Source of far and vacuum ultraviolet radiation based on a transverse high-frequency discharge

We present the results of an investigation of a short-wavelength radiation source (Δλ = 130–350 nm) with excitation by a transverse high-frequency (f = 1.76 MHz) discharge based on a mixture of argon and chlorine (p = 100–500 Pa). We have studied the spectral characteristics of the plasma, the oscilloscope traces of the voltage, the current and emission of the discharge, the dependence of the power of the emission on the electrical power of the discharge, and also the pressure and partial composition of the Ar/Cl₂ mixture. The UV-VUV source emits in a system of broadened and overlapping ArCl(B/X), Cl₂(D′/A′), and Cl**₂ molecular bands. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 74, No. 5, pp. 648–651, September–October, 2007.     

Influence of the iodine vapor pressure on the output characteristics of a UV low-pressure gas-discharge lamp

The influence of the iodine vapor pressure on the output characteristics of a UV lamp pumped by a longitudinal glow discharge is studied. The lamp is filled with a helium-iodine mixture to a pressure of 100–1500 Pa. In the spectral range 320–360 nm, the I₂(D′ → A′) band with a peak at 342 nm prevails, while in the bactericidal range, iodine atomic lines at 183.0 and 206.2 nm dominate. The power of the UV lamp is optimized according to the iodine vapor pressure and working mixture composition by numerical simulation.     

Subnormal glow discharge in a Xe/Cl2 mixture in a narrow discharge tube

Electrical and optical characteristics of a subnormal glow discharge in a short (L=10 cm) discharge tube with an inner diameter of 5 mm are investigated. The dependences of the discharge current-voltage characteristic, the energy deposition in the discharge, the plasma spectral characteristics in the 130-to 350-nm wavelength range, the emission intensities of the XeCl(D-X) 236-nm and XeCl(B-X) 308-nm bands, and the total emission intensity in the range 180–340 nm on the pressure and composition of the Xe/Cl₂ mixture are studied. Two modes of glow discharge are shown to exist: the low-current mode at a discharge current of I _ch ≤2 mA and the high-current mode at I _ch >2 mA. The transition from one mode to another occurs in a stepwise manner. The increase in the chlorine content causes the discharge voltage and the energy deposition in the plasma to increase. At low pressures of the Xe/Cl₂ mixture (P≤0.7 kPa), stationary strata form in the cathode region. The lower the discharge current, the greater the volume occupied by the strata. This longitudinal discharge acts as a powerful source of continuous broadband emission in the range 180–340 nm, which forms due to overlapping the XeCl(D, B-X) and Cl ₂ ^* bands with edges at λ=236, 308, and 258 nm. The intensity of the 236-nm band is at most 20% of the total intensity of UV radiation. The maximum power of UV radiation (3 W at an efficiency of 8%) is attained at a xenon partial pressure of 250–320 Pa and a total pressure of the mixture of 2 kPa.     

Electric-discharge UV radiation source based on a Xe-CsCl vapor-gas mixture

A source of spontaneous UV radiation (excilamp) with a maximum radiation intensity at a wavelength of 308 nm is created. The active medium of the excilamp consists of a mixture of Xe with a CsCl vapor, and this mixture is excited in a longitudinal pulsed-periodic discharge. The B → X transition in the XeCl* exciplex molecule most strongly contributes to the total UV radiation power of the excilamp. The spectral composition of the UV radiation, the time characteristics of the source, and the formation of exciplex molecules as a function of the main discharge excitation parameters are studied.     

Ultraviolet gas-discharge lamp on iodine molecules

The emission characteristics of a pulsed-periodic UV radiation source are reported. The source excited by a pulsed-periodic capacitive discharge initiated in helium-iodine vapor, neon-iodine vapor, or krypton-iodine vapor mixtures radiates in the spectral range 200–450 nm. It is shown that most of the plasma radiation power concentrates in the integral line of the iodine atom (206.2 nm) and in the D′-A′ band of the iodine molecule with a maximum at 342 nm. The radiation intensity of the lamp is optimized in accordance with the partial pressure of the inert gases. The discharge plasma parameters that are of interest for simulating the process kinetics and the output characteristics of an UV source based on molecular iodine, atomic iodine, and xenon iodide are calculated in helium-iodine vapor and xenon-iodine vapor mixtures.     

