Formation process for and strain effect in InAs quantum dots grown on GaAs substrates by using molecular beam epitaxy

Reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM) measurements were used to investigate the dependences of the formation process and the strain on the As/In ratio and the substrate temperature of InAs quantum dots (QDs) grown on GaAs substrates by using molecular beam epitaxy. The thickness of the InAs wetting layer and the shape and the size of the InAs QDs were significantly affected by the As/In ratio and the substrate temperature. The strains in the InAs layer and the GaAs substrate were studied by using RHEED patterns. The magnitude in strain of the InAs QDs formed at a low substrate temperature was larger than that in InAs QDs grown at high substrate temperature. The present results can help to improve the understanding of the formation process and the strain effect in InAs QDs.     

Broadband light emitting from multilayer-stacked InAs/GaAs quantum dots

We report the effect of the GaAs spacer layer thickness on the photoluminescence(PL) spectral bandwidth of InAs/GaAs self-assembled quantum dots(QDs).A PL spectral bandwidth of 158 nm is achieved with a five-layer stack of InAs QDs which has a 11-nm thick GaAs spacer layer.We investigate the optical and the structural properties of the multilayer-stacked InAs/GaAs QDs with different GaAs spacer layer thicknesses.The results show that the spacer thickness is a key parameter affecting the multi-stacked InAs/GaAs QDs for wide-spectrum emission.     

Thermal activation and thermal transfer of localized excitons in InAs self-organized quantum dots

We have investigated the temperature dependence of photoluminescence (PL) properties of a number of InAs/GaAs heterostructures with InAs layer thickness ranging from 0.5 monolayer (ML) to 3 ML. The temperature dependence of the InAs exciton energy and linewidth was found to display a significant difference when the InAs layer thickness is smaller or larger than the critical thickness around 1.7 ML, indicating spontaneous formation of quantum dots (QDs). A model, involving exciton recombination and thermal activation and transfer, is proposed to explain the experimental data. In the PL thermal quenching study, the measured thermal activation energies of different samples demonstrate that the InAs wetting layer may act as a barrier for thermionic emission of carriers in high quality InAs multilayers, while in InAs monolayers and submonolayers the carriers are required to overcome the GaAs barrier to thermally escape from the localized states.     

Atomic layer molecular beam epitaxy growth of InAs on GaAs substrates

InAs layers with thickness ranging from 0.1 to 2.5 m have been grown directly on highly mismatched (7.4%) (001) GaAs substrates by atomic layer molecular beam epitaxy (ALMBE). This growth method, based on the modulated deposition of one or both component species, provides InAs layers with excellent flat morphology, independently of the total thickness. A detailed study of the evolution of the electron diffraction (RHEED) pattern indicates that a complete decoupling between the InAs epitaxial layer and the GaAs substrate is reached in less that 10 monolayers. Evidence is obtained that layer-by-layer nucleation takes place from the beginning of the growth.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

InAs/GaAs柱形岛的制备及特性研究

利用固源分子束外延（MBE）的方法经SK模式自组装生长由多层InAs／GaAs量子点组成的柱形岛.具体分析了GaAs间隔层厚度，生长停顿时间以及InAs淀积量对发光峰波长的影响.原子力显微镜（AFM）结果显示柱形岛表面的形状和尺寸都比较均匀；室温下不同高度的柱形岛样品的发光波长分别达到1.32和1.4μm，而单层量子点的发光波长仅为1.1μm，充分说明了量子点高度对发光波长的决定性影响，这为调节量子点发光波长提供了一种直观且行之有效的方法. 关键词： 柱形岛 生长停顿 间隔层厚度 PL谱     

