反射式负电子亲和势GaN光电阴极量子效率衰减机理研究

针对反射式负电子亲和势(NEA) GaN光电阴极量子效率的衰减以及不同波段对应量子效率衰减速度的不同,参照国外给出的NEA GaN光电阴极在反射模式下量子效率曲线随时间的衰减变化情况,利用GaN光电阴极铯氧激活后的表面模型［GaN(Mg):Cs］:O-Cs,结合量子效率衰减过程中表面势垒的变化,研究了反射式NEA GaN光电阴极量子效率的衰减机理. 有效偶极子数量的减小是造成量子效率降低的根本原因,表面I,II势垒形状的变化造成了不同波段对应的量子效率下降速度的不同. 关键词： 负电子亲和势 GaN光电阴极 量子效率 表面势垒     

反射式负电子亲和势GaN光电阴极量子效率衰减机理研究

针对反射式负电子亲和势(NEA) GaN光电阴极量子效率的衰减以及不同波段对应量子效率衰减速度的不同,参照国外给出的NEA GaN光电阴极在反射模式下量子效率曲线随时间的衰减变化情况,利用GaN光电阴极铯氧激活后的表面模型［GaN(Mg):Cs］:O-Cs,结合量子效率衰减过程中表面势垒的变化,研究了反射式NEA GaN光电阴极量子效率的衰减机理. 有效偶极子数量的减小是造成量子效率降低的根本原因,表面I,II势垒形状的变化造成了不同波段对应的量子效率下降速度的不同.     

梯度掺杂结构GaN光电阴极的稳定性

利用GaN光电阴极多信息量测试评估系统,对反射式梯度掺杂和均匀掺杂GaN光电阴极样品进行了激活及衰减后的量子效率测试,并测试衰减速率。在同样的衰减时间内,和均匀掺杂样品相比,梯度掺杂样品的衰减比例较小,衰减速率较慢,其原因在于梯度掺杂结构可在其发射层内部产生系列内建电场,致使其能带连续向下弯曲,导致其表面真空能级比均匀掺杂样品下降得更低,发射层表面形成的负电子亲和势更明显,造成发射层内的光生电子更易逸出,阴极量子效率的衰减变慢,从而使其稳定性强于均匀掺杂结构。     

反射式变掺杂负电子亲和势GaN光电阴极量子效率研究

从变掺杂负电子亲和势(NEA)Ga N光电阴极材料的光电发射机理入手,给出了反射式变掺杂NEA Ga N光电阴极内建电场和量子效率的计算公式.利用初步设计的变掺杂NEA Ga N光电阴极,介绍了变掺杂NEA Ga N阴极的激活过程和激活光电流的变化特点.结合国内外典型的变掺杂NEA Ga N阴极的量子效率曲线,分析了Ga N光电阴极量子效率曲线的特点.结果显示:由于内建电场的存在,反射式变掺杂NEA Ga N光电阴极量子效率在240 nm处即可达到56%,在较宽的入射光波长范围内,阴极具有相对平稳的量子效率,量子效率值随入射光子能量的增加而增加,并且量子效率曲线在阈值附近表现出了明显的锐截止特性.     

负电子亲和势GaN光电阴极光谱响应特性研究

针对负电子亲和势（NEA） GaN光电阴极成功激活后的量子效率问题,利用自行研制的紫外光谱响应测试仪器,测试了成功激活的NEA GaN光电阴极的光谱响应,给出了230—400 nm波段内反射模式NEA GaN光电阴极的量子效率曲线.测试结果表明：反射模式下NEA GaN光电阴极在230nm具有高达37.4%的量子效率,在GaN光电阴极阈值365 nm处仍有3.75%的量子效率,230 nm和400 nm之间的抑制比率超过2个数量级.文中还结合国外的研究结果,综合分析了影响量子效率的因素. 关键词： 负电子亲和势 GaN光电阴极 光谱响应 反射模式     

用分子束外延法制成透射式GaAs光电阴极

第一次用分子束外延法制成负电子亲和势(NEA)GaAs-GaP 光电阴极。GaAs 的发射表面达到了原子级光滑度。通过 GaAs-GaP 界面上的内扩散形成一个组分渐变的 GaAsP 界面层。此界面层对 GaAs 薄层的光电发射特性(光谱响应曲线和高量子效率)起着重要的作用。     

GaN真空面电子源光电发射机理研究

采用Cs源持续、O源断续的交替方法成功激活了GaN光电阴极,原位测试了透射模式下的光谱响应曲线,获得了透射模式下高达13%的量子效率.从一维定态薛定谔方程入手,得到了GaN真空面电子源材料的电子透射系数的表达式.对于一定形状的阴极表面势垒,电子透射系数决定于入射电子能量、表面势垒的高度和宽度.根据具有负电子亲和势(NEA)特性的透射式GaN光电阴极的能带及Cs,O覆盖过程中阴极表面势垒的变化情况,结合双偶极层[CaN(Mg):Cs]:O-Cs表面模型,分析了GaN真空面电子源材料NEA特性的形成原因.研究表明:Cs,O激活过程中形成的双偶极层对电子逸出起促进作用,双偶极层的形成是材料表面真空能级下降的原因. 关键词： GaN 电子源 透射系数 双偶极层     

