气相反应对CVD生长石墨烯的影响

化学气相沉积法(CVD)制备的石墨烯薄膜具有质量高、均匀性好、层数可控且可放大等优点,近年来受到了学术界和工业界的广泛关注。在高温CVD生长过程中,除衬底表面的反应外,气相反应同样会影响石墨烯的生长行为和薄膜质量。本文将综述气相反应对CVD生长石墨烯的影响：首先对CVD体系内的气相传质过程和气相反应进行了详细讨论;随后系统介绍了基于气相调控提高石墨烯的结晶性、洁净度、畴区尺寸、层数和生长速度的相关策略及其机理;最后对气相反应影响CVD生长石墨烯的规律进行总结,并展望了未来可能的发展方向。     

A systematically generated, pressure-dependent mechanism for high-conversion ethane pyrolysis. 1. Pathways to the minor products

The deposition of carbon during hydrocarbon pyrolysis is part of many industrial processes. The rate and nature of deposition depend, in part, on the gas-phase chemistry of the minor pyrolysis products, which serve as deposition precursors. But the specific reaction pathways governing the formation and destruction of these minor gas-phase products are only partially known. We apply an updated version of our automated mechanism generation tool XMG-PDep to the high-conversion, pyrocarbon-depositing ethane pyrolysis system of Glasier and Pacey, to systematically uncover the likely reaction pathways governing the observed minor products acetylene, propylene, 1,3-butadiene, and benzene. Thorough examination by means of sensitivity, equilibrium, and reaction-pathway analyses reveals an extremely complex, intertwined set of reaction pathways controlling these deposition precursors, some of which are not often considered in the wider pyrolysis literature. Large, aggregated sets of disproportionation reactions, for example, appear to play an important role in the formation of benzene. The analyses motivate a companion paper (following paper in this issue) which explores in greater depth the effects of large groups of radical disproportionation reactions, omitted reaction families, and the possibility that pressure changes in the reactor could alter the distribution of the deposition precursors.     

Density functional theory study of small vanadium oxide clusters

Density functional theory is employed to study structure and stability of small neutral vanadium oxide clusters in the gas phase. BPW91/LANL2DZ level of theory is used to obtain structures of VOy (y=1-5), V2Oy (y=2-7), V3Oy (y=4-9), and V4Oy (y=7-12) clusters. Enthalpies of growth and fragmentation reactions of the lowest energy isomers of vanadium oxide molecules are also obtained to study the stability of neutral vanadium oxide species under oxygen saturated gas-phase conditions. Our results suggest that cyclic and cage-like structures are preferred for the lowest energy isomers of neutral vanadium oxide clusters, and oxygen-oxygen bonds are present for oxygen-rich clusters. Clusters with an odd number of vanadium atoms tend to have low spin ground states, while clusters with even number of vanadium atoms have a variety of spin multiplicities for their ground electronic state. VO2, V2O5, V3O7, and V4O10 are predicted to be the most stable neutral clusters under the oxygen saturated conditions. These results are in agreement with and complement previous gas-phase experimental studies of neutral vanadium oxide clusters.     

有机质谱学法研究气相S_N2离子－分子反应进展

总结了近年来应用质谱方法研究气相SN2离子－分子反应的进展，主要包括气 相SN2离子－分子反应的机理，动力学和热力学的各种因素。与凝固相中反应对比 ，阐明了影响反应机理、方向与程度的决定性因素，及溶剂化效应对凝聚相中反应 的影响方式。还介绍了一些气相中特有的SN2离子－分子反应和研究气相反应特殊 的质谱学研究方法与技术。     

Plasma polymerization anda-C:H film ablation in microwave discharges in methane diluted with argon and hydrogen

Neutral hydrocarbons are observed from a microwave discharge in a fast flow of (A) 0.5–6% methane in argon, (B) 0.5–6% methane in hydrogen, and (C) hydrogen over a previously depositeda-C:H film. System (A) produces polyacetylenic and other hydrocarbons through C₈ by predominantly gas-phase reactions and deposits ana-C: H film. Reactions under conditions (B) and (C) produce hydrocarbon radicals and molecules with masses through 300 that in case (B) arise from both gas-phase reactions and film ablation, and in case (C) from film ablation alone. Proposals are made for the mechanisms of gas-phase polymerization, film deposition, and ablation. Hydrocarbon ions observed downstream from these discharges appear to arise from ionization of neutral species with a distribution determined by subsequent ion-molecule reactions and selective diffusion losses.Work supported by NSF Grant CHE-87-21744.     

