Optically pumped polarized ion source

Characteristics and performance of the KEK optically pumped polarized ion source are described.     

MIS-1 electron-beam ion source

The Institute of Nuclear Physics (INP) has developed and produced electron-beam multiply charged ion sources. These ion sources give the electron beam its high density in the ionization area, at the ion trap ≥10³ A/cm². They produce multiply charged ions of various elements, both gaseous and solid ones. These ion sources successfully employ the technique of the dozed inlet of solid-element atoms into the ion trap.     

ECR ion source based low energy ion beam facility

Mass analyzed highly charged ion beams of energy ranging from a few keV to a few MeV plays an important role in various aspects of research in modern physics. In this paper a unique low energy ion beam facility (LEIBF) set up at Nuclear Science Centre (NSC) for providing low and medium energy multiply charged ion beams ranging from a few keV to a few MeV for research in materials sciences, atomic and molecular physics is described. One of the important features of this facility is the availability of relatively large currents of multiply charged positive ions from an electron cyclotron resonance (ECR) source placed entirely on a high voltage platform. All the electronic and vacuum systems related to the ECR source including 10 GHz ultra high frequency (UHF) transmitter, high voltage power supplies for extractor and Einzel lens are placed on a high voltage platform. All the equipments are controlled using a personal computer at ground potential through optical fibers for high voltage isolation. Some of the experimental facilities available are also described.     

Alignment of heavy ion therapy center vertical terminal

ABSTRACT

Wuwei heavy ion therapy center is the first Chinese heavy ion accelerator facility developed for cancer therapy, in which four terminals are distributed and the height of the vertical terminal is up to 18?m. Installation units of vertical terminal are diverse and complex, moreover, these units present poor alignment visibility. Thereby, it is difficult to perform the alignment among these components. Based on the laser tracker and high precision three-dimensional surveying control network, this paper proposes an efficient alignment method using multiple conversion of magnet fiducial data and pre-alignment of complex magnet unit. All the components are successfully aligned, and meanwhile the installation efficiency of vertical terminals is improved. Alignment accuracy of magnets is less than 0.1?mm. Error analysis presents that this alignment method achieves its goal.     

Multi-element focused ion beams using compact microwave plasma ion source

Focused ion beams (FIB) are widely used for research and applications in nanoscience and technology. We have developed a compact microwave plasma based multi element FIB (MEFIB) system in order to widen the applications and overcome the limitations faced by conventional Liquid Metal Ion Source (LMIS) based FIB systems, that provide primarily Ga ions. The MEFIB source provides high density plasmas (∼1.5 × 10¹¹ cm⁻³) in a compact cross section. Recently the ion energy spread in the plasma meniscus from where the beams are extracted is found to be small (∼5 eV) [1–3]. The beam extraction and focusing are carried out using electrostatic multi electrode assembly. AXCEL INP and SIMION simulation codes are employed for the design of electrostatic Einzel lenses for beam focusing. The beam focal point is measured using a specially designed three slit Faraday cup and the spot size is measured by the micrography of craters formed by the focused ion beams impinging on copper and aluminium substrates. The initial experimental results show a focused beam spot size of ∼ 25 micron which is in good agreement with the simulations. By further reduction of electrode apertures and operating the second Einzel lens at higher potentials, submicron focused ion beams can be expected.     

RF离子源引出特性的研究

为了使RF离子源具有良好的引出特性,测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响,对实验结果进行了分析。在其它参数不变的情况下,吸极的外径D与内径d之比存在最佳值,增加D/d,有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L,石英套管比吸极长l。当l/D增大时,聚焦度上升,引出束流下降。L/d之比减小时,聚焦度增大。当L/d小于4时,聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压,D/d,l/D,L/d适宜的选择范围分别为1.6～2.1,0.7～1.1,4～7。增加振荡器功率会使离子束呈弱聚焦,而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。     

RF离子源引出特性的研究

 为了使RF离子源具有良好的引出特性,测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响,对实验结果进行了分析。在其它参数不变的情况下,吸极的外径D与内径d之比存在最佳值,增加D/d,有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L,石英套管比吸极长l。当l/D增大时,聚焦度上升,引出束流下降。L/d之比减小时,聚焦度增大。当L/d小于4时,聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压,D/d,l/D,L/d适宜的选择范围分别为1.6～2.1,0.7～1.1,4～7。增加振荡器功率会使离子束呈弱聚焦,而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。     

射频离子源离子束成分光谱测量

为HL-2A 装置中性束注入器研制了引出束功率为1MW 的射频离子源。在测试平台上,实验离子源已经成功引出了束能量和束电流分别为35keV 和12.4A、束质子比为79%、脉宽为100ms 的氢离子束,达到了设计束功率要求的44%。在射频离子源实验平台上,利用多普勒频移光谱方法测量了离子源引出束流成分比例,对比了束流成分和射频离子源引出束流之间的关系。实验数据分析表明,在10A 引出束流的情况下,离子流成分 H⁺ ₁、H⁺ ₂ 和H⁺ ₃ 分别为75%、18%和7%。并且当引出束流从3.3A 升至10.4A 时,H⁺ ₁ 从37%升至78%,而H⁺ ₃ 则从19%降至9%。     

CSNS H^- ion source test stand

The Penning surface plasma source is adopted as the China Spallation Neutron Source (CSNS) H^- ion source. The designed energy and beam current of the source are 50 keV and 20 mA, respectively, with a normalized root mean square (norm. rms.) emittance of 0.2 πmm·mrad. The construction of a H^- ion source test stand has been completed, and the commissioning of the source is in progress. Stable H^- ion beams with energy of 50 keV and current up to 50 mA are attained. Emittance measurement for the H^- beam is being prepared.     

