A comparison between X-ray absorption spectroscopy and Bremsstrahlung Isochromat Spectroscopy: The empty states of Pd−Al alloys and Pd2Si

We present X-ray absorption spectra (XAS) obtained with synchrotron radiaton at the PdL _2,3 edges of Pd–Al alloys and Bremsstrahlung Isochromat Spectra (BIS) at 1,486.7 eV of Pd–Al alloys and of Pd₂Si. The XAS and BIS results for the alloys are very similar indicating that the effect of the core potential (e.g. many-body, electronhole excitation) is negligible. The BIS results on Pd₂Si show differences with respect to Pd–Al due to the more localized bonds. The comparison between XAS and BIS data in Pd₂Si is still an open problem and might indicate a more subtle role of the core-hole potential.     

A photoemission study of 4H---SiC(0001)

A photoemission study using synchrotron radiation of the (0001) surface of 4H-SiC is reported. The investigations were concentrated on the (√3 × √3)-R30° and (6√3 × 6√3)-R30° reconstructed surfaces, prepared by resistive heating at a temperature of about 1000°C and 1250°C, respectively. Results from surfaces heated at intermediate temperatures, exhibiting a mixture of these reconstructions, and after heating at a higher temperature, when graphitisation is clearly observed, are also presented. The √3 and 6√3 reconstructed surfaces exhibit characteristic core level and valence band spectra. High resolution core level spectra show unambiguously the presence of surface shifted components in both the Si 2p and C 1s core levels. For the √3 reconstruction, two surface shifted components are observed both in the Si 2p and C 1s level. For the 6√3 reconstruction, the surface region is found to contain a considerably larger amount of carbon. This carbon is found not to be graphitic since surface C 1s components with binding energies different from a graphitic C 1s peak are observed. Graphitisation, as revealed by the appearance of a graphitic C 1s peak, is observed only after heating to a higher temperature than that required for obtaining a well developed 6√3 diffraction pattern.     

Properties of the SiO2/SiC interface investigated by angle resolved studies of the Si 2p and Si 1s levels and the Si KLL Auger transitions

Angle resolved photoemission studies of the Si 2p and Si 1s core levels and the Si KL_2,3L_2,3 Auger transitions from SiO₂/SiC samples are reported. Most samples investigated were grown in situ on initially clean and well ordered √3×√3 reconstructed 4H-SiC(0 0 0 1) surfaces but some samples were grown ex situ using a standard dry oxidation procedure. The results presented cover samples with total oxide thicknesses from about 5 to 118 Å. The angle resolved data show that two oxidation states only, Si⁺¹ and Si⁺⁴, are required to explain and model recorded Si 2p, Si 1s and Si KLL spectra.The intensity variations observed in the core level components versus electron emission angle are found to be well described by a layer attenuation model for all samples when assuming a sub-oxide (Si₂O) at the interface with a thickness ranging from 2.5 to 4 Å. We conclude that the sub-oxide is located at the interface and that the thickness of this layer does not increase much when the total oxide thickness is increased from about 5 to 118 Å.The SiO₂ chemical shift is found to be larger in the Si 1s level than in the Si 2p level and to depend on the thickness of the oxide layer. The SiO₂ shift is found to be fairly constant for oxides less than about 10 Å thick, to increase by 0.5 eV when increasing the oxide thickness to around 25 Å and then to be fairly constant for thicker oxides. An even more pronounced dependence is observed in the Si KLL transitions where a relative energy shift of 0.9 eV is determined.The relative final state relaxation energy ΔR(2p) is determined from the modified Auger parameter. This yields a value of ΔR(2p)=−1.7 eV and implies, for SiO₂/SiC, a “true” chemical shift in the Si 2p level of only ≈0.4 eV for oxide layers of up to 10 Å thick.     

