The adsorption geometry of sulphur on Ir{1 0 0}: A quantitative LEED study

A quantitative low energy electron diffraction (LEED) analysis has been performed for the p(2 × 2)-S and c(2 × 2)-S surface structures formed by exposing the (1 × 1) phase of Ir{1 0 0} to H₂S at 750 K. S is found to adsorb on the fourfold hollow sites in both structures leading to Pendry R-factor values of 0.17 for the p(2 × 2)-S and 0.16 for the c(2 × 2)-S structures. The distances between S and the nearest and next-nearest Ir atoms were found to be similar in both structures: 2.36 ± 0.01 Å and 3.33 ± 0.01 Å, respectively. The buckling in the second substrate layer is consistent with other structural studies for S adsorption on fcc{1 0 0} transition metal surfaces: 0.09 Å for p(2 × 2)-S and 0.02 Å for c(2 × 2)-S structures. The (1 × 5) reconstruction, which is the most stable phase for clean Ir{1 0 0}, is completely lifted and a c(2 × 2)-S overlayer is formed after exposure to H₂S at 300 K followed by annealing to 520 K. CO temperature-programmed desorption (TPD) experiments indicate that the major factor in the poisoning of Ir by S is site blocking.     

Phase mixing and phase separation accompanying the catalytic oxidation of CO on Ir{1 0 0}

The co-adsorption of CO and O on the unreconstructed (1 × 1) phase of Ir{1 0 0} was examined by low energy electron diffraction (LEED) and temperature programmed desorption (TPD). When CO is adsorbed at 188 K onto the Ir{1 0 0} surface precovered with 0.5 ML O, a mixed c(4 × 2)-(2O + CO) overlayer is formed. All CO is oxidised upon heating and desorbs as CO₂ in three distinct stages at 230 K, 330 K and 430 K in a 2:1:2 ratio. The excess oxygen left on the surface after all CO has reacted forms an overlayer with a LEED pattern with p(2 × 10) periodicity. This overlayer consists of stripes with a local p(2 × 1)-O arrangement of oxygen atoms separated by stripes of uncovered Ir. When CO is adsorbed at 300 K onto the surface precovered with 0.5 ML O an apparent (2 × 2) LEED pattern is observed. LEED IV analysis reveals that this pattern is a superposition of diffraction patterns from islands of c(2 × 2)-CO and p(2  × 1)-O structures on the surface. Heating this co-adsorbed overlayer leads to the desorption of CO₂ in two stages at 330 K and 430 K; the excess CO (0.1 ML) desorbs at 590 K.LEED IV structural analysis of the mixed c(4 × 2) O and CO overlayer shows that both the CO molecules and the O atoms occupy bridge sites. The O atoms show significant lateral displacements of 0.14 Å away from the CO molecules; the C-O bond is slightly expanded with respect to the gas phase (1.19 Å); the modifications of the Ir substrate with respect to the bulk-terminated surface are very small.     

Formation of oxygen-induced Si(1 1 3)-3 × 2 facets on the Si(5 5 12) surface

We report the formation of Si(1 1 3)-3 × 2 facets upon exposing oxygens on the Si(5 5 12) surface at an elevated temperature. These facets are found to form only for a limited range of oxygen exposure and exhibit a well-defined 3 × 2 LEED pattern. We also find the surface electronic state unique only to the facets in the valence band. The spectral feature of these electronic states and the behavior of a (1/3 1/2) LEED spot upon oxygen contents in the facets indicate that the formation is a heterogeneous mixture of the clean Si(1 1 3) facets free of oxygens and other facets containing oxygen atoms.     

RT growth of acetonitrile and acrylonitrile on Si(0 0 1)-2 × 1 studied by XPS and LEED

In this work we show the adsorption of acetonitrile (CH₃CN) and acrylonitrile (CH₂CHCN) on Si(0 0 1)-2 × 1 at room temperature by increasing the molecular doses. Especially, by means of XPS and LEED data, we stress the action of these molecules on the silicon surface locating the dangling-bonds quasi-saturation within 10 L. The shortage of nitrogen XPS signal and some anomalies in carbon spectra point to an invading action from a traditional X-ray source (Al-K_α line) against chemisorbed molecules. In particular, we think that a long exposure to this radiation could break carbon-silicon bonds changing some adsorption geometries and making desorb molecular fragments.     

