Low energy repetitive miniature plasma focus device as high deposition rate facility for synthesis of DLC thin films

Diamond-like carbon (DLC) films were deposited on Si (1 0 0) substrate using a low energy (219 J) repetitive (1 Hz) miniature plasma focus device. DLC thin film samples were deposited using 10, 20, 50, 100 and 200 focus shots with hydrogen as filling gas at 0.25 mbar. The deposited samples were analyzed by XRD, Raman Spectroscopy, SEM and XPS. XRD results exhibited the diffraction peaks related to SiO₂, carbon and SiC. Raman studies verified the formation amorphous carbon with D and G peaks. Corresponding variation in the line width (FWHM) of the D and G positions along with change in intensity ratio (I_D/I_G) in DLC films was investigated as a function of number of deposition shots. XPS confirmed the formation sp² (graphite like) and sp³ (diamond like) carbon. The cross-sectional SEM images establish the 220 W repetitive miniature plasma focus device as the high deposition rate facility for DLC with average deposition rate of about 250 nm/min.     

Studies on high-moment soft magnetic FeCo/Co thin films

The dependences of soft magnetic properties and microstructures of the sputtered FeCo (=FeFeCo薄膜 溅射条件 软磁性 高饱和磁化强度FeCo film, sputtering conditions, high saturation magnetization, soft magnetic properties2005-10-263/7/2006 12:00:00 AMThe dependences of soft magnetic properties and microstructures of the sputtered FeCo （=Fe65Co35） films on Co underlayer thickness tCo, FeCo thickness tFeCo, substrate temperature Ts and taxget-substrate spacing dT-s are studied. FeCo single layer generally shows a high coercivity with no obvious magnetic anisotropy. Excellent soft magnetic properties with saturation magnetization μ0Ms of 2.35 T and hard axis coercivity Hch of 0.25 kA/m in FeCo films can be achieved by introducing a Co underlayer. It is shown that sandwiching a Co underlayer causes a change in orientation and reduction in grain size from 70 nm to about 10 nm in the FeCo layer. The magnetic softness can be explained by the Hoffmann＇s ripple theory due to the effect of grain size. The magnetic anisotropy can be controlled by changing dT-S, and a maximum of 14.3 kA/m for anisotropic field Hk is obtained with dT-S=18.0 cm.     

Microwave magnetic properties of soft magnetic thin films

We review our works that focus on the microwave magnetic properties of metallic,ferrite and granular thin films.Soft magnetic material with large permeability and low energy loss in the GHz range is a challenge for the inforcom technologies.GHz magnetic properties of the soft magnetic thin films with in-plane anisotropy were investigated.It is found that several hundreds of permeability at the GHz frequency was achieved for Co100-xZrx and Co90Nb10 metallic thin films because of their high saturation magneti...     

Optimization of neon soft X-rays emission from 200 J fast miniature dense plasma focus device: A potential source for soft X-ray lithography

The neon soft X-ray (SXR) emission characteristics of a Fast Miniature Plasma Focus (FMPF-3) device have been investigated. The FMPF-3 device used for our experiment is of sub-kilojoule energy capacity, which is an order of magnitude lesser than the other well established plasma focus devices. The influence of different geometrical parameters of the anode and the pressure of the filling gas on the SXR emission was investigated to optimize the neon SXR yield and thereby make it a potential source for X-ray lithography. The SXR signal, solely from the desired, characteristic spectral range (900–1600) eV was selectively extracted and acquired using appropriate X-ray absorption filters on diode X-ray spectrometer. It was found that the neon SXR emission from 17 mm long cylindrical anode, which produced best neutron yields, was rather poor, in a very narrow pressure range and that too at low operating pressure. With decrease in the length of cylindrical anode, the optimum operating pressure shifts to higher pressure side, the working pressure range widens and the SXR yield also increases until the anode length is reduced to 12 mm, after which, the SXR yield and working pressure range start to degrade. The highest neon SXR yield of 1.1 J/shot, corresponding to a wall plug efficiency of 0.57%, was obtained for 12 mm long cylindrical anode. The tapered anodes with different length were also designed and tested, but they did not show any significant improvement in neon SXR yield.     

