Surface oxidation process of a diamond‐like carbon film analyzed by difference X‐ray photoelectron spectroscopy

Difference X‐ray photoelectron spectroscopy (D‐XPS) revealed the surface oxidation process of a diamond‐like carbon (DLC) film. Evaluation of surface functional groups on DLC solely by the C 1s spectrum is difficult because the spectrum is broad and has a secondary asymmetric lineshape. D‐XPS clarified the subtle but critical changes at the DLC surface caused by wet oxidation. The hydroxyl (C―OH) group was dominant at the oxidized surface. Further oxidized carbonyl (C?O) and carboxyl (including carboxylate) (COO) groups were also obtained; however, the oxidation of C?O to COO was suppressed to some extent because the reaction required C―C bond cleavage. Wet oxidation cleaved the aliphatic hydrogenated and non‐hydrogenated sp² carbon bonds (C―H sp² and C―C sp²) to create a pair of C―OH and hydrogenated sp³ carbon (C―H sp³) bonds. The reaction yield for C―H sp² was superior at the surface, suggesting that the DLC film was hydrogen rich at the surface. Oxidation of aromatic sp² rings or polycyclic aromatic hydrocarbons such as nanographite to phenols did not occur because of their resonance stabilization with electron delocalization. Non‐hydrogenated sp³ carbon (C―C sp³) bonds were not affected by oxidation, suggesting that these bonds are chemically inert. Copyright © 2014 John Wiley & Sons, Ltd.     

In situ XPS and SIMS analysis of O2+ beam‐induced silicon oxidation

The chemical composition variation of silicon under 4 keV O₂⁺ ion beam bombardment at different incident angles was studied by in situ small‐area XPS. The changes in secondary ion profile (³⁰Si⁺, ⁴⁴SiO⁺, ⁵⁶Si₂⁺, ⁶⁰SiO₂⁺) during oxygen ion beam bombardment also have been monitored. We present a direct correlation of the changes in secondary ion depth profile with surface composition during sputtering. Evolution of the secondary ion profile obtained from SIMS shows similar trends with variation of oxygen concentration in the crater surface measured by XPS. It is shown that when the oxygen ion beam incidence angle is < 40° silicon dioxide is the dominant species on the crater surface and the matrix ion species ratio (MISR) value for ⁴⁴SiO⁺/⁵⁶Si₂⁺ is higher than for ³⁰Si⁺/⁵⁶Si₂⁺. For incidence angles of >40°, the formation of sub‐oxide is favoured and thus the MISR value for ⁴⁴SiO⁺/⁵⁶Si₂⁺ is lower than for ³⁰Si⁺/⁵⁶Si₂. At 40° bombardment there are similar amounts of SiO₂ and sub‐oxides present on the crater surface and the MISR values for ⁴⁴SiO⁺/⁵⁶Si₂⁺ and ³⁰Si⁺/⁵⁶Si₂⁺ are also similar. Copyright © 2004 John Wiley & Sons, Ltd.     

The initial oxidation of magnesium: an in situ study with XPS,HERDA and ellipsometry

The initial oxidation of magnesium at oxygen partial pressures between 1.3 × 10^?8 and 1.3 × 10^?5 Pa and at temperatures ranging from 273 to 550 K has been investigated in situ with X‐ray photoelectron spectroscopy (XPS), ellipsometry and high resolution elastic recoil detection analysis (HERDA). Quantitative analysis of the XPS spectra showed a clear oxygen deficiency with respect to MgO for the initial oxide. HERDA measurements confirmed this relatively low oxygen content in the thin oxide layers formed. Ellipsometry measurements showed that the electronic structure of the initially formed oxide differs significantly from that of bulk MgO. The band gap values at room temperature for the oxide layers investigated are clearly smaller than the value for bulk MgO. Copyright © 2006 John Wiley & Sons, Ltd.     

