点火黑腔用铝铜复合芯轴的制备及性能

选取纯度较高的1100铝棒作为加工模芯的原材料,利用金刚石车床精加工出表面粗糙度均方根值小于20 nm的铝模芯,采用磁控溅射的方法在铝模芯上制备厚度大于5 m的铜防护层,得到铝铜复合芯轴。对制备的铜防护层的表面微观结构、结晶性能、厚度一致性进行了分析测试,结果表明磁控溅射法制备的铜防护层沿(111)面择优生长,表面粗糙度均方根值小于30 nm,厚度一致性优于95%,圆柱度小于1 m。镀层与基底结合力强,可满足大厚度黑腔涂层的制备需求。     

冲击波实验用铝楔形靶加工技术

采用单点金刚石车削技术制备加工铝楔形靶,发现金刚石车削加工楔形靶实际轮廓为圆锥面。通过Veeco NT1100白光干涉仪对表面轮廓及粗糙度进行了测量,结果表明平面部分表面粗糙度小于50 nm,最大峰谷值小于100 nm,斜面部分表面粗糙度小于200 nm。分析认为斜面部分粗糙度测量数值较大是由刀具工作角度变化导致的,而测量轮廓线非圆锥体母线又导致粗糙度测量结果大于实际值。     

热蒸镀法制备Z箍缩用铝镁合金箔材及其性能

厚度低于5 m的AlMg合金箔材可作为带材切割的原材料应用于Z箍缩物理实验。利用热蒸镀方法,通过控制沉积速率在超光滑的NaCl基片上获得了AlMg薄膜,最终在脱膜后获得了厚度低于5 m的无支撑AlMg箔材。实验对该箔材的厚度均匀性、表面粗糙度、衍射峰位、晶粒尺寸及距表面不同距离下的成份进行了分析表征。实验发现,此热蒸镀法制备的AlMg合金箔材的厚度均匀性优于8%,两面的表面粗糙度均小于180 nm,晶粒尺寸约20 nm;不同厚度样品的衍射峰位未明显偏移,箔材内应力很小;不同深度下Mg含量稳定分布,而在箔材表面杂质含量较高,在距表面6 nm以下合金含量达到预期值并趋于稳定。热蒸镀法制得的无支撑AlMg合金箔材具有厚度可控且均匀、成分稳定、内应力小的特点,适用于制备Z箍缩带阵负载。     

Al/Cu阻抗匹配状态方程测试靶制备工艺研究

 采用轧制技术和真空扩散连接技术,成功实现了Al/Cu阻抗匹配状态方程测试靶的制备,通过原子力显微镜（AFM）、扫描电镜（SEM）、X射线衍射（XRD）、台阶仪等测试方法,对样品结构及表面质量进行分析。结果表明：通过轧制技术制备的金属薄膜表面质量较好,表面粗糙度小于25 nm;扩散连接铝铜薄膜界面结合良好,为连续连接,扩散界面控制在150 nm以内。     

Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching

In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O₂, and the etching time. The etching parameters were studied in detail and optimized to minimize the surface roughness in etched areas. Ridge MZI waveguides with SU-8 2005 were fabricated under the optimized etching conditions, resulting in smooth and almost vertical patterns. The waveguides showed single-mode propagation at 1550 nm wavelength and low propagation loss of less than 1.565 dB/cm, which was similar to the waveguides fabricated by the wet-etching technique.     

