金辅助催化方法制备GaAs和GaAs/InGaAs纳米线结构的形貌表征及生长机理研究

利用金（Au）辅助催化的方法,通过金属有机化学气相沉积技术制备了GaAs纳米线及GaAs/InGaAs纳米线异质结构.通过对扫描电子显微镜（SEM）测试结果分析,发现温度会改变纳米线的生长机理,进而影响形貌特征.在GaAs纳米线的基础上制备了高质量的纳米线轴、径向异质结构,并对生长机理进行分析.SEM测试显示,GaAs/InGaAs异质结构呈现明显的“柱状”形貌与衬底垂直,InGaAs与GaAs段之间的界面清晰可见.通过X射线能谱对异质结样品进行了线分析,结果表明在GaAs/InGaAs轴向纳米线异质结构样品中,未发现明显的径向生长.从生长机理出发分析了在GaAs/InGaAs径向纳米线结构制备过程中伴随有少许轴向生长的现象.     

ZnO纳米线的合成与生长机理

采用化学气相沉积系统制备ZnO纳米线,以覆盖一层约5nm厚的Ag薄膜的单晶Si(001)为衬底,纳米线的生长遵循气-液-固(VLS)机理。对得到的样品采用X射线衍射(XRD)和扫描电镜(SEM)进行晶体结构和形貌的表征。XRD结果表明衬底温度在600~700℃时生长的ZnO纳米线具有六方结构和统一的取向。通过扫描电子显微镜分析,比较了生长温度对纳米线直径和长度的影响。实验表明我们可以通过催化剂和温度来实现ZnO纳米线生长的可控。与传统的VLS生长方式不同的是在我们制备的ZnO纳米线顶端并没有看到催化剂颗粒,表明纳米线的生长方式是底部生长,我们对其生长机理进行了研究。     

化学气相沉积法制备GaN纳米结构设计性实验

在无催化剂辅助条件下,采用化学气相沉积法生长了GaN纳米线.通过调整衬底、NH3气流、生长时间等,实现了半导体GaN纳米线的生长以及形貌调控.用X射线衍射仪和扫描电子显微镜对产物的物相及形貌进行了表征.获得了合成GaN纳米线的优化条件.     

Si衬底上InP纳米线的晶体结构和光学性质

采用金属有机化学气相沉积技术,利用自催化法,在Si(100)、(111)衬底上成功生长了InP纳米线。利用扫描电镜观察样品表面,在Si(100)、(111)衬底上生长的纳米线形貌相似,纳米线面密度不同。利用X射线衍射和透射电镜研究纳米线的生长取向和晶体结构,结果显示纳米线具有闪锌矿结构,生长方向〈111〉,并且具有层状孪晶结构。与InP体材料相比,纳米线的光致发光峰位蓝移,半峰全宽增大,拉曼散射TO和LO峰向低波数频移,频移随激发光功率减弱而减小。     

ZnO/ZnS核壳纳米线界面缺陷的形成及发光特性研究

ZnO/ZnS核壳纳米结构因具有优异的光电特性,在光电子领域极具应用前景,其依靠核壳结构界面处载流子的束缚效应可更加有效地控制载流子的产生、传输和复合过程。为讨论ZnO/ZnS核壳结构界面状态及其相应的光学特性,生长了不同程度硫粉硫化的ZnO/ZnS核壳纳米线,再利用扫描电子显微镜(SEM)、透射电子显微镜(TEM)及光致发光光谱(PL)等测试表征手段,分析并讨论经过不同程度硫粉硫化后的ZnO/ZnS核壳纳米线界面处的结构及其光学性质的变化。通过分析ZnO/ZnS核壳结构形貌发现,ZnS成功包覆ZnO纳米线。随着硫化程度的增加,ZnO核结构被破坏,并在核壳界面处引入缺陷,导致形成具有不同结晶质量的ZnO/ZnS核壳纳米线结构,从而会影响ZnO/ZnS核壳纳米线的光学性质。结果表明,ZnO/ZnS核壳界面处缺陷较少时,对载流子的产生和传输具有一定的束缚作用,可以抑制非辐射复合效应,提高材料光学性能;当界面缺陷增加时,形成的缺陷能级则会降低材料的光学性能。     

超长定向含铁多壁碳纳米管阵列的制备

采用无模板化学气相沉积法,以二茂铁为催化剂,二甲苯为碳源,利用单温炉加热装置制备了定向碳纳米管阵列。运用扫描电子显微镜、透射电子显微镜、拉曼光谱和X射线衍射仪等对定向碳纳米管阵列的形貌、成分和物相进行细致的分析和表征。结果表明:制得的碳纳米管阵列具有良好的定向性和多壁管状结构,并且石墨化程度高;碳纳米管中除碳元素外,管中包含有少量以纳米颗粒和纳米线形式存在的铁及其化合物,主要成分是铁和碳化铁。结合碳纳米管的制备和透射电子显微镜分析表征结果,认为超长碳纳米管阵列的生长模式为底部生长方式,即经历催化剂分解、催化、成核、长大、中毒、凝聚成粒和连接成线的循环过程,正是由于碳源和催化剂的连续供应促成了碳纳米管阵列的快速定向生长。     