Reduction of matrix effects in TOF‐SIMS analysis by metal‐assisted SIMS (MetA‐SIMS)

We investigated reduction of the matrix effect in time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS) analysis by the deposition of a small amount of metal on the sample surfaces (metal‐assisted SIMS or MetA‐SIMS). The metal used was silver, and the substrates used were silicon wafers as electroconductive substrates and polypropylene (PP) plates as nonelectroconductive substrates. Irganox 1010 and silicone oil on these substrates were analyzed by TOF‐SIMS before and after silver deposition. Before silver deposition, the secondary ion yields from the substances on the silicon wafer and PP plate were quite different due to the matrix effect from each substrate. After silver deposition, however, both ion yields were enhanced, particularly the sample on the PP plate, and little difference was seen between the two substrates. It was therefore found that the deposition of a small amount of metal on the sample surface is useful for reduction of the matrix effect. By reducing the matrix effect using this technique, it is possible to evaluate from the ion intensities the order of magnitude of the quantities of organic materials on different substrates. In addition, this reduction technique has clear utility for the imaging of organic materials on nonuniform substrates such as metals and polymers. MetA‐SIMS is thus a useful analysis tool for solving problems with real‐world samples. Copyright © 2005 John Wiley & Sons, Ltd.     

Summary of ISO/TC 201 Standard: ISO 14701:2011 – Surface chemical analysis – X‐ray photoelectron spectroscopy—measurement of silicon oxide thickness

This International Standard specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X‐ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X‐ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that may be restricted to less than a 6° cone semiangle. For thermal oxides in the range 1‐ to 8‐nm thickness, using the best method described in this International Standard, uncertainties at a 95% confidence level around 2% may be typical and around 1% at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties. Copyright © 2012 Crown copyright.     

GDOES,XPS, and SEM with EDS analysis of porous coatings obtained on titanium after plasma electrolytic oxidation

In the paper, the glow discharge optical emission spectroscopy, X‐ray photoelectron spectroscopy, scanning electron microscopy, and energy‐dispersive X‐ray spectroscopy results of a commercial purity titanium grade 2 after plasma electrolytic oxidation (PEO), also known as micro arc oxidation (MAO), are presented. The PEO treatment was performed in the electrolyte containing concentrated (85%) phosphoric acid with copper nitrate at the voltage of 450 ± 10 V for 1 min. For the electrolyte, copper nitrate addition from 300 to 600 g/l was used. Porous coatings of specific properties were obtained. The measurements results allow to state that the copper and nitrogen ions can be introduced into the surface layer formed on pure titanium by the plasma electrolytic oxidation. The distributions of these elements were detected to depend on the electrolyte composition, with the highest amounts revealed in the coating created in the electrolyte containing 600 g Cu(NO₃)₂ in 1 l H₃PO₄. Three sub‐layers of the coating, displayed in this work by two models, were developed in the study. The analysis performed shows that under the PEO treatment in each of the electrolytes used, the formation of coating with the top sub‐layers always enriched in copper compounds was found. Copyright © 2016 John Wiley & Sons, Ltd.     

X‐ray photoelectron analysis of surface functional groups on diamond‐like carbon films by gas‐phase chemical derivatization method

Oxygen‐related surface functional groups on diamond‐like carbon (DLC) films were derivatized with fluorine‐ and nitrogen‐related groups by the gas‐phase chemical derivatization (GCD) method, and the groups were analyzed quantitatively by X‐ray photoelectron spectroscopy (XPS). It is desirable that a derivatization reaction is unique to the target group; however, it usually causes undesirable side reactions which affect other groups. This diversity of the reactions has complicated the analysis. In this report, we have overcome the problem by applying a mathematical treatment which takes the side reactions into account. This improved analysis shows that it is no longer necessary to have derivatization reactions unique to the target groups. As a result, it is demonstrated that the carbonyl (C?O) group is the dominant surface functional group on both the DLC and its wet‐oxidized films, the carboxyl (COOH) group plays a minor role, and the presence of the hydroxyl (OH) group is logically denied. Considering the oxidation steps of these oxygen‐related surface functional groups, it is suggested that the C?O group on the DLC films requires the cleavage of the carbon–carbon bond with a relatively high activation energy barrier to change into the COOH group. Copyright © 2010 John Wiley & Sons, Ltd.     

