Heat capacity of isotopically enriched Si, Si and Si in the temperature range 4 K<T<100 K

The heat capacity of isotopically enriched ²⁸Si, ²⁹Si, ³⁰Si samples has been measured in the temperature range between 4 and 100 K. The heat capacity of Si increases with isotopic mass. The values of the initial Debye temperature Θ_D(0) for the three isotopic varieties of silicon have been determined. Good agreement with the theoretical dependence of the heat capacity on isotopic mass has been found.     

Considerable increase in thermal conductivity of a polycrystalline CVD diamond upon isotope enrichment

We measured the temperature dependence of thermal conductivity of a polycrystalline CVD diamond with natural isotope composition and an isotope enriched (99.96% ¹²C) sample at temperatures from 5 to 420 K. The isotope enriched diamond demonstrates a considerable growth of thermal conductivity at temperatures above 80 K compared to the diamond with natural composition of isotopes. At room temperature the thermal conductivity reaches 24.3 W·cm^?1K^?1, and the isotope effect makes up not less than 34%.     

Qualitative sims analysis of<Superscript>28,29,30</Superscript>Si isotope concentration in silicon using a Tof.Sims-5 Setup

The possibility of quantitative SIMS determination of^28-30Si isotope concentrations in silicon samples using a TOF.SIMS-5 spectrometer is shown. Th e isotope composition of a large number of Si samples, namely epitaxial Si layers with a natural isotope ratio, amorphous Si films depleted of²⁸Si isotope (deposited on natural Si substrates), and samples enriched with ²⁸Si isotope (manufactured by VITCON) is investigated. Substantial variations in the ²⁹Si/³⁰Si isotope ratio (from 1.51 for the natural content up to 25 in the case of limiting enrichment with ²⁸Si isotope) are revealed.     

Isotopically engineered Si and Ge for spintronics and quantum computation

Si, Ge as well as SiGe structures are the promising materials for spintronics and quantum computation due to the fact that in both crystals only one isotope (²⁹Si and ⁷³Ge) has nuclear spin. As a result, isotope engineering of Si and Ge permits to control the density of nuclear spins and vary the spin coherence time, a crucial parameter in spintronics. In the first part we discuss the NMR study of nuclear spin decoherence in Ge single crystals with different abundance of the ⁷³Ge isotope. It was observed that the slow component of the dephasing process is elongated with depletion of Ge crystal with isotope ⁷³Ge. The second part is devoted to the development of the Kane's model of nuclear spin-based quantum computer, which uses the nuclear spin of ³¹P impurity atoms in a ²⁸Si matrix as quantum bits (qubits). We discuss a new method of placing ³¹P atoms in a ²⁸Si based on neutron-transmutation-doping of isotopically engineered Si and Ge. In the proposed structure, interqubit coupling is due to indirect hyperfine interaction of ³¹P nuclear spins with electrons localized in a ²⁸Si quasi-one-dimensional nanowire, which allows one to control the coupling between distant qubits.     

Spectroscopy of excitons and shallow impurities in isotopically enriched silicon—electronic properties beyond the virtual crystal approximation

Recent high resolution spectroscopic studies of excitonic and impurity transitions in high-quality samples of isotopically enriched Si have dramatically expanded our understanding of the effects of isotopic composition on the electronic properties of semiconductors. Prior to these studies on Si, the results for other semiconductors, focusing mainly on the isotopic dependence of the electronic band gap energy E_G in the T→0 limit, could all be explained within the virtual crystal approximation (VCA), in which only the average isotopic mass was relevant. Remarkably, not only were the effects of isotopic randomness observable in natural Si (when compared to enriched ²⁸Si), but the random isotopic distribution present in natural Si was found to be the true source of what had been thought of as ‘fundamental’ spectroscopic limits in Si, including the linewidths of bound exciton emission lines and impurity absorption transitions, and the ‘intrinsic’ acceptor ground state splitting. Many of these transitions are far narrower in highly enriched ²⁸Si than in the most perfect natural Si, challenging existing spectroscopic methods, and opening up new possibilities for precision measurements, and for the observation of new physics.     