Radiative characteristics and kinetics of processes in low-pressure gas-discharge lamps based on a mixture of helium and iodine vapors

The UV radiation of glow- and capacitive-discharge lamps based on mixtures of inert gases with iodine vapors are optimized in the spectral range of 175–360 nm, in which working helium-iodine mixtures of different compositions are used. The most intense spectral lines in the bactericidal region of the spectrum were the atomic lines of iodine (183.0, 206.2 nm), and in the region of 320–360 nm, emission of the spectral band of an iodine molecule prevailed with a maximum at λ = 342 nm. For a capacitive lamp with a casing opaque in the spectral range λ < 250 nm, the main part of the plasma emission power is concentrated in the A′-D′ band of an iodine molecule with a maximum at 342 nm. The emission brightness of this lamp is optimized in iodine molecule transitions depending on the partial helium pressure. We present the results of simulating the kinetics of processes in a glow-discharge plasma in mixtures of He, Xe, and iodine vapors. We establish the dependence of the main part of the emission intensity of the 206.2 nm spectral line of an iodine atom and the 342 nm band of an iodine molecule on the helium pressure in a glow-discharge lamp operating on a He-I₂ mixture.     

Emission characteristics and parameters of a glow discharge in an argon-xenon-chlorine mixture

We present the results of a study of the emission characteristics of a low-pressure longitudinal glow discharge in an Ar-Xe-Cl₂ mixture (p = 0.5–6.0 kPa) and numerical modeling of its plasma parameters as a function of the parameter E/P. We optimized the average emission power of the discharge in the spectral range 160–310 nm as a function of the discharge current, the pressure and composition of the gas mixture. The plasma parameters were calculated for the optimal mixture (according to experimental data) and included obtaining the dependences of the electron transport and energy characteristics, the power losses per unit pressure in the discharge going toward elementary electron processes in the plasma, and also the ionization and attachment coefficients as a function of the parameter E/P. The results of numerical modeling of the glow discharge parameters allow us to provide a qualitative basis for the emission distribution in the spectrum of a plasma based on an Ar-Xe-Cl₂ mixture. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 75, No. 4, pp. 563–567, July–August, 2008.     

An electric discharge emitter operating simultaneously in the 308 [XeCl(B-X)], 258 [Cl2(D′-A′)], 236 [XeCl(D-X)], 222 [KrCl(B-X)], 175 [ArCl(B-X)], and 160 [H2(B-X)] nm bands

An experiment to optimize an ultraviolet (UV)-vacuum ultraviolet (VUV) multiwave emitter using chlorine molecules and chlorides of heavy inert gases is reported. The emitting medium was an Ar-Kr-Cl₂ or an Ar-Kr-Xe-Cl₂ (HCl) mixture kept at a pressure ranging from 1 to 30 kPa. Excitation was effected by means of a transverse volume discharge with spark preionization. Emission spectra were examined. The dependences of the emission intensity on the total pressure of the medium, partial pressures of its components, charging voltage, and number of discharge pulses were studied. It is demonstrated that such a discharge emits simultaneously in the 308, 258, 236, 222, 175, and 160 nm bands due to the transitions XeCl(B-X), Cl₂(D′-A′), XeCl(D-X), KrCl(B-X), ArCl(B-X), and H₂(B-X), respectively. It was established that the respective intensities are close to each other if the partial pressures are as follows: P _Ar=10–20 kPa; P _{Kr, Xe}=0.4–0.6 kPa; P _Cl2=0.2–0.4 kPa, P _HCl=0.08 kPa, and P _H2=0.5–1.0 kPa. It was found that the addition of H₂ to the medium decreases the intensities of the excimer bands, increases the emission resource (to 10⁴ pulses or higher), and expands the operating wavelength range. The last-named effect is due to Lyman H₂ bands (at 158–161 nm).     

Output characteristics and parameters of the plasma from a gas-discharge low-pressure ultraviolet source using helium-iodine and xenon-iodine mixtures

The output characteristics and parameters of the plasma of a powerful gas-discharge source of UV radiation are studied. The UV source uses He-I₂ and Xe-I₂ mixtures and is excited by a longitudinal glow discharge. The pressure of the gas mixtures is varied from 100 to 1500 Pa, and the discharge power falls into the range 15–250 W. The source (lamp) emits in the spectral interval 200–390 nm, which covers the spectral line of the iodine atom at 206.2 nm, the spectral band of XeI(B-X) with a maximum at 253 nm, and the spectral band of with a maximum at 342 nm. For He(Xe)-I₂ mixtures at a pressure of 800–1000 Pa (this pressure range is near-optimal according to our experimental data), the electron energy distribution functions and the electron kinetic coefficients as functions of parameter E/N (E is the electric field strength, and N is the particle concentration in the discharge) are calculated. The calculated plasma parameters are used in the qualitative analysis of key electronic processes in the plasma of an exciplex halogen UV source and will be subsequently employed in numerical simulation of the process kinetics and output characteristics of a UV source based on helium-iodine or xenon-iodine mixtures.     