Theoretical study of the pyrolysis of methyltrichlorosilane in the gas phase. 1. Thermodynamics

Structures and energies of the gas-phase species produced during and after the various unimolecular decomposition reactions of methyltrichlorosilane (MTS) with the presence of H2 carrier gas were determined using second-order perturbation theory (MP2). Single point energies were obtained using singles + doubles coupled cluster theory, augmented by perturbative triples, CCSD(T). Partition functions were obtained using the harmonic oscillator-rigid rotor approximation. A 114-reaction mechanism is proposed to account for the gas-phase chemistry of MTS decompositions. Reaction enthalpies, entropies, and Gibbs free energies for these reactions were obtained at 11 temperatures ranging from 0 to 2000 K including room temperature and typical chemical vapor deposition (CVD) temperatures. Calculated and experimental thermodynamic properties such as heat capacities and entropies of various species and reaction enthalpies are compared, and theory is found to provide good agreement with experiment.     

Carbon nitride formation in gas-phase reactions of CH4, NH3 and H2: an ab initio study

Ab initio QCISD(T)/6-311++(2d,2p) calculations have been carried out for an extensive study of gas-phase reactions among CH₄, NH₃ and their radicals. Our study shows that stable HCN molecules are readily formed by successive H abstraction reactions. Some of the reactions are strongly exothermic and have negligible energy barriers. In agreement with some recent experiments, our results indicate that H abstraction reactions, which make the chemical vapor deposition of diamond thin films successful, do not favor the formation of carbon nitride thin films.     

叔丁氧基自由基引发氢迁移过程的理论研究

采用多种密度泛函理论方法(如CAM-B3LYP, M062x和wB97x方法), 并辅以极化连续介质模型对叔丁氧基自由基(^tBuO·)与一系列胺类、 烷烃、 醇类和醚类反应物之间氢迁移反应的反应机理进行研究. 计算结果表明, 这类氢迁移反应主要受熵的控制. 通过对液相平动熵和气相平动熵得到的活化自由能数据进行对比, 可以看出, 使用气相平动熵得出的活化自由能明显偏高于实验测量值, 而以液相平动熵计算的反应活化自由能垒与实际结果相近, 3种方法对胺类和烷烃类反应物体系得出的结果更可靠, 对醇类和醚类反应物体系自由能垒则略低.     

纳米TiO_2的制备及其改性和应用研究进展

简要介绍了TiO2纳米材料的制备、改性方法及其应用;其制备方法包括气相法和液相法,液相法又包括溶胶-凝胶法、水热/溶剂热法、液相沉积法和微乳液法;其改性主要包括贵金属沉积、离子掺杂、染料敏化和半导体复合;其应用领域则主要包括光催化、光伏电池和光解水.     

Effect of Si-H bond on the gas-phase chemistry of trimethylsilane in the hot wire chemical vapor deposition process

The effect of the Si-H bond on the gas-phase reaction chemistry of trimethylsilane in the hot-wire chemical vapor deposition (HWCVD) process has been studied by examining its decomposition on a hot tungsten filament and the secondary gas-phase reactions in a reactor using a soft laser ionization source coupled with mass spectrometry. Trimethylsilane decomposes on the hot filament via Si-H and Si-CH(3) bond cleavages. A short-chain mechanism is found to dominate in the secondary reactions in the reactor. It has been shown that the hydrogen abstractions of both Si-H and C-H occur simultaneously, with the abstraction of Si-H being favored. Tetramethylsilane and hexamethyldisilane are the two major products formed from the radical recombination reactions in the termination steps. Three methyl-substituted disilacyclobutane molecules, i.e., 1,3-dimethyl-1,3-disilacyclobutane, 1,1,3-trimethyl-1,3-disilacyclobutane, and 1,1,3,3-tetramethyl-1,3-disilacyclobutane are also produced in reactor from the cycloaddition reactions of methyl-substituted silene species. Compared to tetramethylsilane and hexamethyldisilane, a common feature with trimethylsilane is that the short-chain mechanism still dominates. However, a more active involvement of the reactive silene intermediates has been found with trimethylsilane.     

