Optimization of a glancing angle for simultaneous trace elemental analysis by using a portable total reflection X-ray fluorescence spectrometer

By using a portable total reflection X-ray fluorescence spectrometer with a 1 W X-ray tube, a specimen containing nanograms of Ca, Sc, Ti, V, Cr, Mn, Fe, and Ni is measured at several glancing angles of incident X-rays. Continuum X-rays are used as the excitation source. The intensities of the spectral background which degrades sensitivity to trace elements are decreased with a decrease of the glancing angle, and all these elements are detected at the glancing angle of 0.13° smaller than the critical angle for total reflection of the incident X-rays (0.20°). An optimum glancing angle for simultaneously detecting these trace elements is around 0.13°, and detection limits at 0.13° are sub-nanograms to ten nanograms.     

A portable total reflection X-ray fluorescence spectrometer with a diamond-like carbon coated X-ray reflector

A diamond-like carbon (DLC) coated quartz glass sample holder is used in a portable total reflection X-ray fluorescence (TXRF) spectrometer. A spot area of a water sample on the DLC sample holder becomes smaller than that on a quartz glass sample holder usually used in TXRF analysis because DLC is more hydrophobic. Therefore, the use of the DLC sample holder enhances fluorescent X-rays reaching a detector compared with the use of a quartz glass sample holder, leading to improvement in detection sensitivity. A detection limit of 28 pg is achieved for Cr in a river water sample when using the DLC sample holder.     

Detection limit calculations for the total reflection techniques of X-ray fluorescence analysis

In this work, theoretical calculations of detection limits for different total reflection techniques of X-ray fluorescence analysis are presented. Calculations include grazing incidence (TXRF) and gracing emission (GEXRF) conditions. These calculations are compared with detection limits calculated for conventional X-ray fluorescence (XRF). In order to compute detection limits, Shiraiwa and Fujino's model was used to calculate X-ray fluorescence intensities. This model makes certain assumptions and approximations to achieve the calculations, especially in the case of the geometrical conditions of the sample, and the incident and takeoff beams. Nevertheless, the calculated data of detection limits for conventional XRF and total-reflection XRF show a good agreement with previous results. The model proposed here allows us to analyze the different sources of background and the influence of the excitation geometry, which contribute to a better understanding of the physical processes involved in the XRF analysis by total reflection. Finally, a comparison between detection limits in total-reflection analysis at grazing incidence and at grazing emission is carried out. Here, a good agreement with the theoretical predictions of the Reciprocity Theorem is found, showing that, in theory, detection limits are similar for both techniques.     

Poly-capillary X-ray and neutron optics (Kumakhov optics)

Poly-capillary X-ray optics (Kumakhov optics) are based on multiple total external reflections of radiation in small-diameter hollow capillary tubes. Such tubes can be made to form different kinds of lens and make it possible to focus and control X-rays and neutrons over broad angular and energy ranges. Thus, as instances, X-rays can be focused for medical therapy and material sciences, and intense quasi-parallel X-ray and neutron beams can be produced from divergent sources for medical diagnosis and X-ray lithography. This new form of optical control offers improved efficiency and effectiveness in almost all uses of X-rays or slow neutrons, and makes possible many new applications.     

Using of a microcapillary refractive X-ray lens for focusing and imaging

The microcapillary lens, formed by air bubbles in a hollow core glass capillary filled with epoxy, is a novel design of a compound refractive lens for X-rays. The epoxy enclosed between two air bubbles has the form of a biconcave lens and acts as a positive lens for X-rays. Each individual lens is spherical with radius of curvature equal to the inner radius of the capillary. Up to 500 individual biconcave lenses can be formed in a single capillary with diameters from 50 to 500 μm. Due to the small radius of curvatures that can be achieved, microcapillary lenses typically have shorter focal lengths than those made by compression or injection molding. For example, microcapillary lenses with a focal length about 5 cm for 8 keV X-rays and 50-micron aperture are readily available.We have produced a set of lenses in a 200-micron inner-diameter glass capillary with 100–350 individual microlenses and measured their parameters at the Stanford Synchrotron Radiation Laboratory and at the Advanced Photon Source.Our investigations have also shown that the lenses are suitable for imaging applications with an X-ray tube as a source of X-rays. A simple X-ray microscope is discussed. The microscope consists of a copper anode X-ray tube, X-ray lens and CCD-camera. The object, lens and CCD-camera were placed in-line at distances to satisfy the lens formula. It is shown that the field of view of the microscope is about 1 mm and resolution is equal to 3–5 μm.     

