溶胶-凝胶法制备BaTiO3/SrTiO3多层膜的介电增强效应

采用溶胶凝胶法,在PtTiSiO2Si衬底上逐层制备了BaTiO3SrTiO3多层膜.从多层膜的XRD图可看出明显的双峰,分别对应为BaTiO3和SrTiO3的特征峰,表明样品已形成了多层膜结构.与同厚度的Ba05Sr05TiO3单层膜比较,BaTiO3SrTiO3多层膜的介电系数得到了明显的增强,在频率为10kHz时,周期为66nm的BaTiO3SrTiO3多层膜相对于同厚度的Ba05Sr05TiO3薄膜的介电系数从245增强到595,而损耗依然保持较低,分别为0029和0033.研究同时表明,BaTi 关键词： 溶胶-凝胶法 多层膜 介电增强     

氧非正分La0.9Ba0.1MnO3-δ/SrTiO3:Nb p-n异质结的整流特性研究

利用脉冲激光沉积技术在掺Nb的SrTiO3衬底上制备了氧非正分La0.9Ba0.1MnO3-δ/SrTiO3:Nb p-n异质结.在20-300 K这一较宽的温度范围内获得了光滑的整流曲线.整流实验表明:该p-n异质结的正向扩散电压V0随着温度升高在薄膜金属-绝缘转变温度附近出现极大值,表现出与氧正分La0.9Ba0.1MnO3-δ/SrTiO3:Nb p-n结截然不同的温度特性.结合薄膜的电阻-温度实验和能带计算结果,对这一奇异的现象进行了解释.     

薄膜光学 薄膜光学理论与膜系设计

O484.1 2005010406 R.F.溅射Ba0．5Se0．5TiO3／RuO2薄膜及其介电特性研究= Dielectric propertics of sputtered Ba0.5 Sr0.5 TiO3 thin film on RuO2 bottom electrode[刊,中]／张柏顺(湖北大学物理学与电子技术学院．湖北．武汉(430062)),章天金…∥光电子技术与信息,-2004,17(2).-19-22 用R.F．磁控溅射法在p-Si(100)衬底上沉积Ba0.5 Sr0.5TiO3／RuO2异质结,BST薄膜的晶相和表面形貌用 XRD和SEM分析,表明在衬底温度为550℃时。薄膜的结晶度高、表面粗糙、晶粒较大。电容器InGa／BST／RuO2的     

溶胶-凝胶法制备MgO/(Ba0.8Sr0.2)TiO3多层薄膜及其介电和漏电特性研究

采用改进的溶胶-凝胶方法在LaNiO3/Si(100)衬底上制备了MgO/(Ba0.8Sr0.2)TiO3多层薄膜.实验结果表明,MgO层的引入改变了(Ba0.8Sr0.2)TiO3的介电特性和漏电流行为,使薄膜的漏电流降低了3个数量级,但介电常数也有相应降低.漏电流的显著降低是由MgO子层的高阻特性以及微量Mg向(Ba0.8Sr0.2)TiO3晶格中扩散造成的.     

脉冲激光沉积法制备钛酸锶钡薄膜及其光电性质

用脉冲激光沉积技术制备了钛酸锶钡(Ba0.5Sr0.6TiO3薄膜.用X射线光电子能谱和原子力显微镜分别分析了薄膜的化学组分和表面形貌.在交流信号为50 mV和100 kHz时测量了薄膜的介电系数和介电损耗随外加电场的变化关系,得出最高的介电可调率达到45%.利用单光束纵向Z扫描的方法研究了薄膜的非线性光学性质,得到非线性折射率为5.04×10-6cm2/kW,非线性吸收系数为3.59×10-6m/W,测量所用光源的波长为532 nm,脉宽为55 ps,表明Ba0.5Sr0.5TiO3薄膜有较快的非线性光学响应.     

SrTiO_3(001)衬底上单层FeSe超导薄膜的分子束外延生长

在以前工作的基础上,进一步研究了SrTiO3(001)(STO)衬底上单层FeSe超导薄膜的分子束外延生长.首先,通过去离子水刻蚀、盐酸溶液腐蚀和纯氧气氛中退火等步骤,获得台阶有序、具有单一TiO2终止的原子级平整表面的STO衬底,这是前提条件.这个过程中酸的选择和退火过程中氧的流量是最为关键的因素.其次,在FeSe薄膜的分子束外延生长中,选择适当的Fe源和Se源束流以及衬底温度是关键因素.如选择适当,生长模式为step-?ow生长,这时得到的FeSe薄膜将是原子级平整的.最后一步为退火,这个过程会增强FeSe薄膜结晶性以及它与SrTiO3衬底间的结合强度.     