Enhanced field emission from Si doped nanocrystalline AlN thin films

Si doped and undoped nanocrystalline aluminum nitride thin films were deposited on various substrates by direct current sputtering technique. X-ray diffraction analysis confirmed the formation of phase pure hexagonal aluminum nitride with a single peak corresponding to (1 0 0) reflection of AlN with lattice constants, a = 0.3114 nm and c = 0.4986 nm. Energy dispersive analysis of X-rays confirmed the presence of Si in the doped AlN films. Atomic force microscopic studies showed that the average particle size of the film prepared at substrate temperature 200 °C was 9.5 nm, but when 5 at.% Si was incorporated the average particle size increased to ∼21 nm. Field emission study indicated that, with increasing Si doping concentration, the emission characteristics have been improved. The turn-on field (E_to) was 15.0 (±0.7) V/μm, 8.0 (±0.4) V/μm and 7.8 (±0.5) V/μm for undoped, 3 at.% and 5 at.% Si doped AlN films respectively and the maximum current density of 0.27 μA/cm² has been observed for 5 at.% Si doped nanocrystalline AlN film. It was also found that the dielectric properties were highly dependent on Si doping.     

Isotope effect in the thermal conductivity of germanium single crystals

The thermal conductivity of chemically, structurally, and isotopically highly pure germanium single crystals is investigated experimentally in the temperature range from 2 to 300 K. It is found that the thermal conductivity of germanium enriched to 99.99% ⁷⁰Ge is 8 times higher at the maximum than the thermal conductivity of germanium with the natural isotopic composition. Pis’ma Zh. éksp. Teor. Fiz. 63, No. 6, 463–467 (25 March 1996)     

The effect of sulfide substitution in the mixed conductor Cu7PSe6

Cu₇PSe₆ is a mixed conductor exhibiting structural phase transitions above and below room temperature that are accompanied by step-like changes in electrical conductivity. The substitution of S²⁻ for Se²⁻ in Cu₇PSe₆ significantly enhances electrical conductivity at room temperature compared to that observed for the pure compound. In the case of Cu₇P(Se_0.80S_0.20)₆, a nearly temperature-independent electrical conductivity exceeds 1 S/cm with no evidence of any phase transitions throughout the temperature interval 200-400 K. However, the ionic contribution accounts for just 2% of the total electrical conductivity in this solid solution at room temperature.     

Evolution of surface morphology of NiO thin films under swift heavy ion irradiation

NiO nanoparticle thin films grown on Si substrates were irradiated by 107 MeV Ag⁸⁺ ions. The films were characterized by glancing angle X-ray diffraction and atomic force microscopy. Ag ion irradiation was found to influence the shape and size of the nanoparticles. The pristine NiO film consisted of uniform size (∼100 nm along major axis and ∼55 nm along minor axis) elliptical particles, which changed to also of uniform size (∼63 nm) circular shape particles on irradiation at a fluence of 3 × 10¹³ ions cm⁻². Comparison of XRD line width analysis and AFM data revealed that the particles in the pristine films are single crystalline, which turn to polycrystalline on irradiation with 107 MeV Ag ions.     

Growth of isotopically enriched Si nanowires

The isotopically enriched silicon (²⁸Si) nanowires have been fabricated by using the floating-zone (FZ) melting vapour method. The growth of the nanowires was performed in the top area, 1.52 cm from the floating melting zone (2 mm width) of a raw material bar under a flow of Ar gas. Field emission scanning electron microscopy and transmission electron microscopy analyses revealed that the nanowires of isotopically enriched ²⁸Si crystalline had diameters ranging from 2050 nm and lengths of several hundreds of micrometres. The special structure of the tip of the isotopically enriched ²⁸Si nanowires was observed.     

Evidence for fast decay dynamics of the photoluminescence from Ge nanocrystals embedded in SiO2

We have investigated the origin of room temperature photoluminescence from ion-beam synthesized Ge nanocrystals (NCs) embedded in SiO₂ using steady state and time-resolved photoluminescence (PL) measurements. Ge NCs of diameter 4-13 nm were grown embedded in a thermally grown SiO₂ layer by Ge⁺ ion implantation and subsequent annealing. Steady state PL spectra show a peak at ∼2.1 eV originating from Ge NCs and another peak at ∼2.3 eV arising from ion-beam induced defects in the SiO₂ matrix. Time-resolved PL studies reveal double exponential decay dynamics on the nanoseconds time scale. The faster component of the decay with a time constant τ₁∼3.1 ns is attributed to the nonradiative lifetime, since the time constant reduces with increasing defect density. The slower component with time constant τ₂∼10 ns is attributed to radiative recombination at the Ge NCs. Our results are in close agreement with the theoretically predicted radiative lifetime for small Ge NCs.     