From "parasitic" association reactions toward the stoichiometry controlled gas phase synthesis of nanoparticles: a theoretically driven challenge for experimentalists

In the present record a model for the gas-phase reactions during the chemical vapor deposition (CVD) processes of group 13-15 materials is presented, based on the results of extensive quantum-chemical modeling. Thermodynamic criteria have been introduced to evaluate the importance of a range of association reactions. For the organometallic and hydride derivatives, association processes are found to be favorable both thermodynamically and kinetically. Formation of high mass association products takes place under CVD conditions, including laser-assisted CVD. Structural and thermodynamic properties of the most important ring and cluster intermediates have been predicted. The stoichiometry-controlled synthesis of the 13-15 ternary alloys and nanoparticles using cluster compounds as single-source precursors is predicted to be viable. The association pathway described may be generalized to the CVD reactions of many binary materials (12-16, 13-16, 13-15, 14-15, 14-16).     

Plasma electrochemistry: electroreduction in a flame

The manipulation of electron transfer reactions at surfaces forms the cornerstone of electrodeposition and processing of materials on substrates with precise control of stoichiometry and oxidation state. However, the utility of this technique, which is mainly carried out in liquid electrolytes, is ultimately limited by the electrolysis of the solvent which limits a potential window to at best 4.8 V in nonaqueous solutions (A. J. Bard and L. R. Faulkner, Electrochemical Methods: Fundamentals and Applications, Wiley, New York, NY, 2nd edn, 2001; ref. 1) and can be up to 6 V in ionic liquids (A. P. Abbott, K. J. McKenzie, Phys. Chem. Chem. Phys., 2006, 8, 4265-4279; ref. 2). A long-sought-after goal has been to develop a corresponding technique at the solid/gas interface in the absence of a solvent which will allow in principle a potential window in excess of 100 V (J. M. Goodings, J. Guo, A. N. Hayhurst and S. G. Taylor, Int. J. Mass Spectrom., 2001, 206, 137-151; ref. 3). This extended potential window will enable chemistry at the solid/gas interface that is not possible at the solid/liquid interface. Here we describe a new approach to gas-phase electrochemistry using a flame plasma as the electrolyte medium. We demonstrate the controlled electrochemical reduction of Cu(+) to Cu(0) at an electrode surface in a flame environment with resulting deposition of either Cu(2)O or Cu species on conducting diamond electrodes. This approach is novel in that it involves the application of an electrochemical potential difference to change the redox state of surface confined species, not the measurement of flame bore ions (as in flame ionisation detectors). This new technique will permit deposition of films and particles on surfaces with control over the oxidation state of the species. This will provide a valuable enhancement to the capabilities of materials preparation methods such as flame spray deposition.     

Breaking bonds of open-shell species with the restricted open-shell size extensive left eigenstate completely renormalized coupled-cluster method

The recently developed restricted open-shell, size extensive, left eigenstate, completely renormalized (CR), coupled-cluster (CC) singles (S), doubles (D), and noniterative triples (T) approach, termed CR-CC(2,3) and abbreviated in this paper as ROCCL, is compared with the unrestricted CCSD(T) [UCCSD(T)] and multireference second-order perturbation theory (MRMP2) methods to assess the accuracy of the calculated potential energy surfaces (PESs) of eight single bond-breaking reactions of open-shell species that consist of C, H, Si, and Cl; these types of reactions are interesting because they account for part of the gas-phase chemistry in the silicon carbide chemical vapor deposition. The full configuration interaction (FCI) and multireference configuration interaction with Davidson quadruples correction [MRCI(Q)] methods are used as benchmark methods to evaluate the accuracy of the ROCCL, UCCSD(T), and MRMP2 PESs. The ROCCL PESs are found to be in reasonable agreement with the corresponding FCI or MRCI(Q) PESs in the entire region R = 1-3Re for all of the studied bond-breaking reactions. The ROCCL PESs have smaller nonparallelity error (NPE) than the UCCSD(T) ones and are comparable to those obtained with MRMP2. Both the ROCCL and UCCSD(T) PESs have significantly smaller reaction energy errors (REE) than the MRMP2 ones. Finally, an efficient strategy is proposed to estimate the ROCCL/cc-pVTZ PESs using an additivity approximation for basis set effects and correlation corrections.     