Excellent soft magnetic properties realized in FeCoN thin films

FeCoN soft magnetic thin films are prepared by using the reactive direct-current magnetron sputtering technique. It is found that the addition of N₂ can reduce the coercivity of the FeCoN film, and excellent soft magnetic properties can be obtained when the ratio of N₂ flow to total gas flow is 10%. The influences of texture, grain size, and stress on the magnetic properties and the high-frequency behaviors of the films are also discussed.     

Excellent soft magnetic properties realized in FeCoN thin films

FeCoN soft magnetic thin films are prepared by using the reactive direct-current magnetron sputtering technique.It is found that the addition of N2 can reduce the coercivity of the FeCoN film,and excellent soft magnetic properties can be obtained when the ratio of N2 flow to total gas flow is 10%.The influences of texture,grain size,and stress on the magnetic properties and the high-frequency behaviors of the films are also discussed.     

Influence of Kr doping on neon soft X-rays emission in fast miniature plasma focus device

An investigation on the possibility of enhancement of soft X-ray (SXR) (900–1600 eV) emission from a fast miniature plasma focus (FMPF) device of 235 J (at 14 kV) storage energy through doping of operating gas was performed. Neon (Ne), the operating gaseous medium, was doped with krypton (Kr) in different volumetric ratios at various operating pressures ranging from 2 to 14 mbar. The 1% Kr doping increased the average optimum SXR emission efficiency from 0.47% to 0.6% without enhancing the hard X-ray (HXR) (>1600 eV) emission. The Kr doping influenced the major pinching characteristics such as focusing efficiency and time to pinch with consequential effect on X-ray emissions. Synchronous operation of the 4 pseudo-spark gap (PSG) switches was mandatory for efficient discharge current delivery to the electrodes. A drastic improvement in the pinching efficiency was obtained with replacement of old and worn out PSG switches with the new ones. Optical imaging of current sheath dynamics was performed using gated ICCD camera to verify the normal operation of the device after the PSGs replacement. A numerical simulation analysis on the 2 cm long stainless steel tapered anode, used in this study, was done to predict the maximum SXR emission efficiency and the peak operating gas pressure. An analysis on the amount of SXR fluence generated at the source position and the proportion of it reaching the target position is also reported.     

条形畴结构的FeCoAlON薄膜磁性的研究

用磁控射频溅射法制备了FeCoAlON薄膜, 研究了Al-O和N元素的添加对FeCo合金薄膜的软磁性的影响. 研究结果表明: 随着Al, O, N元素添加量的增加, 薄膜微结构从多晶转化到纳米晶再转化到非晶态, 薄膜表现为软磁性; 在N的含量较高时, 薄膜呈现条形畴结构, 本文对条形畴结构出现的机理和条件作了详细讨论, 并发现具有条形畴结构的薄膜的磁导率频率特性具有多峰共振的特点. 关键词： 铁钴基合金 薄膜 条形畴     

Nd-Fe-B/FeCo多层纳米复合膜的结构和磁性

制备了Nd₂₈Fe₆₆B₆/Fe₅₀Co₅₀多层纳米复合磁性薄膜，对溅射态和650℃退火处理15 min试样的相成分分析和微结构的观察显示，溅射态薄膜呈非晶态，经650℃退火处理15 min后，薄膜主要相成分为硬磁性Nd₂Fe₁₄B相和软磁性相FeCo(110)相.Nd₂Fe₁₄B相呈柱状，其易磁化c轴垂直于膜面，尺寸约10 nm.在硬磁性相和软磁性相之间存在少量富Nd相和非晶态，富Nd相大小约7 nm.磁性测量和分析表明，1)该系列薄膜退火态具有垂直于膜面的磁晶各向异性.2)对于固定厚度(10 nm)层Nd-Fe-B和不同厚度(t_FeCo=1—100 nm)层FeCo多层纳米复合膜,剩磁随软磁相FeCo 厚度的增加快速增加，而矫顽力则减小.当t_FeCo=5 nm时，最大磁能积达到200 kJ/m³. 3)硬磁相Nd-Fe-B层和软磁相FeCo层之间交换耦合导致剩磁和磁能积增强. 关键词： Nd-Fe-B/FeCo多层纳米复合膜 交换耦合 磁各向异性     

