等离子体鞘层附近尘埃颗粒特性的数值模拟

为了研究尘埃等离子体中尘埃颗粒以及鞘层中粒子密度分布等特性,对尘埃颗粒存在条件下等离子体鞘层结构的采取数值模拟.采用稳态无碰撞的尘埃等离子体鞘层模型,对玻姆判据、尘埃颗粒的荷电性质、平板鞘层区域的电势分布及鞘层内粒子分布特性进行了系统的数值模拟研究.计算结果显示,鞘层边缘尘埃颗粒数密度的增加、尘埃温度的升高,将引起孤立尘埃颗粒对电子吸附能力的减弱,集体效应也受到一定程度的影响;二者同时对离子玻姆速度以及鞘层厚度的增加都有着极大的促进作用.鞘层电势在靠近下极区处降落迅速,主要聚集在接近阴极极板的鞘层区域,各种微粒数密度的空间分布满足准中性条件.     

碰撞参数对磁化电负性等离子体鞘层结构的影响

数值研究了离子马赫数的取值和碰撞参数对由热电子、热负离子和冷正离子构成的磁化电负性等离子体鞘层结构的影响.通过理论推导得到了鞘层模型的玻姆判据的表达式,并得到了不同离子马赫数情况下鞘层的正离子密度分布和净电荷分布曲线,还进一步得到了几个不同碰撞参数下鞘层的带电粒子密度、净电荷以及电势分布曲线.结果表明:离子马赫数取值不同对应不同的鞘层结构;碰撞使鞘层中正离子密度增加,使电子密度更快减小到零,对负离子密度分布影响不明显;碰撞使净电荷密度的峰值幅度增加并向鞘层边缘移动,使鞘层中电势值升高并使鞘层厚度减小.     

ECR微波等离子体离子输运的数值模拟

建立了ECR微波等离子体源离子输运的平板和圆柱模型,对离子历经的空间区域的输运过程进行了数值研究。采用Monte Carlo(M-C)方法模拟了存在外磁场情况下,离子离开开放电室后历经中性区、鞘层区、最后被加负偏压的工作表面吸收的全过程,考虑了离子与中性粒子的电荷交换碰撞玫弱性散性,统一处理了中性区和鞘层区电势的衔接,采用曲线拟合,电势自洽迭代方法把中性区和鞘层区衔接起来,得到了光滑自治的电势分布曲线和鞘层区不同位置处的速度分布、能量分布及角分布。     

半圆形容器等离子体源离子注入过程中离子动力学的两维PIC计算机模拟

利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律. 详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上各点离子注入剂量分布规律,获得了工件表面各点注入离子的入射角分布规律. 研究结果揭示了半圆容器边缘附近鞘层中离子聚焦现象,以及离子聚焦现象导致工件表面注入剂量分布和注入角度分布存在很大不均匀的基本物理规律. 关键词： 等离子体源离子注入 鞘层 两维particle-in-cell方法 离子运动轨迹     

电子温度各向异性对霍尔推力器BN绝缘壁面鞘层特性的影响

建立多价态多组分等离子体一维流体鞘层模型,引入电子温度各向异性系数并考虑出射电子速度分布,研究了电子温度各向异性对霍尔推力器中的BN绝缘壁面鞘层特性和近壁电子流的影响.分析结果表明,相比于纯一价氙等离子体鞘层参数,推力器中的多价态氙等离子体鞘层电势降略有降低,电子壁面损失增加,临界二次电子发射系数减小.推力器中的电子温度各向异性现象可以显著地加大出射电子能量系数,进而降低鞘层电势降,增强电子壁面相互作用.数值结果表明,空间电荷饱和机制下电子温度各向异性对鞘层空间电势分布影响显著. 关键词： 霍尔推力器 电子温度各向异性 空间电荷饱和鞘层     

等离子体源离子注入鞘层随时空演化的数值模拟

在等离子体源离子注入装置中(PSⅡ),靶被直接放入均匀等离子体源中,并在其上加负高压脉冲,从而使靶的周围形成了一个只存在离子的等离子体鞘层,离子以较高速度注入靶中。利用冷流体方程和泊松方程组成的非线性方程组对一维平面几何鞘层时空演化过程进行数值模拟,所采用的负高电势脉冲波形为方波和梯形波,得到了电子密度、离子密度、电势分布的时空演化曲线,并首次对梯形波下降沿时间内鞘层时空演化作了详细讨论。     

