Electrical properties of p-type ZnGeP2 irradiated by H+ ions

The properties of p-type ZnGeP₂ [p₀=(5–10)·10¹⁰ cm^–3, ₀=(2–5)·10^–7 (·cm)^–1], irradiated with H⁺ ions [E=5 MeV, T_irr=300 K, D=(1·10¹²–1.7·10¹⁶) cm^–2] are studied. An increase in the resistivity (to gr_max - 5·10¹¹ ·cm) and subsequent reduction in for large currents of H⁺ ions ( - 9·10⁸ ·cm for D - 1.7·10¹⁶ cm^–2), is observed in irradiated crystals. The resistivity of irradiated p-type ZnGeP₂ is found to be very sensitive to hydrostatic pressure [(4–5)·10^–5 bar^–1]. The annealing of radiation defects in the temperature interval (20–600) °C is examined.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 91–93, October, 1991.     

Electrophysical properties and annealing of defects in nuclear transmutation-doped GaAs irradiated by H+ ions

A study has been made of the electrophysical characteristics of nuclear-transmutation-doped GaAs (NTDG) and GaAs doped with metallurgical impurities Sn, Te, Ge, and In, after irradiation by H⁺ ions at fluxes of up to 1.5·10¹⁶ cm^–2. It is shown that the changes in the GaAs produced by irradiation do not depend on the method used to dope the material and can be described on the basis of the known spectrum of E and H traps in GaAs. Crystals of GaAs annealed after irradiation display deep (P1–P3) traps, which are responsible for the high-temperature proton insulation GaAs.V. D. Kuznetsov Siberian Physicotechnical Institute at the State University, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 10, pp. 61–65, October, 1992.     

Electrical and optical properties and stabilization of the Fermi level in GaP crystals irradiated by electrons and H+ ions

Electrical and optical properties and Fermi level stabilization are studied in GaP crystals irradiated by electrons (E2.2 MeV, D1·10¹⁹ cm^–2) and H⁺ ions (E5 MeV, D1.7·10¹⁶ cm^–2). It is shown that the limiting position of the Fermi level (F_limE_G/2±0.2 eV) is independent of the initial GaP parameters and the type of bombarding particle, but is determined by the condition of local neutrality of the defective GaP. Resistivity values for the irradiated specimens of _max(D)1·10¹³ ·cm were obtained at 300 K. At maximum integral particle fluxes a decrease in crystal resistivity to (3–6)·10⁹ ·cm was observed. The readjustment of GaP absorption spectra in the region hvE_G upon irradiation is related to recharging of gap states by radiation defects upon motion of the Fermi level toward F_lim.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 12, pp. 37–42, December, 1994.     

Electrical properties of Cd,Zn and S ion-implanted layers in GaAs

The electrical properties of cadmium, zinc, and sulfur ion-implanted layers in gallium arsenide have been measured by the van der Pauw-Hall technique. Ion implantation was performed with the substrates held at room temperature. The dependence of sheet resistivity, surface carrier concentration, and mobility on ion dose and on post-implantation anneal temperature was determined. In the case of 60 keV Cd⁺ ions implanted into n-type substrates, a measurable p-type layer resulted when samples were annealed for 10 minutes at a temperature in the range 600—900°C. After annealing at 300—900°C for 10 minutes, 100 per cent electrical activity of the Cd ions resulted for ion doses ≤ 10¹⁴/cm².

The properties of p-type layers produced by implantation of 85 keV Zn⁺ ions were similar to those of the 60 keV cadmium-implanted layers, in that no measurable p-type behavior was observed in samples annealed below a relatively high temperature. However, in samples implanted with 20 keV Zn⁺ ions a p-type layer was observed after annealing for 10 minutes at temperatures as low as 300°C.

Implantation of sulfur ions into p-type GaAs substrates at room temperature resulted in the formation of a high resistivity n-type layer, evcn before any annealing was performed. Annealing at temperatures up to 200°C or above 600°C lowered the resistivity of the layer, while annealing in the range 300—500°C eliminated the n-type layer.     

Electrical properties of ion-doped GaAs films obtained by implanting E=100-keV Cd+ ions

A study is made of the influence of the conditions of ion implantation (T_p, D) and subsequent heat treatment (T_ann, t_ann) on the implantation efficiency and the electrical properties of ion-doped films obtained by implanting Cd⁺ ions.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 40–44, January, 1981.     

