碱溶液修饰硅纳米线阵列绒面

提出用碱溶液修饰硅纳米线阵列制作太阳能绒面的方法。实验中首先采用金属催化化学腐蚀法在Si(100)基底上制备了定向排列的硅纳米线阵列,然后将纳米线阵列浸入碱溶液中进行修饰,修饰时间分别为10,30,50,60,90s。通过扫描电子显微镜(SEM)对硅纳米线阵列进行形貌分析,采用太阳能测试系统附带的积分球测量纳米线阵列绒面结构的反射光谱。通过测量和分析发现硅纳线阵列在碱溶液中修饰30s时表面分布均匀,在400～1000nm波段的综合反射率低于4%。结果表明碱溶液修饰纳米线阵列的方法能够有效分散束状硅纳米线阵列,明显降低绒面的反射率,并且初步分析了碱溶液修饰硅纳米线阵列的分散机理。     

硅薄膜太阳电池表面纳米线阵列光学设计

陷光结构的优化是增加硅薄膜太阳电池光吸收进而提高其效率的关键技术之一. 以硅纳米线阵列为代表的光子晶体微纳陷光结构具有突破传统陷光结构Yablonovith极限的巨大潜力. 通常硅纳米线阵列可以用作太阳电池的增透减反层、轴向p-n结、径向p-n结. 针对以上三种应用, 本文运用有限时域差分(FDTD)法系统研究了硅纳米线阵列在 300-1100 nm 波段的光学特性. 结果表明, 当硅纳米线作为太阳电池的减反层时, 周期P=300 nm, 高度H=1.5 μm, 填充率(FR)为0.282条件下时, 反射率最低为7.9%. 当硅纳米线作为轴向p-n结电池时, P=500 nm, H=1.5 μm, FR=0.55条件下纳米线阵列的吸收效率高达22.3%. 硅纳米线作为径向p-n结电池时, 其光吸收主要依靠纳米线, 硅纳米线P=300 nm, H=6 μm, FR= 0.349 条件下其吸收效率高达32.4%, 进一步提高其高度吸收效率变化不再明显. 此外, 本文还分析了非周期性硅纳米线阵列的光学性质, 与周期性硅纳米线阵列相比, 直径随机分布和位置随机分布的硅纳米线阵列都可以使吸收效率进一步提高, 相比于周期性硅纳米线阵列, 优化后直径随机分布的硅纳米线阵列吸收效率提高了39%, 吸收效率为27.8%. 本文运用FDTD法对硅纳米线阵列的光学特性进行设计与优化, 为硅纳米线阵列在太阳电池中的应用提供了理论支持.     

金催化的硅纳米线的可控制备及光学特性研究

硅纳米线是新型一维半导体纳米材料的典型代表。利用阳极氧化铝薄膜为模版复制出具有有序纳米结构的金膜,在金的催化辅助下对单晶硅进行湿法刻蚀,得到尺寸、形状、分布可控的硅纳米线阵列,并对其光学特性进行了研究。研究结果表明,金代替银作为催化剂,可以有效地抑制二次刻蚀,金的化学性质相对于银更加稳定,克服了银膜在较高的温度或较长刻蚀时间下产生的结构性破坏,得到形貌规整、尺寸可控的硅纳米线阵列。对该阵列在400 nm~1 200 nm波段的反射率、透过率进行了测试,并对比分析了金模板催化与传统方法机理的异同。测试结果表明,相较于传统金属辅助化学刻蚀法,文中提出的金模板催化法制备的硅纳米线阵列尺寸及分布更加均匀可控,在宽光谱范围内的抗反射性得到了显著提高。     