高质量镍基超晶格薄膜的制备及表征

自发现镍基超导薄膜之后, 镍基材料体系已成为当前人们的研究热点. 而在相关报道中, 普遍认为高质量的镍基超导前驱体薄膜的制备对其拓扑还原后超导电性的实现具有重要影响. 前期研究表明高质量的前驱体薄膜只生长在SrTiO3 衬底附近, 这与我们的实验结果一致. 为了可控制备高质量的镍基超导前驱体薄膜, 本文利用脉冲激光沉积(PLD) 技术在SrTiO3 (001) 衬底上生长不同厚度的可层选择性还原的[SrTiO3 ]m/[ Nd0 .8Sr0 .2 NiO3 ]n[(STO)m/(NSNO)n ]超晶格薄膜. 采用反射高能电子衍射仪(RHEED) 及透射电子显微镜(STEM) 和 X 射线衍射(XRD) 技术对超晶格薄膜的结构进行原位检测及结构表征, 然后利用综合物性测量系统(PPMS) 测试薄膜的电磁输运性质. 结果表明, 超晶格薄膜的结构质量良好, 超晶格薄膜和高质量单层前驱体薄膜表现出类似的电阻和磁阻现象. 该研究为后续镍基超导薄膜的可重复制备提供了重要的参考.     

LaTiO3+x薄膜生长氧压对薄膜结构和输运性能的影响

利用脉冲激光沉积 (PLD)的方法,在750℃的生长温度,不同的氧气气氛下(6.6×10-4Pa～50Pa)制备了LaTiO3 x(LTO)薄膜.反射式高能电子衍射仪 (RHEED)实时监测表明我们所制备的薄膜表面平整光滑,面内取向较好.X射线衍射 (XRD)数据表明:LaTiO3 x薄膜特征峰的位置随生长氧压的变化而发生变化.当氧压增大时,衍射峰对应的2θ角减小,并且在中间氧压时,衍射峰宽化.我们认为氧压增大,使得薄膜中氧含量增加.随着x值的增加,薄膜的电输运性能发生显著改变.在高真空度条件下生长的薄膜表现出很强的金属性,当氧压增加时,材料的电阻率显著增大.实验中测量的所有样品的电阻率都保持正的温度系数,并且在一个相当大的温度区间内与温度的平方呈线性关系.     

YBa2Cu3O7-δ薄膜厚度在多层异质结构(Ag/Ba0.1Sr0.9TiO3/YBa2Cu3O7-δ/LaAlO3)中对Ba0.1Sr0.9TiO3介电性能的影响研究

铁电/超导(Ba, Sr)TiO3/YBa2Cu3O7-δ异质结在可调谐微波器件方面具有非常好的应用前景.我们采用1.2°斜切LaAlO3基片,以脉冲激光沉积法(PLD)制备出性能较好的Ba0.1Sr0.9TiO3/YBa2Cu3O7-δ (BST/YBCO)异质薄膜.并进一步研究了YBCO薄膜厚度对BST性能的影响.研究发现当YBCO薄膜厚度增加到180nm附近时,其生长模式由二维step-flow转变为三维岛状模式,严重损害了在YBCO上面生长的BST薄膜的介电性能.具体表现在:BST薄膜的介电常数和可调谐率明显降低,介电损耗和漏电流却大幅度上升.通过测量电容与温度的关系,以应力效应模型对这一实验现象作出解释,认为YBCO薄膜厚度超过临界值,生长模式的转变促使晶格失配应力在YBCO和BST薄膜中得到释放,这导致BST/YBCO界面粗糙,以及BST薄膜中产生了大量的位错和缺陷,BST薄膜的性能因而大为降低.此外,通过对完全相同条件生长的单层YBCO薄膜的表面形貌进行了AFM研究,测试结果进一步验证了YBCO薄膜厚度增加到180nm时,其表面变得异常粗糙,均方根粗糙度(RMS)从120nm厚度时的3nm增加到180nm厚度时的9nm.因此,我们提出:通过严格控制底层YBCO薄膜的厚度,进而控制它的生长模式,能够非常有效地提高BST薄膜的介电性能.     