TRIUMF resonant ionization laser ion source

The range of isotopes available at the TRIUMF Isotope Separator Accelerator (ISAC) facility has been greatly enhanced by adding a Resonance Ionization Laser Ion Source (RILIS). A large wavelength range is accessible with the fundamental, second and third harmonic generation of titanium-sapphire laser light. In addition a dedicated laser is available for non-resonant laser ionization. The first on-line beam ⁶²Ga was delivered in Dec. 2004. In general RILIS improves the intensity, purity and emittance of ion beams. ⁶²Ga and ²⁶Al and Be beams have been delivered so far on-line. This work was financed by TRIUMF which is federally funded via a contribution agreement through the National Research Council of Canada.     

Influence of ion species ratio on grid-enhanced plasma source ion implantation

Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N_2^+ and atomic ions N^+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N_2^+ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N^+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.     

高频离子源等离子体的光谱诊断

采用发射光谱法研究了高频离子源的等离子体性质。该离子源应用于ZF-200keV中子发生器中,是一种电感耦合型无极环形放电高频离子源。实验采用绝对定标后的光学多道分析系统测定了离子源等离子体在不同阶段氢原子巴耳末谱线系中前三条谱线的强度,并采用部分局部热力学平衡状态的理论,计算出了相应阶段高频离子源等离子体的电子温度、氢原子浓度、氢离子浓度等参数,并进行了简要分析。     

高频H型放电离子源的场特性

从Maxwell方程组出发,推导了高频H型放电离子源放电空间的场分布, 并采用Mafia软件进行了三维实体建模,计算了高频离子源放电击穿前和稳定工作后的电磁场分布,得到了高频离子源放电空间电磁场分布的直观图像。通过比较击穿前高频电场的轴向和环向分量,得出了轴向电场在高频离子源击穿中起主要作用的结论,并进而推导出了高频离子源的击穿判据,得出了气体击穿时离子源击穿电压和放电管内气压的关系,与实验结果符合较好。     

Optimised operation of gas field ion source

Ion-beam emission from a gas field ion source can considerably be improved by employing base tips of spherical instead of paraboloidal geometry. With such tips, due to their better electrical field distribution, gas supply is enhanced and desorption reduced. As an important technical consequence, emission levels of gas ions at liquid-nitrogen temperature are sufficient for material-modification purposes. PACS 41.75.Ak; 82.65.Pa; 79.70.+q     

高频H型放电离子源的场特性

 从Maxwell方程组出发，推导了高频H型放电离子源放电空间的场分布, 并采用Mafia软件进行了三维实体建模，计算了高频离子源放电击穿前和稳定工作后的电磁场分布，得到了高频离子源放电空间电磁场分布的直观图像。通过比较击穿前高频电场的轴向和环向分量，得出了轴向电场在高频离子源击穿中起主要作用的结论，并进而推导出了高频离子源的击穿判据，得出了气体击穿时离子源击穿电压和放电管内气压的关系，与实验结果符合较好。     

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研究了矩形永磁体的理论计算方法,深入剖析了PIC-MCC处理算法,在粒子模拟软件平台下研制了全三维PIC-MCC模拟算法,并采用该算法数值研究了J-PARC多峰离子源放电特性,分析了J-PARC离子源电子能量沉积过程和体积产生机制,讨论了该离子源在光学特性和设计思路上的优势。结果显示:该离子源能产生空间均匀的负氢离子离子束,且体积负氢离子产生效率较高。     

Optimisation of cold cathode ion source model

This paper represents the results of the optimisation of cold cathode ion source model with 5 cm extraction aperture diameter. In this model, the glow discharge is utilised for generation of electrons in the cathode of the ion source. The various models with different lengths of cathode and anode are tested. The shortest model with 4.5 cm in length of cathode and anode each shows satisfactory operation and can be used in cases when the high values of extracted ion current are not required. The best model from the point of view of ion beam current value and efficiency of the discharge is the model with cathode length of 7 cm and anode length of 7 cm. In this case, the obtained maximum ion beam current is 110 mA when the discharge current is 1000 mA. In case when moderate values of extracted ion beam current are necessary, it is possible to operate the ion source even without the anode magnetic system.     

HL-2M装置5 MW中性束加热束线离子源放电室研制

为了给HL-2M装置建设一条5 MW中性束加热束线,开展了中性束加热用热阴极弧放电离子源放电室的研制。这条中性束束线包含4套80 kV/45 A/5 s离子源,放电室的设计指标为850 A/5 s。首先采用CST软件中的电磁工作室对特定几何结构的放电室会切磁场进行了模拟计算,得到了会切磁场分布,验证了会切磁场布局的合理性。针对放电室加工工艺和实验过程中局部拉弧等问题,对放电室结构进行了不断改进。放电室侧壁由40列会切磁体改为7圈环形磁体,阴极灯丝结构从灯丝板结构最终改为陶瓷可伐结构,并且在放电室和加速器之间增加了陶瓷屏蔽。在阴极板结构放电室和阴极陶瓷可伐结构放电室内都获得了正常的弧放电。最终定型的放电室采用周边7圈环形会切磁体和陶瓷可伐结构。在定型的放电室内达到了5 MW中性束束线离子源弧放电的指标。弧放电时间接近5 s,最大弧放电电流达到1000 A。