Pd颗粒表面修饰ZnO纳米线阵列的制备及其气敏特性

采用化学气相沉积(CVD)方法在SiO_2/Si衬底生长了ZnO纳米线阵列,纳米线长约为15μm,直径为100~500 nm。通过改变溅射沉积时间(0~150 s),在ZnO纳米线表面包覆了不同厚度的Pd薄膜。在Ar气氛中,经800℃高温退火后,制备出Pd颗粒表面修饰的ZnO纳米线阵列并对其进行了气敏测试。对于乙醇而言,所有传感器最佳工作温度均为280℃。溅射时间的增加(3~10 s)导致ZnO纳米线表面Pd纳米颗粒数量及尺寸增加,传感器响应值由2.0增至3.6。过长的溅射时间(30~150 s)将导致Pd颗粒尺寸急剧增大甚至形成连续膜,传感器响应度显著降低。所有传感器对H2均表现出相对较好的选择性,传感器具有较好的响应-恢复特性和稳定性。最后,探讨了Pd颗粒表面修饰对ZnO纳米线阵列气敏传感器气敏特性的影响机制。     

硅纳米线拉曼光谱的研究

声子限制效应会引起本征硅纳米线拉曼光谱红移及不对称宽化,但研究发现其并非引起硅纳米线拉曼光谱改变的主要因素。研究表明,由于在拉曼光谱测量中,通常使用的入射激光功率都在5 mW以上,激光加热会导致很高的局部温度,从而引起拉曼光谱大幅度红移并对称宽化,这是硅纳米线拉曼光谱红移的主要影响因素。另外,激光功率很高时,由激光激发的载流子会与声子发生Fano型干涉,从而使硅纳米线拉曼光谱发生Fano型红移和不对称宽化。除此之外,对小直径本征硅纳米线,声子限制效应导致波矢选择定弛则弛豫,使不在布里渊区中心的声子也可以参与拉曼散射,因而其拉曼光谱中除常见的几个拉曼峰外还会出现新拉曼峰。     

银修饰的ZnO纳米线的发光和光响应性质

采用不同浓度的银溶液对水热方法生长的ZnO纳米线进行了银修饰,并对其形貌、光致发光和光响应特性进行了研究.实验结果表明,随着修饰用银浓度的加大,光致发光的强度减弱.对原生的和用浓度为10mmol/L的银修饰的ZnO纳米线的光响应进行了测试和比较,发现银修饰的ZnO纳米线在380 nm的响应度达4.6 mA/W,其值是未...     

晶体硅太阳电池表面纳米线阵列减反射特性研究

为增强晶体硅太阳电池的光利用率, 提高光电转换效率, 研究了硅纳米线阵列的光学散射性质. 运用严格耦合波理论对硅纳米线阵列在310—1127 nm波段的反射率进行了模拟计算, 用田口方法对硅纳米线阵列的表面传输效率进行了优化. 结果表明, 当硅纳米线阵列的周期为50 nm, 占空比为0.6, 高度约1000 nm时减反射效果最佳; 该结构在上述波段的平均反射率约为2%, 且在较大入射角度范围保持不变. 采用金属催化化学腐蚀法, 于室温、室压条件下在单晶硅表面制备周期为60 nm,占空比为0.53, 高度为500 nm的硅纳米线阵列结构, 其反射率的实验测试结果与计算模拟值相符, 在上述波段的平均反射率为4%—5%, 相对于单晶硅35%左右的反射率, 减反射效果明显. 这种减反射微结构能够在降低太阳电池成本的同时有效减小单晶硅表面的光反射损失, 提高光电转换效率.     

正方形纳米线及纳米孔阵列辐射特性研究

晶体硅纳米线及纳米孔阵列结构不仅有着优异的增吸收特性,而且与传统的硅膜电池相比能大幅降低原料成本,因而在光伏市场中有着巨大发展前景。本文采用严格耦合波分析(RCWA)研究了晶体硅正方形纳米线和纳米孔阵列结构的辐射特性,证明了两种结构的应用潜力。在AM1.5太阳能光谱辐射强度下,纳米线和纳米孔阵列结构最终效率都大于24%,高出同等厚度晶体硅薄膜70%P以上。两种纳米结构在周期600 nm附近达到最高,其中纳米线阵列结构有着更低的最优填充率。不同角度混合极化入射下,两种结构的最终效率能够维持在大的角度范围内(0~60°),表现了良好的角度特性。     