The birth of the X-ray refractive lens

In the X-ray region, no optics based on the principle of refraction existed since the discovery of the X-rays by Röentgen in November 1985, although mirrors and zone-plates that use the principle of reflection and diffraction have been employed. The idea of a practical X-ray refractive lens was first disclosed in February 1994, i.e., just one year before the centenary of the discovery of X-rays. The present paper reviews why the X-ray lens did not appear for so many years, and how the design was born. The paper also discusses technologies to be developed for high performance X-ray lenses, and advantages of refractive X-ray lenses over other X-ray optics.     

Improvement of total reflection X-ray fluorescence analysis of low Z elements on silicon wafer surfaces at the PTB monochromator beamline for undulator radiation at the electron storage ring BESSY II

Several different total reflection X-ray fluorescence (TXRF) experiments were conducted at the plane grating monochromator beamline for undulator radiation of the Physikalisch-Technische Bundesanstalt (PTB) at the electron storage ring BESSY II, which provides photon energies between 0.1 and 1.9 keV for specimen excitation. The lower limits of detection of TXRF analysis were investigated for some low Z elements such as C, N, O, Al, Mg and Na in two different detection geometries for various excitation modes. Compared to ordinary XRF geometries involving large incident angles, the background contributions in TXRF are drastically reduced by the total reflection of the incident beam at the polished surface of a flat specimen carrier such as a silicon wafer. For the sake of an application-oriented TXRF approach, droplet samples on Si wafer surfaces were prepared by Wacker Siltronic and investigated in the TXRF irradiation chamber of the Atominstitut and the ultra-high vacuum TXRF irradiation chamber of the PTB. In the latter, thin C layer depositions on Si wafers were also studied.     

X-ray induced fluorescence spectrometry at grazing incidence for quantitative surface and layer analysis

Summary Single layers and layer systems on diverse substrates were measured by Total Reflection X-Ray Fluorescence (TXRF) spectrometry. The angular dependence of the fluorescence intensities at grazing incidence allows the elemental composition, density and thickness of the layers to be evaluated using model calculations.     

Measurement of trace element concentration in a metal matrix using total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence spectroscopy (TXRF) has been used in combination with synchrotron radiation in order to determine detection limits and lowest limits of concentration of trace elements in metal matrices. Two applications on irradiated material are described, where the TXRF method has some advantages, as compared to other detection methods, because only few micrograms of material is needed for the measurements. The first application is devoted to radiation damage studies on first wall material of future fusion reactors. Therefore, metal foils were irradiated with 590 MeV protons at PSI and the transmutational elements produced in the foils were measured. The second application is the assessment of radiation damage of core components in a nuclear power plant, e.g. the reactor pressure vessel. This is performed by the determination of the fast neutron fluence on the components using an activation reaction of ⁹³Nb which is a trace element in most reactor steels. Detection limits of a few picograms have been found in the experiments.     

Energy dispersion of X-ray continua in the energy range 8 keV to 16 keV by refraction on Si wafers

Total reflection of X-rays in matter at given grazing incidence angle is characterized by an energy cut-off. Photons with energies greater than the cut-off energy penetrate into matter and are refracted corresponding to a transition from the optically more dense to the optically less dense medium. Since the refractive index depends on photon energy, an energy dispersion of continuous X-radiation is observed. The present investigation is dedicated to the energy dispersion of continuous X-radiation from an X-ray tube with Mo target (operated at 45 kV) by Si wafers. Theory and experimental results are in excellent agreement. Measurement of the cut-off and refracted beam is a very good tool for angular calibration of experimental setups in total reflection X-ray fluorescence analysis (TXRF). A further interesting detail of this concept is its application to monochromators, which can be tuned over a wide range of photon energies. A refractive monochromator does not suffer from the occurrence of harmonics and a systematic variation of the photon flux and the spectral width of monochromatic radiation can be performed by a variation of slit widths in the collimator system.     