高气压反射式高能电子衍射仪监控脉冲激光外延氧化物薄膜

在超高真空分子束外延（MBE）生长技术中，反射式高能电子衍射仪（RHEED）能实时显示半导体和金属外延生长过程，给出薄膜表面结构和平整度的信息，成为MBE必备的原位表面分 析仪.为了研究氧化物薄膜如高温超导（YBa₂Cu₃O₇） 、铁电薄膜（Sr_1-xBa_x TiO₃）及它们的同质和异质外延结构的生长机理，获得高质量的符合各种应用 需要的氧化 物多层薄膜结构，在常规的制备氧化 关键词： 高温超导薄膜 RHEED     

Growth and in situ high-pressure reflection high energy electron diffraction monitoring of oxide thin films

Interface and surface physics is an important sub-discipline within condensed matter physics in recent decades. Novel concepts like oxide-electronic device are prompted, and their performance and lifetime are highly dependent on the flatness and abruptness of the layer surfaces and interfaces. Reflection high-energy electron diffraction (RHEED), which is extremely sensitive to surface morphology, has proven to be a versatile technique for the growth study of oxide thin films. A differential pumping unit enables an implementation of RHEED to pulsed laser deposition (PLD) systems, ensuring an in situ monitoring of the film growth process in a conventional PLD working oxygen pressure up to 30 Pa. By optimizing the deposition conditions and analyzing the RHEED intensity oscillations, layer-by-layer growth mode can be attained. Thus atomic control of the film surface and unit-cell control of the film thickness become reality. This may lead to an advanced miniaturization in the oxide electronics, and more importantly the discovery of a range of emergent physical properties at the interfaces. Herein we will briefly introduce the principle of high-pressure RHEED and summarize our main results relevant to the effort toward this objective, including the growth and characterization of twinned La_2/3Ca_1/3MnO₃ thin films and ReTiO_3+δ/2 (Re = La, Nd; δ = 0 ～ 1) A _n B _n O_3n+2 structures, on YSZ-buffered ‘Silicon on Insulator’ and LaAlO₃ substrates, respectively, as well as the study of the initial structure and growth dynamics of YBa₂Cu₃O_7?δ thin films on SrTiO₃ substrate. Presently we have realized in situ monitoring and growth mode control during oxide thin film deposition process.     

Imposed layer-by-layer growth by pulsed laser interval deposition

Pulsed Laser Deposition (PLD) has become a significant technique to study the thin film growth of novel materials. Here, one has benefited from the main advantages of PLD, the relative easy stoichiometric transfer of material from target to substrate and the almost free choice of (relatively high) background pressures. However, the applicability of PLD is still hampered, because real time in situ growth monitoring was almost not available. For example, Reflection High-Energy Electron Diffraction (RHEED) was limited to low background pressures only until recently. High pressure RHEED, which makes it possible to in situ monitor during deposition of oxides at the higher pressures, opened new possibilities [1]. Besides observed intensity oscillations due to layer by layer growth, enabling accurate growth rate control, it became clear that intensity relaxation observed due to the typical pulsed way of deposition leads to a wealth of information about growth parameters [2]. Here, PLD in combination with high pressure RHEED is used to study the influence of the different parameters on the growth mode, resulting in a new approach to impose layer by layer growth by interval deposition.     

Effect of Terraces at the Interface on the Structural and Physical Properties of La_(0.8)Sr_(0.2)MnO_3 Thin Films

Employing atomic force microscopy,transmission electron microscopy and the second harmonic generation technique,we carefully explore the structural properties of 6-unit-cell-thick La_(0.8)Sr_(0.2)MnO_3 films grown on SrTiO_3 with atomically flat TiO_2-terminated terraces on the surface.The results clearly demonstrate that the terraces on the surface of TiO_2-terminated SrTiO_3 can improve the layer-by-layer epitaxial growth of the manganite films,which results in uniform film coverage at the beginning of growth and thus reduces the substrate-induced disorder at or near the interface.Comparing the magnetic and transport properties of La_(0.8)Sr_(0.2)MnO_3 films with the thicknesses varying from 6 unit cells to 80 unit cells grown respectively on as-received SrTiO_3 and TiO_2-terminated SrTiO_3,it is found that these atomically flat terraces on the surface of TiO_2-terminated SrTiO_3 can greatly enhance the Curie temperature and conductivities of the ultrathin La_(0.8)Sr_(0.2)MnO_3 films with thickness less than 50 unit cells,while no obvious difference is detected in the magnetic and transport properties of the 80unit-cell thick films.     

Layer-by-layer growth of MgO thin films controlled by inserting a TiN seed layer using an in-situ pulsed laser deposition

Completely (200)-oriented MgO films were grown on Si(100) with insertion of a TiN seed layer by pulsed laser deposition (PLD). Compared with the conventional direct ablation of a metal Mg or ceramic MgO target, we successfully demonstrated an effective way to improve the crystallinity of MgO thin films. By using TiN as a seed layer, high-quality MgO films with an atomic-scale smooth surface of about 0.55 nm (Ra) were obtained. Moreover, it is found that the quality of MgO films was independent of the thickness of the TiN seed layer. The improved crystalline quality of the MgO films was attributed to the layer-by-layer growth mode during the deposition of MgO films, which was monitored in-situ by reflection high energy electron diffraction (RHEED). PACS 68.55.Jk; 81.15.Fg     

