A Three-Dimensional Two-Phase Model for Thermal Plasma Chemical Vapor Deposition with Liquid Feedstock Injection

In this paper, a comprehensive model for thermal plasma chemical vapor deposition (TPCVD) with liquid feedstock injection is documented. The gas flow is assumed to be steady, of a single temperature. Radiation and charged species contributions are excluded, but extensive homogeneous and heterogeneous chemistry is included. The liquid phase is traced by considering individual droplets. Discussion on the model's application to diamond production from acetone in a hydrogen–argon plasma is included. The major conclusions are: (1) Liquid injection possesses a capability to deliver the hydrocarbon precursor directly onto the deposition target. (2) For the case of complete evaporation of the droplet before reaching the substrate, the deposition rate is similar to that obtained with gaseous precursors. (3) The computational results compare well with experimental data. The modeling results can be used to optimize the injection parameters with regard to the deposition rate.     

Modeling of H2 and H2/CH4 Moderate-Pressure Microwave Plasma Used for Diamond Deposition

One-dimensional transport models of moderate-pressure H ₂ and H ₂ /CH ₄ plasmas obtained in a diamond deposition microwave reactor are presented. These models describe the plasma as a thermochemically nonequilibrium flow with three different energy modes. The solution of the one-dimensional plasma transport equations enabled the estimation of plasma species concentrations and temperatures on the axis of the reactor. As far as pure H ₂ plasmas are concerned, results showed that the model predictions of gas and vibration temperatures are in good agreement with experimental measurements. The model also yields a relatively good qualitative prediction of the variations of H-atom mole fraction with the power density absorbed by the plasma. The results obtained for H ₂ /CH ₄ discharges showed that the model prediction on the variations of H-atom mole fraction with methane percentage in the discharge is in good qualitative agreement with experimental results. They also showed that methane is rapidly converted to acetylene before reaching the discharge zone. The concentrations of neutral hydrocarbon species in the reactor are mainly governed by thermal chemistry. The addition of methane strongly affects the ionization kinetics of the plasma. Three major ions are generally obtained in H ₂ /CH ₄ plasmas: C ₂ H ₂ ⁺ , C ₂ H ₃ ⁺ , and C ₂ H ₅ ⁺ . The relative predominance of these ions depends on the considered plasma region and on the discharge conditions. The ionic species concentrations are also mainly governed by chemistry, except very near the substrate surface. Finally the use of this transport model along with the surface chemistry model of Goodwin ⁽¹⁾ enabled us to estimate the diamond growth rate for several discharge conditions.     

Methyl Concentration Measurements During Microwave Plasma-Assisted Diamond Deposition

Absolute line-of-sight averaged measurements of methyl radical concentrationsin a microwave plasma-assisted diamond deposition reactor arepresented. The measurements are based on the use of broadband ultravioletabsorption spectroscopy to characterize the distinguishing absorptionfeature of methyl at 216 nm associated with the X(²A₂)(²A₁) electronictransition. The dependence of the line-of-sight methyl concentration andmole fractions with the percentage of methane in the feed-gas, plasma powerdensity, and position of substrate relative to the optical probe volume isstudied. The measurements suggest that the near-substrate methyl molefraction is only weakly sensitive to changes in substrate temperature andare largely influenced by the gas-phase temperature. A comparison is madebetween the measured mole fractions and recent predictions based on aone-dimensional model of this process. The measured mole fractions areconsistently greater than those predicted by about a factor of ten. Thisdiscrepancy is explained in part by the line-of-sight limitations in theexperimental facility.     

Molecular Beam Mass Spectrometry System for Characterization of Thermal Plasma Chemical Vapor Deposition

A molecular beam mass spectrometry system for in situ measurement of the concentration of gas phase species including radicals impinging on a substrate during thermal plasma chemical vapor deposition (TPCVD) has been designed and constructed. Dynamically controlled substrate temperature was achieved using a variable thermal contact resistance method via a backside flow of an argon/helium mixture. A high quality molecular beam with beamtobackground signal greater than 20 was obtained under film growth conditions by sampling through a small nozzle (75 m) in the center of the substrate. Mass discrimination effects were accounted for in order to quantify the species measurements. We demonstrate that this system has a minimum detection limit of under 100 ppb. Quantitative measurements of hydrocarbon species (H, H₂, C, CH₃, CH₄, C₂H₂, C₂H₄) using Ar/H₂/CH₄ mixtures and silicon species (Si, SiH, SiH₂, SiCl, SiCl₂, Cl, HCl) using Ar/H₂/SiCl₄ mixtures were obtained under thermal plasma chemical vapor deposition conditions.     