Cu空心微球的精密连接技术

以Cu作为代用材料,通过分解实验方法,研究了扩散连接各工艺条件对靶丸参数的影响关系,获得适宜的工艺参数(温度小于600℃,压强小于6 MPa,时间60 min)。据此,实际连接Cu半球并制备出Cu空心微球。采用白光干涉仪、扫描电子显微镜、微米X射线断层扫描机等仪器对样品进行测试,结果显示连接界面无明显缺陷,内表面粗糙度小于50 nm,内球面直径差值小于20μm,连接强度满足机械加工要求。     

多辊轧机冷轧技术在靶材料制备中的应用

 叙述了多辊轧机轧制金属薄膜原理，以Ti膜制备为例，借助多辊轧机冷轧技术进行1.5 μm厚钛薄带的制备工艺研究。对薄膜的特性测试结果表明：工作辊的表面粗糙度对于轧制薄膜的表面粗糙度的影响很大，降低工作辊表面的粗糙度可以得到粗糙度为25.2 nm的金属薄膜。     

叶面降尘对香梨叶片高光谱特征的影响及定量反演研究

叶面降尘指大气中的浮尘经重力沉降后,在植物叶片表面所形成的一层明显积尘,对其进行监测,可为沙尘区的环境评价及农业灾害评估提供基本依据。在量化叶面降尘的基础上,研究了叶面降尘对南疆香梨叶片高光谱特征的影响,分析了叶面降尘与反射率的相关性,并建立了叶面降尘的高光谱定量反演模型。研究结果表明,叶面降尘使可见光(400~700 nm)反射率增加,最大变幅位于666 nm,绝对变化率为-10.50%,相对变化率为62.89%;使近红外(701~1 050 nm)的反射率降低,最大变幅位于758 nm,绝对变化率为12.04%,相对变化率为-41.75%。叶面降尘量大于20 g·m-2时,叶片除尘后,绿峰、红光吸收谷、蓝光吸收谷得到凸现,500~750 nm波段的斜率明显变大。叶面降尘量低于20 g·m-2时,其对绿峰的形状和面积影响不大。叶面降尘与反射率在可见光波段呈正相关,与近红外波段呈负相关,可见光波段的相关性要优于近红外波段,最大相关系数(0.61)出现在663 nm。在构建的七种PLSR反演模型中,倒数对数一阶微分模型具有较好的稳定性及预测能力,决定系数(R2)、均方根误差(RMSE)、预测方差比(RPD)分别为0.78,3.37和2.09,对叶面降尘具有很好的预测能力,其余模型的RPD均小于2.0。研究结果为叶面降尘的高光谱遥感监测提供了一定的理论依据,同时为沙尘区环境评价及农业灾害评估提供了新的数据获取方法与思路。     

二氧化钛薄膜表面粗糙度研究

为了探究二氧化钛(TiO₂)薄膜表面粗糙度的影响因素, 利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO₂)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明, TiO₂薄膜表面粗糙度随着基底表面的增大而增大, 但始终小于基底表面粗糙度, 说明TiO₂薄膜具有平滑基地表面粗糙的作用; 随着沉积速率的增大, 薄膜表面粗糙度先降低后趋于平缓; 对于粗糙度为2 nm的基底, 离子束能量大小的改变影响不大, 薄膜表面粗糙度均在1.5 nm左右; 随着膜层厚度的增大, 薄膜表面粗糙度先下降后升高。     

Properties of Cu film and Ti/Cu film on polyimide prepared by ion beam techniques

Cu film and Ti/Cu film on polyimide substrate were prepared by ion implantation and ion beam assisted deposition (IBAD) techniques. Three-dimension white-light interfering profilometer was used to measure thickness of each film. The thickness of the Cu film and Ti/Cu film ranged between 490 nm and 640 nm. The depth profile, surface morphology, roughness, adhesion, nanohardness, and modulus of the Cu and Ti/Cu films were measured by scanning Auger nanoprobe (SAN), atomic force microscopy (AFM), and nanoindenter, respectively. The polyimide substrates irradiated with argon ions were analyzed by scanning electron microscopy (SEM) and AFM. The results suggested that both the Cu film and Ti/Cu film were of good adhesion with polyimide substrate, and ion beam techniques were suitable to prepare thin metal film on polyimide.     