Nano-structured Fe thin film deposition using plasma focus device

This paper reports the deposition of nano-structured Fe thin films using 3.3 kJ Mather-type plasma focus. The conventional hollow copper anode was replaced by anode fitted with solid Fe top and the deposition was done using different numbers of deposition shots at two different angular positions. Scanning Electron Microscopy shows that the size of nano-phase agglomerate is smaller when the sample is deposited using either lesser number of deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction shows that crystal structure characteristics change with increase in number of deposition shots. Measurements of magnetic properties using Vibrating Sample Magnetometer identify intermediate magnetization and coercivity in Fe thin films deposited at smaller angular position with respect to anode axis. It is concluded that the morphological, structural and magnetic characteristics of Fe thin films deposited using plasma focus device depend not only on the number of focus deposition shots but also on the angular position of the sample.     

Synthesis of ZrSiN composite films using a plasma focus device

ZrSiN thin films are synthesized by using plasma focus through various numbers of focus shots （10, 20, and 30）, with samples placed at 9 cm away from the tip of the anode. Crystal structures, surface morphologies, and elemental compositions of ZrSiN films are characterized by an X-ray diffractometer （XRD） and scanning electron microscope （SEM） attached with energy dispersive X-ray spectroscopy （EDS）. XRD patterns confirm the formations of polycrystalline ZrSiN films. Crystallinity of nitride increases with the increase of focus shot number. The average crystallite size of zirconium nitride increases from 27 ± 3 nm to 73±8 nm and microstrain decreases from 2.28 to 1.0 with the increase of the focus shot number. SEM results exhibit the formations of granular and oval-shaped microstructures, depending on the number of focus shots. EDS results confirm the presences of silicon, zirconium, nitrogen, and oxygen in the composite films. The content values of Zr and N in the composite films increase with the increase of the focus shot number.     

Synthesis of nano-structure tungsten nitride thin films on silicon using Mather-type plasma focus

Nano-structure thin film of tungsten nitride was deposited onto Si-substrate at room temperature using Mather-type plasma focus (3.3?kJ) machine. Substrate was exposed against 10, 20, 30, and 40 deposition shots and its corresponding effect on structure, morphology, conductivity and nano-hardness has been systematically studied. The X-ray diffractormeter spectra of the exposed samples show the presence of various phases of WN and WN₂ that depends on number of deposition shots. Surface morphological study revealed the uniform distribution of nano-sized grains on deposited film surface. Hardness and conductivity of exposed substrate improved with higher deposition shots. X-ray photo-electron spectroscopy survey scan of 40 deposition shots confirmed the elemental presence of W and N on Si-substrate.     

Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device

The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.     

Microstructure and microwave permeability of FeCo thin films with Co underlayer

Microstructure, static magnetic properties and microwave permeability of sputtered FeCo films were examined. Fe₆₀Co₄₀ films (100 nm in thickness) deposited on glass substrates exhibited in-plane isotropy and a large coercivity of 161.1 Oe. When same thickness films were deposited on 2.5 nm Co underlayer, well-defined in-plane anisotropy was formed with an anisotropy field of 65 Oe. The sample had a static initial permeability of about 285, maximum imaginary permeability of 1255 and ferromagnetic resonance frequency of 2.71 GHz. Cross-sectional TEM image revealed that the Co underlayer had induced a columnar grain structure with grain diameter of 10 nm in the FeCo films. In comparison, FeCo films without Co underlayer showed larger grains of 70 nm in diameter with fewer distinct vertical grain boundaries. In addition, the Co underlayer changed the preferred orientation of the FeCo from (1 0 0) to (1 1 0). The improvement in soft magnetic properties and microwave behavior originates from the modification of the film microstructure, which can be well understood by the random anisotropy theory.     

Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus

Pulsed laser deposition synthesized ZnO thin films, grown at 400 °C substrate temperature in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions obtained from 2.94 kJ dense plasma focus to achieve the nitrogen doping in ZnO. Structural, compositional and optical properties of as-deposited and nitrogen ion irradiated ZnO thin films were investigated to confirm the successful doping of nitrogen in irradiated samples. Spectral changes have been seen in the nitrogen irradiated ZnO thin film samples from the low temperature PL measurements. Free electron to acceptor emissions can be observed from the irradiated samples, which hints towards the successful nitrogen doping in films. Compositional analysis by X-ray photoelectron spectroscopy and corresponding shifts in binding energy core peaks of oxygen and nitrogen confirmed the successful use of plasma focus device as a novel source for nitrogen ion doping in ZnO thin films.     