Resonant photoemission at the oxygen K edge as a tool to study the electronic properties of defects at SiO2 /Si and SiO2 /SiC interfaces

Silicon is by far the most important material used in microelectronics, partly due to the excellent electronic properties of its native oxide (SiO₂), but substitute semiconductors are constantly the matter of research. SiC is one of the most promising candidates, also because of the formation of SiO₂ as native oxide. However, the SiO₂/SiC interface has very poor electrical properties due to a very high density of interface states which reduce its functionality in MIS devices. We have studied the electronic properties of defects in the SiO₂/Si and SiO₂/SiC interfaces by means of XAS, XPS and resonant photoemission at the O 1s and the Si 2p edges, using silicon dioxide thermally grown with thicknesses below 10 nm. Our XAS data are in perfect agreement with literature; in addition, resonant photoemission reveals the resonant contributions of the individual valence states. For the main peaks in the valence band we find accordance between the resonant behaviour and the absorption spectra, except for the peaks at −15 eV binding energy, whose resonant photoemission spectra have extra features. One of them is present in both interfaces and is due to similar defects, while another one at lower photon energy is present only for the SiO₂/SiC interface. This is related to a defect state which is not present at the SiO₂/Si interface.     

Study of electronic structures for Fe thin films deposited on Si- and C-faces of 4H-SiC substrates by soft X-ray emission spectroscopy

Silicon carbide (SiC) is a candidate material for electronic devices to operate upon crucial environment. Electronic states of silicides and/or carbide/graphite formed in metal/SiC contact system are fundamentally important from the viewpoint of device performance.We study interface electronic structure of iron thin film deposited on silicon (Si)- and carbon (C)-face of 4H-SiC(0 0 0 1) by using a soft X-ray emission spectroscopy (SXES). For specimens of Fe (50 nm)/4H-SiC (substrate) contact systems annealed at 700 and 900 °C, the Si L_2,3 emission spectra indicate different shapes and peak energies from the substrate depending on thermal-treated temperature. The product of materials such as silicides is suggested. Further, from comparison of Si L_2,3 emission spectra between Si- and C-face for the same annealing temperature at 700 °C, it is concluded that the similar silicides and/or ternary materials are formed on the two surfaces. However for those of 900 °C, the film on substrate is composed of the different silicide and/or ternary materials.     

Spectroscopic characterization of β-FeSi2 single crystals and homoepitaxial β-FeSi2 films by XPS and XAS

Chemical state analysis by a combination of X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS) using synchrotron radiation is performed for β-FeSi₂ single crystals and homoepitaxial β-FeSi₂ films. The Si 2p XPS and Fe L-edge XAS spectra imply that the annealing at 1173 K to remove native oxide layers on the crystal induces the formation of FeSi in the surface. The formation of FeSi is also confirmed by Si K-edge XAS analysis. For the homoepitaxial β-FeSi₂ films grown on the crystals, the Si K-edge XAS spectra indicate that structurally homogeneous β-FeSi₂ films can be grown on the β-FeSi₂ single crystals when the substrate temperatures of 973 and 1073 K are applied for molecular beam epitaxy (MBE). Consequently, it is indicated that the combination of XPS and XAS using synchrotron radiation is a useful tool to clarify chemical states of β-FeSi₂ single crystals and homoepitaxial β-FeSi₂ films, which is important to reveal optimized growth conditions of homoepitaxial films.     

Dopant diffusion and surface morphology of vanadium implanted 4H-silicon carbide

The diffusion behaviours of vanadium implanted p- and n-type 4H-SiC are investigated by using the secondary ion mass spectrometry (SIMS). Significant redistribution, especially out-diffusion of vanadium towards the sample surface is not observed after 1650℃ annealing for both p- and n-type samples. Atomic force microscopy (AFM) is applied to the characterization of surface morphology, indicating the formation of continuous long furrows running in one direction across the wafer surface after 1650℃ annealing. The surface roughness results from the evaporation and re-deposition of Si species on the surface during annealing. The chemical compositions of sample surface are investigated using x-ray photoelectron spectroscopy (XPS). The results of C 1s and Si 2p core-level spectra are presented in detail to demonstrate the evaporation of Si from the wafer and the deposition of SiO₂ on the sample surface during annealing.     