Reduction of Metallurgical Wastes in an RF Thermal Plasma Reactor

Recovery of metals from iron and zinc oxides, as well as from zinc-containing metallurgical wastes, such as flue dust from the Siemens–Martin process and sludge from hot galvanizing, has been studied in an rf thermal plasma reactor under reducing conditions. The product composition was estimated by thermodynamic calculations based on the minimization of the Gibbs free enthalpy. Effects of the plate power of rf generator and the feed rate of powder on the chemical and phase composition of products have been investigated in detail. It has been proved that the rf thermal plasma treatment makes possible to produce unstable species in thermodynamic terms: metallic zinc was gained in the reaction of ZnO and hydrogen. The gradient cooling along the plasma reactor led to the segregation of the iron and zinc compounds. Valuable products were made from the particular wastes by a single step thermal plasma processing.     

Modeling and Spectroscopic Investigations on the Evaporation of Zirconia in a Thermal rf Plasma

The evaporation process of zirconia powders injected in a thermal rf plasma is investigated. Both model calculations and optical emission spectroscopy are used to study the evaporation behavior. Gas temperatures and velocity distributions are determined numerically from conservation laws and Maxwell equations. The influence of plasma and particle parameters on the thermal history of entrained particles is discussed. Asymmetric Abel inversion is applied to detect asymmetric emission profiles in the plasma source. Spectroscopic measurements reveal that evaporated zirconium is concentrated near the axis of the plasma. Numerical calculations show that line-integrated emission profiles can be used to distinguish the cases of complete and incomplete evaporation. Axial emission profiles confirm that the evaporation zone is shifted upstream of the plasma when smaller precursor particles are used.     

Deposition of Diamond-Like Carbon Film in a Closed-Space CH4 RF Plasma

Deposition of diamond-like carbon (DLC) film and mass spectrometry measurements were carried out in a closed-space CH₄ rf (13.56 MHz) plasma (without both gas injection and vacuum pumping during the process). At pressures less than 0.6 Torr, the thickness of the DLC film deposited increased with increasing elapsed deposition time, and reached a maximum value, but after this the film thickness started to decrease, which was considered to be caused predominantly by ion-induced sputter etching. The maximum film thickness appeared at larger elapsed time for higher deposition pressure. The mass concentrations of hydrocarbon ions indicated anomalous behavior at early deposition times, but those of higher hydrocarbon ions are clearly increased at the point where the film thickness started to decrease. These results suggested that the ratio of precursor CH₃al density to the total hydrocarbon ion density (_CH3/_ion in the CH₄a was an important factor for the carbon film formation, and when this ratio reduced to a certain critical value with increasing elapsed deposition time, the deposited film was then re-etched predominately by the secondary higher hydrocarbon ions. At 1.0 Torr where a polymer-like soft carbon film was deposited, such re-etching of the deposited film was not observed.     

Effects of Precursors and Plasma Parameters on Fullerene Synthesis in RF Thermal Plasma Reactor

Synthesis of fullerenes from graphite powders of different grade was studied in a radiofrequency (RF) plasma reactor. Dependence of fullerene yield on the properties and feed rate of precursors and on the helium content of plasma gas was studied in details. The fullerene yield was influenced by the mean size and the thermal conductivity of graphite particles on the one hand, and the helium content of the gas phase on the other. Soot containing fullerene mixture of 5.9% was produced in best conditions found in this work. The main component of the fullerene mixture was C₆₀. In addition, it contained about 30% of C₇₀ (corresponding to a C₆₀/C₇₀ mass ratio of 2.64). Higher fullerenes such as C₈₄ were also detected by mass spectroscopy (MS) and high performance liquid chromatography (HPLC).     

Deposition of SiO2-Like Films by HMDSN/O2 Plasmas at Low Pressure in a MMP-DECR Reactor

The effects of process parameters such as O₂/HMDSN (hexamethyldisilazane) ratio, microwave discharge power and deposition pressure on the growth rate, chemical bonding nature, and refractive index of thin films deposited by microwave plasma from HMDSN with oxygen, have been investigated. The plasma was created in a Microwave Multipolar reactor excited by Distributed Electron Cyclotron Resonance. The films were deposited at room temperature and characterized by Fourier Transform Infrared spectroscopy and ellipsometry. Growth rate increased with the discharge power P or the deposition pressure but decreased significantly with increasing O₂/HMDSN ratio. A large change in the film composition was observed when the O₂/HMDSN ratio was varied: films deposited with only HMDSN precursor are polymer-like but as the O₂/HMDSN ratio increased, organic groups decreased. For relative pressure values over 70%, deposited films are SiO₂-like with refractive index values close to those found for thermal silicon dioxide.     