Incidence angle dependence on structural and optical properties of UHV deposited copper nano layers

Copper nano-layers with different incident angles as vertical, 20 and 30 degrees, same 73.3 nm thicknesses, and same deposition rate, were deposited on glass substrates, at 373K temperature, under UHV conditions. Their nano-structures were determined by AFM and XRD methods. Their optical properties were measured by spectrophotometry in the spectral range of 300–1100 nm. Kramers–Kronig relations were used for the analysis of the reflectivity curves of Cu films to obtain the optical constants of the nano layers. Different incident angles show important effects on both structural and optical properties. The effective medium approximation was employed to establish the relation between structure zone model (SZM) and EMA predictions. By increasing incidence angle the separation of metallic grains increases, hence the volume fraction of voids increases. That is in agreement with AFM analysis. The predictions of Drude free-electron theory are compared with experimental results for dielectric functions of these nano layers. There is a good agreement between our optical results and Hangman's optical results for a bulk standard Cu sample.     

Side-wall roughness in SOI rib waveguides fabricated by inductively coupled plasma reactive ion etching

SOI rib waveguides were fabricated with vertical side walls using inductively coupled plasma reactive ion etching. The root-mean-square (rms) roughness of the side-wall surface was directly measured by atomic force microscopy. The rms roughness of the side-wall surface obtained by three-mask lithography is 28.73 nm, much higher than that of the one-mask-lithography SOI rib waveguide. The scattering loss induced from side-wall roughness is evaluated using Tiens theory, and is proportional to the square of the side-wall rms roughness. To reduce the rms roughness, hydrogen annealing was used to smooth the side-wall surface obtained by three-mask lithography. After hydrogen annealing, there is a significant drop in the rms roughness of the side-wall surface. PACS 42.82.Et; 42.81.Dp; 52.80.Yr; 68.37.Ps; 81.65.Ps     

Theory of thin-film, narrowband, linear-polarization rejection filters with superlattice structure

A device to be obtained by depositing a columnar thin-film on a transparent substrate decorated periodically by an array of rectangular grooves is proposed as a narrowband, linear-polarization rejection filter. The rigorous coupled-wave approach is harnessed to calculate the reflectances and transmittances. High-quality filters of chosen materials and with less than 2 nm bandwidths can be designed with a vapor flux angle for deposition of the columnar thin-film as the controlling parameter.     

Cu掺杂无水芒硝的光致发光特性

在气温1 100℃下,将纯天然无水芒硝(Na2SO4)和Cu的混合粉末加热20 min,制备了Na2SO4:Cu发光材料.在室温中测量了光致发光谱.通过实验结果发现发射光谱形状依赖于激发波长,在260nm激发下的发射光谱是由峰值位于430 nm处的宽带谱构成,所得到的宽带谱归属于Cu+内电子的3d94s→3d10跃迁....     

二氧化锆薄膜表面粗糙度的研究

采用电子束蒸发工艺,利用泰勒霍普森相关相干表面轮廓粗糙度仪,研究了不同基底粗糙度、不同二氧化锆薄膜厚度以及不同的离子束辅助能量下所沉积的二氧化锆薄膜的表面粗糙度。结果表明：随着基底表面粗糙度的增加,二氧化锆薄膜表面粗糙度呈现出先缓慢增加,当基底的粗糙度大于10nm后呈现快速增加的趋势;随着二氧化锆薄膜厚度的增加,其表面均方根粗糙度（RMS）先减小后增大;随着辅助沉积离子能量的增加,其表面粗糙度呈现出先减小后增加的趋势。     

太湖水体反射率的光谱特征波长分析

水体反射率的光谱特征波长分析是解决内陆水色遥感难题的一项重要的基础工作.该文分析了2006-2009年七次太湖综合实验获取的312个采样点遥感反射率,找出反射率曲线出现极大值、极小值、由凹向凸转变的拐点、由凸向凹转变的拐点对应的特征波长,给出了太湖水体反射率350～900nm范围内的光谱特征波长:359,440,464,472,552,566,583,628,636,645,660,676,689,706,728,791,806和825 nm.最后用浮游植物色素的吸收光谱、太湖水体特有的组成成分解释了特征波长.文章分析特征波长的方法,对于各种光谱曲线的特征波长分析都适用,该方法能够有效地区分曲线峰值所在波长和谷值所在波长重叠的情况.该文的研究成果有利于建立反演水质参数的算法,从而提高反演算法的精度.     