Electrical conduction properties of Si δ-doped GaAs grown by MBE

The temperature dependent Hall effect and resistivity measurements of Si δ-doped GaAs are performed in a temperature range of 25–300 K. The temperature dependence of carrier concentration shows a characteristic minimum at about 200 K, which indicates a transition from the conduction band conduction to the impurity band conduction. The temperature dependence of the conductivity results are in agreement with terms due to conduction band conduction and localized state hopping conduction in the impurity band. It is found that the transport properties of Si δ-doped GaAs are mainly governed by the dislocation scattering mechanism at high temperatures. On the other hand, the conductivity follows the Mott variable range hopping conduction (VRH) at low temperatures in the studied structures.     

Investigation of 4H-SiC epitaxial layers implanted by Al ions

4H-SiC epitaxial layers 26 μm thick with N _d ?N _a = 1 × 10¹⁵ cm^?3 grown by the CVD method on 4H-SiC commercial wafers were implanted by Al ions with energy of 100 keV and a dose of 5 × 10¹⁶ cm^?2. To produce the p ⁺?n junction, a rapid thermal annealing for 15 s at 1700°C was used. The obtained samples were studied by the local cathodoluminescence, X-ray diffractometry, and transmission electron microscopy. It was established that under specified conditions of implantation, the width of a region with a high content of radiation defects exceeded by two orders of magnitude, the depth of the projective range of Al ions and was equal to 40 μm. This result is explained by the combined contribution of the radiation enhanced defect diffusion and long-range action effect. A short-term high-temperature annealing resulted in the recrystallization of the specimen surface layer and enhancement of CVD layer structure.     

Electrophysical properties of GaAs layers and the characteristics of fast particle GaAs detectors

Results of complex experiments aimed at finding a relationship between the properties of initial GaAs single-crystal wafers and epitaxial films and the threshold spectrometric characteristics of ionizing radiation detectors are reported.     

Electrical properties of DX centers in GaAs and AlGaAs

Abstract

The DX center, the lowest energy state of the donor in AIGaAs with x < 0.22, is responsible for the reduced conductivity as well as the persistent photoconductivity observed in this material at low temperature. Extensive studies of the properties of this deep level in Si-doped AIGaAs are reviewed here. Data are presented showing that the characteristics of the DX center remain essentially unchanged when it is resonant with the conduction band (x < 0.22) and that, independent of other compensation mechanisms, the DX center therefore limits the free carrier concentration in Si-doped GaAs to a maximum of about 2 × 10¹⁹ cm^?3. Recent measurements suggesting that the lattice relaxation involves the motion of the Si atom from the substitutional site toward an interstitial site are also presented. Evidence for the negative U model, that the DX level is the two electron state of the substitutional donor, is discussed.     

Relationship of properties of MBE grown GaAs layers with growth conditions

Reflection medium energy electron diffraction, scanning electron microscope and measurements of angular dependence of reflectivity in vacuum ultraviolet region, low-temperature photoluminescence and Hall effect were used to study surface structure and morphology and optical and electrical properties of GaAs layers grown by molecular beam epitaxy (MBE) and influence of growth conditions on their properties. The quality of MBE GaAs layers depends strongly on the growth conditions. The residual background impurities in MBE system and other contamination sources degrade the optical and electrical quality and can influence the formation of macroscopic defects. The incorporation of background impurities and the formation of vacancy-impurity complexes are dramatically affected by As₄ to Ga flux ratio at a given growth temperature and suppressed strongly under growth conditions with slight As excess which ensures to maintain the As-stabilised surface. The growth under such conditions results in improved electrical and optical properties and satisfactory surface morphology.The authors are indebted to Dr. J. Oswald for the measurements of PL spectra, to Drs. M. imecková and K. Jurek for their kind assistance in SEM investigation and for taking SEI and X-ray microprobe analyses, to Ing. O. tika for the measurements of thickness of the layers and to Dr. P. Doubrava for the Hall effect measurements in several samples. For the use of facilities to measure the Hall effect the thanks are also due to Dr. V. míd.     

Characterization of MOVPE-grown GaAs layers by C-V analysis

A computer simulation study of the capacitance of a surface space charge layer in undoped n-GaAs grown by metalorganic vapour phase epitaxy is presented. The effect of the deep donor level EL2 on the surface capacitance of epilayers with an ideal free surface is estimated. In order to approach the as-grown layer surface the model used is extended considering MIS and Schottky-barrier structures and their voltage-capacitance curves are analysed. The theoretical C-V dependences are compared with experimental C-V curves of a real structure including N⁺-GaAs substrate, undoped n-GaAs epitaxial layer containing EL2 levels and thin native oxide. Conditions are determined at which the EL2 levels as well as the native oxide film may influence the capacitance characteristics.     

Swelling of metallic surfaces irradiated by helium ions

At doses close to threshold for exfoliation or bubble formation the surfaces have been investigated by SEM and, after isolation of surface layers, also by RBS. Swelling as a function of energy and material has been determined. The data are interpreted in the form of volume occupied by a helium atom. We find an indication for a volume decrease with increasing energy. A special example of blister formation is also discussed, where we find evidence for a non-uniform fracture plane.     