Study of the first nucleation steps of thin films by XPS inelastic peak shape analysis

The initial steps in the formation of thin films have been investigated by analysis of the peak shape (both inelastic background and elastic contributions) of X‐ray photoelectron spectra. Surface coverage and averaged height of the deposited particles have been estimated for several overlayers (nanometre range) after successive deposition cycles. This study has permitted the assessment of the type of nucleation and growth mechanisms of the films. The experiments have been carried out in situ in the preparation chamber of an XPS spectrometer. To check the performance of the method, several materials (i.e. cerium oxide, vanadium oxide and cadmium sulfide) have been deposited on different substrates using a variety of preparation procedures (i.e. thermal evaporation, ion beam assisted deposition and plasma enhanced chemical vapour deposition). It is shown that the first deposited nuclei of the films are usually formed by three‐dimensional particles whose heights and degree of surface coverage depend on the chemical characteristics of the growing thin film and substrate materials, as well as the deposition procedure. It is concluded that XPS peak shape analysis can be satisfactorily used as a general method to characterize morphologically the first nanometric moieties that nucleate a thin film. Copyright © 2006 John Wiley & Sons, Ltd.     

Effect of proton irradiation on structure and optical property of PTFE film

Effects of protons on chemical structure and optical properties of polytetrafluoroethylene (PTFE) film were investigated in the energy range of 60 to 170 keV to simulate the effects of space proton irradiation environment. The results show that for PTFE film irradiated with protons, the change in C_1s spectrum, along with those in F_1s and the FT‐IR spectrum after irradiation, demonstrates that two processes take place simultaneously. One is substitution in which carbon to fluorine bonds can be broken by the protons and some positions of fluorine are occupied by active protons; the other is the carbonification, which results in the change of surface color and an increase of carbon percentage on the irradiated surface. For the PTFE film irradiated with 150 keV protons, the spectral absorbance ΔA_λ in the wavelengths longer than 300 nm increase unmonotonously with proton fluence, and an abnormally recovery decrease of the ΔA_λ with the increase of fluence in the range of 5×10¹³ cm^?2 to 10¹⁵ cm^?2 is observed. The change of the ΔA_λ could be related to the competition of the carbonification and the substituting effect. The carbonification increases the ΔA_λ, while the substituting increases the amorphousness amount, leading to an increase in the transparency of the film. In addition, the creation of radicals can also contribute to the increase in absorbance. Copyright © 2003 John Wiley & Sons, Ltd.     

X‐ray photoelectron spectroscopic chemical state quantification of mixed nickel metal,oxide and hydroxide systems

Quantitative chemical state X‐ray photoelectron spectroscopic analysis of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging due to the complexity of the Ni 2p peak shapes resulting from multiplet splitting, shake‐up and plasmon loss structures. Quantification of mixed nickel chemical states and the qualitative determination of low concentrations of Ni(III) species are demonstrated via an approach based on standard spectra from quality reference samples (Ni, NiO, Ni(OH)₂, NiOOH), subtraction of these spectra, and data analysis that integrates information from the Ni 2p spectrum and the O 1s spectra. Quantification of a commercial nickel powder and a thin nickel oxide film grown at 1‐Torr O₂ and 300 °C for 20 min is demonstrated. The effect of uncertain relative sensitivity factors (e.g. Ni 2.67 ± 0.54) is discussed, as is the depth of measurement for thin film analysis based on calculated inelastic mean free paths. Copyright © 2009 John Wiley & Sons, Ltd.     

XPS and ToF‐SIMS study of a chalcopyrite–pyrite–sphalerite mixture treated with xanthate and sodium bisulphite

We present data from the surface analysis of a mineral mixture of chalcopyrite, pyrite, and sphalerite, elucidating surface reactions occurring during grinding and flotation. Flotation tests are also performed on the mixture, carried out in the presence of collector (SIBX) and also in the absence and presence of sodium bisulphite (NaHSO₃), a gangue sulphide mineral depressant. X‐ray photoelectron spectroscopy (XPS) studies on the ground mineral sample prior to flotation indicate that the mineral feed is heavily oxidised, especially the sphalerite in the mixture. Flotation recovery data clearly shows the effect of this oxidation, with the mineral recoveries of all three phases being lower than those observed in single mineral studies. In addition, the flotation recoveries show the effect of the inadvertent copper activation of pyrite and sphalerite, and the effect of bisulphite in reducing the flotation of sphalerite and pyrite in the mixture. Time of flight secondary ion mass spectrometry(ToF‐SIMS) data indicates that the depressing effect of bisulphite is due to the removal of copper and sulphur‐like species from the surface of pyrite and sphalerite and a consequent increase in the oxidation of these minerals. ToF‐SIMS data also indicates that the low recovery of pyrite and chalcopyrite in the absence of collector is most likely due to precipitation of zinc hydroxide on the surfaces of these minerals, formed in solution due to copper activation of sphalerite. Copyright © 2005 John Wiley & Sons, Ltd.     