Influence of Plasma Treatment on the Electroless Deposition of Copper on Carbon Fibers

Air and nitrogen glow discharge were used to replace chromic acid pretreatment to deposit copper film on carbon fiber surfaces from an CuSO₄‐HCHO electroless system. A greater copper uptake and a more uniformly coated copper film were obtained for plasma‐treated carbon fibers. The adhesion between the copper film and the carbon fibers was also improved. An orthogonal table L₉(3⁴) was used to study the effects of discharge pressure, discharge power, time and gas type on the copper uptake. Scanning electron microscopy (SEM), reflection absorption infrared spectroscopy (RAIR) and X‐ray photoelectron spectroscopy (XPS) at different depths were applied to characterize the physical and chemical changes of the surface of the carbon fibers. The results showed that after plasma treatment, the carbon fiber surface became rough and several types of polar oxygen groups, such as carboxylic acid COOH, esters COOC, quinones Ph?O, etc., were introduced into the carbon fiber surface. A mechanism of plasma treatment effects on copper electroless deposition on the carbon fiber surface is also suggested.     

Characterization of the Converging Jet Region in a Triple Torch Plasma Reactor

Enthalpy probe measurements were taken of the converging plasma plume in a triple torch plasma reactor and related to substrate heat flux measurements. Results show excellent entrainment of process gases injected into the converging plasma plume by way of the central injection probe. At lower pressures (40 kPa), the plasma volume is equivalent to at least a 3 cm diameter, 4 cm long cylinder, with relatively uniform temperature, velocity, and substrate heat flux profiles when compared to a typical dc arc jet. Converging plasma plume size, substrate heat flux, and enthalpy profiles are also shown to be a strong function of applied system power. Substrate heat flux measurements show smaller radial gradients than enthalpy probe measurements, because of the high radial velocity component of gases above the substrate boundary layer. Enthalpy probe measurements were also conducted for diamond deposition conditions and approximate temperature and velocity profiles obtained. Problems with the uniform gas mixture assumption prohibited more accurate measurements. Reproducibility of enthalpy measurement results was shown with an average standard deviation of 11.8% for the velocity and 7.6% for the temperature measurements.     

不同进气方式对热等离子体应用于CH4-CO2重整的影响

采用大功率双阳极热等离子体装置, 对CH4-CO2重整制合成气进行实验研究. 实验采用两种不同的原料气输入方式: 一种是使原料气(CH4和CO2的混合气体)作为等离子体放电气体全部通入第1阳极与第2阳极间的放电区, 直接参与放电; 另一种是保持前述状态, 再附加另一部分原料气通入从等离子体发生器喷出的等离子体射流区. 实验表明: 第1种方式下, CH4和CO2同时具有很高的单程转化率和反应选择性, 但能量转化效率较低; 第2种方式下, 尽管CH4和CO2单程转化率和选择性有所降低, 但由于进料量增加, 所得合成气摩尔量较大, 因此能量转化效率高于第1种进气方式所得结果. 实验还发现, 保持放电电流恒定的情况下, 等离子体放电电压随通入第1阳极与第2阳极间放电区的原料气流量增加而增加, 与通入等离子体射流区的流量无关, 同时实验未发现等离子体发生器阴极和阳极被氧化或出现碳沉积现象.     

甲醇在热阴极DC-PCVD方法制备金刚石膜过程中的作用

采用热阴极DC－PCVD方法制备了金刚石膜，研究了甲醇对放电状态和金刚石膜生长特性的影响。结果表明，通入适量的甲醇有利于稳定辉光放电状态，保持阴性清洁，提高膜的生长质量。用扫描电镜和拉曼光谱等测试手段对金刚石膜的生长特性进行了分析。     

Solid-Phase Synthesis of Calcium Carbide in a Plasma Reactor

A laboratory-scale spout-fluid bed reactor with a dc plasma torch was used to study the solid-phase synthesis of calcium carbide. Calcium oxide powder with a mean particle size of 170 m was reacted with graphite powder (130 m). Argon was used to initiate the plasma and hydrogen gas was then added to increase power and raise the plasma jet enthalpy. Experimental results showed that the reaction took place in the vicinity of the plasma jet and that conversion to calcium carbide increased linearly with reaction time. The rate of conversion increased exponentially with plasma jet temperature, indicating that chemical reaction was the controlling mechanism. Microscopic analysis of the solid product showed that calcium carbide was formed around both reactants, and that the reaction followed a shrinking core model. Although melting and agglomeration of partially reacted particles occurred at high temperature, resulting in instability of the bed and impeding the reaction progress, high conversions are expected in a continuous process with optimized reactor design.     