ZnO半导体电导型X射线探测器件研究

本文制备了基于ZnO纳米线阵列和ZnO薄膜的Ag-ZnO-Ag电导型X射线探测器件,研究了它们对X射线的响应特性.薄膜器件在100 V偏置时的响应度达到0.12μC/Gy,纳米线阵列器件在50 V偏压下的响应度达到0.17μC/Gy.器件工作机理研究表明,器件的响应过程与表面氧吸附与解吸附效应有关,氧气吸附与解吸附过程使得X射线辐照下的载流子寿命大幅度增加,从而使得器件对X射线具有较高的响应度.本文研究结果表明ZnO薄膜和纳米线阵列器件在X射线剂量测量领域具有应用前景.     

微流控技术制备ZnO纳米线阵列及其气敏特性

利用微流控技术在微通道中制备了Zn O纳米线阵列,通过X射线衍射和扫描电子显微镜分别对纳米线的物相和表面形貌进行了表征.结果发现,合成的Zn O纳米线具有良好的c轴择优取向性和结晶度.同时,对Zn O纳米线阵列在丙酮、甲醇和乙醇气体中的气敏特性进行了研究,测试结果表明:在最佳工作温度(475?C)下,纳米线阵列对200 ppm(1 ppm=10-6)丙酮气体的最大灵敏度可达8.26,响应恢复时间分别为9和5 s;通过与传统水热法制备的Zn O纳米线的气敏性能相比较发现,基于微流控技术制备的纳米线阵列具有更高的灵敏度和更快的响应恢复速度.最后,从材料表面氧气分子得失电子的角度对Zn O纳米线气敏机理进行了讨论.     

Effects of silver and gold catalytic activities on the structural and optical properties of silicon nanowires

The metal-assisted chemical etching of silicon in an aqueous solution of hydrofluoric acid and hydrogen peroxide is established for the fabrication of large area, uniform silicon nanowire (SiNW) arrays. In this study, silver (Ag) and gold (Au) are considered as catalysts and the effect of different catalysts with various thicknesses on the structural and optical properties of the fabricated SiNWs is investigated. The morphology of deposited catalysts on the silicon wafer is characterized by atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM). It is shown that the morphology of the fabricated silicon nanostructures remarkably depends upon the catalyst layer thickness, and the catalyst etching time directly affects the structural and optical properties of the synthesized SiNWs. FESEM images show a linear increment of the nanowire length versus time, whereas the etching rate for the Au-etched SiNWs was lower than the Ag-etched ones. Strong light scattering in SiNWs caused the total reflection to decrease in the range of visible light, and this decrement was higher for the Ag-etched SiNW sample, with a longer length than the Au-etched one. A broadband visible photoluminescence (PL) with different peak positions is observed for the Au- and Ag-etched samples. The synthesized optically active SiNWs can be considered as a promising candidate for a new generation of nano-scale opto-electronic devices.     

Raman spectroscopy and field electron emission properties of aligned silicon nanowire arrays

Arrays of aligned silicon nanowire (SiNW) were synthesized on a silicon (1 0 0) substrate by self-assembling electroless nanoelectrochemistry. Compared with that of bulk crystal silicon, the first-order Raman peak of the silver cap-removed SiNW arrays shows a downshift and asymmetric broadening due to the phonon quantum confinement effects, and intensity enhancement. Field electron emission from the SiNWs was also investigated. The turn-on field was found to be about 12 V/μm at a current density of 0.01 mA/cm². These highly densified and ordered SiNW arrays can be expected to have favorable applications in vacuum electronic or optoelectronic devices.     

Fabrication and field emission properties of multi-walled carbon nanotube/silicon nanowire array

Silicon nanowire (SiNW) arrays were fabricated on silicon wafers by the metal-assisted chemical etching method. Varied average diameters of SiNW arrays were realized through further treatment in a mixed agent of HF and HNO₃ of certain concentrations. After the treatment, there were more than 93% SiNWs with diameters smaller than 100 nm. The tip of each SiNW was subsequently wrapped with multi-walled carbon nanotubes (MWCNTs) with chemical vapor deposition method. The as-fabricated MWCNT/SiNW arrays were fabricated into electric field emitters, with turn-on field of 2.0 V/μm (current density: 10 μA/cm²), much lower than that of SiNW array (5.0 V/μm). The turn-on electric field of MWCNT/SiNW array decreased with the decreasing of the average diameter of SiNWs, indicating the performance of the field emission is relative to the morphology of SiNWs. As the SiNW array is uniform in height and easy to fabricate, the MWCNT/SiNW array shows potential applications in flat electric display.     