Lateral interactions and nonequilibrium in adsorption and desorption. Part 1. Experimental results for (2 × 2)-(3O + NO)/Ru(0 0 1)

Extending earlier vibrational spectroscopy and thermal desorption measurements on this system, its geometrical structure and its adsorption/desorption kinetics have been investigated in detail. The adsorption and desorption of NO proceed, with little influence on the 3O template, on its (2 × 2) lattice of empty hcp sites. The desorption kinetics, with splitting of the TPD spectra into two peaks, are far from the expected behavior for independent sites. Also, the vibrational band structure shows dispersion beyond dipole-dipole interactions. So, despite the quite large NO-NO distance and their screening by the O atoms, there is clear evidence for static and dynamic lateral interactions which should be extractable from the data. A qualitative analysis suggests that these interactions are due to elastic coupling between the positions and vibrations, respectively, of the O and NO adsorbates. However, quantitative conclusions cannot be drawn directly as the kinetic data cannot be interpreted in a quasiequilibrium approach, as would be the normal procedure, due to the presence of strong nonequilibrium effects. The lack of internal equilibration is presumably caused by slow diffusion. The results are sufficiently complete and detailed to justify the effort of theoretical modeling with the aim to quantitatively describe both the lateral interactions and the nonequilibrium effects.     

Adsorption of glycine on a NiAl(1 1 0) alloy surface

The adsorption and desorption of glycine (NH₂CH₂COOH), vacuum deposited on a NiAl(1 1 0) surface, were investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED), temperature-programmed desorption, work function (Δφ) measurements, and ultraviolet photoelectron spectroscopy (UPS). At 120 K, glycine adsorbs molecularly forming mono- and multilayers predominantly in the zwitterionic state, as evidenced by the UPS results. In contrast, the adsorption at room temperature (310 K) is mainly dissociative in the early stages of exposure, while molecular adsorption occurs only near saturation coverage. There is evidence that this molecularly adsorbed species is in the anionic form (NH₂CH₂COO⁻). Analysis of AES data reveals that upon adsorption glycine attacks the aluminium sites on the surface. On heating part of the monolayer adsorbed at 120 K is converted to the anionic form and at higher temperatures dissociates further before desorption. The temperature-induced dissociation of glycine (<400 K) leads to a series of similar reaction products irrespective of the initial adsorption step at 120 K or at 310 K, leaving finally oxygen, carbon and nitrogen at the surface. AES and LEED measurements indicate that oxygen interacts strongly with the Al component of the surface forming an “oxide”-like Al-O layer.     

Structure analysis of W(0 0 1)2 × 1-O surface at room and liquid nitrogen temperatures

Surface structure of O-adsorbed W(0 0 1) surface after annealing to 1200 K has been analyzed by low energy electron diffraction at 77 K as well as at room temperature. The optimum structure has tungsten missing rows and oxygen double rows. Furthermore, the R-factor is minimized at the structure that O atoms are adsorbed on one of the two different threefold hollow sites of the (1 1 0) facet appearing on the W(0 0 1)2 × 1 with missing row. However, the results suggest that two domains of O atoms adsorbed on both the two different threefold hollow sites coexist. Then, I-V curves have been analyzed as a function of the mixing ratio of the two domains having different O adsorption sites at room and low temperatures. The energy difference between these two sites has been estimated to be 6.5 meV from the temperature dependence of the mixing ratio.     

Reactivity to sulphur of clean and pre-oxidised Cu(1 1 1) surfaces

The reactivity of clean and pre-oxidised Cu(1 1 1) surfaces exposed to sulphur (H₂S) has been studied at room temperature by Auger electron spectroscopy, low energy electron diffraction and scanning tunneling microscopy. On the clean surface, the sulphur-saturated surface structure is dominated by the or so-called “zigzag” superstructure. It is shown that a single orientation domain is favoured by the slight misorientation (∼2°) of the surface with respect to the (1 1 1) plane. Scanning tunneling microscopy measurements also revealed two minority structures. Pre-oxidation was performed by exposure to 1.5 × 10⁴ L of O₂ at 300 °C. Under exposure to H₂S (1 × 10⁻⁷ mbar) at room temperature, the oxygen is totally substituted by sulphur. Once initiated, sulphur adsorption seems to propagate to cover the whole surface on the O-covered surface faster than on the clean Cu(1 1 1). At saturation by adsorbed sulphur, the surface is completely covered by the superstructure of highest coverage. This enhanced uptake of sulphur is assigned to the surface reconstruction of the copper surface induced by the pre-oxidation, causing a stronger reactivity of the Cu atoms released by the decomposition of the oxide.     

