的最高激光能量密度为10.35J/cm2,100%损伤概率时的最低激光能量密度为11.48J/cm2。     

衬底温度和硼掺杂对p型氢化微晶硅薄膜结构和电学特性的影响

以B₂H₆为掺杂剂,采用射频等离子体增强化学气相沉积技术在玻璃衬底上制备p型氢化微晶硅薄膜.研究了衬底温度和硼烷掺杂比对薄膜的微结构和暗电导率的影响.结果表明：在较高的衬底温度下很低的硼烷掺杂比即可导致薄膜非晶化;在实验范围内,随着衬底温度升高薄膜的晶化率单调下降,暗电导率先缓慢增加然后迅速下降,变化趋势与硼烷掺杂比的影响极为相似.最后着重讨论了p型氢化微晶硅薄膜的生长机理. 关键词： p型氢化微晶硅薄膜 衬底温度 晶化率 电导率     

柔性衬底上ALD法低温制备的ZnO薄膜的光学和电学特性(英文)

以二乙基锌和水分别作为金属前驱体和反应物,利用原子层沉积方法(ALD)在柔性衬底上生长ZnO薄膜,讨论了生长温度对薄膜特性的影响。用AFM、XRD和HALL等对薄膜的表面形貌、晶体结构和电学性质进行表征,并且用PL光谱表征了其光学特性。实验结果表明,随着生长温度(低温下)的升高,薄膜的晶体质量和光学特性得到改善。当生长温度为170℃时,薄膜呈现良好的c轴择优取向,且具有较高的电子浓度(5.62×1019cm-3)和电子迁移率(28.2 cm2·V-1·s-1)。     

多孔氧化铝薄膜的制备和光学特性研究

采用阳极氧化法制备了二维有序纳米孔氧化铝膜.研究了工艺参数对多孔薄膜有序性、孔径、膜厚度等的影响，测量了多孔氧化铝有序膜的光透过、光吸收和光发射等光学特性.结果表明，在波长360 nm附近多孔氧化铝有序膜的光透过谱线和光吸收谱线发生突变，波长大于360 nm时，光透过增强；波长小于360 nm时，光吸收增强.多孔氧化铝有序膜的光致发光强度和峰位与激发光波长有关，光致发光谱范围在340~600 nm.     

衬底温度对ZnO薄膜晶体结构和电学性质的影响研究

由GDARE法在较低温度下,以玻璃为衬底沉积ZnO薄膜,用SEM、AFM、XRD及交流阻抗谱测量等方法研究了衬底温度对薄膜表面形貌、晶体结构以及晶体导电性质的影响.研究结果表明,室温下沉积的薄膜为颗粒致密的非晶相结构,晶界电阻较小.在衬底温度大于50℃时,由GDARE法可沉积出具有一定c轴取向的ZnO薄膜.随衬底温度的升高,薄膜沿c轴择优生长趋势明显增强,内应力减小,晶界效应增强,晶界电阻增大.衬底温度大于100℃后,沿c轴的取向度增强趋势减缓.在衬底温度180～200℃时,可获得高度c轴取向的ZnO超细微粒薄膜,其结晶性能良好,表面光滑,平均粒径30～40nm,晶粒尺寸均匀,晶形规则,沿c轴的内应力很小,取向度达0.965.此时薄膜的晶界效应增强,晶界电阻明显大于室温下沉积的薄膜,而晶粒电阻所占比例很小,总阻抗以晶界电阻为主.同时还讨论了衬底温度对薄膜晶体结构及晶界特性的影响机理.     