Band alignment of Ga2O3/6H-SiC heterojunction

A high-quality Ga₂O₃ thin film is deposited on an SiC substrate to form a heterojunction structure. The band alignment of the Ga₂O₃/6H-SiC heterojunction is studied by using synchrotron radiation photoelectron spectroscopy. The energy band diagram of the Ga₂O₃/6H-SiC heterojunction is obtained by analysing the binding energies of Ga 3d and Si 2p at the surface and the interface of the heterojunction. The valence band offset is experimentally determined to be 2.8 eV and the conduction band offset is calculated to be 0.89 eV, which indicate a type-II band alignment. This provides useful guidance for the application of Ga₂O₃/6H-SiC electronic devices.     

Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0 0 1)

To investigate the initial growth of Fe films on Si(0 0 1) and the Fe/Si interface, Fe films at various thicknesses have been systematically studied by soft X-ray absorption spectroscopy (XAS) and X-ray photoemission spectroscopy (XPS). The Fe L edge XAS spectrum shows a strong thickness dependence with broader line-width for thinner films. Detailed analysis of the Fe absorption signal as a function of the thickness shows that the broad linewidth of Fe L edge XAS spectra is mostly contributed by the first Fe layer at the Fe/Si interface. In contrast to XAS, Fe 2p photoemission spectra for these films are identical. However, valence band photoemission also shows a strong thickness dependence. Comparing the valence band photoemission spectra of the thin Fe/Si(0 0 1) films with that of pure Si and the thickest Fe film, the difference spectra at all thicknesses show almost identical shape indicating the same origin: the Fe/Si interface. Thus, it is mainly the first Fe layer at Fe/Si layer that is reactive with the Si substrate changing its electronic structure.     

X-ray photoelectron and X-ray absorption spectroscopic study on β-FeSi2 thin films fabricated by ion beam sputter deposition

A combination of X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS) using synchrotron radiation is applied to clarify surface chemical states of β-FeSi₂ films fabricated by an ion-beam sputtering deposition method. The differences in the chemical states of the films fabricated at substrate temperatures of 873, 973 and 1173 K are investigated. For the film fabricated at 873 K, Si 2p XPS spectra indicate the formation of a relatively thicker SiO₂ layer. In addition, Fe L-edge XAS spectra exhibit the formation of FeSi_2−X by preferential oxidation of Si or the presence of unreacted Fe. The results for the film fabricated at 1173 K imply the existence of FeSi₂ with α and ? phases. In contrast, the results for the film fabricated at 973 K indicate the formation of relatively homogeneous β-FeSi₂. These imply that the relatively excellent crystal property of the film fabricated at 973 K is due to the formation of homogeneous β-FeSi₂. As a conclusion, the combination of XPS and XAS using synchrotron radiation is a powerful tool to elucidate the surface chemical states of thin films.     

n-SiC的电子拉曼散射及二级拉曼谱研究

研究了利用离子注入法得到的掺氮n-SiC拉曼光谱. 理论线形分析表明,与4H-SiC相比,6H-SiC中LO声子等离子体激元耦合模(LOPC模)拉曼位移随自由载流子浓度变化较小. 5145nm激发光下得到的电子拉曼散射光谱表明,k位处由1s(A₁)到1s(E)的能谷轨道跃迁带来的拉曼谱6H-SiC中有四条,4H-SiC中有二条;高频6303及635cm^-1处观察到的谱线被认为与深能级缺陷有关. 最后,利用纤锌矿型结构二级拉曼散射选择定则指认了6 关键词： 碳化硅 电子拉曼散射 轨道能谷分裂 倍频谱     