低温CVD法在玻璃衬底上制备ZnO纳米线阵列

采用化学气相沉积(CVD)法在镀Cr(20nm)的玻璃衬底上,低温制备了ZnO纳米线阵列。利用扫描电子显微镜(SEM)和X射线衍射(XRD)对样品的表面形貌和微结构进行了分析表征。结果表明:源分解温度1350℃,衬底温度450～500℃,氩气流量为35sccm时,ZnO纳米线在玻璃衬底上呈现有序生长;XRD谱图中只观测到ZnO(002)衍射峰。表明制备的纳米线阵列具有高度c轴择优取向生长特性和较高的结晶质量。     

真空热蒸发制备CdS/ZnS核/壳异质结纳米线

将传统的真空热蒸发镀膜实验加以改进,先以催化剂辅助蒸发制备出CdS纳米线,再将其作为模板,以ZnS为蒸发源物质,二次蒸发包覆ZnS层,成功制备出大量的CdS/ZnS核/壳异质结纳米线.经X射线衍射、X射线能量色散谱、透射电镜分析表明,所得CdS/ZnS异质结纳米线的核心部分为CdS单晶纳米线,外层为ZnS多晶层.本文的实验方法简便易行,所得纳米结构在光电纳米器件领域有一定应用前景.     

生长周期对有机金属化学气相沉积法制备SiO2-InP光子晶体的影响

有机金属化学气相沉积(MOCVD)方法在人工蛋白石空隙中填充了磷化铟(InP)晶体以改变这类材料的光学行为,在选择了InP的生长条件的基础上进行了周期生长试验。利用扫描电子显微镜(SEM)和紫外可见光谱(UV-Vis)对人工蛋白石晶体及其填充InP后的形貌和反射谱特性进行了分析。结果发现,采用周期生长方式有利于InP在模板空隙中的填充,且在反应时间相同的条件下,反应周期数越多,InP在空隙中的填充率越高,填充率增加反过来增大了二氧化硅球和空隙之间的折射率差,从而可控地对所制备光子晶体光子带隙进行调制。实验表明InP具有较好的生长质量,此项研究为制备三维InP光子晶体打下了基础。     

异质结型CuO/ZnO复合纳米线的制备及光催化性能

在室温下,通过溶液法在Cu衬底上制备了CuO纳米线,然后采用溶剂热法在CuO纳米线表面生长ZnO纳米颗粒以构建CuO/ZnO复合纳米线异质结构.利用扫描电镜、透射电镜、X射线衍射仪和X射线光电子能谱分析了样品的形貌、结构和元素组成.结果显示CuO/ZnO复合纳米线由ZnO纳米颗粒和CuO纳米线组成.在模拟太阳光照射下,...     

LP-MOCVD生长温度对InGaAs性能的影响

众所周知,InGaAs在InP和GaAs二个系列材料中具有最大的载流子迁移率和最大的饱和速率,InGaAs/GaAs应变量子阱可以把GaAs的发射波长从0.83μm延伸到1.1μm[1],而InGaAs/InP量子阱激光器又可以实现1.1～1.8μm内任意波长发射[2],并且,InGaAs/InP探测器的响应波长范围为0.93μm～1.65μm[3],因此,它不论对高速电子器件如HBT和HEMT,还是光电子器件如激光器(LD)和探测器(PIN和APD)都具有极重要的意义。     

X-ray and electron spectroscopy investigation of the core-shell nanowires of ZnO:Mn

ZnO/ZnO:Mn core-shell nanowires were studied by means of X-ray absorption spectroscopy of the Mn K- and L_2,3-edges and electron energy loss spectroscopy of the O K-edge. The combination of conventional X-ray and nanofocused electron spectroscopies together with advanced theoretical analysis turned out to be fruitful for the clear identification of the Mn phase in the volume of the core-shell structures. Theoretical simulations of spectra, performed using the full-potential linear augmented plane wave approach, confirm that the shell of the nanowires, grown by the pulsed laser deposition method, is a real dilute magnetic semiconductor with Mn²⁺ atoms at the Zn sites, while the core is pure ZnO.     