Trace analysis of high-purity copper by total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence (TXRF) analysis after the separation of matrix element was studied for the determination of trace impurity elements (Ca, Sc, V, Cr, Mn, Fe, Co, Ni and Zn) in high purity copper. Matrix copper was removed by electrolysis (0.2 A, 8 h) of a nitric acid solution. A 10 μL aliquot of the remaining solution of the electrolysis was dropped on a silicon-wafer sample-carrier and dried in a vacuum. This was repeated five times and the precipitate of five 10 μL-aliquots was analyzed by TXRF using a W-Lβ beam with an incident angle of 0.05?°. TXRF analytical values were obtained by using relative sensitivity factors of the analytes to the internal standard element (Pd). Detection limits of the analytes ranges from 0.077 ng for Zn to 0.785 ng for Ca.     

Total-reflection X-ray fluorescence imaging

A new experimental technique for surface imaging using total-reflection X-ray fluorescence (TXRF) is described. Although TXRF has so far been used to analyze the average chemical composition of rather large sample areas in the order of centimeters squared, a new opportunity to obtain spatial information has arisen through the combination of conventional TXRF and position-sensitive measurement using a collimator and a CCD camera. The most significant point here is that the extremely close detector sample geometry of TXRF measurement fits very well with the present imaging procedure. Scanning of the sample and/or incident beam is not necessary, and therefore the exposure time is reasonably short, typically 3–10 min. The number of pixels is approximately 1 million, and the spatial resolution obtained was several tens of microns in the present preliminary case. The selective-excitation capability of tunable monochromatic synchrotron radiation enhances the present imaging technique. Changing the energy of incident photons makes it possible to distinguish the elements, and one can obtain a surface image of the specific elements.     

X-ray microfocussing combined with microfluidics for on-chip X-ray scattering measurements

This work describes the fabrication of thin microfluidic devices in Kapton (polyimide). These chips are well-suited to perform X-ray scattering experiments using intense microfocussed beams, as Kapton is both relatively resistant to the high intensities generated by a synchrotron, and almost transparent to X-rays. We show networks of microchannels obtained using laser ablation of Kapton films, and we also present a simple way to perform fusion bonding between two Kapton films. The possibilities offered using such devices are illustrated with X-ray scattering experiments. These experiments demonstrate that structural measurements in the 1 A-20 nm range can be obtained with spatial resolutions of a few microns in a microchannel.     

X-ray spectrometry using polycapillary X-ray optics and position sensitive detector

Polycapillary X-ray optics (capillary X-ray lens) are now popular in X-ray fluorescence (XRF) analysis. Such an X-ray lens can collect X-rays emitted from an X-ray source in a large solid angle and form a very intense X-ray microbeam which is very convenient for microbeam X-ray fluorescence (MXRF) analysis giving low minimum detection limits (MDLs) in energy dispersive X-ray fluorescence (EDXRF). A new method called position sensitive X-ray spectrometry (PSXS) which combines an X-ray lens used to form an intense XRF source and a position sensitive detector (PSD) used for wavelength dispersive spectrometry (WDS) measurement was developed recently in the X-ray Optics Laboratory of Institute of Low Energy Nuclear Physics (ILENP) at Beijing Normal University. Such a method can give high energy and spacial resolution and high detection efficiency simultaneously. A short view of development of both the EDXRF using a capillary X-ray lens and the new PSXS is given in this paper.     

Total-reflection X-ray fluorescence moving towards nanoanalysis: a survey

Within the last 20 years, total-reflection X-ray fluorescence (TXRF) has been applied to solve a lot of analytical problems. It turned out that TXRF gives an actual approach to nanoanalysis in three different fields: (i) for tiny samples with only nanogram sample amounts; (ii) for low traces with concentrations down to ng/l; (iii) for surfaces and shallow layers with some nanometer thickness. After a short tutorial on total-reflection of X-rays and the formation of standing waves, several selected examples are given for each of the three fields of nanoanalysis. Finally, a critical evaluation of TXRF and its future prospects are given in this survey article.     