Ultraviolet photoemission spectroscopy of (TaSe4)2I

The vacuum ultraviolet photoemission spectra of quasi-one-dimensional charge density wave ( CDW ) system, (TaSe₄)₂I, were measured for photon energies between 32 and 100 eV at room temperature ( in the normal phase ) and at about 100 K ( in the CDW phase ). The spectrum of Ta 4f core-levels has shown no additional splitting due to the two different Ta sites. The spectra of the valence and conduction bands have revealed the resonant enhancement for the excitation of the Ta 5p core states, which demonstrates the remarkable hybridization of Ta 5d orbitals with Se 4p orbitals with binding energies smaller than 4 eV. In the CDW phase, the partial cross section decreases for both Ta 5d bands and Se 4p bands with Ta 5d components.     

Si(001)面上外延生长的Ru2 Si3电子结构及光学性质研究

基于第一性原理的赝势平面波方法,对异质外延关系为Ru2Si3(100)//Si(001),取向关系为Ru2Si3[010]//Si[110]正交相的Ru2Si3平衡体系下能带结构、态密度和光学性质等进行了理论计算.计算结果表明:当1.087 nm≤a≤1.099 nm时,正交相Ru2Si3的带隙值随着晶格常数a取值的增大而增大.当a取值为1.093 nm时,体系处于稳定状态,此时Ru2Si3是具有带隙值为0.773 eV的直接带隙半导体.Ru2Si3价带主要是由Si的3p,3s态电子及Ru 4d态电子构成;导带主要由Ru的4d及Si的3p态电子构成.外延稳定态及其附近各点处Ru2Si3介电函数的实部和虚部变化趋势基本一致,但外延稳定态Ru2Si3介电函数的曲线相对往低能区漂移,出现的介电峰减少且峰的强度明显增强.     

Manganese silicide single crystal and films deposited on Si(1 1 1): A comparative spectroscopic study

A comparative experimental study is presented of the electronic properties of MnSi films grown on Si(1 1 1) and of MnSi single crystals, using X-ray absorption spectroscopy (XAS), and core level and valence band photoemission spectroscopy (PES). No significant differences in the electronic structure of the two systems can be found.Absorption measurements on the Mn 2p threshold show a mixed valence ground state, where the multiplet structure is washed out by the hybridisation of the Mn 3d states with the Si sp states. These results are also confirmed by photoemission (PE) spectra from the valence band and the Mn 3s, 3p and 2p core levels.Strong attention has been paid to the effect of contamination. The occurrence of multiplet effects in the absorption spectra indicates unambiguously the localisation of the Mn 3d electrons in Mn-O bonds, which strongly influences the electronic properties of these systems.     

High-resolution study of x-ray resonant Raman scattering at the K edge of silicon

We report on the first high-resolution measurements of the K x-ray resonant Raman scattering (RRS) in Si. The measured x-ray RRS spectra, interpreted using the Kramers-Heisenberg approach, revealed spectral features corresponding to electronic excitations to the conduction and valence bands in silicon. The total cross sections for the x-ray RRS at the 1s absorption edge and the 1s-3p excitation were derived. The Kramers-Heisenberg formalism was found to reproduce quite well the x-ray RRS spectra, which is of prime importance for applications of the total-reflection x-ray fluorescence technique.     

Energy band structure and X-ray spectra of phenakite Be<Subscript>2</Subscript>SiO<Subscript>4</Subscript>

The electronic structure of crystalline phenakite Be₂SiO₄ is investigated using x-ray emission spectroscopy (XES) (Be K _α XES, Si L _{2, 3} XES, O K _α XES) and x-ray absorption spectroscopy (XAS) (Be 1s XAS, Si 2p XAS, O 1s XAS). The energy band structure is calculated by the ab initio full-potential linearized augmented-plane-wave (FLAPW) method. The total and partial densities of states and the dispersion curves for the Be₂SiO₄ compound are presented. It is shown that the top of the valence band and the bottom of the conduction band of the Be₂SiO₄ compound are predominantly formed by the oxygen 2p states. According to the results obtained, the electron transition with the lowest energy supposedly can occur at the center of the Brillouin zone. The effective masses of electrons (0.5m _e ) and holes (3.0m _e ) for the Be₂SiO₄) compound are estimated.     