Characterisation of the interaction of glycine with Cu(1 0 0) and Cu(1 1 1)

Reflection-absorption infrared spectroscopy (RAIRS) has been used to characterise the interaction of standard and fully deuterated glycine with Cu(1 0 0) and Cu(1 1 1). RAIRS shows clearly that the surface interaction leads to formation of the adsorbed deprotonated glycinate (NH₂CH₂COO-) species, with some evidence for changes in orientation with coverage previously seen on Cu(1 1 0). Qualitative low energy electron diffraction observations were also conducted to characterise the long-range ordering, although effects of electron-beam-induced radiation damage limited the information obtained. Nevertheless, the results do suggest some subtle isotopic-mass-related structural variations. The results are discussed in the context of previously published scanning tunnelling microscopy and photoelectron diffraction measurements.     

Formation and hydrogenation of p(2 × 2)-N on Pt(1 1 1)

The formation of a well-ordered p(2 × 2) overlayer of atomic nitrogen on the Pt(1 1 1) surface and its reaction with hydrogen were characterized with reflection absorption infrared spectroscopy (RAIRS), temperature programmed desorption (TPD), low energy electron diffraction (LEED), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). The p(2 × 2)-N overlayer is formed by exposure of ammonia to a surface at 85 K that is covered with 0.44 monolayer (ML) of molecular oxygen and then heating to 400 K. The reaction between ammonia and oxygen produces water, which desorbs below 400 K. The only desorption product observed above 400 K is molecular nitrogen, which has a peak desorption temperature of 453 K. The absence of oxygen after the 400 K anneal is confirmed with AES. Although atomic nitrogen can also be produced on the surface through the reaction of ammonia with an atomic, rather than molecular, oxygen overlayer at a saturation coverage of 0.25 ML, the yield of surface nitrogen is significantly less, as indicated by the N₂ TPD peak area. Atomic nitrogen readily reacts with hydrogen to produce the NH species, which is characterized with RAIRS by an intense and narrow (FWHM ∼ 4 cm⁻¹) peak at 3322 cm⁻¹. The areas of the H₂ TPD peak associated with NH dissociation and the XPS N 1s peak associated with the NH species indicate that not all of the surface N atoms can be converted to NH by the methods used here.     

The CuGaSe2(0 0 1) surface: A (4 × 1) reconstruction

We report on the formation of a stable (4 × 1) reconstruction of the chalcopyrite CuGaSe₂(0 0 1) surface. Using Ar⁺ ion-bombardment and annealing of epitaxial CuGaSe₂ films grown on GaAs(0 0 1) substrates it was possible to obtain flat, well-ordered surfaces showing a clear (4 × 1) reconstruction. The cleanliness and structure were analyzed in situ by AES and LEED. AES data suggest a slight Se-enrichment and Cu-depletion upon surface preparation. Our results demonstrate that (0 0 1) surfaces of the Cu-III-VI₂(0 0 1) material can show stable, unfacetted surfaces.     

Infrared reflection absorption study of carbon monoxide adsorption on Cu(1 0 0)-c(2 × 2)-Pd surfaces formed by palladium vacuum-depositions at various temperatures

Using infrared reflection absorption spectroscopy (IRRAS) and temperature programmed desorption (TPD), we investigated carbon monoxide (CO) adsorption and desorption behaviors on atomic checkerboard structures of Cu and Pd formed by Pd vacuum deposition at various temperatures of Cu(1 0 0). The 0.15-nm-thick Pd deposition onto a clean Cu(1 0 0) surface at room temperature (RT) showed a clear c(2 × 2) low-energy electron diffraction (LEED) pattern, i.e. Cu(1 0 0)-c(2 × 2)-Pd. The RT-CO exposure to the c(2 × 2) surfaces resulted in IRRAS absorption caused by CO adsorbed on the on-top sites of Pd. The LEED patterns of the Pd-deposited Cu(1 0 0) at higher substrate temperatures revealed less-contrasted c(2 × 2) patterns. The IRRAS intensities of the linearly bonded CO bands on 373-K-, 473-K-, and 673-K-deposited c(2 × 2) surfaces are, respectively, 25%, 22%, and 10% less intense than those on the RT-deposited surface, indicating that Pd coverages at the outermost c(2 × 2) surfaces decrease with increasing deposition temperature. In the initial stage of the 90-K-CO exposure to the RT surface, the band attributable to CO bonded to the Pd emerged at 2067 cm⁻¹ and shifted to higher frequencies with increasing CO exposure. At saturation coverage, the band was located at 2093 cm⁻¹. In contrast, two distinct bands around 2090 cm⁻¹ were apparent on the spectrum of the 473-K-deposited surface: the CO saturation spectrum was dominated by an apparent single absorption at 2090 cm⁻¹ for the 673-K-deposited surface. The TPD spectra of the surfaces showed peaks at around 200 and 300 K, which were ascribable respectively to Cu-CO and Pd-CO. Taking into account the TPD and IRRAS results, we discuss the adsorption-desorption behaviors of CO on the ordered checkerboard structures.     