稠密等离子体焦点装置研制

研制了一台用作脉冲中子源的稠密等离子体焦点装置(DPF),其放电室为Mather型结构。介绍了整个装置的工作原理及系统组成,详细论述了放电室的设计方法。实验结果表明,在550~600 Pa充氘压力范围下,当储能电容充电电压大于19 kV时,装置的平均中子产额大于5.0×10⁸(D-D)中子/脉冲,中子脉冲宽度(FWHM)为(40±5) ns。该装置能用于中子、伽马辐射诊断中探测系统灵敏度实验研究,也可用于开展快中子照相、中子活化分析以及单粒子效应等方面的研究工作。     

Synthesis of composite TiN/Ni3N/a-Si3N4 thin films using the plasma focus device

Composite films of TiN/Ni₃N/a-Si₃N₄ were synthesized using the Mather-type plasma focus device with varying numbers of focus deposition shots (5, 15, and 25) at 0° and 10° angular positions. The composition and structural analysis of these films were analyzed by using Rutherford backscattering (RBS) and X-ray diffraction (XRD). Scanning electron microscope and atomic force microscope were used to study the surface morphology of films. XRD patterns confirm the formation of composite TiN/Ni₃N/a-Si₃N₄ films. The crystallite size of TiN (200) plane is 11 and 22 nm, respectively, at 0° and 10° angular positions for same 25 focus deposition shots. Impurity levels and thickness were measured using RBS. Scanning electron microscopy results show the formation of net-like structures for multiple focus shots (5, 15, and 25) at angular positions of 0° and 10°. The average surface roughness of the deposited films increases with increasing focus shots. The roughness of the film decreases at higher angle 10° and the films obtained are smoother as compared with the films deposited at 0° angular positions.     

用于等离子体焦点装置的强流装置

研制了用于稠密等离子体焦点的强流装置,该装置采用八台低电感低内阻脉冲电容器和八个低感大电流、可控触发高压开关并联组成初级储能模块,高压开关同步击穿后产生μs级强电流经平行板传输线加载到负载。脉冲电容器和高压开关采用一体化设计,结构紧凑,使脉冲电容器与高压开关间的连接电感尽可能小;平板传输线为扇形结构,一个扇形平板传输线连接一个高压开关,平行板传输线可以将电感做得较小,有利于大电流回路的传输。在脉冲电容器充电20 kV时,假负载上可以得到500 kA的电流,电流上升时间约为3.7 μs。     

Energy spectrum of multi-radiation of X-rays in a low energy Mather-type plasma focus device

The multi-radiation of X-rays was investigated with special attention to their energy spectrum in a Mather-type plasma focus device （operated with argon gas）. The analysis is based on the effect of anomalous resistances. To study the energy spectrum, a four-channel diode X-ray spectrometer was used along with a special set of filters. The filters were suitable for detection of medium range X-rays as well as hard X-rays with energy exceeding 30 keV. The results indicate that the anomalous resistivity effect during the post pinch phase may cause multi-radiation of X-rays with a total duration of 300 ± 50 ns. The significant contribution of Cu-Kα was due to the medium range X-rays, nonetheless, hard X-rays with energies greater than 15 keV also participate in the process. The total emitted X-ray energy in the forms of Cu-K and Cu-K/3 was around 0.14 ± 0.02 （J/Sr） and 0.04 ±0.01 （J/Sr）, respectively. The total energy of the emitted hard X-ray （〉 15 keV） was around 0.12± 0.02 （J/Sr）.     

Comparison of the soft magnetic properties of permalloy and conetic thin films

The soft magnetic properties of the substrate/[non-buffer or buffer Ta]/[permalloy (Ni₈₀Fe₂₀) or conetic (Ni₇₇Fe₁₄Cu₅Mo₄)]/Ta prepared by ion beam sputter deposition are investigated. The value of the surface resistance of the conetic film is twice as high as that of the permalloy film. The value of the coercivity and magnetic susceptibility of the conetic film decreased by 25% and doubled relative to that of the permalloy film. The coercivity, with a value of 0.12 Oe, and the magnetic susceptibility, with a value of 1.2×10⁴ for the conetic film, are suitable for soft magnetic biosensor applications.