Decomposition of hexamethyldisilane on a hot tungsten filament and gas-phase reactions in a hot-wire chemical vapor deposition reactor

To study the effect of an Si-Si bond on gas-phase reaction chemistry in the hot-wire chemical vapor deposition (HWCVD) process with a single source alkylsilane molecule, soft ionization with a vacuum ultraviolet wavelength of 118 nm was used with time-of-flight mass spectrometry to examine the products from the primary decomposition of hexamethyldisilane (HMDS) on a heated tungsten (W) filament and from secondary gas-phase reactions in a HWCVD reactor. It is found that both Si-Si and Si-C bonds break when HMDS decomposes on the W filament. The dominance of the breakage of Si-Si over Si-C bond has been demonstrated. In the reactor, the abstraction of methyl and H atom, respectively, from the abundant HMDS molecules by the dominant primary trimethylsilyl radicals produces tetramethylsilane (TMS) and trimethylsilane (TriMS). Along with TMS and TriMS, various other alkyl-substituted silanes (m/z = 160, 204, 262) and silyl-substituted alkanes (m/z = 218, 276, 290) are also formed from radical combination reactions. With HMDS, an increasing number of Si-Si bonds are found in the gas-phase reaction products aside from the Si-C bond which has been shown to be the major bond connection in the products when TMS is used in the same reactor. Three methyl-substituted 1,3-disilacyclobutane species (m/z = 116, 130, 144) are present in the reactor with HMDS, suggesting a more active involvement from the reactive silene intermediates.     

Kinetic aspects of chemical control over flame propagation in combustible gases

Kinetic aspects of controlling ignition and flame propagation parameters in the gas phase by chemical methods are considered. The efficiency of the chemical methods is due to the branched chain character of gas-phase combustion reactions and the dominant role of the competition between chain branching and chain termination in these processes.     

A Global Model of Chemical Vapor Deposition of Silicon Dioxide by Direct-Current Corona Discharges in Dry Air Containing Octamethylcyclotetrasiloxane Vapor

A model of the electron distribution in direct current corona plasmas is combined with a global chemistry model and a two-dimensional transport model to predict the rate of chemical vapor deposition of silicon dioxide on the discharge wire in both positive and negative discharges in dry air containing octamethylcyclotetrasiloxane. The gas-phase chemistry includes reactions to form atomic oxygen (O) and additional global reactions to form gaseous silicon dioxide precursors by the impact reactions of electrons and atomic oxygen with silicone molecules. Surface chemistry is approximated by a single step global reaction from gaseous to solid silicon dioxide. The rate coefficient between atomic oxygen and octamethylcyclotetrasiloxane is estimated from prior experiments to be on the order of 10^–12 cm³/molecule-s. The effects of discharge polarity, current, wire radius and air velocity (Peclet number for mass transfer) on the deposition rate are considered. Deposition rates can be minimized by using positive coronas instead of negative coronas for Peclet number less than 18.5. At higher Peclet numbers, the deposition rate is slightly higher in positive corona discharges, but devices used indoors should continue to use the positive corona in order to minimize the production of ozone. The deposition rate in the positive corona is relatively insensitive to air velocity for velocities from 0.044 to 10 m/s^–1 . However,it may be minimized by operating the corona with the lowest current that provides adequate performance (e.g., particle charging) and the smallest wire that provides adequate mechanical strength.     