Surface modification of a liquid‐crystalline polymer for copper metallization

The effects of different surface modifications on the adhesion of copper to a liquid‐crystalline polymer (LCP) were investigated with X‐ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, contact‐angle measurements, and pull tests. High pull‐strength values were achieved when copper was sputter‐deposited onto plasma and reactive‐ion‐etching (RIE)‐pretreated LCP surfaces. The values were comparable to the reference pull strengths obtained with laminated copper on the LCP. The adhesion was relatively insensitive to the employed feed gas in the pretreatments. The surface characterizations revealed that for RIE and plasma treatments, the enhanced adhesion was attributable to the synergistic effects of the increased surface roughness and polar component of the surface free energy of the polymer. However, if the electroless copper deposition was performed on RIE‐ or plasma‐treated surfaces, very poor adhesion was measured. Good adhesion between the LCP substrate and electrolessly deposited copper was achieved only in the case of wet‐chemical surface roughening as a result of the creation of a sufficient number of mechanical interlocking sites, together with a significant loss of oxygen functionalities, on the surface. © 2003 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 623–636, 2003     

One‐Step Preparation of Electrospun Microfibrous Polystyrene Mats Having Surface Enriched in p‐tert‐Butylcalix[4]arene Fitted with Phosphinoyl Pendant Arms

Polystyrene microfibers containing lower‐rim substituted calix[4]arene with phosphinoyl pendant arms were easily prepared in one‐step procedure by electrospinning. A specific feature of the fibers is the difference in their functionality at the surface and in the bulk. The graded structure of the fibers was shown by XPS analyses. The calix[4]arene concentration in the 3–5 nm surface layer was 50% higher than the theoretically calculated if calix[4]arene was uniformly distributed in the fibers. A six‐coordinated complex was formed between the calix[4]arene included in the fibers and Ni²⁺ ions. The distribution of phosphorus along the fibers is uniform, as evidenced by X‐ray mapping.

     

X‐ray photoelectron spectroscopy and the pattern recognition method—their application to surface studies in CoPd alloys

In the present work, polycrystalline CoPd alloys in varying range of bulk atomic percent composition (Co30Pd70, Co50Pd50 and Co70Pd30) are investigated by means of X‐ray photoelectron spectroscopy (XPS). The results of conventional XPS quantitative multiline (ML) approach are compared to the results obtained on the basis of XPS lines shape analysis, where the selected XPS or X‐ray induced Auger electron (XAES) transitions, are processed using the pattern recognition method known as the fuzzy k‐nearest neighbour (fkNN) rule. The fkNN rule is applied to the following spectra line shapes: Pd MNV, Co 2p, Co LMM, Pd 3d and valence band, analysing electrons in a varying range of selected kinetic energies. Both methods showed the surface segregation of Pd in Co30Pd70 and Co50Pd50 alloys. The results of the ML, the binding energy shift (ΔBE) analysis and the fkNN rule remained in agreement. Discrepancies in quantitative results obtained using different approaches are discussed within the accuracy of the applied methods, differences due to mean escape depth (MED) of electrons in considered transitions, their depth distribution function, the sensitivity of electron transition line shape on the environmental change (weaker effect for the inner shell transitions, and stronger effect for the outer shell transitions and Auger electron spectroscopy (AES) electrons transitions) and the non‐uniform depth profile concentrations. Copyright © 2005 John Wiley & Sons, Ltd.     