MeV Au ion induced modifications at Co/Si interface

We report on room temperature MeV Au ion induced modifications at the Co/Si interfaces. Nanometers size thin film of Co and Si were grown by ultra high vacuum (UHV) electron beam evaporation technique on Si(1 1 1) surface and were irradiated by 1.5 MeV Au²⁺ ions at a fluence of 5 × 10¹⁴ ions cm⁻². High-resolution transmission electron microscopy (HRTEM) along with energy filter imaging technique has been employed to study the formation of Co-Si alloy at the interface. Formation of such surface alloy has been discussed in the light of ion-matter interaction in nanometer scale regime.     

Magnetoresistance of magnetite thin films grown by pulsed laser deposition on GaAs(1 0 0) and Al2O3(0 0 0 1)

Magnetotransport properties of magnetite thin films deposited on gallium arsenide and sapphire substrates at growth temperatures between 473 and 673 K are presented. The films were grown by UV pulsed laser ablation in reactive atmospheres of O₂ and Ar, at working pressure of 8 × 10⁻² Pa. Film stoichiometry was determined in the range from Fe_2.95O₄ to Fe_2.97O₄. Randomly oriented polycrystalline thin films were grown on GaAs(1 0 0) while for the Al₂O₃(0 0 0 1) substrates the films developed a (1 1 1) preferred orientation. Interfacial Fe³⁺ diffusion was found for both substrates affecting the magnetic behaviour. The temperature dependence of the resistance and magnetoresistance of the films were measured for fields up to 6 T. Negative magnetoresistance values of ∼5% at room temperature and ∼10% at 90 K were obtained for the as-deposited magnetite films either on GaAs(1 0 0) or Al₂O₃(0 0 0 1).     

Effects of thermal treatment on the morphology of Alq3 thin layers on Si(1 1 1) substrate

Alq₃ thin layers were vapor deposited onto a single crystal of Si(1 1 1) and the morphology of the surface was investigated by the scanning tunneling microscope under ultrahigh vacuum conditions. The STM imaging showed considerable influence of the thermal processing onto the topography of the sample. Slowly raising the sample temperature to ∼160 °C caused a complete desorption of Alq₃ molecules and uncovering the clean surface of Si(1 1 1). A fast rise of the temperature (flashing) to ∼600 °C led to decomposition of the Alq₃ and resulted in remnants of a carbon-rich surface species. Then heating or flashing this surface to a temperature in excess of 1000 °C brought about the occurrence of regular shape object on the Si(1 1 1) surface.     

Effect of erbium interlayer on nickel silicide formation on Si(1 0 0)

To reveal the influence of erbium interlayer on the formation of nickel silicide and its contact properties on Si substrate, Er(0.5-3.0 nm) and Ni(20 nm) are successively deposited onto Si(1 0 0) substrate and are treated by rapid thermal annealing in pure N₂ ambient. The NiSi formation temperature is found to increase depending on the Er interlayer thickness. The formation temperature of NiSi₂ (700 °C) is not influenced by Er addition. But with 2 nm Er interlayer, the formed NiSi₂ is observed textured with preferred orientation of (1 0 0). During the formation of NiSi, Er segregates to the surface and little Er remains at the NiSi/Si(1 0 0) interface. Therefore, the Schottky barrier height of the formed NiSi/n-Si(1 0 0) contact is measured to be 0.635 ∼ 0.665 eV which is nearly invariable with different Er addition.     