负电子亲和势GaN光电阴极激活机理研究

利用自行研制的光电阴极激活评估实验系统,给出了GaN光电阴极Cs激活及Cs/O激活的光电流曲线.针对GaN光电阴极的负电子亲和势（NEA）特性的成因,结合激活过程中光电流变化规律和成功激活后的阴极表面模型,研究了NEA GaN光电阴极激活机理.实验表明：GaN光电阴极在单独导入Cs激活时就可获得明显的NEA特性,Cs/O激活时引入O后光电流的增长幅度不大.用双偶极层模型［GaN（Mg）：Cs］：O—Cs较好地解释了激活成功后GaN光电阴极NEA特性的成因. 关键词： 负电子亲和势 GaN 激活 光电流     

反射式NEA GaN光电阴极量子效率恢复研究

以反射式NEA GaN光电阴极充分激活、衰减以及补Cs后的量子效率曲线为依据,针对阴极量子效率的衰减规律和补Cs后的恢复状况,论述了NEA GaN光电阴极量子效率的衰减和恢复机理.经过重新Cs化处理,反射式NEA GaN光电阴极量子效率在240 nm到300 nm的短波区域恢复到激活后最好状态的94%以上,300 nm到375 nm的长波区域恢复到88%以上.结合反射式NEA GaN光电阴极衰减前后的表面势垒形状和反射式GaN光电阴极量子效率的计算公式,得到了量子效率曲线的衰减规律以及补Cs后的恢复状况与 关键词： 反射式 NEA GaN光电阴极 量子效率     

梯度掺杂与均匀掺杂GaN光电阴极的对比研究

为了提高负电子亲和势(NEA)GaN光电阴极的量子效率,利用金属有机化合物化学气相淀积(MOCVD)外延生长了梯度掺杂反射式GaN光电阴极,其掺杂浓度由体内到表面依次为1×10¹⁸ cm^-3,4×10¹⁷ cm^-3,2×10¹⁷ cm^-3和6×10¹⁶ cm^-3,每个掺杂浓度区域的厚度约为45 nm,总的厚度为180 nm.在超高真 关键词： NEA GaN光电阴极 梯度掺杂 量子效率 能带结构     

指数掺杂GaAs光电阴极量子效率的理论计算

将GaAs光电阴极发射层掺杂浓度由体内到发射表面从高到低的进行指数掺杂，能在发射层形成一个恒定的内建电场，有利于光电子的逸出.在考虑内建电场的作用下，通过建立和求解少数载流子所遵循的一维连续性方程，得到了反射式和透射式指数掺杂阴极的量子效率公式，并利用这些公式对其量子效率进行了理论计算和仿真.计算结果显示发射层指数掺杂能较明显的提高阴极的量子效率，与均匀掺杂阴极相比，能使反射式阴极积分灵敏度提高约20%，透射式阴极提高30%以上.指数掺杂提高阴极量子效率的主要原因与内建电场有关，光电子在内建电场作用下以扩散加漂移的方式到达阴极表面，从而减小了后界面复合速率对阴极的影响，同时提高了阴极的等效电子扩散长度. 关键词： 指数掺杂 内建电场 能带结构 量子效率     

光学共振增强的表面铯激活银纳米结构光阴极

金属光阴极因其超短脉冲发射和运行寿命长的特性从而具有重要应用价值,但是较高的功函数和较强的电子散射使其需要采用高能量紫外光子激发且光电发射量子效率极低.本文利用Mie散射共振效应增强银纳米颗粒中的局域光学态密度,提升光吸收率和电子的输运效率,并利用激活层降低银的功函数,从而增强光阴极在可见光区的量子效率.采用时域有限差分方法分析银纳米球阵列的光学共振特性,采用磁控溅射和退火工艺在银/氧化锡铟复合衬底上制备银纳米球,紧接着在其表面沉积制备铯激活层,最后在高真空腔体中测试光电发射量子效率.实验结果表明平均粒径150 nm的银纳米球光阴极在425 nm波长的量子效率超过0.35%,为相同激活条件下银薄膜光阴极的12倍,峰值波长与理论计算的Mie共振波长相符合.     

NEA GaN光电阴极量子产额研究

围绕NEA GaN光电阴极光电发射过程的光谱响应理论,研究了其量子产额问题。分别给出了反射模式和透射模式NEA GaN光电阴极的量子产额计算公式,分析了影响量子产额的因素。分析了国外制备的反射模式和透射模式NEA GaN光电阴极的量子产额曲线。结果表明,目前制备的NEA GaN光电阴极已具有高达30%的量子效率和良好的发射性能。相同条件下,反射模式比透射模式的量子效率要高,而且反射模式不像透射模式那样存在短波限制。     

The QE numerical simulation of PEAsemiconductor photocathode

Several kinds of models have already been proposed to explain the photoemission process. The exact photoemission theory of the semiconductor photocathode was not well established after decades of research. In this paper an integral equation of quantum efficiency (QE) is constructed to describe the photoemission of positive electron affinity (PEA) of the semiconductor photocathode based on the three-step photoemission model. Various factors (e.g., forbidden band gap, electron affinity, photon energy, incident angle, degree of polarization, refractive index, extinction coefficient, initial and final electron energy, relaxation time, external electric field and so on) have an impact on the QE of the PEA semiconductor photocathode, which are entirely expressed in the QE equation. In addition, a simulation code is also programmed to calculate the QE of the K₂CsSb photocathode theoretically at 532 nm wavelength. By and large, the result is in line with the expected experimental value. The reasons leading to the distinction between the experimental and theoretical QE are discussed.     