Photoelectron spectroscopy on organic surfaces: X‐ray degradation of oxygen‐plasma‐treated and chemically reduced poly(propylene) surfaces in comparison to conventional polymers

The X‐ray‐induced sample damage during mono XPS analysis of an oxygen‐plasma‐oxidized and subsequently wet‐chemically reduced poly(propylene) film was investigated as a showcase for plasma‐modified or plasma‐deposited samples. By doing this, the degradation index approach as introduced by Beamson and Briggs in the Scienta ESCA300 high‐resolution XPS database of organic polymers has been adopted. As to be expected, the sample degrades by loosing oxygen as revealed by observation of decreasing O/C and C OR/C_sum ratios. However, the X‐ray degradation indices are definitely higher than those of conventional reference polymers. Moreover, the C OR/C_sum degradation index is significantly higher in comparison with one obtained for the O/C ratio. In that context, there is no difference between the plasma sample and a conventional poly(vinyl alcohol) polymer. It is concluded that for reliable quantitative surface chemical analysis, the quality of spectra in terms of acquisition times must be optimized aimed to a minimization of X‐ray degradation. Finally, it is proposed to describe the photon flux of an X‐ray gun in an XPS experiment, which defines the degradation rate at the end, by using the sample current simply measured with a carefully grounded sputter‐cleaned reference silver sample. Copyright © 2009 John Wiley & Sons, Ltd.     

The effect of localized lateral growth of multiwalled carbon nanotubes with ammonia plasma post‐treatment

We present horizontally‐oriented multiwalled carbon nanotubes (CNTs) grown by means of thermal chemical vapor deposition. The CNT is across the trenches of the catalytic metals on predefined Ti electrodes. The properties of the lateral multiwalled CNT, following post‐ammonia plasma treatment, are reported. Information about the ammonia plasma treated on the interface structure of CNT is obtained using X‐ray photoelectron spectroscopy. The experimental results show that upon exposure to ammonia, the electrical property of the CNT is found to increase. Copyright © 2012 John Wiley & Sons, Ltd.     

Controlled sub‐10‐nanometer poly(N‐isopropyl‐acrylamide) layers grafted from silicon by atom transfer radical polymerization

Surface‐initiated atom transfer radical polymerization (SI‐ATRP) was used to graft poly(N‐isopropylacrylamide) (PNIPAM) brush layers with a controllable thickness in the 10‐nm range from silicon substrates. The rate of polymerization of N‐isopropylacrylamide was tuned by the [Cu(II)]₀/[Cu(I)]₀ ratio between the deactivating and activating species. The polymer layer thickness was characterized by atomic force microscopy (AFM) and ellipsometry. PNIPAM layers with a dry thickness between 5.5 and 16 nm were obtained. Time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) confirmed that the chemical structure is PNIPAM brushes. Analysis of the AFM data showed that our procedure leads to polymer grafts in the “mushroom‐to‐brush” transition regime.     

XPS and XAES analysis of copper,arsenic and sulfur chemical state in enargites

Enargite, a copper arsenic sulfide with the formula Cu₃AsS₄ is of environmental concern due to its potential to release toxic arsenic species. The oxidation and dissolution of enargite are governed by the composition and chemical state of the outermost surface layer. Qualitative and quantitative analysis of the enargite surface can be initially obtained on the basis of X‐ray photoelectron spectroscopy (XPS) binding energy and intensity data. However, a more precise determination of the chemical state of the principal elements of enargite (copper, arsenic and sulfur) in the altered surface layer and in the bulk of the mineral requires a combined analysis based on XPS photoelectron lines and the corresponding X‐ray excited Auger lines. On the basis of results obtained on natural and synthetic enargite samples and on standards of sulfides and oxides, the Auger parameter α′ of different compounds was calculated and the Wagner chemical state plots were drawn for arsenic, copper and sulfur. Arsenic in enargite is found to be in a chemical environment similar to that of arsenides or elemental arsenic, whereas copper in enargite is in a chemical state that corresponds to copper sulfide, Cu₂S, for all samples irrespective of surface treatment (natural or freshly cleaved). Only sulfur changed from a chemical state similar to that of copper or iron sulfide in freshly cleaved samples to another state in natural enargite in the as‐received state. Thus, it is the sulfur atom at the surface of enargite that is most susceptible to changes in the enargite surface state and composition. A more detailed interpretation of this behavior, based on differences in the initial and final state effects, is proposed here. The concept of Auger parameter and chemical state plot, used here for the first time for investigating enargite, has proved to be a method to unambiguously assign the chemical state of the principal elements copper, arsenic and sulfur in these minerals. Copyright © 2006 John Wiley & Sons, Ltd.