薄膜材料光学参量的测量

介绍了薄膜材料光学参量测量实验的原理和方法以及对GaN膜的测量结果。     

微晶硅薄膜沉积过程中的等离子体光学与电学特性研究

采用空间分辨光发射谱和傅里叶变换功率阻抗分析仪研究了衬底偏压和辉光功率对微晶硅薄膜沉积过程中的等离子体光学与电学特性的影响.研究表明：在交流偏压(AC)、悬浮(floating)、负直流加交流(-DC＋AC)偏压下,Hα发射强度空间分布规律相似,平均鞘层长度相等;正直流加交流(＋DC＋AC)偏压和接地(grounded)时Hα发射强度显著增强,并存在双峰(double layers)现象.增大功率,Hα发射强度也随着增大,并在17W与22W之间产生跳变.电学测试发现功率增大,等离子体电阻降低,电抗降低,电 关键词： 等离子体 光发射谱 衬底偏压 辉光功率     

Influence of composition on electrical and optical properties of new chalcogenide thin films from Ge-Se-Tl system

Bulk Ge₂₀Se_80−xTl_x (x ranging from 0 to 15 at%) chalcogenide glasses were prepared by conventional melt quenching technique. Thin films of these compositions were prepared by thermal evaporation, on glass and Si wafer substrates at a base pressure of 10⁻⁶ Torr. X-ray diffraction studies were performed to investigate the structure of the thin films. The absence of any sharp peaks in the X-ray diffractogram confirms that the films are amorphous in nature. The optical constants (absorption coefficient, optical band gap, extinction coefficient and refractive index) of Ge₂₀Se_80−xTl_x thin films are determined by absorption and reflectance measurements in a wavelength range of 400-900 nm. In order to determine the optical gap, the absorption spectra of films with different Tl contents were analyzed. The absorption data revealed the existence of allowed indirect transitions. The optical band gap showed a sharp decrease from 2.06 to 1.79 eV as the Tl content increased from 0% to 15%. It has been found that the values of absorption coefficient and refractive index increase while the extinction coefficient decreases with increase in Tl content in the Ge-Se system. These results are interpreted in terms of the change in concentration of localized states due to the shift in Fermi level. DC electrical conductivity of Ge₂₀Se_80−xTl_x thin films was carried out in a temperature range 293-393 K. The electrical activation energy of these films was determined by investigating the temperature dependence of dc conductivity. A decrease in the electrical activation energy from 0.91 to 0.55 eV was observed as the Tl content was increased up to 15 at% in Ge₂₀Se_80−xTl_x system. On the basis of pre-exponential factor, it is suggested that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges.     

The optical properties of thin erbium films

The effective dielectric constant, ε′₂, of very thin films of erbium on sodium chloride substrates was determined from measurements of normal incidence reflectance and transmittance in the visible spectrum. ε′₂ showed a maximum which moved to longer wavelengths as the film thickness increased. Electron microscopy revealed that the film islands grew flatter and more irregular with thickness. The shape factor of the islands, F, was calculated by a modified Maxwell-Garnett method and became smaller as the film thickness increased.     

衬底温度对反应磁控溅射W掺杂ZnO薄膜的微观结构及光电性能的影响

采用直流脉冲反应磁控溅射方法生长W掺杂ZnO（WZO）透明导电氧化物薄膜并研究了衬底温度对薄膜微观结构、组分、表面形貌以及光电性能的影响.实验结果表明,WZO薄膜具有良好的（002）晶面择优取向,且适当的衬底温度是制备优质WZO薄膜的关键因素.随着衬底温度升高,薄膜表面粗糙度先增大后减小;衬底温度较高时,薄膜的结构致密,结晶质量好,电子迁移率高.当衬底温度为325℃时,WZO薄膜获得最低电阻率9.25×10^-3Ω·cm,方块电阻为56.24Ω/□,迁移率为11.8 cm² V^-1·s^-1,其在可见光及近红外区域（400—1500 nm）范围的平均透过率达到85.7%.     

Electrical and optical properties of Sb-doped ZnO thin films synthesized by sol–gel method

Sb-doped ZnO thin films with different values of Sb content （from 0 to 1.1 at.%） are deposited by the sol-gel dip- coating method under different sol concentrations. The effects of Sb-doping content, sol concentration, and annealing ambient on the structural, optical, and electrical properties of ZnO films are investigated. The results of the X-ray diffraction and ultraviolet-visible spectroscopy （UV-VIS） spectrophotometer indicate that each of all the films retains the wurtzite ZnO structure and possesses a preferred orientation along the c axis, with high transmittance （〉 90%） in the visible range. The Hall effect measurements show that the vacuum annealed thin films synthesized in the sol concentration of 0.75 mol/L each have an adjustable n-type electrical conductivity by varying Sb-doping density, and the photoluminescence （PL） spectra revealed that the defect emission （around 450 nm） is predominant. However, the thin films prepared by the sol with a concentration of 0.25 mol/L, despite their poor conductivity, have priority in ultraviolet emission, and the PL peak position shows first a blue-shift and then a red-shift with the increase of the Sb doping content.     

