CH_3OH在Ga-rich GaAs(001)-(4×2)表面上的吸附与解离:团簇模型的密度泛函计算

采用简单团簇模型结合密度泛函理论研究了CH3OH在Ga-rich Ga As(001)-(4×2)表面上的吸附与解离过程.计算结果表明,CH3OH在Ga-rich Ga As(001)-(4×2)表面上首先会形成两种化学吸附状态,然后CH3OH经解离生成CH3O自由基和H原子吸附在表面不同位置上.通过比较各个吸附解离路径,发现解离后的H原子相对更容易吸附在位于表面第二层紧邻的As原子上.     

Cs/GaN(0001)吸附体系电子结构和光学性质研究

采用基于第一性原理的密度泛函理论平面波超软赝势方法计算了 1/4ML Cs原子吸附 (2 × 2) GaN(0001) 表面的吸附能、能带结构、电子态密度、电荷布居数、功函数和光学性质. 计算发现, 1/4ML Cs 原子在 GaN(0001) 表面最稳定吸附位为 N 桥位, 吸附后表面仍呈现为金属导电特性, Cs原子吸附GaN(0001)表面后主要与表面 Ga 原子发生作用, Cs6s 态电子向最表面 Ga 原子转移, 引起表面功函数下降. 研究光学性质发现, Cs 原子吸附 GaN(0001) 表面后, 介电函数虚部、吸收谱、反射谱向低能方向移动.     

GaAs(100)表面(4×1)结构的UPS研究

用偏振的紫外光源测量了GaAs(100)表面(4×1)结构的UPS谱,从清洁表面和吸附氧以后UPS的差谱中辨别出了在价带顶以下2eV以内的表面态峰,根据用偏振光所得到的谱和跃迁选择定则的讨论,认为表面态包含了三个峰,价带顶以下0.5eV处有一个对应于表面Ga原子桥键态的峰,在0.7eV处有对应于表面As原子桥键态的峰,而在1.3eV处的峰则同表面原子的悬键态相联系。 关键词：     

Si(100)表面电子态的总电流谱研究

用自制的总电流谱仪研究了Si(100)2×1清洁表面以及H原子饱和吸附后的Si(100)1×1-2H双氢化相表面的电子态。在清洁表面上测得的空电子态位于价带顶以上0.7eV处,而占有电子态则在价带顶以下0.25,8.4和近12eV处。在双氢化相表面上还观测到处于价带顶以下两个诱导表面态。 关键词：     

双层石墨烯吸附碱金属原子的第一性原理研究

基于密度泛函的第一性原理方法,研究了Li、Na、K和Rb碱金属原子吸附在双层石墨烯(BLG)表面的吸附能、迁移行为、电子性能.研究发现,Li和Na原子在BLG表面吸附易形成团簇,K和Rb原子能够分散吸附.碱金属原子在BLG表面的扩散能垒随原子半径的增加而减小.碱金属原子吸附使电子部分转移至BLG,使体系Fermi能级贯穿导带,表现出金属性.电荷密度差和电荷转移的分析表明,Li、Na、K和Rb与BLG表面以离子键结合.     

室温下InP(100)表面K诱发催化氮化反应的同步辐射光电子能谱研究

利用同步辐射光电子能谱研究了室温下p型InP(100)表面,由于K吸附诱发的催化氮化反应过程。对于N_2/K/InP(100)体系的P2p;In4d芯能级和价带谱的研究表明:碱金属吸附于InP(100)表面可以强烈地影响其在室温下的氮化反应,K的存在极大地提高了N_2在InP(100)表面的粘附系数。由我们的实验结果和碱金属吸附于GaAs(110),InP(110),GaP(110)表面的研究结果可知,碱金属吸附于Ⅲ-V族半导体表面后,可以极大地提高N_2在Ⅲ-V族半导体表面的粘附系数,从而促进Ⅲ-V族半 关键词：     

双层石墨烯吸附碱金属原子的第一性原理研究

基于密度泛函的第一性原理方法,研究了Li、Na、K和Rb碱金属原子吸附在双层石墨烯(BLG)表面的吸附能、迁移行为、电子性能. 研究发现,Li和Na原子在BLG表面吸附易形成团簇,K和Rb原子能够分散吸附. 碱金属原子在BLG表面的扩散能垒随原子半径的增加而减小. 碱金属原子吸附使电子部分转移至BLG,使体系Fermi能级贯穿导带,表现出金属性. 电荷密度差和电荷转移的分析表明,Li、Na、K和Rb与BLG表面以离子键结合.     