A planar XeCl-exilamp pumped by a low-pressure glow discharge

The energy characteristics of an XeCl exciplex lamp with planar construction pumped by a low-pressure gas discharge are investigated experimentally. When a discharge gap of width 2 cm and a Xe-Cl₂ mixture were used, average radiation powers up to 20 mW were obtained in the wavelength interval 200–380 nm at efficiencies of ∼0.4%. In this case the total efficiency of radiation into an angle of 4π exceeded 4%. It is shown that increasing the working pressure and using low discharge currents can lead to “point” radiation sources. Zh. Tekh. Fiz. 67, 43–46 (December 1997)     

Multiwave excimer lamps using XeF/XeCl/KrF/KrCl molecules

Results are presented of an investigation of the spectral and temporal characteristics of an electricdischarge excimer lamp emitting simultaneously on the 351 nm XeF, 308 nm XeCl, 249 nm KrF, and 222 nm KrCl transitions. The He/Kr/Xe/SF₆/HCl working mixtures were excited in a transverse discharge with ultraviolet spark preionization at a total pressure of 25–100 kPa. In order to obtain the same brightness the concentration ratio [Kr]/[Xe] for the excimer molecular transitions was 8/0.8 kPa, and that for the halogen-containing molecules was [SF₆]/[HCl][=[0.06–0.12]/[0.08–0.16] kPa. The duration of the radiation pulses for the excimer molecular transitions at atmospheric pressure was 100–200 ns and when the total mixture pressure was reduced to 250 kPa, this was doubled or trebled. The service life of the spontaneous radiation for B-X transitions in excimer molecules was 10⁵ pulses. Zh. Tekh. Fiz. 68, 64–67 (December 1998)     

Emission properties of a pulsed-periodic barrier discharge initiated in helium-iodine and argon-iodine mixtures

The subject of investigation is the emission properties of a pulsed-periodic barrier discharge initiated by submicrosecond pulses (f = 40–1000 Hz) in He-I₂ and Ar-I₂ mixtures. The investigation is carried out in the spectral range 200–400 nm at a pressure of the working medium of 1–100 kPa and an iodine partial pressure of 130–200 Pa. The dependence of UV emission from the plasma of the barrier discharge at the 342 nm I₂(D′ → A′) band and the iodine atom spectral line at 206.2 nm on the argon and helium partial pressures, excitation pulses repetition rate, and charging voltage of the capacitor of a short high-voltage pulse modulator is optimized. The contribution of the 206.2 nm I* spectral line to the UV emission of the barrier discharge is estimated.     

A multiwavelength low-pressure radiation source based on argon and xenon chlorides

The characteristics of an excimer radiation source pumped by a subnormal dc glow discharge in an Ar/Xe/Cl₂ mixture with the source operating in a spectral range of 160–310 nm were studied. The emission intensities of the 175, 236, 258, and 308 nm bands due to the transitions ArCl (B-X), XeCl (D-X), Cl₂ (D′-A′), and XeCl (B-X), respectively, were optimized in relation to the pressure, composition, and discharge current of the mixture.     

Ultraviolet radiation sources on (H2O,D2O) water vapor

Emission characteristics of ultraviolet (UV) radiation from water vapor (H₂O, D₂O, and a mixture of H₂O and D₂O vapors) excited by pulse-periodic discharges with open electrodes, as well as electrodes outside the discharge tube (capacitive discharge), are presented. Radiation is studied in a spectral range of 175–350 nm. The emission characteristics of a UV radiation source based on vapors of ordinary and “heavy” water, as well as the results of optimization of brightness of radiation bands from the OH and OD radicals as functions of pressure and the composition of the He-H₂O and He-D₂O mixtures, are reported.     