Third-order nonlinear optical properties of thin sputtered gold films

Au films of thickness ranging between 5 and 52 nm were prepared by sputtering on quartz substrates and their third-order nonlinear optical response was investigated by Optical Kerr effect (OKE) and Z-scan techniques using 532 nm, 35 ps laser pulses. All prepared films were characterized by XRD, AFM and UV-VIS-NIR spectrophotometry while their third-order susceptibility χ⁽³⁾ was measured and found to be of the order of 10⁻⁹ esu. The real and imaginary parts of the third-order susceptibility were found in very good agreement with experimental results and theoretical predictions reported by Smith et al. [D.D. Smith, Y. Yoon, R.W. Boyd, Y.K. Cambell, L.A. Baker, R.M. Crooks, M. George, J. Appl. Phys. 86 (1999) 6200].     

衬底温度对HfO_2薄膜结构和光学性能的影响

采用直流磁控反应溅射法,分别在室温,200,300,400和500℃下制备了HfO2薄膜。利用X射线衍射(XRD)、椭圆偏振光谱(SE)和紫外可见光谱(UVvis)研究了衬底温度对HfO2薄膜的晶体结构和光学性能的影响。XRD研究结果显示:不同衬底温度下制备的HfO2薄膜均为单斜多晶结构;随衬底温度的升高,(-111)面择优生长更加明显,薄膜中晶粒尺寸增大。SE和UVvis研究结果表明:随衬底温度升高,薄膜折射率增加,光学带隙变小;制备的HfO2薄膜在250～850nm范围内有良好的透过性能,透过率在80%以上。     

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temper- ature. The as-deposited films are annealed at different temperatures from 400 C to 800 C in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400 C to 800 C. The band gap of the as-deposited ZnO:In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400 C. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400 C to 800 C.     

纳米ZnO和ZnO-SiO2复合薄膜的光学性质研究

通过溶胶凝胶(sol-gel)法分别在玻璃衬底上制备了ZnO纳米薄膜和ZnO-SiO₂纳米复合薄膜,并利用紫外-可见光分光光度计对薄膜的光学性能进行了分析.可见光-紫外透射谱显示,随着ZnO溶胶浓度从0.7mol/L降低到0.006mol/L,制备的ZnO薄膜从只出现一个380nm(对应的光学禁带宽度为3.27eV)左右的吸收边到在380和320nm(对应的光学禁带宽度为3.76eV)左右各出现一个吸收边,并且随着ZnO溶胶浓度的降低,在380—320nm波段内的透过率明显提高.而Z 关键词： 纳米ZnO 2复合薄膜')" href="#">ZnO-SiO₂复合薄膜 溶胶凝胶法 透射率     

Al掺杂原子分数及退火温度对ZnO薄膜光学特性的影响

采用溶胶凝胶法在（0001）Al2O3衬底上制备了不同掺杂原子分数的ZnO:Al薄膜,在Ar气氛中进行了600～950 ℃不同温度的退火处理,研究了掺杂原子分数和退火温度对薄膜光致发光、光吸收和透射的影响。结果显示,薄膜的紫外峰强度随掺杂原子分数和退火温度的提高而增强,与缺陷相关的绿光强度却随着掺杂原子分数和退火温度的提高而降低;薄膜光学带隙随掺杂原子分数的提高从3.21 eV增大到3.25 eV;光吸收在可见光区随着退火温度的升高而增大,在紫外区却随着退火温度的升高而减小,透射与吸收的变化规律相反;薄膜吸收边随退火温度的升高出现轻微的红移。