Xe原子吸附对GaAs(110)表面重构的影响

基于第一性原理的自洽场密度泛函理论(DFT)和广义梯度近似(GGA),利用缀加平面波加局域轨道(APW+lo)近似方法，建立了五层层晶超原胞模型，模拟了GaAs(110)表面结构和单个Xe原子在其表面的吸附.利用牛顿动力学方法，对GaAs(110)表面原子构形的弛豫和Xe原子在GaAs(110)表面的吸附进行了计算.从三种不同的初始构形出发，即Xe原子分别在Ga原子的顶位，As原子的顶位以及桥位，都发现Xe原子位于桥位时体系能量最低.由此，认为Xe原子在GaAs(110)表面的吸附位置在桥位，并且发现吸附Xe原子后GaAs(110)表面有趋向于理想表面的趋势，表面重构现象趋于消失，表面原子间键长有一定的恢复,这与理论预言相符合. 关键词： 密度泛函理论 表面结构 APW 表面原子吸附     

密度泛函理论研究碱金属原子在完美氧化镁(001)表面的吸附

基于平面波赝势法的密度泛函理论系统地研究了孤立碱金属原子(锂、钠、钾、铷、铯)在完美氧化镁(001)表面的吸附. 锂在氧位表面上的吸附能是0.72 eV,大约是其它碱金属的3倍. 锂和表面氧之间较强的相互作用主要是来源于共价键的作用,这可由态密度和差分电荷密度的分析所证实. 讨论碱金属在MgO(001)表面吸附的成键机理.     

碱金属原子与W,Pt表面的电荷交换

本工作利用热能碱金属原子与炽热W,Pt表面的相互作用,研究了碱金属原子与金属表面的电荷交换,以及金属表面吸附原子后表面功函数的变化。 关键词：     

THE ADSORPTION OF Ge ON GaAS(ll0)

In the present work, the chemisorption of Ge on GaAs(1lO) was studied by a cluster model using the charge self-consistent extended H ückel method (EHT) and the results thus obtained were compared with those derived from the experiments. It was shown from the calculation that after chemisorption, the substrate tends to relax back to the ideal unrelaxed state, after cleavage. The tilted angle of the As-Ga bond was reduced from the well khown 27° to 10°.The gap states which were driven into both the valence band and the conduction band due to relaxation will-be introduced into the gap after chemisorption. From the calculation of the total energy of the cluster, it was found that the Ge atom could bind to both Ga and As atoms although the binding of the latter was somewhat stronger. The gap states were derived from the p states of Ge and the s and p states of Ga and As atoms. The states will serve as donors and acceptors for p and n type materials respectively . From a comparison with the previous results concerning studies of group Ⅲ and Ⅴ metals on GaAs(110) surface, it seems that the change of surface relaxation after chemisorption might be the origin of gap states and the cause for Fermi level pinningr. The explanation was first put forward by Chen et al . from their experimental studies . The present calculation also gives the core shifts of Ga(3d) and As(3d) of the clean relaxation surfaces with respect to that of the bulk as well as the core shifts of Ga(3d) and As(3d) after the chemisorption of Ge atom. A chemisorption induced state which is attributed to a precursor state for a heterojunction interface state is also obtained at a binding energy near 7eV which is in fairly good agreement with the experimental result.     

Photoemission study of Gd metal overlayers on a GaAs(110) surface

We have studied the chemical reactions of Gd metal on an in situ cleaved GaAs(110) surface by photoemission spectroscopy of Ga 3d and As 3d core-levels as well as the Gd 4f level on- and off-resonance valence band using synchrotron radiation. We find that the Fermi-level pinning is completed before 0.13 ML coverage, and the deposited Gd atoms start to react with the GaAs substrate at a very low coverage (critical coverage < 0.067 ML). As more Gd atoms are deposited, they form stable compounds with As atoms which are then trapped in the relatively narrow interfacial layer of thickness less than about 3.3 ML, while Ga atoms diffuse out towards the surface and eventually become metallic. The thickness of the GdGa intermixed layers is estimated to be about 6.7 ML, which is somewhat greater than that for a interface.     

Metallization and demetallization of clean and oxygen-covered ultrathin alkali metal films on GaAs(1 0 0)

The structure and the electronic valence state occupation of ultrathin K, Rb, and Cs films grown on a GaAs(1 0 0)-(4×2) surface have been studied by means of metastable He atom scattering (MHAS), He atom scattering (HAS), and low-energy electron diffraction (LEED) at temperatures ranging from 150 to 400 K. From the survival probability of the scattered He^* atoms, detailed information on the coverage-dependent filling of the alkali metal valence states and their emptying upon subsequent exposure to oxygen were derived. These data reveal for K and Rb a nearly linear band filling with increasing coverage starting at about 0.5 ML whereas a more rapid filling is observed for Cs which is almost completed at about 0.7 ML. Subsequent oxygen adsorption causes a demetallization of the metallic alkali metal monolayers. In case of Cs, a distinct minimum of the He^* signal appears at an oxygen exposure of about 0.8 L, presumably indicating the onset of subsurface oxidation.     

未钝化和H钝化GaN纳米线的电子结构

用密度泛函理论研究直径为9.5Å,15.9Å和22.5Å,未钝化和H钝化GaN纳米线的能带和态密度.结果表明:未钝化和H钝化GaN纳米线的能隙都是直接带隙,未钝化GaN纳米线的禁带宽度随着直径的增加减小,但是变化不明显,H钝化GaN纳米线的禁带宽度随着直径增大也是减小的,但是减小的幅度比未钝化的大.未钝化GaN纳米线表面N原子的2p电子主要聚集在价带顶,表面Ga原子的4p电子主要聚集在导带底,这两种电子都具有很强的局域性,而且决定着能隙值;加H钝化可以消除表面原子产生的表面效应.     