High resolution core and valence band XPS spectra of non-conductor pyroxenes

High resolution core level and valence band (VB) X-ray photoelectron spectra (XPS) of the non-conductor pyroxene minerals, bronzite ((Mg_0.8,Fe_0.2)₂Si₂O₆) and diopside (Ca(Mg_0.8Fe_0.2)Si₂O₆) have been obtained with the Kratos magnetic confinement charge compensation which minimizes differential charge broadening. Observed Si 2p, O 1s, Mg 2p and Ca 2p total linewidths are all about 1.3 eV, very similar to those observed previously with the same instrument for SiO₂ and olivines ((Mg,Fe)₂SiO₄); and we consider that these widths are within 0.05 eV of the minimum room temperature linewidths for these samples with the experimental resolution of this instrument of 0.35 eV. These linewidths are all determined by vibrational broadening due to the M-O symmetric stretch in the ion states. The Si 2p binding energies (BE) are intermediate between the quartz and olivine Si 2p binding energies; but the O 1s spectra resolve the bridging oxygen (BO) and non-bridging oxygen (NBO) in the unit, with the NBO O 1s very close in BE to the O in olivine, and the BO very close to the BO in SiO_2. Indeed in both diopside and bronzite, it is possible to separate the three structurally inequivalent O atoms in the O 1s spectra: the BO at a BE of about 532.6 eV, a NBO peak from the MgOSi moiety (Mg in the M1 site) at about 531.3 eV, and a NBO peak at 531 eV from the CaOSi or the FeOSi moieties (Ca and Fe in the M2 site). The O 1s BE increases with the increase in the electronegativity Ca < Mg < Fe < Si. Moreover, the linewidths of these peaks increase when Fe and Mg are both present in either M1 (diopside) or M2 (bronzite) sites.The valence band spectra for the two pyroxenes are rather similar, and quite different from the VB spectra of quartz and olivines. The dispersion of the pyroxene VB spectra is intermediate between the VB spectra of quartz and olivines; the valence band spectrum of pyroxenes are more dispersed than in olivines by about 1.5 eV but less dispersed than quartz by about 1.5 eV. These VB spectra can be assigned using the previous olivine VB spectra and high quality pseudopotential density functional theoretical calculations in the generalized gradient (GGA) approximation. As for the olivine VB spectra, the Fe 3d t_2g and e_g orbitals in M1 and M2 sites of the pyroxene are located at the top of the pyroxene valence band, and the BE of the Fe 3d peaks from M1 are about 0.7 eV smaller than the Fe 3d peaks in M2. The theoretical XPS valence band spectra using the theoretical density of states and the Gelius intensity approximation are is in good semi-quantitative agreement with the experimental spectra. This intermediate dispersion of pyroxenes is due to the partial polymerization of the Si-O units in pyroxenes, and the intermediate charge on the Si atoms as indicated by the Si 2p BE.     

Ultrathin ZrO2 films on Si-rich SiC(0 0 0 1)-(3 × 3): Growth and thermal stability

The growth and thermal stability of ultrathin ZrO₂ films on the Si-rich SiC(0 0 0 1)-(3 × 3) surface have been explored using photoelectron spectroscopy (PES) and X-ray absorption spectroscopy (XAS). The films were grown in situ by chemical vapor deposition using the zirconium tetra tert-butoxide (ZTB) precursor. The O 1s XAS results show that growth at 400 °C yields tetragonal ZrO₂. An interface is formed between the ZrO₂ film and the SiC substrate. The interface contains Si in several chemically different states. This gives evidence for an interface that is much more complex than that formed upon oxidation with O₂. Si in a 4+ oxidation state is detected in the near surface region. This shows that intermixing of SiO₂ and ZrO₂ occurs, possibly under the formation of silicate. The alignment of the ZrO₂ and SiC band edges is discussed based on core level and valence PES spectra. Subsequent annealing of a deposited film was performed in order to study the thermal stability of the system. Annealing to 800 °C does not lead to decomposition of the tetragonal ZrO₂ (t-ZrO₂) but changes are observed within the interface region. After annealing to 1000 °C a laterally heterogeneous layer has formed. The decomposition of the film leads to regions with t-ZrO₂ remnants, metallic Zr silicide and Si aggregates.     