The improvement of InAs/GaAs quantum dot properties capped by Graphene

InAs self‐assembled quantum dots (QDs) were grown by molecular beam epitaxy on (001) GaAs substrate. Uncapped and capped QDs with GaAs and graphene layers were studied using atomic force microscopy and Raman spectroscopy. Graphene multi‐layer was grown by chemical vapor deposition and transferred on InAs/GaAs QDs. It is well known that the presence of a cap layer modifies the size, shape, and density of the QDs. According to the atomic force microscopy study, in contrast to the GaAs capped sample, which induce a dramatic decrease of the density and height of dots, graphene cap layer sample presents a slight influence on the surface morphology and the density of the islands compared with the uncapped one. The difference shown in the Raman spectra of the samples is due to change of strain and alloy disorder effects on the QDs. Residuals strain and the relaxation coefficients have been investigated. All results confirm the best crystalline quality of the graphene cap layer dots sample relative to the GaAs capped one. So graphene can be used to replace GaAs in capping InAs/GaAs dots. To our knowledge, such study has not been carried out until now. Copyright © 2013 John Wiley & Sons, Ltd.     

脉冲激光原位辐照对InAs/GaAs(001)量子点生长的影响

在InAs/GaAs(001)量子点生长过程中, 当InAs沉积量为0.9 ML时, 利用紫外纳秒脉冲激光辐照浸润层表面, 由于高温下In原子的不稳定性, 激光诱导的原子脱附效应被放大, 样品表面出现了原子层移除和纳米孔. 原子力显微镜测试表明纳米孔呈现以[110]方向为长轴(尺寸: 20-50 nm)、[110]方向为短轴(尺寸: 15-40 nm)的表面椭圆开口形状, 孔的深度为0.5-3 nm. 纳米孔的密度与脉冲激光的能量密度正相关. 脉冲激光的辐照对量子点生长产生了显著的影响: 一方面由于纳米孔的表面自由能低, 沉积的InAs优先迁移到孔内, 纳米孔成为量子点优先成核的位置; 另一方面, 孔外的区域因为In原子的脱附, 量子点的成核被抑制. 由于带有纳米孔的浸润层表面具有类似于传统微纳加工技术制备的图形衬底对量子点选择性生长的功能, 该研究为量子点的可控生长提供了一种新的思路.     

Tuning vertically stacked InAs/GaAs quantum dot properties under spacer thickness effects for 1.3 μm emission

Coherent InAs islands separated by GaAs spacer (d) layers are shown to exhibit self-organized growth along the vertical direction. A vertically stacked layer structure is useful for controlling the size distribution of quantum dots. The thickness of the GaAs spacer has been varied to study its influence on the structural and optical properties. The structural and optical properties of multilayer InAs/GaAs quantum dots (QDs) have been investigated by atomic force microscopy (AFM), transmission electron microscopy (TEM), and photoluminescence (PL) measurements. The PL full width at half maximum (FWHM), reflecting the size distribution of the QDs, was found to reach a minimum for an inter-dots GaAs spacer layer thickness of 30 monolayers (ML). For the optimized structure, the TEM image shows that multilayer QDs align vertically in stacks with no observation of apparent structural defects. Furthermore, AFM images showed an improvement of the size uniformity of the QDs in the last layer of QDs with respect to the first one. The effect of growth interruption on the optical properties of the optimized sample (E30) was investigated by PL. The observed red shift is attributed to the evolution of the InAs islands during the growth interruption. We show the possibility of increasing the size of the QDs approaching the strategically important 1.3 m wavelength range (at room temperature) with growth interruption after InAs QD deposition.     

Stress evolution during growth of bilayer self-assembled InAs/GaAs quantum dots

We investigated the stress evolution during molecular-beam epitaxy of bilayer InAs/GaAs(001) quantum dot (QD) structures in real time and with sub-monolayer precision using an in-situ cantilever beam setup. During growth of the InAs at 470 °C a stress of 5.1 GPa develops in the wetting layer, in good agreement with the theoretical misfit stress. At a critical thickness of 1.5 monolayers the strain is relieved by the QD formation. In the case of InAs/GaAs bilayer structures, the second InAs layer grows identical to the first for GaAs spacer thicknesses exceeding ∼13 nm. For thinner spacers the critical thickness for the 2D/3D transition in the second layer decreases. The stress of the second InAs layer does not reach the value of the first, indicating that InAs QDs grow on partially strained areas due to the strain field of the previous InAs layer. PACS 68.35.-p; 68.35.Gy; 68.65.Hb; 81.07.Ta; 81.10.Aj     