Shallow surface etching of organic and inorganic compounds by electrospray droplet impact

The electrospray droplet impact (EDI) was applied to bradykinin, polyethylene terephthalate (PET), SiO₂/Si, and indium phosphide (InP). It was found that bradykinin deposited on the stainless steel substrate was ionized/desorbed without the accumulation of radiation products. The film thickness desorbed by a single collisional event was found to be less than 10 monolayers. In the EDI mass spectra for PET, several fragment ions were observed but the XPS spectra did not change with prolonged cluster irradiation. The etching rate for SiO₂ by EDI was measured to be ∼0.2 nm/min. The surface roughness of InP etched by EDI was found to be one order of magnitude smaller than that etched by 3 keV Ar⁺ for about the same etching depths. EDI is capable of shallow surface etching with little damage left on the etched surface.     

Matter wave diffraction from an inclined transmission grating: searching for the elusive 4He trimer Efimov state

The size of the helium trimer is determined by diffracting a beam of 4He clusters from a 100 nm period grating inclined by 21 degrees. Because of the bar thickness the projected slit width is roughly halved to 27 nm, increasing the sensitivity to the trimer size. The peak intensities measured out to the eighth order are evaluated via a few-body scattering theory. The trimer pair distance is found to be (r) = 1.1(+0.4)(-0.5) nm in agreement with predictions for the ground state. No evidence for a significant amount of Efimov trimers is found. Their concentration is estimated to be under 6%, less than expected.     

Stress,Roughness and Reflectivity Properties of Sputter-Deposited B_4C Coatings for X-Ray Mirrors

Boron carbide(B_4C) coatings have high reflectivity and are widely used as mirrors for free-electron lasers in the x-ray range. However, B_4C coatings fabricated by direct-current magnetron sputtering show a strong compressive stress of about-3 GPa. By changing the argon gas pressure and nitrogen-argon gas mixing ratio, we are able to reduce the intrinsic stress to less than-1 GPa for a 50-nm-thick B_4C coating. It is found that the stress in a coating deposited at 10 m Torr is-0.69 GPa, the rms roughness of the coating surface is 0.53 nm, and the coating reflectivity is 88%, which is lower than those of coatings produced at lower working pressures. When the working gas contains 8% nitrogen and 92% argon, the B4 C coating shows not only-1.19 GPa stress but also a low rms roughness of 0.16 nm, and the measured reflectivity is 93% at the wavelength of 0.154 nm.     

Estimation of surface snow properties using combined millimeter-wave backscatter and near-infrared reflectance measurements

Knowledge of surficial snow properties such as grain size, surface roughness, and free-water content provides clues to the metamorphic state of snow on the ground, which in turn yields information on weathering processes and climatic activity. Remote sensing techniques using combined concurrent measurements of near-infrared passive reflectance and millimeter-wave radar backscatter show promise in estimating the above snow parameters. Near-infrared reflectance is strongly dependent on snow grain size and free-water content, while millimeter-wave backscatter is primarily dependent on free-water content and, to some extent, on the surface roughness. A neural-network based inversion algorithm has been developed that optimally combines near-infrared and millimeter-wave measurements for accurate estimation of the relevant snow properties. The algorithm uses reflectances at wavelengths of 1160 nm, 1260 nm and 1360 nm, as well as co-polarized and cross-polarized backscatter at a frequency of 95 GHz. The inversion algorithm has been tested using simulated data, and is seen to perform well under noise-free conditions. Under noise-added conditions, a signal-to-noise ratio of 32 dB or greater ensures acceptable errors in snow parameter estimation.