Study of electronic states for V thin films deposited on 6H-SiC substrates by soft X-ray emission spectroscopy

Silicon carbide (SiC) is a candidate material for electronic devices to operate upon crucial environment. Electronic states of silicides and/or carbide/graphite formed in metal/SiC contact system is fundamentally important from the view point of device performance.We study interface electronic structure of vanadium (V) thin-film deposited on 6H-SiC(0 0 0 1) Si-face by using a soft X-ray emission spectroscopy (SXES). For specimens of V(38 nm)/6H-SiC (substrate) contact systems annealed at 850 °C, the Si L_2,3 emission spectra indicate different shapes and peak energies from the substrate. The product of materials such as silicides and/or ternary materials is suggested. Similarly, the C Kα emission spectra show the shape and peak energy characteristic of vanadium carbide including substrate 6H-SiC signal.     

Single crystal growth of SiC and electronic devices

Single crystal growth of silicon carbide (Sic) and application to electronic devices are reviewed. In the crystal growth, bulk and homoepitaxial growth are picked up, and crystal quality and electrical properties are described. For electronic devices, various device processes are argued. Power devices based on Sic are stressed in this review.

Bulk single crystals of SiC can be grown by a sublimation method, and large-area 6H-SiC and 4H-SiC single crystals are obtained. The occurrence of SiC polytypes is affected by the growth condition, and can be controlled successfully by optimizing these conditions. 6H-SiC is grown on 6H-SiC (0001) Si-faces, and 4H-SiC on 6H-SiC (0001) C-faces. The crystallinity of bulk crystals is investigated by reflection high-energy electron diffraction (RHEED) and X-ray analysis, and characterization is carried out in detail by optical and electrical measurement.

Successful homoepitaxial vapor phase growth of SiC can be realized using off-axis (0001) substrates prepared by a sublimation method called “step-controlled epitaxy”. Since the crystallinity of epilayers is improved during the step-controlled epitaxy, this growth technique is a key for getting high-quality crystal surfaces. Impurity doping is controlled during homoepitaxial growth by employing impurity gases, such as N₂, trimethylaluminum (TMA), and B₂H₆. A wide-range of carrier concentrations of 5 × 10¹³～3 × 10¹⁸ cm^?3 for n-type and 5 × 10¹⁶～3 × 10²⁰ cm^?3 for p-type are realized. The impurity-incorporation mechanism in the step-controlled epitaxy is discussed based on the C/Si ratio dependence of impurity doping.

Electrical properties of SiC grown by step-controlled epitaxy are determined precisely. A high electron mobility of 720 cm²/Vs is obtained in an undoped 4H-SiC epilayer with an electron concentration of 2.5 × 10^l6 cm^?3 at 300 K. This electron mobility is about two times higher than that of 6H-Sic (～380 cm²/Vs). High breakdown fields of 1～5 × 10⁶ V/cm are obtained for both 6H- and 4H-SiC, one order of magnitude higher than those for Si. A high saturation electron drift velocity of 1.6 × 10⁷ cm/s is obtained in 4H-Sic, which may make possible high performance of high-frequency 4H-SiC power devices. Impurity levels and deep levels are investigated by Hall effect, admittance spectroscopy, and DLTS measurement. Metal/4H-SiC Schottky barrier heights are characterized and a strong dependence on metal work function without strong “pinning” is elucidated.

Device processes are described for ion implantation. Interface properties of SiO₂/SiC are characterized in detail using metal-oxide-semicond.