Effect of Ga and As vacancies on electronic properties of Ga0.9375Al0.0625As

Electronic properties of Ga_0.9375Al_0.0625As with Ga and As monovacancies are investigated with the density functional theory. A perfect GaAlAs, which specifically produces a radiation wavelength of ～825.6 nm, has been determined in terms of size and number of atoms of substances. We have introduced eight types of vacancies depending on the distance from the Al atom to the vacancy to obtain the changes in charges, band structures, density of states, and optical conductivity. We found that the Fermi level enters into the valence band due to the formations of the Ga or As vacancies so that the vacant materials may show the characteristics of the p-type semiconductor. Interestingly, Ga-vacancy systems make direct band gaps, which are still good for the use in a semiconductor laser. But, As-vacancy systems, where the indirect gaps appear, are not feasible for the same application. It has been found that the latter phenomenon is induced by a newly formed density of state, which comes from the overlapping of hybridised 4s and 4p orbitals of Ga atoms around As vacancy.     

Ab initio determination of atomic structure and energy of surface states of bare and hydrogen covered GaN (0001) surface — Existence of the Surface States Stark Effect (SSSE)

Density Functional Theory (DFT) calculations indicate that energetically stable structure of clean GaN(0001) surface posses (2 × 1) reconstruction, having every second row of Ga located near plane of N atoms, that gives rise to Ga-related dispersionless surface electronic state, already identified by angle resolved photoelectron spectroscopy (ARPES) measurements [S.S. Dhesi et al. Phys. Rev. B 56 (1997) 10271, L. Plucinski et al. Surf. Sci 507-10 (2002) 223, S. M. Widstrand et al. Surf. Sci. 584 (2005) 169]. The energy reduction in reconstruction proceeds via change of the hybridization of the occupied Ga surface states from sp³ to sp², transforming the empty states to p_z type. It is also shown that the electric subsurface field, modeled in new slab model which allows to simulate electric fields at the semiconductor surfaces [P. Kempisty et al., J. Appl. Phys. 106 (2009) 054901], strongly affects the energy of electronic states of GaN(0001) surfaces. The change of the field may shift the energy of surface states of bare and hydrogen covered GaN(0001) surface, by several eV with respect to the band states. The phenomenon, denoted as Surface States Stark Effect (SSSE), explains various band bending values, measured at differently doped n-type GaN(0001) surfaces. It is shown also that, for the adsorbate density up to one H atom for each Ga surface atom i.e. 1 monolayer coverage (1 ML), the hydrogen adatoms are located at the on-top positions, i.e. directly above Ga atoms. For these adsorbate densities, the H-related quantum surface state is located slightly below the valence band maximum (VBM) in the case of p-type GaN surface. For n-type GaN, the H-related surface state is located deeply in the valence band, about 2 eV below VBM. For higher, 1.25 ML hydrogen coverage, the two H adatoms create either surface attached H₂ ad-molecule (energetically stable) or triple bridge configuration is created (metastable). The H₂ ad-molecule is weekly attached to the surface, having the desorption energy barrier equal to 0.16 eV. For 1.25 ML coverage the DFT results were obtained for p-type GaN only. They show that in the ad-molecule case, a new surface electronic state arises which is located about 6.7 eV below VBM. In the case of the bridge configuration, the bridge related surface state is located closely to the conduction band minimum (CBM).     

Benefits of oxygen in CuInSe2 and CuGaSe2 containing Se-rich grain boundaries

Using density functional theory calculation, we show that oxygen (O) exhibits an interesting effect in CuInSe₂ and CuGaSe₂. The Se atoms with dangling bonds in a Se-rich Σ3 (114) grain boundary (GB) create deep gap states due to strong interaction between Se atoms. However, when such a Se atom is substituted by an O atom, the deep gap states can be shifted into valence band, making the site no longer a harmful non-radiative recombination center. We find that O atoms prefer energetically to substitute these Se atoms and induce significant lattice relaxation due to their smaller atomic size and stronger electronegativity, which effectively reduces the anion–anion interaction. Consequently, the deep gap states are shifted to lower energy regions close or even below the top of the valence band.     

Possible effects of oxygen in Te-rich Σ3 (112) grain boundaries in CdTe

Using density functional theory calculation, we show that oxygen (O) exhibits an interesting effect in CdTe. The Te atoms with dangling bonds in a Te-rich rich Σ3 (112) grain boundary (GB) create deep gap states due to strong interaction between Te atoms. However, when such a Te atom is substituted by an O atom, the deep gap states can be shifted toward the valence band, making the site no longer a harmful non-radiative recombination center. We find that O atoms prefer energetically substituting these Te atoms and induce significant lattice relaxation due to their smaller atomic size and stronger electronegativity, which effectively reduces the anion–anion interaction. Consequently, the deep gap states are shifted to lower energy regions close to or even below the top of the valence band.