Properties of ZnO thin films grown on Si substrates in vacuum and oxygen ambient by pulsed laser deposition

Epitaxial ZnO thin films have been synthesized directly on Si(1 1 1) substrates by pulsed laser deposition (PLD) in vacuum. The reflection high-energy electron diffraction (RHEED) indicates that streaky patterns can be clearly observed from the ZnO epilayers prepared at 600 and 650 °C, revealing a two-dimensional (2D) growth mode. While the ZnO thin film deposited in oxygen ambient shows ring RHEED pattern. There is a compressive in-plane stress existing in the ZnO epitaxial film, but a tensile one in the polycrystalline film. Compared with the ZnO epilayer, the ZnO polycrystalline film shows more intense ultraviolet emission (UVE) with a small full width at half maximum (FWHM) of 89 meV. It is suggested that the atomically flat epilayers may be powerfully used as transitive stratums to grow high-quality ZnO films suitable for the fabrication of optoelectronic devices.     

Abundant photoelectronic behaviors of La_(0.67)Sr_(0.33)MnO_3/Nb:SrTiO_3 junctions

Temperature dependence on rectifying and photoelectronic properties of La_(0.67)Sr_(0.33)MnO_3/Nb:SrTiO_3(LSMO/STON) junctions with the thickness values of LSMO film varying from 1 nm to 54 nm are systematically studied. As shown experimentally, the junctions exhibit good rectifying properties. The significant differences in photoemission property among the LSMO/STON junctions are observed. For the junction in a thicker LSMO film, the photocurrent shows a monotonic growth when temperature decreases from 300 K to 13 K. While for the junction in an ultrathin LSMO film, the behaviors of photocurrent are more complicated. The photocurrent increases rapidly to a maximum and then smoothly decreases with the decrease of temperature. The unusual phenomenon can be elucidated by the diffusion and recombination model of the photocarrier.     

Effects of growing conditions on the electric and magnetic properties of strained La2/3Sr1/3MnO3 thin films

We investigate the growing condition dependences of magnetic and electric properties of the La_2/3Sr_1/3MnO₃ thin films grown on SrTiO₃（001） substrates.With reducing the film thickness and growth pressure,the Curie temperature（T_c）drops off,and the magnetism and metallicity are suppressed.At an appropriate deposition temperature,we can obtain the best texture and remarkably enhance the magnetic and electrical properties.However,the resistivity of film cannot be modulated by changing the dc current and green light intensity.This result may be induced by the coherent strains in the epitaxially grown film due to its lattice mismatching that of the SrTiO₃ substrate.Furthermore,we show that the relations between the magnetism and the resistivity for the typical films with different thickness values.For the 13.4-nm-thick film,the R-T curve presents two transition behaviors:insulator-to-metal and metal-to-insulator in the cooling process:the former corresponds to magnetic transition,and the later correlates with thermal excitation conduction.     

籽晶层对喷雾热分解法生长ZnO薄膜结晶质量和光电性能的影响

通过脉冲激光沉积(PLD)方法在Si(100)衬底上沉积一层高质量的ZnO籽晶层,在籽晶层上进一步采用超声喷雾热分解(USP)法生长ZnO薄膜,研究了籽晶层对ZnO薄膜结晶质量和ZnO/Si异质结光电特性的影响。研究结果表明,在籽晶层的诱导作用下,USP法生长ZnO薄膜由多取向结构变为(002)单一取向,结晶性能得到了显著改善;籽晶层上生长的薄膜呈现出垂直于衬底生长的柱状晶结构,微观结构更加致密。通过研究紫外光照前后ZnO/Si异质结的整流特性,发现引入籽晶层后,反向偏压下异质结的光电响应显著增加,并且在开路状态下出现明显的光伏效应。     

The interface of laser-deposited Fe/Ag multilayers: evidence for the "subsurface growth mode" during pulsed-laser deposition and examination of the bcc-fcc transformation

One of the most significant features of pulsed-laser deposition (PLD) in vacuum as compared to conventional deposition methods is that a significant number of ions are deposited with a high kinetic energy of about 100 eV. Using Fe/Ag multilayers, we show that the deposition of energetic particles during PLD leads to implantation into the existing film. The film growth can be described by a growth mode in which the material does not grow on top, but rather within the topmost few monolayers of the already deposited film. To examine this "subsurface growth", in situ resistance measurements and electron diffraction experiments were performed. Resistance measurements show a drop in conductance after beginning a new Fe layer, an effect attributed to implantation and alloying at the interface. Electron diffraction experiments allow the observation of the structural change from fcc-Ag to bcc-Fe and vice versa. These experiments are interpreted by the use of a Bain transformation to describe a homogeneous transformation between the two structures.