Metal-semiconductor transition in undoped ZnO films deposited by spray pyrolysis

ZnO films were deposited on glass substrate by using spray pyrolysis method. Films were deposited at different solution molarities 0.02 and 0.1 M. The films are highly transparent in the visible range of the electromagnetic spectrum with a transmission reaching up values to 90%. Band gaps were calculated as 3.24 and 3.28 eV with the help of transmission spectrums. When the solution molarity of the sprayed solution is increased from 0.02 to 0.1 M, carrier concentrations of the films increase from 1.6×10¹⁹ cm⁻³ to 5.1×10¹⁹ cm⁻³. Temperature-dependent conductivity measurements of these conducting and transparent films also showed, for the first time, a metal-semiconductor transition (MST). The deposited ZnO films show metallic conductivity above ∼420 K and semiconducting behavior at temperatures below it.     

Magnetic properties of amorphous Ge–Fe thin films

Thin films of Ge_100−xFe_x (x in at%) alloys, fabricated by thermal co-evaporation, have an amorphous structure at compositions x<∼40, although an unidentified crystalline phase with an FCC symmetry also exists at low Fe content. Magnetization versus temperature curves show that saturation magnetization is non-zero (1 to 2.5 emu/cm³) and remains nearly unchanged up to the highest measured temperature of 350 K. Magnetic hysteresis loops at room temperature show a typical ferromagnetic shape, complete saturation occurring by 1–2 kOe. These results may indicate ferromagnetic ordering at room temperature. No definite tendency is observed in the compositional dependence of saturation magnetization.     

Trap-controlled behavior in ultrathin Lu2O3 high-k gate dielectrics

Amorphous Lu₂O₃ high-k gate dielectrics were grown directly on n-type (100) Si substrates by the pulsed laser deposition (PLD) technique. High-resolution transmission electron microscope (HRTEM) observation illustrated that the Lu₂O₃ film has amorphous structure and the interface with Si substrate is free from amorphous SiO₂. An equivalent oxide thickness (EOT) of 1.1 nm with a leakage current density of 2.6×10⁻⁵ A/cm² at 1 V accumulation bias was obtained for 4.5 nm thick Lu₂O₃ thin film deposited at room temperature followed by post-deposition anneal (PDA) at 600 °C in oxygen ambient. The effects of PDA process and light illumination were studied by capacitance-voltage (C-V) and current density-voltage (J-V) measurements. It was proposed that the net fixed charge density and leakage current density could be altered significantly depending on the post-annealing conditions and the capability of traps to trap and release charges.     

Ferromagnetism in amorphous Ge1−xMnx grown by low temperature vapor deposition

Magnetic properties of amorphous Ge_1−xMn_x thin films were investigated. The thin films were grown at 373 K on (100) Si wafers by using a thermal evaporator. Growth rate was ∼35 nm/min and average film thickness was around 500 nm. The electrical resistivities of Ge_1−xMn_x thin films are 5.0×10⁻⁴∼100 Ω cm at room temperature and decrease with increasing Mn concentration. Low temperature magnetization characteristics and magnetic hysteresis loops measured at various temperatures show that the amorphous Ge_1−xMn_x thin films are ferromagnetic but the ferromagnetic magnetizations are changing gradually into paramagnetic as increasing temperature. Curie temperature and saturation magnetization vary with Mn concentration. Curie temperature of the deposited films is 80-160 K, and saturation magnetization is 35-100 emu/cc at 5 K. Hall effect measurement at room temperature shows the amorphous Ge_1−xMn_x thin films have p-type carrier and hole densities are in the range from 7×10¹⁷ to 2×10²² cm⁻³.     

Rotational-coherence molecular laser isotope separation

We have proposed a laser isotope separation method, utilizing rotational coherence of a simple molecule. In the scheme, photoexcited molecules are isotopically separated by difference of rotational period between them. To illustrate this method, two-pulse photodissociation of mixed ⁷⁹Br₂/⁸¹Br₂ isotopes has been investigated theoretically. The photodissociation probabilities of ⁷⁹Br₂ and ⁸¹Br₂ have been calculated as functions of time delay between the photoexcitation and dissociation laser pulses. We have demonstrated that isotope enrichment factor of ⁷⁹Br relative to ⁸¹Br can be changed from 0.34 to 1.8, by simply changing the time delay only by 0.2 ns. Additionally, we have shown that this method is effective for heavy isotopes, based on mass dependence of the isotope enrichment factor.