New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications

A new radio frequency (rf) hardware is developed for glow discharge spectroscopic methods. The resulting features and its capabilities for analytical applications are discussed. The electrical equipment developed allows to work as quickly, stably, reliably and easily as known from the direct current (dc) mode. Moreover, the rf power measurement has been improved. The hardware has been developed, optimised and tested for glow discharge optical emission spectroscopy (GDOES), but nevertheless it is possible to use it for all procedures applying glow discharge sources.     

Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry

A model developed recently for a radio-frequency glow discharge, is applied to experimental Grimm-type discharge conditions, to check the validity of the model calculations. The calculated electrical characteristics (rf voltage, d.c. bias voltage, electrical power, peak-to-peak current, as well as the time-profiles of voltage and current), and the calculated erosion rates are compared with the measured values for an rf frequency of 3.5 MHz. The electrical characteristics are found to be in fairly good agreement. The calculated and measured erosion rates show larger discrepancies. Compared to the d.c. Grimm-type glow discharge, where similar quantities were compared and were found in excellent agreement, the agreement is less satisfactory in the rf discharge. This illustrates that the rf discharge is much more complicated than a d.c. discharge, and that more fundamental studies are required.     

Comparison between a radio-frequency and direct current glow discharge in argon by a hybrid Monte Carlo–fluid model for electrons,argon ions and fast argon atoms

A hybrid Monte Carlo–fluid model has been developed for the electrons, argon ions and fast argon atoms in an argon glow discharge, either operated in the dc mode or the capacitively coupled rf mode. Typical working conditions for rf GD-OES are considered, i.e. approximately 6 torr argon gas pressure and approximately 10 W power. Typical results of the model, like the potential distributions, densities, fluxes and ionization rates, will be presented and compared between the two operation modes. It will be demonstrated that the rf discharge yields more efficient ionization than the dc discharge, and hence the rf discharge requires lower voltages to obtain the same amount of power, which is in good correspondence to experimental observations.     

Powering the analytical glow discharge

The glow discharge may be powered by direct current (dc), radio frequency (rf) and pulsed discharge sources. Each has specific advantages and special features that should be considered by analysts using the various forms of glow discharge spectroscopy. This paper reviews some of the factors that contribute to the selection of a power source for the glow discharge.     

Powering the analytical glow discharge

The glow discharge may be powered by direct current (dc), radio frequency (rf) and pulsed discharge sources. Each has specific advantages and special features that should be considered by analysts using the various forms of glow discharge spectroscopy. This paper reviews some of the factors that contribute to the selection of a power source for the glow discharge.     

Anode Magnetron Enhanced DC Glow Discharge Processes for Plasma Surface Cleaning and Polymerization

The objective of this study was to examine some fundamental factors involved in the design and construction of the anode magnetron dc glow discharge processes as well as its performance in plasma cleaning and polymerization. Those advantages of anode magnetron include the capability of the magnetron to operate at low pressure, as well as decreasing the thickness of cathode dark space, i.e., the negative glow which contains a higher concentration of ions and active species was more closely to the cathode surface, which makes the plasma surface cleaning and polymerization an effective and uniform processes. The deposition rate at a given discharge power is increased by the presence of anode magnetrons, and is also much higher relative to rf and af. The refractive index of dc plasma film at a given polymer thickness (such as TMS, 70 nm, RI: 2.4) is higher than rf, af, and cascade arc plasma (RI: 1.6–1.7).     

Optimization of an rf-powered magnetron glow discharge for the trace analysis of glasses and ceramics

A radiofrequency (rf) powered planar magnetron glow discharge ion source has been designed and coupled to a double-focusing mass spectrometer. Superposition of the electrical field of the plasma in the cathode dark space and the magnetic field obtained from a ring-shaped magnet located directly behind the sample (cathode) form the electron traps and enhance the sputtering and ionization efficiency of the ion source. In order to establish optimum conditions for the trace analysis of nonconducting materials, mass spectrometric studies have been carried out on the ion signal intensities and energy distributions of analyte and discharge gas ions depending on pressure.     