Total reflection X-ray fluorescence analysis with chemical microchip

A chemical microchip, which has a flat region on the surface, was recently designed for total reflection X-ray fluorescence (TXRF) analysis. A sample solution was introduced from an inlet by a microsyringe and flowed into a microchannel. Finally it overflowed from the well-type microchannel on the flat region. The sample solution on this region was dried, and then measured by TXRF. The TXRF spectra could be measured with a low background level. This preliminary result indicated that the edge of the well-type channel would not cause a serious problem for TXRF analysis. In addition, a good linear relationship was obtained for Zn Kα in Zn standard solution. This suggests that quantitative analysis by TXRF is feasible in combination with a chemical microchip.     

Trace analysis of high-purity copper by total reflection X-ray fluorescence spectrometry

Total reflection X-ray fluorescence (TXRF) analysis after the separation of matrix element was studied for the determination of trace impurity elements (Ca, Sc, V, Cr, Mn, Fe, Co, Ni and Zn) in high purity copper. Matrix copper was removed by electrolysis (0.2 A, 8 h) of a nitric acid solution. A 10 μL aliquot of the remaining solution of the electrolysis was dropped on a silicon-wafer sample-carrier and dried in a vacuum. This was repeated five times and the precipitate of five 10 μL-aliquots was analyzed by TXRF using a W-Lβ beam with an incident angle of 0.05 °. TXRF analytical values were obtained by using relative sensitivity factors of the analytes to the internal standard element (Pd). Detection limits of the analytes ranges from 0.077 ng for Zn to 0.785 ng for Ca. Received: 25 December 1997 / Revised: 30 March 1998 / Accepted: 2 April 1998     

The use of Si carriers for aerosol particle collection and subsequent elemental analysis by total-reflection X-ray fluorescence spectrometry

The adoption of polished Si carriers was studied for the sensitive elemental analysis of aerosol particles using total-reflection X-ray fluorescence (TXRF) spectrometry. The surface roughness of the Si carrier measured by atomic force microscopy was found to be smaller than those of glassy carbon and quartz glass carriers, which are commonly used for TXRF analysis. The detection limits of elements for the Si carrier were superior to those for the glassy carbon and the quartz glass carriers, presumably due to its smaller surface roughness. For example, the detection limit of Sr for the Si carrier was 9 pg, which was 100 times and 3 times lower than those for the glassy carbon and the quartz glass carriers, respectively. The Si carriers could be successfully applied to the direct aerosol particle collection by impaction and the subsequent elemental analysis by TXRF. From the results of the elemental analysis of aerosol particles, the variations in the concentrations of K, Ca, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn Sr and Pb with time could be clarified.     

X-ray fluorescence analysis in the ng region using total reflection of the primary beam

The article describes the experimental set-up for producing X-ray fluorescent spectra with an essentially reduced background. This is achieved by total reflection of X-rays at a plane, smooth surface of a suitable reflector material. Suprasil (quartz) and germanium are used as reflectors. Liquid samples (1–5 μl) are placed in the centre of the reflector and dried. The experimental facilities enabled the authors to attain detection limits in the ng region with energy dispersive X-ray fluorescence analysis.     

An electrochemical enrichment procedure for the determination of heavy metals by total-reflection X-ray fluorescence spectroscopy

An electrolytic separation and enrichment technique was developed for the determination of trace elements by total-reflection X-ray fluorescence spectroscopy (TXRF). The elements of interest are electrodeposited out of the sample solution onto a solid, polished disc of pure niobium which is used as sample carrier for the TXRF measurement. The electrochemical deposition leads to a high enrichment of the analytes and at the same time to a removal of the matrix. This results in substantially improved detection limits in the lower picogram per gram region. The deposited elements are directly measured by TXRF without any further sample preparation step. The homogeneous thin layer of the analytes is an ideal sample form for TXRF, because scattered radiation from the sample itself is minimized. The proposed sample preparation method is useful particularly for the analysis of heavy metals in liquid samples with for TXRF disturbing matrices, e.g. sea water.