高取向As掺杂ZnO纳米线阵列的制备与表征

在不采用任何金属催化剂的条件下,运用化学气相沉积法,在Si(100)衬底上制备出高取向的As掺杂ZnO纳米线阵列.样品的X射线衍射(XRD)谱显示获得了单一取向的衍射峰,表明样品具有较好的结晶质量.场发射扫描电镜(FE-SEM)观察表明,As掺杂ZnO纳米线阵列具有均一的直径和长度,其顶部和根部直径分别为70 nm和1...     

Growth mode and effect of carrier gas on In0.53Ga0.47As/InP surface morphology grown with trimethylarsine and arsine

Different growth mode have been observed for InGaAs/InP grown with trimethylarsine and arsine by Metalorganic Vapor Phase Epitaxy (MOVPE) when changing the carrier gas. The surface has been investigated by Atomic Force Microscope (AFM) for epilayers grown at 600°C under pure hydrogen or a mixture of hydrogen and nitrogen as carrier gas. The step/terrace surface morphology was observed for InP/InP and InGaAs/InP (001) using 0.2° off substrates. InP epilayers grown under nitrogen flow show step-bunched terraces as large as 170 nm. The effect of the group V source for InGaAs/InP has been studied. It is shown that the step edge characteristic of step flow growth appears for lattice-matched InGaAs/InP grown with arsine. When using TMAs and hydrogen as a carrier gas, the growth mode and surface roughness depends greatly on V/III ratio and growth temperature. Under nitrogen flow with the combination of TMI+TMG+TMAs, pit-like defects (5–8 nm deep) are visible at high surface concentration (10⁹–10¹⁰/cm²). When increasing V/III ratio, 3D growth occurs simultaneously with pit-like defects, recovering the whole surface of the sample. Various surface morphology characteristics of InGaAs epilayers assessed by AFM characterisation will be presented and discussed.     

Growth and characterization of type-II ZnO/ZnTe core-shell nanowire arrays for solar cell applications

Large area, well-aligned type-II ZnO/ZnTe core-shell nanowire arrays have been fabricated on an a-plane sapphire substrate. The ZnO nanowires were grown in a furnace by chemical vapor deposition with gold as catalyst and then were coated with a ZnTe shell on the ZnO nanowires surface by a metal-organic chemical deposition chamber. The morphology and size distribution of the ZnO/ZnTe core-shell nanowire arrays were studied by scanning electron microscopy (SEM) and the crystal structure was examined by x-ray diffraction (XRD). Transmission measurement was used to study the optical properties of the core-shell nanowires. The results indicated that the ZnO/ZnTe core-shell nanowire arrays have good crystalline quality. In addition, it was found that the nanowire arrays have good light absorption characteristics and these properties make it suitable for making photovoltaic devices.     

Optical and structural properties of InGaAs/InP double quantum wells grown by molecular beam epitaxy with polycrystalline GaAs and GaP decomposition sources

We report successful growth of high-quality InGaAs/InP double quantum wells (DQWs) with safer and more cost-effective decomposition source molecular beam epitaxy (MBE). The transmission electron microscopy (TEM) images and double crystal X-ray diffraction (TCXD) measurement reveal the formation of abrupt interfaces between InGaAs and InP layers. In the case of optical quality, the line width of 12 K-photoluminescence of the DQWs is 8.2 meV, which is comparable to that of single quantum well grown by MBE with PH₃ cracker and more complex instrument (4 meV).     

Structural and optical properties of vertically aligned InP nanowires grown by metal organic vapor phase epitaxy

Vertically aligned InP nanowires were successfully grown by metalorganic vapor phase epitaxy under metal-catalyzed vapor–liquid–solid growth processes. Au nanoparticles with a nominal diameter of 20 nm were used as the seed to control the diameter of the nanowires. Scanning and transmission electron microscopic studies showed highly dense nanowires with uniform diameters along the length direction, and the zinc-blende structure of the nanowires with 1 1 1 growth direction, respectively. Cathodeluminescence measurements showed a significant blueshift in the spectral peak position compared to bulk InP due to the quantum confinement of the carriers in the nanowires.     

Free-standing and vertically aligned InP nanowires grown by metalorganic vapor phase epitaxy

Metalorganic vapor phase epitaxial technique has been used to grow surface mounted vertical and uniform cross-sectional InP nanowires on a wafer scale basis. The growth was carried out under the vapor–liquid–solid mechanism using Au colloidal nanoparticles of nominal diameters of 10 and 20 nm, and their properties were compared. The effect of the pre-growth anneals and growth temperatures on the stability of the nanowires were studied in detail. Scanning electron microscopy and transmission electron microscopic studies showed average diameter of the nanowires in the range of 20–35 nm, and of length 700 nm with growth direction of 1 1 1. Room temperature photoluminescence measurements of the nanowires grown on 10 and 20 nm Au particles showed strong peaks, which were blue shifted by 25 and 32 meV, respectively, compared to bulk InP.