Mercury-free emitter pumped by a krypton fluoride molecule pulse-periodic barrier discharge

The characteristics of a pulsed-periodic short-barrier-discharge emitter operating at wavelength λ = 248 nm KrF(X-B) are investigated. The operating mixtures of the UV lamp are low-aggressive krypton-sulfur hexafluoride (SF6) mixtures at a total pressure in the range 1–50 kPa and a SF₆ partial pressure of 0.1–0.4 kPa. The spectral characteristics of the plasma are studied, and the 248 nm KrF(X-B) band luminosity is optimized in terms of the operating mixture composition, pump voltage, and pulse repetition rate. The mean power of UV emission from the lateral surface of the cylindrical lamp is estimated.     

UV Radiation of Low Pressure XeCl* and KrCl* Glow Discharges

The positive column of low pressure DC glow discharges in Xe/Cl₂ and Kr/Cl₂ gas mixtures has been investigated with respect to its UV radiation power and radiative efficiency for a wide range of parameters (total gas pressure: 1–30 mbar, current 10–30 mA, partial pressure of Cl₂: 1–33%). Also the radial distribution of the particle number densities of XeCl* (B) and KrCl* (B) has been determined by absolutely calibrated emission spectroscopy. Optimum UV (190–350 nm) output and efficiency has been found in gas mixtures with a relative Cl₂ partial pressure of 2–3% and total gas pressure of 12–18 mbar. At these parameters, the UV radiation power per column length is greater than 40 Watt/m with a radiative efficiency of 15–18%. These discharges could be used for UV induced photochemical processes.     

A Pulsed-Periodic, Low-Pressure Volume Discharge in Chlorine and in a Xenon/Chlorine Mixture

The electrical and optical characteristics of a self-initiated, low-pressure, pulsed-periodic discharge in chlorine and in a xenon/chlorine mixture are investigated. A volume discharge not bounded by dielectric walls was triggered in a spherical anode–plane cathode system of electrodes on supply of a constant positive-polarity voltage to the anode. The discharge existed in the form of a unit domain. The spatial, spectral (in the range 150–350 nm), and time characteristics (voltage, current, and photocurrent of total radiation of plasma in the spectral range 200–700 nm) of the volume discharge are investigated. Optimization of the pressure and of the structure of the working medium is carried out to obtain the maximum brightness of UV–VUV radiation of the bands of the Cl₂(D–A), Cl₂ ^**, and XeCl(D, B–X) molecules. The results obtained are of interest for being used in a pulsed-periodic, excimer-halogen low-pressure lamp.     

Optical characteristics of the plasma of a transverse volume discharge in Cl2 and He/Cl2 mixtures

Results are presented from a study of UV and VUV emission from the plasma of a transverse volume discharge in chlorine and a He/Cl₂ mixture. In the wavelength range Δλ=140–300 nm, the Cl₂(D′-A′) band with an edge at 258 nm and the Cl ₂ ^* band with edge at λ=195 nm are found to be dominant. It is shown that, in the pressure range [Cl₂]=0.1–2.0 kPa, the intensity of emission with λ≤195 nm is higher than the intensity of the Cl₂(D′-A′) band. At [Cl₂]≥2 kPa, emission in the 258-nm band is dominant.     

Kr-KCl exciplex lamp

A new source of UV radiation (excilamp) based on Kr-KCl vapor-gas mixture excited by a longitudinal high-voltage pulsed-periodic discharge is created. The emission spectrum and time characteristic of the discharge radiation are studied. The B → X transition in the KrCl* excimer molecule (λ = 222 nm) is found to dominate in the radiation spectrum of the source. The dependence of the pulse output power of the lamp on various factors is investigated, and the mechanism of B state formation in the excimer molecule is discussed.     

Laser-initiated ignition of hydrogen-air mixtures

The subject of investigation is the kinetic mechanisms intensifying chain reactions that proceed in a hydrogen-air mixture when O₂ molecules dissociate under the action of laser radiation with wavelength λ _I = 193.3 nm and are excited into the b ¹Σ _g ⁺ electron state by radiation with λ _I = 762.346 nm. The efficiencies of both methods to initiate ignition are compared. Numerical simulation shows that the ignition temperature for the laser-induced excitation of O₂ molecules into theb ¹Σ _g ⁺ state is lower than for the dissociation of O₂ molecules by UV laser radiation, with the energy supplied to the mixture being the same. However, both photochemical methods are much more efficient than mere heating of the mixture by laser radiation or another source of heat.