Deposition of Ethylene-Hexafluoropropene Gradient Plasma-Copolymer Using Dielectric Barrier Discharge Reactor at Atmospheric Pressure: Application to Release Coatings on Pressure-Sensitive Tape

Plasma-polymerized hexafluoropropene (PPHFP) film deposited using a dielectric barrier discharge reactor at atmospheric pressure had low enough adhesive strength, 22.2 Nm^–1, for use as a release coating of pressure-sensitive adhesive tapes, but the bond strength between PPHFP film and a poly (ethylene terephthalate) (PET) substrate film was slightly weak: some part of the PPHFP deposits could be peeled from the PET substrate. Since the XPS results indicated that the bond strength between plasma-polymerized ethylene (PPE) film and PET substrate was strong enough, we tried to deposit PPE and plasma-polymerized ethylene - hexafluoropropene gradient plasma-copolymer between the PET substrate and the PPHFP film. This multi-layer film (MLF) had low enough adhesive strength, 36.6 Nm^–1, for use as the release coating; this value was near that of a control sample, Teflon sheet, 21.6 Nm^–1. Moreover, the bond strength between MLF and PET substrate became stronger than that between PPHFP and PET films.     

Fabrication,Characterization and Optical Properties of TiO2 Nanotube Arrays on Boron-doped Diamond Film Through Liquid Phase Deposition

TiO2 nanotube（TiNT） arrays were deposited on boron-doped diamond films by a liquid-phase deposition method with ZnO nanorod arrays as the template.The different morphologies of TiNTs have been obtained by controlling the morphology of ZnO template.The X-ray diffraction and energy-dispersive X-ray analysis show that the ZnO nanorod array template has been removed in the TiNTs formation process.The crystalline quality of the TiNTs is improved by increasing the annealing temperature.The band gap of the TiNTs is about 3.25 eV estimated by the UV-Vis absorption spectroscopy,which is close to the value of bulk TiO2.In the photoluminescence spectrum,a broad visible emission in a range of ca.550-750 nm appears due to the surface oxygen vacancies and defects.     

Modelling of Carbon Tetrachloride Decomposition in Oxidative RF Thermal Plasma

Decomposition of carbon tetrachloride in a RF thermal plasma reactor was investigated in oxygen–argon atmosphere. The net conversion of CCl₄ and the main products of decomposition were determined by GC–MS (Gas Chromatographic Mass Spectroscopy) analysis of the exhaust gas. Temperature and flow profiles had been determined in computer simulations and were used for concentration calculations. Concentration profiles of the species along the axis of the reactor were calculated using a newly developed chemical kinetic mechanism, containing 34 species and 134 irreversible reaction steps. Simulations showed that all carbon tetrachloride decomposed within a few microseconds. However, CCl₄ was partly recombined from its decomposition products. Calculations predicted 97.9% net conversion of carbon tetrachloride, which was close to the experimentally determined value of 92.5%. This means that in RF thermal plasma reactor much less CCl₄ was reconstructed in oxidative environment than using an oxygen-free mixture, where the net conversion had been determined to be 61%. The kinetic mechanism could be reduced to 55 irreversible reaction steps of 26 species, while the simulated concentrations of the important species were within 0.1% identical compared to that of the complete mechanism.     

Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors

In this paper a process based on the use of rf inductively coupled plasma is applied for the synthesis and deposition of Si-base ceramic materials (i.e., SiC, Si₃N₄, SiO₂). The starting materials are low-cost liquid disilanes. The atomization process is first investigated and the structure of the resulting coatings is characterized by means of X-ray diffraction, scanning electron microscopy as well as with transmission electron microscopy. Results of the influence of some processing parameters (i.e., chamber pressure, spray distance, substrate cooling, plasma gas nature and composition, precursor composition and atomization parameters) on the phase and microstructure of the coating is reported. Control of the microstructure (or nanostructure) as well as the phase content, namely the / ratio of the phases for SiC and Si3N4, can be achieved with such a synthesis and deposition technique.     

Effect of Water Vapor on Benzene Decomposition Using a Nonthermal-Discharge Plasma Reactor

The effect of water vapor on benzene decomposition in air was investigatedusing a nonthermal-discharge plasma reactor packed with ferroelectricmaterials. The conversion of benzene was found to decrease with an increaseof water concentration. On the other hand, the selectivity to CO₂ in thedecomposition products increased with an increase of water concentration. Acomparison between the benzene conversion to CO and CO₂ suggested that COformation was suppressed by water to a greater extent than was CO₂formation. N₂O formation also decreased with an increase of waterconcentration. These results suggest that the activity of oxygen speciesresponsible for the formation of CO and N₂O is reduced by water.     

Decomposition of Benzene in Air in a Plasma Reactor: Effect of Reactor Type and Operating Conditions

The decomposition of benzene was carried out in two types of plasma reactors packed with BaTiO₃ pellets: one reactor had two stainless steel electrodes (SUS reactor), and the other reactor had a glass layer between two concentric electrodes (GL reactor). The decomposition efficiency and the suppression of formation of N₂O and NO_x were greater in the GL reactor than in the SUS reactor. In contrast, the suppression of O₃ formation and the oxidation to CO_x in the SUS reactor were superior to those in the GL reactor. The effect of wa eform and frequency of applied ac power was in estigated for each reactor.