尘埃颗粒与等离子体鞘层相互作用的数值模拟

通过求解一维稳态的尘埃等离子体鞘层模型,得到了等离子体鞘层势、正离子密度、电子密度和尘埃颗粒密度随一维横向的分布,Bohm判据及鞘层边界无量纲Bohm速度随尘埃密度的变化曲线,尘埃颗粒的带电量和尘埃密度的关系,尘埃颗粒的温度对尘埃颗粒自身在鞘层中分布的影响。结果表明,随着尘埃密度的增加,鞘层的厚度在减小,鞘层内的电子密度在下降,而且尘埃颗粒的带电量也在逐渐减少;随着尘埃温度的增加,鞘层的厚度减小,电子密度下降,而且鞘层附近的尘埃颗粒在逐渐增多。     

壁面二次电子发射对霍尔推力器放电通道绝缘壁面双鞘特性的影响

为进一步揭示霍尔推力器放电通道绝缘壁面鞘层的特性, 利用考虑了壁面二次电子分布函数的一维稳态流体鞘层模型, 研究了壁面二次电子发射对近壁双鞘特性的影响. 分析结果表明, 由于壁面发射的二次电子对近壁鞘层中的电子密度有增加作用, 存在一个临界二次电子发射系数σ_dc使得: 当σ≤σ_dc时, 鞘层为单层的正离子鞘结构; 当σ>σ_dc时, 鞘层表现为双层的正离子鞘和电子鞘相连结构, 连接点对应于垂直于壁面方向上电势分布的拐点. 然而, 当σ进一步增大到0.999时, 鞘层转变为三层的正离子鞘-电子鞘-正离子鞘交替结构. 数值结果表明: 随着σ的增加, 电子鞘与离子鞘的连接点向远离壁面的方向移动, 电子鞘的厚度逐渐增加; 随着壁面出射电子能量系数a的增加, 近壁区鞘层的厚度也逐渐增加. 关键词： 霍尔推力器 双鞘 壁面二次电子发射     

空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化

等离子体源离子注入过程中，鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构，对材料的不同部位这种影响是不同的.利用无碰撞两维流体动力学模型，研究了有限上升时间的电压脉冲作用下，共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中，鞘层的时空演化规律.通过计算得到了鞘层内随时间变化的电势分布和离子密度分布，计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律.计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异.     

具有非广延分布电子的碰撞等离子体磁鞘的结构

很多关于等离子体鞘层的研究工作都是基于电子满足经典的麦克斯韦速度分布函数,而等离子体中的粒子具有长程电磁相互作用,使用Tsallis提出的非广延分布来描述电子更为恰当.本文建立一个具有非广延分布电子的碰撞等离子体磁鞘模型,理论推导出受非广延参数q影响的玻姆判据,离子马赫数的下限数值会随着参数q的增大而减小.经过数值模拟,发现与具有麦克斯韦分布(q=1)电子的碰撞等离子体磁鞘对比,具有超广延分布(q<1)和亚广延分布(q>1)电子的碰撞等离子体磁鞘的结构各有不同,包括空间电势分布、离子电子密度分布、空间电荷密度分布.模拟结果显示非广延分布的参数q对碰撞等离子体磁鞘的结构具有不可忽略的影响.希望这些结论对相关的天体物理、等离子体边界问题的研究有参考价值.     

Positive ion speed at the plasma–sheath boundary of a negative ion-emitting electrode

One-dimensional fluid model for a planar sheath in front of a negative ion-emitting electrode surface immersed in a collision-less, non-magnetized, electronegative plasma is presented. It was found that the positive ion speed at the plasma–sheath boundary (PSB) increases linearly with negative ion emission from the electrode but attains a saturation value as soon as a virtual cathode is formed near the electrode surface. The effect of negative ion emission on the pre-sheath region shows that the potential drop increases across the pre-sheath in accordance with the rise in positive ion speed at the PSB. The sheath width obtained using the present model shows a similar trend as the Child-Langmuir law, but its magnitude is found to be consistently higher compared with a non-emitting electrode. A plausible explanation has been given to explain these effects.     