Microstructural and optical properties of multiple closely stacked InAs/GaAs self-assembled quantum dot arrays

The microstructural and the optical properties of multiple closely stacked InAs/GaAs quantum dot (QD) arrays were investigated by using atomic force microscopy (AFM), transmission electron microscopy (TEM), and photoluminescence (PL) measurements. The AFM and the TEM images showed that high-quality vertically stacked InAs QD self-assembled arrays were embedded in the GaAs barriers. The PL peak position corresponding to the interband transitions from the ground electronic subband to the ground heavy-hole band (E₁-HH₁) of the InAs/GaAs QDs shifted to higher energy with increasing GaAs spacer thickness. The activation energy of the electrons confined in the InAs QDs increased with decreasing with GaAs spacer thickness due to the coupling effect. The present results can help to improve the understanding of the microstructural and the optical in multiple closely stafcked InAs/GaAs QD arrays.     

原子氢辅助分子束外延GaAs(331)A表面形貌演化

研究了GaAs高指数面(331)A在原子氢辅助下分子束外延形貌的演化.原子力显微镜测试表明：在常规分子束外延情况下,GaAs外延层台阶的厚度和台面的宽度随衬底温度的升高而增加,增加外延层厚度会导致台阶的密度和台面的宽度增加然后饱和.而在原子氢辅助分子束外延情况下,当GaAs淀积量相同时GaAs外延层台阶的密度增大宽度减小.认为这是由于原子氢的作用导致Ga原子迁移长度的减小.在GaAs(331)A台阶基底上生长出InAs自组织纳米线,用光荧光测试研究了其光学各项异性特征.     

Influence of elastic strains in sublayers on the critical thickness of the Stranski-Krastanow transition for the GeSi/Si(001) system

A novel estimation of the critical thickness of the epitaxial layer in the Stranski-Krastanow (SK) transition is proposed. The transition criterion is based on accumulation of the energy of the effective strain up to a certain critical value. The calculation includes the elastic energy stored in elastically strained layers, takes into account the restriction on the depth of the strained layer still affecting the transition, and a segregation effect described by thermally activated atomic exchange. The equations of growth on the vicinal substrate surface that divide each monolayer into submonolayers parallel to the surface are used. Simulation results are compared with the corresponding experimental data for the heterostructures built of a strained sublayer covered by a spacer layer on which a wetting layer is deposited until the SK transition occurs. The Ge/Si structures of this type are grown by molecular beam epitaxy, and in addition, the experimental results for InAs/GaAs systems, published in the literature, are used. A comparison of experimental and calculated data on the dependence between the critical thickness of the wetting layer and the thickness of the spacer layer shows good agreement for both Ge/Si and InAs/GaAs systems.     

Long-wavelength light emission from InAs quantum dots covered by GaAsSb grown on GaAs substrates

We fabricated InAs quantum dots (QDs) with a GaAsSb strain-reducing layer (SRL) on a GaAs(0 0 1) substrate. The wavelength of emission from InAs QD is shown to be controllable by changing the composition and thickness of the SRL. An increase in photoluminescence intensity with increasing compositions of Sb and thickness of the GaAsSb SRL is also seen. The efficiency of radiative recombination was improved under both conditions because the InAs/GaAsSb/GaAs hetero-interface band structure more effectively suppressed carrier escape from the InAs QDs.     

自组织InAs/GaAs量子点垂直排列生长研究

利用自组织生长InAs/GaAs量子点的垂直相关排列机制，生长了上下两层用6.5nm GaAs间隔的InAs结构.下层InAs已经成岛，由于应力传递效应，上层InAs由二维生长向三维成岛生长的转变提前发生，临界厚度从1.7ML变成小于1.5ML.透射电子显微镜截面象显示形成上下两层高度差别很大的InAs量子点，但是由于两层量子点之间存在强烈的电子耦合，光致发光谱中只有与包含大量子点的InAs层相对应的一个发光峰.     