The adsorption of CO on Ir(111) investigated with FT-IRAS

The adsorption of CO on Ir(111) has been investigated with Fourier transform infrared reflection-absorption spectroscopy, temperature programmed desorption, and low-energy electron diffraction. At sample temperatures between 90 and 350 K, only a single absorption band, above 2000 cm⁻¹, has been observed at all CO coverages. For fractional coverages above approximately 0.2, the bandwidth becomes as narrow as 5.5 cm⁻¹. The linewidth is attributed mainly to inhomogeneous broadening at low CO coverages and to the creation of electron-hole pairs at higher CO coverages. The coverage-dependent frequency shift of the IR band can be described quantitatively using an improved dipolar coupling model. The contribution of the dipole shift and the chemical shift to the total frequency shift were separated using isotopic mixtures of CO. The chemical shift is positive with a constant value of approximately 12 cm⁻¹ for all coverages, whereas the dipole shift increases with coverage up to a value of 36 cm⁻¹ at a coverage of 0.5 ML.     

Sulfur poisoning of the CO adsorption on Co(0 0 0 1)

CO adsorption on a sulfur covered cobalt surface at 185 K has been studied using XPS, TDS, LEED, and WF measurements. As in the case of CO adsorption on the clean Co(0 0 0 1) surface, CO adsorbs and desorbs molecularly and no dissociation was observed. The saturation coverage of CO decreases linearly from 0.54 ML to 0.27 ML when the S pre-coverage increases to 0.25 ML. The WF increased during CO adsorption, but did not reach the value obtained for CO adsorption on the clean surface. The smaller work function change is explained by the reduced adsorption of CO on the sulfur-precovered surface. A reduction in the activation energy of desorption for CO from 113 kJ/mol to 88 kJ/mol was observed indicating weaker bonding of the CO molecules to the surface. The behavior of the CO/S/Co(0 0 0 1) system was explained by a combination of steric and electronic effects.     

Substitutional adsorption geometry for Pb(1 1 1)-(√3 × √3)R30°-K

Intermixed structures for alkalis (larger than Li) on close-packed substrates have previously been observed only on Al(1 1 1). This study shows that K forms an ordered intermixed structure on Pb(1 1 1). The structures of clean Pb(1 1 1) and Pb(1 1 1)-(√3 × √3)R30°-K were studied using dynamical low-energy electron diffraction (LEED). The clean Pb(1 1 1) surface at 47 K was found to be a relaxed version of the bulk structure, in agreement with an earlier study of the same surface [Y.S. Li, F. Jona, P.M. Marcus, Phys. Rev. B 43 (1991) 6337]. At room temperature, adsorption of K on this surface results in a (√3 × √3)R30° structure, which was shown using dynamical LEED to consist of K atoms substituted in surface vacancies. The K-Pb bond length was found to be 3.62 ± 0.3 Å, with no significant change to the Pb interlayer spacings.     

Coadsorption of CO and C6H6 on Co(0 0 0 1)

We have studied the influence of CO on the adsorption of benzene on the Co(0 0 0 1) surface using LEED, XPS, TDS and work function measurements. CO was found to reduce the benzene adsorption, but even at saturation CO exposure no complete blocking was observed. Thermal desorption of the coadsorbed layer featured CO and H₂ peaks indicating partial dehydrogenation of benzene and retaining of the CO bond. Ordered LEED structures were found with all coverages: Pre-adsorption of CO led to patterns already seen for pure carbon monoxide adsorption. Pre-adsorption of benzene showed the known structure of pure benzene also with small CO exposures, but higher CO exposures yielded a mixture of and patterns.     