碰撞对两种正离子的电负性磁鞘影响的数值研究

建立包括两种正离子的电负性磁鞘的流体模型,利用四阶龙格库塔法数值求解描述一维稳态等离子体鞘层的方程组,考察离子与中性粒子碰撞对一维稳态等离子体鞘层的影响.结果表明:鞘边Ar⁺与He⁺的含量比值与碰撞参数对离子马赫数的取值范围都有影响.鞘边负离子含量越少,碰撞对鞘层中带电粒子密度的影响越明显.并且随碰撞参数的加大,鞘层中电子、负离子的密度下降越快,两种正离子的密度则呈现不同的波动变化.鞘边负离子含量越多,碰撞对鞘层中两种正离子的速度影响就越明显.此外,碰撞参数越大对鞘边δ越大的鞘层中的带电粒子密度影响越大.     

多成分电负性碰撞等离子体的鞘层玻姆判据

采用双流体模型研究了多成分的电负性碰撞等离子体鞘层的玻姆判据,讨论了一维稳态情形下不同的带电粒子对鞘层玻姆判据的影响。采用拟牛顿法,得到了数值解。结果表明：玻姆判据存在上限和下限。二次电子发射系数越大,离子的马赫数越大;负离子的含量越多,离子的马赫数越小。鞘层中离子的温度、离子与中性粒子的碰撞以及离子的带电量对玻姆判据的上下限的取值都有一定的影响。     

Arc spot ignition caused by sheath instability

The transition from the stationary and homogeneous state of the collision-free space charge sheath between plasma and wall to a strongly inhomogeneous and instationary state with are spots is initiated by local enhancement of power supply from the plasma, connected with increasing electron emission. The general relations between surface emissivity, net current density, sheath potential, and power density in such “active” boundary layers are derived, taking the feedback of emitted electrons on the plasma parameters into account, as far as necessary. Joule heat generation is taken into account. The decisive effect of the transition is the rapidly increasing yield of thermo-field electron emission. Conditions and possible paths to sheath instability and arc spot formation are discussed     

Transition region between a nonequilibrium plasma and a negative electrode

A model is developed that describes the transition region between a quasineutral plasma and a planar negative electrode and in which the electron velocity distribution is represented as the sum of two Maxwellian distributions with different temperatures or as the sum of a Maxwellian distribution and distribution corresponding to an electron beam directed toward the electrode. Criteria for the formation of a sheath of positive space charge and a secondary plasma in the transition region are derived. An analysis is made of the dependence of the structure of the transition region on the parameters of the electron distribution, the space charge density distribution in the sheath, and the density of the ion current to the electrode. The criteria obtained are compared with the Bohm criterion.     

Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens

A complex focusing effect of positive and negative ions caused by the sheath forming to biased electrodes that interface insulators has been found by solving in three dimensions the potential distribution and ion kinetics within the sheath. Thus, intrinsically correlated with the sheath shape, certain electrical charges are focused on the surface, forming well defined patterns named modal lines and modal spots. Their superposition to the previously reported discrete focusing leads to a total flux that represents a "fingerprint" of the entire sheath on the electrode surface. The ion flux pattern is developed experimentally on the surface of square and octagonal electrodes exposed to Ar/SF(6) and CF4 plasmas. Present results are of high potential importance for fundamental studies concerning sheath formation and charge kinetics and also in a wide range of plasma applications.     

Determination of sheath parameters by test particles upon local electrode bias and plasma switching

Equilibrating gravitation by electric forces, microparticles can be confined in the plasma sheath above suitably biased local electrodes. Their position depends on the detailed structure of the plasma sheath and on the charge that the particles acquire in the surrounding plasma, that is by the electron and ion currents towards it. Bias switching experiments reveal how the charge and equilibrium position of the microparticle change upon altered sheath conditions. Above a critical bias, the particle is subject to an additional downward acceleration that cannot be explained solely by gravity and ion drag. This acceleration can be attributed to a positive charging of the particle induced by extreme out-of-equilibrium conditions of the plasma sheath in its surroundings: locally the plasma sheath can be completely deprived of electrons by means of the bias. We observe similar particle behaviors also in the afterglow of the discharge for a persisting bias voltage on the electrode: damped oscillation into a new equilibrium or (accelerated) fall according to the bias. The observed particle dynamics in locally tailored plasma sheath environments directly monitors changes in electric field structures and plasma density profiles.     

rf Electrode sheath formation near a concave electrode

In this work we present experimental results concerning electrode sheath and ion flux formation near a concave electrode with the dimension of a cavity comparable to the electrode sheath length. It is shown that the secondary electron emission can play a crucial role in plasma molding over the electrode surface. It is also observed that plasma has a tendency to "self-leakage" in electrode cavities.