Electrical properties and defect model of tin-doped indium oxide layers

Tin-doped In₂O₃ layers were prepared by the spray technique with doping concentrationsc _Sn between 1 and 20 at. % and annealed at 500 °C in gas atmospheres of varying oxygen partial pressures. The room-temperature electrical properties were measured. Maximum carrier concentrationsN=1.5×10²¹cm^–3 and minimum resistivities =1.3×10^–4 cm are obtained if the layers are doped withc _Sn9 at. % and annealed in an atmosphere of oxygen partial pressurep _O2 10^–20 bar. At fixed doping concentration, the carrier mobility increases with decreasing oxygen pressure. The maximum obtainable mobility can be described in terms of electron scattering by ionized impurities. From an analysis of the carrier concentration and additional precision measurements of the lattice constants and film thicknesses, a defect model for In₂O₃:Sn is developed. This comprises two kinds of interstitial oxygen, one of which is loosely bound to tin, the other forming a strongly bound Sn₂O₄ complex. At low doping concentrationc _Sn4 at. % the carrier concentration is governed by the loosely bound tin-oxygen defects which decompose if the oxygen partial pressure is low. The carrier concentration follows from a relationN=K ₁ ·p _O2 ^–1/8 ·(3 ×10¹⁰ × c_Sn –N)^1/4 with an equilibrium constantK ₁=1.4×10¹⁵ cm^–9/4bar^1/8, determined from our measurements.     

多波长飞秒激光激发下GaAs纳米线SHG特性研究

本文基于有限元法研究了直立生长于GaAs衬底的GaAs纳米线的光场响应和光场增强性质. 实验使用多个波长的飞秒激光脉冲激发GaAs纳米线, 测得了较高效率的二次谐波信号, 并首次使用宽带超连续飞秒脉冲 (1000–1300 nm) 在纳米线上获取了宽带、无杂散荧光噪声的二次谐波信号. 这种高效的二次谐波产生过程主要归因于纳米结构引起的局域场增强效应. 本文阐明了GaAs纳米线的二次谐波倍频特性, 这些结果对于其在纳米光学中的光器件、 光集成等领域的进一步研究和实际应用具有很好的参考价值. 关键词： GaAs纳米线 二次谐波 飞秒激光     

Electrical transport and persistent photoconductivity in quantum dot layers in InAs/GaAs structures

The conductivity of quantum dot layers is studied in InAs/GaAs structures in the temperature range from 300 to 0.05 K in the dark and using two types of illumination in magnetic fields up to 6 T. Depending on the initial concentration of current carriers, the conductivity of the structures varied from metallic (the Shubnikov-de Haas effect was observed) to hopping conductivity. At low temperatures, the temperature dependence of the resistance changed from the Mott dependence to the dependence described by the Shklovskii-Efros law for hopping conductivity in the presence of the Coulomb gap in the density of states. The conductivity of samples was studied upon their illumination at λ = 791 nm and λ > 1120 nm. All the samples exhibited a positive persistent photoconductivity at T < 250 K. The structures were also studied using photoluminescence and an atomic force microscope.     

N+GaAs subpicosecond photodetector irradiated by fast neutrons

We report experimental results of the characterization of an N⁺GaAs photodetector irradiated by fast neutrons with flux up to doses of 4×10¹⁷ n/cm² using a constructed electro-optic sampling system and illumination with 80-fs-wide laser pulses. The investigated N⁺GaAs sample was compared with the same non-irradiated sample. The device shows a response time of 680 fs full width at half maximum (648 GHz, 3-dB bandwidth) with a voltage amplitude of 3.1 mV. Changes in the shape of the electrical signal for different beam power excitations and bias voltages have been demonstrated. Using X-ray diffraction and diffuse scattering analyses, we have observed a decrease of the lattice constant and an almost three times decreased radius of nanoclusters; the density dislocations increased by over four times after neutron irradiation.     

Raman scattering by two-phonons and fractons in irradiated GaAs

The second-order transverse acoustic mode and amorphous Raman modes, originating from a continuous random network and medium range ordering (MRO), in high energy light ion (HELI) irradiated GaAs are investigated. The change in the phonon density of states of the transverse acoustic mode phonon distinguishes the effect of HELI irradiation on highly resistive undoped and chromium-doped GaAs. The boson mode, originating from the MRO of the system, has been identified and a model based on phonon-fracton scattering has been used for the explanation of this “boson mode”. The spectral dimension, correlation length and the scaling factor, with which the elastic constant varies with length in MRO regions in GaAs, are estimated.