自组织生长InAs/GaAs量子点发光动力学研究

介绍了最新发展的粒子数混合超快光谱测量技术,以及采用该技术对自组织生长InAs/GaAs量子点发光动力学的研究结果.实验发现,自组织InAs/GaAs量子点结构的发光寿命大约为1ns,与InAs层厚度关系不大;激子寿命与温度有一定的关系,但没有明显的实验证据表明与量子点的δ态密度有关;用粒子数混合技术,实验上可直接观察到量子点中载流子在激发态能级的态填充过程. 关键词：     

Growth and characterization of ultrathin GaP layer in a GaAs matrix by X-ray interference effect

An ultrathin two monolayers thick layer of GaP sandwiched within a GaAs matrix was grown by atomic layer molecular beam epitaxy (ALMBE). The X-ray interference effect (Pendellösung) was used to determine the structural parameters such as thickness, lattice parameter, chemical composition, and strain. Excellent agreement between the experimental rocking curve and the simulation using the dynamical theory of X-ray diffraction was found indicating the high quality of the sample. Analysis of the scans in symmetrical (004) and asymmetrical (224) reflections, sensitive to both perpendicular and parallel strain, shows that the GaP layer is coherent with the substrate, i.e., it is below the critical thickness in agreement with critical thickness theories. Despite the competition for incorporation between arsenic and phosphorus the experimental GaP thickness is found to be identical to the nominal growth value, demonstrating full incorporation of phosphorus when growing by ALMBE. No significant out-diffusion or segregation of P is observed.     

Transition of 3D to 2D growth modes of InAs grown on GaAs

We report a method to grow thin strain-released InAs layer on GaAs (1 0 0) substrates by molecular beam epitaxy. We have shown that by controlling the growth parameters, a thin 2D InAs layer can be grown during initial stages, which eventually serves as a buffer layer to trap dislocations and epitaxial regrowth of InAs on this buffer results in high crystal quality. The size dependence of the InAs islands formed during initial stages with growth time has been studied by atomic force microscopy. With continuous short-time epitaxial growth during various stages, the InAs growth mode transfers from 3D to 2D. The introduction of dislocations into InAs epitaxial islands and their behavior during initial growth stage has been theoretically studied. The theoretical results are in remarkable agreement with the experimental results and shows that once the film is formed, the film strain is totally relaxed. The 200 nm thick InAs epilayer grown on this buffer shows a narrow X-ray diffraction peak. Such InAs strain-released buffer layer would be useful for regrowth of high In content based materials on top of it for electronics and optoelectronics device applications.     

Extremely Low Density InAs Quantum Dots with No Wetting Layer

Extremely low density InAs quantum dots （QDs） are grown by molecular beam droplet epitaxy. The gallium deposition amount is optimized to saturate exactly the excess arsenic atoms present on the GaAs substrate surface during growth, and low density InAs/GaAs QDs （4× 10^6 cm^-2） are formed by depositing 0.65 monolayers （MLs） of indium. This is much less than the critical deposition thickness （1.7 ML）, which is necessary to form InAs/GaAs QDs with the conventional Stranski-Krastanov growth mode. The narrow photoluminescence linewidth of about 24 meV is insensitive to cryostat temperatures from IO K to 250K. All measurements indicate that there is no wetting layer connecting the QDs.     

Excitation transfer in novel self-organized quantum dot structures

We report on studies of excitation transfer processes in vertically self-organized pairs of unequal-sized quantum dots (QDs), created in InAs/GaAs bilayers having differing InAs deposition amounts in the first (seed) and subsequent layer. The former and latter enable independent control, respectively, of the density and the size distribution of the second layer QDs. This approach allows us to enhance the average volume and improve the uniformity of InAs QDs, resulting in low-temperature photoluminescence at 1.028 eV with a linewidth of 25 meV for 1.74 ML (seed)/3.00 ML InAs stacking. The optical properties of the formed pairs of unequal-sized QDs with clearly discernible ground-state transition energy depend on the spacer thickness and composition. Photoluminescence results provide evidence for nonresonant energy transfer from the smaller QDs in the seed layer to the larger QDs in the second layer in such asymmetric QD pairs. Transfer times down to 20 ps (36 ML GaAs spacer) are estimated, depending exponentially on the GaAs spacer thickness.