Fabrication of silver-coated silicon nanowire arrays for surface-enhanced Raman scattering by galvanic displacement processes

Silver-coated silicon nanowire (SiNW) arrays were prepared utilizing galvanic displacement processes consisting of three steps: galvanic displacement deposition of silver particles using a HF-AgNO₃ or NH₄F-AgNO₃ aqueous solution; formation of SiNW arrays by a silver-assisted chemical etching process conducted in the HF-H₂O₂ aqueous solution; deposition of silver particles on the SiNW arrays from the NH₄F-AgNO₃ aqueous solution. The effects of the morphology of pre-deposited silver particles and deposition solution on the formation of silver-coated SiNW arrays were discussed. Surface-enhanced Raman scattering (SERS) performances have been studied using Rhodamine 6G (R6G) probe molecules on the silver-coated SiNW substrates.     

硅纳米线阵列的光学特性

在常温常压条件下,采用改进的金属催化化学腐蚀方法在n型单晶硅片(100)上制备了大面积垂直于硅衬底、直径均匀、排列整齐的硅纳米线阵列。分析了样品的表面形貌和反射谱,纳米线直径为10~50 nm。在腐蚀时间分别为15,30,60 m in时,纳米线长度分别为9,17,34μm。样品的减反射性能优异,在300~1 000nm波段,得到了2.4%的反射率。初步分析了纳米线阵列的减反射机制和不同腐蚀时间样品的反射率差异。     

The Influence of B<Subscript>2</Subscript>H<Subscript>6</Subscript> on the Growth of Silicon Nanowire

The un-doped and boron-doped silicon nanowires (SiNWs) were grown via vapor–liquid–solid (VLS) mechanism by low pressure chemical deposition (LPCVD). The diameters of un-doped and boron-doped SiNWs varied from 18.5 to 75.3 nm and 26.6 to 66.1 nm, respectively. The critical growth temperature of boron-doped SiNWs is 10°C lower than that of un-doped ones and the diameters of the boron-doped SiNWs is always larger than that of the un-doped ones under different growth temperatures. This is because that the introduction of diborane enhanced the dissociation of SiH₄ which determines the growth process of SiNW. A growth process of silicon nanowire is proposed to describe the influence of B₂H₆.     

Microstructural characterization of Li insertion in individual silicon nanowires

The lithiation and delithiation process of silicon nanowire arrays (SiNWs) on silicon substrates has been studied with high-resolution electron microscopy. The composition of lithiated SiNWs was revealed, consisting of the unreacted crystalline silicon core and the reacted amorphous Li–Si shell. In particular, the Li–Si shell was comprised of a mixture of amorphous silicon oxide and crystalline silicon, leading to hindrance during Li–Si alloying/dealloying upon cycling.     

一种新方法制备硅/聚(3, 4-乙撑二氧噻吩)核/壳纳米线阵列杂化太阳能电池

采用气相聚合法制备了有机/无机杂化的硅/聚3, 4-乙撑二氧噻吩核/壳纳米线阵列(SiNWs/PEDOT)太阳能电池. 相对平面结构Si/PEDOT太阳能电池, SiNWs/PEDOT太阳能电池的能量转换效率提升了7倍, 达到3.23%.对比分析反射光谱、I-V曲线及外量子效率的实验结果, 发现SiNWs/PEDOT太阳能电池性能改进的主要原因可归结为: 气相聚合法能够有效地制备出SiNWs/PEDOT电池的核/壳纳米线阵列结构, 使得器件具有高光捕获、高比结面积和高电荷收集效率. 关键词： Si/PEDOT核/壳纳米线结构 太阳能电池 气相聚合