Optimization of an rf-powered magnetron glow discharge for the trace analysis of glasses and ceramics

A radiofrequency (rf) powered planar magnetron glow discharge ion source has been designed and coupled to a double-focusing mass spectrometer. Superposition of the electrical field of the plasma in the cathode dark space and the magnetic field obtained from a ring-shaped magnet located directly behind the sample (cathode) form the electron traps and enhance the sputtering and ionization efficiency of the ion source. In order to establish optimum conditions for the trace analysis of nonconducting materials, mass spectrometric studies have been carried out on the ion signal intensities and energy distributions of analyte and discharge gas ions depending on pressure.     

Trace analysis of glasses by magnetically enhanced rf GDMS

A radiofrequency (rf) glow discharge ion source coupled to a commercial double-focusing mass spectrometer was used for the direct trace element analysis of glass samples. By utilizing an additional ring-shaped magnet located behind the flat sample in an rf glow discharge ion source compared with a configuration without a magnet, the sputtering and ionization efficiency of glass samples was enhanced and the detection power for trace elements was improved. The detection limits for elements determined by rf glow discharge mass spectrometry at low mass resolution (m/Δm = 300) are 10–100 ng/g. Possible interferences of atomic ions of analyte and molecular ions which limited the determination of some elements (e.g. Ti, Mn, Fe, Ni, Co, Cu, Zn) could be resolved at the mass resolution of m/Δm = 3000. The detection limits for these elements were found to be about 100 ng/g. Relative sensitivity factors (RSFs) for all elements of interest with respect to Sr (internal standard element) were determined in the range of 0.2–3.     

α-蒎烯等离子体聚合及其聚合物结构研究

本文应用外部电容耦合式聚合装置,研究了α—蒎烯等离子体聚合规律。通过元素分析,裂解色谱-质谱、红外光谱和接触角测定等方法测定了聚合物的结构和性能。     

丙醛的等离子体聚合以及聚合物的结构与性质初探

应用外部电容耦合式等离子体聚合方法,制得了丙醛聚合物,研究了不同的等离子体条件对丙醛的聚合行为的影响。通过元素分析、红外光谱分析、色谱-质谱联合分析、X-射线衍射、润湿性测定等手段研完发现,聚合物为无定形交联结构,表面能为41—45达因/厘米。     

Glow Discharge Induced Graft Polymerization of Nonvolatile Monomers on Wool

Nonvolatile monomers were grafted to wool by exposure to rf glow discharge under vacuum. The amount of grafting was limited to an average of 2 to 5% weight uptake. With increasing impregnation the amount of graft decreased, and mostly extractable homopolymers formed. Increasing the intensity of the glow discharge above a certain level is also detrimental because at this point the rate of degradation exceeds the rate of polymerization.     

Radio-frequency glow discharge ion source for high resolution mass spectrometry

A radio-frequency powered glow discharge ion source has been developed for a double-focusing mass spectrometer. The sputtering and ionization of conducting, semiconducting and insulating materials have been realized using a 13.56 MHz generator to supply the discharge operating potential. The glow discharge ion source operates stably at argon pressures of 0.1–1 hPa and radio frequency powers of 10–50 W. The influence of discharge parameters and gas inlet system on sputtering rates and ion signal intensities for semi-insulating gallium arsenide wafers has been investigated.     

A simple and rapid method for determination of boron in fast breeder reactor components

The present paper describes a new analytical method developed for direct determination of boron in steels using radio frequency glow discharge optical emission spectrometer. “Single parameter alternative method” technique has been used to optimize the various experimental conditions of glow discharge plasma such as forward power, gas pressure inside plasma chamber, pre-integration time, and integration time. Different emission lines for boron were studied and inter element interference effect is also discussed in the paper. A complete statistical analysis has been done to validate the developed method. A RSD of less than ±5% is achieved for boron in the range of 0.0010–0.020% in Steels using this method.     

Distribution of polymer deposition in plasma polymerization. III. Effect of discharge power

Distribution of polymer deposition in an inductively coupled rf discharge system is studied as a function of level of discharge power with acetylene and styrene as monomers. When a fixed flow rate is used, the discharge power has a relatively small effect on the pattern of distribution of polymer deposition as long as values of W/FM, where W is discharge wattage, F is flow rate, and M is molecular weight of monomer, are maintained above a critical level to maintain full glow in the reaction tube. It has been shown that plasma polymerization of two monomers which have different molecular weights can be compared in a fair manner by selecting conditions to yield similar value of W/FM.     