Negative affinity 3–5 photocathodes: Their physics and technology

Negative electron affinity (NEA) photocathodes are defined by the relationship between the potential barrier at the surface and the bottom of the conduction band in the bulk of the material. If the bottom of the conduction band liesabove the potential barrier at the surface, the device is said to have a negative electron affinity. In practice this condition is obtained by heavyp-doping of the semiconductor (to encourage downward band bending at the surface) and by adding a thin film (several atomic layers) of cesium richcesium oxide on the clean semiconductor surface. The physics, development, fabrication, and applications of the NEA cathode are reviewed. The threshold of response of a NEA photocathode is set by the semiconductor bandgap. By alloying to form ternary or quaternary 3–5 compounds (3–5 compounds are formed from elements of the 3rd and 5th columns of the periodic table), the bandgap (and thus the threshold) can be placed at any desired photon energy within certain limits. The most important limit is that at about 1.1 eV which is the lowest limit achieved for NEA cathodes. This limit is set by the point at which the bandgap of the 3–5 material becomes less than the surface potential barrier. Fundamental work aimed at understanding the 3–5: cesium oxide “interfacial” barrier which sets this limitation is briefly discussed. Because of the “interfacial” barrier, the quantum yield of NEA cathodes decreases as the threshold of response moves to lower photon energy. Field assisted photocathodes provide a means of extending the threshold of response beyond 1.1 eV. Two different approaches to field assisted photocathodes and recent achievements are discussed. A major advancement has been the achievement of semi-transparent NEA photocathodes by sealing GaAs to glass. This makes possible practical NEA image tubes. The thermionic emission from 3-5 NEA cathodes can be orders of magnitude lower than that from conventional photocathodes. The reasons for this are discussed. Yield and dark current data are given on 3-5 NEA cathodes in operating photomultipliers. Work supported in part by the Advanced Research Projects Agency of the Department of Defense and monitored by Night Vision Laboratory, U.S Army Electronics Command, under Contract No. DAAK 02-74-C-0069.     

Influence of built-in electric filed on the energy and emergence angle spreads of transmission-mode GaAs photocathode

In order to research the transport characteristic of photoelectrons in different-structure transmission-mode GaAs photocathodes, the energy and emergence angle spreads of photoelectrons reaching the band-bending region are calculated and the photoemission properties are analyzed. Based on the established atomic configuration models and ionized impurity scattering formulas of the uniform-doping and exponential-doping photocathodes, the trajectories of photoelectrons in different GaAs photocathodes have been calculated. The results show that, the emergence angle spread of the exponential-doping photocathode is more centralized than that of the uniform-doping one. The influence of the built-in electric field on the photoemission is obvious in the short-wave region. The built-in electric field not only increases the quantum efficient, but also improves the resolution of photocathode. This research can be propitious to investigate the photoemission mechanism, and to analyze the effect of the excited photoelectrons on the image intensifier performance.     

指数掺杂反射式GaAlAs和GaAs光电阴极比较研究

采用指数掺杂技术, 通过金属有机化学气相沉积法外延生长了反射式GaAlAs和GaAs光电阴极, GaAlAs发射层的Al组分设计为0.63. 在超高真空系统中分别对两种阴极进行激活实验, 得到激活后的光谱响应曲线. 利用指数掺杂反射式光电阴极量子效率公式对实验曲线进行拟合并分析了电子漂移扩散长度、后界面复合速率、表面电子逸出几率等性能参数对光电发射性能的影响. 结果表明, 与GaAs光电阴极相比, GaAlAs光电阴极的Al组分虽然在一定程度上不利于光电发射, 但是解决了GaAs光电阴极由于响应波段宽而不能很好地用于窄波段可见光探测领域的问题, 制备出只对蓝绿光响应的反射式GaAlAs光电阴极.     

NEA光电阴极的(Cs,O)激活工艺研究

在自行研制的负电子亲和势光电阴极性能评估实验系统上,首次利用动态光谱响应技术和变角X射线光电子能谱(XPS)表面分析技术研究了GaAs光电阴极的(Cs,O)激活工艺.获得了首次导Cs、(Cs,O)导入以及(Cs,O)循环的优化激活条件.XPS分析给出GaAs(Cs,O)的最佳激活层厚度为0.82 nm,首次导Cs达到峰值光电发射时的Cs覆盖率为0.71个单层.在优化激活条件下,可以在国产反射式GaAs上获得1025 μA/lm的积分灵敏度.