Theoretical and experimental consideration of the reactions between VxOy+ and ethylene

We present joint theoretical and experimental results which provide evidence for the selectivity of V(x)O(y)(+) clusters in reactions toward ethylene due to the charge and different oxidation states of vanadium for different cluster sizes. Density functional calculations were performed on the reactions between V(x)O(y)(+) and ethylene, allowing us to identify the structure-reactivity relationship and to corroborate the experimental results obtained by Castleman and co-workers (Zemski, K. A.; Justes, D. R.; Castleman, A. W., Jr. J. Phys. Chem. A 2001, 105, 10237). The lowest-energy structures for the V(2)O(2)(-)(6)(+) and V(4)O(8)(-)(10)(+) clusters and the V(2)O(3)(-)(6)(+)-C(2)H(4) and V(4)O(10)(+)-C(2)H(4) complexes, as well as the energetics for reactions between ethylene and V(2)O(4)(-)(6)(+) and V(4)O(10)(+) are presented here. The oxygen transfer reaction pathway was determined to be the most energetically favorable one available to V(2)O(5)(+) and V(4)O(10)(+) via a radical-cation mechanism.The association and replacement reaction pathways were found to be the optimal channels for V(2)O(4)(+) and V(2)O(6)(+), respectively. These results are in agreement with the experimental results reported previously. Experiments were also conducted for the reactions between V(2)O(5)(+) and ethylene to include an energetic analysis at increasing pressures. It was found that the addition of energy depleted the production of V(2)O(4)(+), confirming that a more involved reaction rather than a collisional process is responsible for the observed phenomenon. In this contribution we show that investigation of reactions involving gas-phase cationic vanadium oxide clusters with small hydrocarbons is suitable for the identification of reactive centers responsible for selectivity in heterogeneous catalysis.     

Characterization of a DAPI-RIT-DAPI System for Gas-Phase Ion/Molecule and Ion/Ion Reactions

The discontinuous atmospheric pressure interface (DAPI) has been developed as a facile means for efficiently introducing ions generated at atmospheric pressure to an ion trap in vacuum [e.g., a rectilinear ion trap (RIT)] for mass analysis. Introduction of multiple beams of ions or neutral species through two DAPIs into a single RIT has been previously demonstrated. In this study, a home-built instrument with a DAPI-RIT-DAPI configuration has been characterized for the study of gas-phase ion/molecule and ion/ion reactions. The reaction species, including ions or neutrals, can be introduced from both ends of the RIT through the two DAPIs without complicated ion optics or differential pumping stages. The primary reactant ions were isolated prior to reaction and the product ions were mass analyzed after controlled reaction time period. Ion/molecule reactions involving peptide radical ions and proton-transfer ion/ion reactions have been carried out using this instrument. The gas dynamic effect due to the DAPI operation on internal energy deposition and the reactivity of peptide radical ions has been characterized. The DAPI-RIT-DAPI system also has a unique feature for allowing the ion reactions to be carried out at significantly elevated pressures (in 10^–1 Torr range), which has been found to be helpful to speed up the reactions. The viability and flexibility of the DAPI-RIT-DAPI system for the study of gas-phase ion reactions have been demonstrated.

IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

IR laser-induced gas-phase photolysis of Fe(CO)(5)-SiH(4) mixtures occurs as SiH(4)-photosensitized decomposition of Fe(CO)(5) is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi(2) and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe(1.6)SiO(4), carbon-encaged iron disilicide, FeSi(2), and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.     

Benchmark calculations of proton affinities and gas-phase basicities of molecules important in the study of biological phosphoryl transfer

Benchmark calculations of proton affinities and gas-phase basicities of molecules most relevant to biological phosphoryl transfer reactions are presented and compared with available experimental results. The accuracy of proton affinity and gas-phase basicity results obtained from several multi-level model chemistries (CBS-QB3, G3B3, and G3MP2B3) and density-functional quantum models (PBE0, B1B95, and B3LYP) are assessed and compared. From these data, a set of empirical bond enthalpy, entropy, and free energy corrections are introduced that considerably improve the accuracy and predictive capability of the methods. These corrections are applied to the prediction of proton affinity and gas-phase basicity values of important biological phosphates and phosphoranes for which experimental data does not currently exist. Comparison is made with results from semiempirical quantum models that are commonly employed in hybrid quantum mechanical/molecular mechanical simulations. Data suggest that the design of improved semiempirical quantum models with increased accuracy for relative proton affinity values is necessary to obtain quantitative accuracy for phosphoryl transfer reactions in solution, enzymes, and ribozymes.