Surface alloy formation after deposition of Ce on Rh(1 1 0)

Vapour deposition of Ce onto a Rh(1 1 0) single crystal at room temperature is studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and low energy electron diffraction (LEED). The thicknesses of the deposited Ce layers are estimated to be between 2 and 9 Å. To study the changes in the Ce-Rh surface layer, the samples are annealed at temperatures between 500 and 1000 °C after Ce deposition.After heating, a c(2 × 2) LEED pattern appears for the sample with the thinnest deposited Ce layer (2.4 Å). For samples with thicker Ce-films, the LEED pattern co-exists of a c(2 × 2) structure and a more diffuse 6% contracted (2 × 1) structure. This appears at the same temperature as the Ce 3d and Rh 3d core levels exhibit sharp intensity changes and binding energy shifts.The intensity of the f⁰, f¹ and f² multiplets in the Ce 3d core level spectra change when the annealing temperature is increased. The relative intensity of the Ce 3d f⁰ and f² features compared to the Ce 3d f¹ features is largest after annealing to 500 °C. This is below the temperature at which the ordered surface alloy is formed. When the sample is heated above the formation temperature of the surface alloy, the relative intensity of the Ce 3d f⁰ and f² features decrease.     

The adsorption of NO on an oxygen pre-covered Pt(1 1 1) surface: in situ high-resolution XPS combined with molecular beam studies

Adsorption of NO on a Pt(1 1 1) surface pre-covered with a p(2 × 2) atomic oxygen layer has been studied in situ by high-resolution X-ray photoelectron spectroscopy and temperature-programmed XPS using third-generation synchrotron radiation at BESSY II, Berlin, combined with molecular beam techniques and ex situ by low energy electron diffraction and temperature-programmed desorption. O 1s XP spectra reveal that an ordered p(2 × 2)-O layer dramatically changes the adsorption behavior of NO as compared to the clean surface. The atomic oxygen occupies fcc hollow sites, and therefore blocks NO adsorption on these sites, which are energetically preferred on clean Pt(1 1 1). As a consequence, NO populates on-top sites at low coverage. At 110 K for higher coverages, NO can additionally adsorb on hcp hollow sites, thereby inducing a shift of the O 1s binding energy of atomic oxygen towards lower energies by about 0.25 eV. The bond strength of the hcp hollow NO species to the substrate is weakened by the presence of atomic oxygen. A sharp p(2 × 2) LEED pattern is observed for NO adsorption on the oxygen pre-covered surface, up to saturation coverage. The total saturation coverage of NO on Pt(1 1 1) pre-covered with varying amounts of oxygen (below 0.25 ML) decreases linearly with the coverage of oxygen. The initial sticking coefficient of NO is reduced from 0.96 on clean Pt(1 1 1) to 0.88 on a p(2 × 2) oxygen pre-covered surface.     

Initial growth of platinum on oxygen-covered Ni(1 1 0) surfaces

The initial growth of Pt on the Ni(1 1 0)-(3 × 1)-O and NiO(1 1 0) surfaces has been studied by coaxial impact collision ion scattering spectroscopy (CAICISS), low energy electron diffraction (LEED) and X-ray photoelectron spectroscopy (XPS). Prior to Pt deposition, the atomic structure of the near-surface regions of the Ni(1 1 0)-(3 × 1)-O and NiO(1 1 0) structures were studied using CAICISS, finding changes to the interlayer spacings due to the adsorption of oxygen. Deposition of Pt on the Ni(1 1 0)-(3 × 1)-O surface led to a random substitutional alloy in the near-surface region at Pt coverages both below and in excess of 1 ML. In contrast, when the surface was treated with 1800 L of atomic oxygen in order to form a NiO(1 1 0) surface, a thin Pt layer was formed upon room temperature Pt deposition. XPS and LEED data are presented throughout to support the CAICISS observations.     

The adsorption of CCl4 on Ag(1 1 1): Carbene and CC bond formation

The adsorption of CCl₄ on Ag(1 1 1) has been investigated from 100 K to 300 K using absolute sticking probability measurement, temperature programmed desorption, Auger electron spectroscopy, low energy electron diffraction, ultra-violet photoelectron spectroscopy and X-ray photoelectron spectroscopy. At 100 K, CCl₄ adsorbs molecularly with a sticking probability of 1.0, forming a (3 × 3) adsorption structure. At 300 K the following overall reaction occurs,

2CCl_4(g)→4Cl_(chem)+C₂Cl_4(g),