Comparison Between Air Filamentary and Helium Glow Dielectric Barrier Discharges for the Polypropylene Surface Treatment

Recently, a glow like dielectric controlled barrier discharge (GDBD) working at atmospheric pressure has been observed. Such a discharge could replace a filamentary dielectric controlled barrier discharge (FDBD) used in corona treatment systems to improve the wettability or the adhesion of polymers. So it is of interest to compare these two types of discharges and their respective effect on a polymer surface. This is the aim of an extensive study we have undertaken. The first step presented here is the comparison of a filamentary discharge in air with a glow discharge in helium. Helium is the most appropriate gas to realize a glow discharge at atmospheric pressure. Air is the usual atmosphere for a corona treatment. The plasma was characterized by emission spectroscopy and current measurements. The surface transformations were indicated by the water contact angle, the leakage current measurement and the X-ray photoelectron spectroscopy. Results show that the helium GDBD is better than air FDBD to increase polypropylene wettability without decreasing the bulk electrical properties below a certain level. Contact angle scattering as well as leakage current measurements confirm that the GDBD clearly results in more reproducible and homogeneous treatment than the FDBD.     

Microplasma-based atomic emission detectors for gas chromatography

This paper is an update on the development of microplasmas as detectors for gas chromatography. Direct current (dc), alternating current (ac), and radio frequency (rf) microplasmas developed in recent years will be described with their significant analytical results, which mostly concern the detection of halogens and sulfur. New results will be added which employ a microhollow cathode discharge (MHCD) as excitation source. Emphasis will be given to this microplasma which has already been implemented as an element-selective detector for emission spectrometry and as ionization source for mass spectrometry. The possibility to use it as a multielement-selective detector for gas chromatography will be presented. A discussion of the published detection limits of all these microplasmas is given.     

Quantitative depth profile analysis of metallic coatings by pulsed radiofrequency glow discharge optical emission spectrometry

In recent years particular effort is being devoted towards the development of pulsed GDs because this powering operation mode could offer important analytical advantages. However, the capabilities of radiofrequency (rf) powered glow discharge (GD) in pulsed mode coupled to optical emission spectrometry (OES) for real depth profile quantification has not been demonstrated yet. Therefore, the first part of this work is focussed on assessing the expected advantages of the pulsed GD mode, in comparison with its continuous mode counterpart, in terms of analytical emission intensities and emission yield parameters. Then, the capability of pulsed rf-GD-OES for determination of thickness and compositional depth profiles is demonstrated by resorting to a simple multi-matrix calibration procedure. A rf forward power of 50 W, a pressure of 600 Pa, 1000 Hz pulse frequency and 50% duty cycle were selected. The quantification procedure used was validated by analysing conductive layers of thicknesses ranging from a few tens of nanometer up to about 20 μm and varied compositions (hot-dipped zinc, galvanneal, back contact of thin film photovoltaic solar cells and tinplates).     

Quartz crystal microbalance simulation of the directionality of Si etching in CF4 glow discharges

Two quartz crystal microbalances have been mounted in a planar rf discharge system in such a way that the potential of the microbalances with respect to the glow discharge can be varied. This apparatus allows a rapid simulation of the etching directionality that can be expected in real pattern transfer situations in that operating one microbalance at ground and one at a negative potential gives a measure of the sidewall and vertical etch rates, respectively. The voltage threshold for ion-assisted etching has been determined to be 20 V which is the approximate value of the plasma potential in this asymmetric system.     

Glow discharge electron impact ionization source for miniature mass spectrometers

A glow discharge electron impact ionization (GDEI) source was developed for operation using air as the support gas. An alternative to the use of thermoemission from a resistively heated filament electron source for miniature mass spectrometers, the GDEI source is shown to have advantages of long lifetime under high-pressure operation and low power consumption. The GDEI source was characterized using our laboratory's handheld mass spectrometer, the Mini 10. The effects of the discharge voltage and pressure were investigated. Design considerations are illustrated with calculations. Performance is demonstrated in a set of experimental tests. The results show that the low power requirements, mechanical ruggedness, and quality of the data produced using the small glow discharge ion source make it well-suited for use with a portable handheld mass spectrometer.