Correlation of plasma electron temperature with neutron emission ina low-energy plasma focus

Correlation of neutron emission with plasma electron temperature in a low-energy (2.3 kJ) plasma focus is investigated. To determine the plasma temperature by continuum X-ray analysis, cobalt is selected as the filter, which discriminates the line radiation from the background impurities like carbon, nitrogen, and oxygen, or the copper of which plasma focus electrodes are made. For a pressure range of high neutron emission (1-4 mbar), the neutron yield is found to correlate with the plasma temperature. The highest temperature recorded is 5 keV at 2.5 mbar, the filling pressure for the highest neutron emission in this device     

Study of X-ray emission of dense plasma focus device in the presence of external magnetic field

The X-ray emission from a 3.3 kJ dense plasma focus device filled with argon in the presence of an external axial magnetic field has been quantitatively measured for the first time with the help of a diode X-ray spectrometer. The X-ray energy and electron temperature estimated from signals are found to be lower with application of the external axial magnetic field. The variation of the electron temperature with pressure shows a maximum at 80 Pa and a decrease both with increase or decrease of the filling gas pressure.     

Influence of electrode and insulator materials on the neutronemission in a low energy plasma focus device

Insertion of internal impurities is one of the factors for the degradation of neutron output in plasma focus devices. In this context, neutron emission measurements were carried out in a 2.2 kJ (7.2 μF, 25 kV) Mather type squirrel cage plasma focus device with various combinations of electrode and insulator materials. The neutron yield was measured by silver activation detector. The results indicate that a central electrode of low erosion rate material produces maximum neutron yield with the highest anisotropy factor. A time integrated X-ray pinhole image shows that focus corresponding to the highest neutron yield material is the most compressed. The dielectric constant of the ceramic insulators has, at best, a very weak correlation with neutron output. The nonceramic insulators like perspex, nylon, or teflon neither produce focus nor neutrons     

Multi-spike structure of ion pulses generated by plasma focus discharges

Space- and time-resolved studies of high-energy (> 50 keV) deuteron beams emitted from 3 different Mather-type plasma focus facilities of energy capacity ranging from about 10 kJ to above 200 kJ are presented. In deuteron beams space-resolved with a pinhole camera a spike structure is observed. In quasi-monoenergetic, e.g. 305±20 keV deuterons chosen from a Thomson-spectrograph image there appear up to 3 separate pulses of 8–10 ns FWHM, separated by 30–40 ns intervals. Some pulses demonstrate a fine spike structure with FWHM < 2 ns.     

Variation of soft X-ray emission with gas pressure in a plasmafocus

The variation of the soft X-ray emission in a low energy (3 kJ, 15 kV) plasma focus over a range of pressures is investigated. The working gases are argon and an argon-hydrogen mixture. The X rays are detected using an assembly of PIN-Si diodes with differential filtering and with a multipinhole camera, soft X rays originating from the plasma and from electron beam activity on the copper anode are observed. In general, three pressure regimes can be discerned. In the first regime, both the plasma X rays and the copper line radiation are weak. In the second regime, the X-ray emission is intense and the contribution from copper lines is strong. In the third pressure regime, the plasma X rays are intense while contribution from the copper X-rays are weak     

Plasma focus based flash hard X-ray source in the 100 keV region with reproducible spectrum

A pulsed hard X-ray source with shot to shot reproducible spectrum, based on a 4.7 kJ small-chamber Mather-type plasma focus device, is presented. The hard X-ray output spectrum was measured in a single shot basis by differential absorption on metallic plates. The measured spectra have a single dominant peak around 75 keV and a spectral bandwidth covering the 40-150 keV range. A hard X-ray dose of (53±3) μGy per shot was measured on axis at 53 cm from the source, and found to be uniform within a half aperture angle of 6°.     

Synthesis of TiN/a-Si3N4 thin film by using a Mather type dense plasma focus system

A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness (root-mean-square).     

Nano-structured Fe thin film deposition using plasma focus device

This paper reports the deposition of nano-structured Fe thin films using 3.3 kJ Mather-type plasma focus. The conventional hollow copper anode was replaced by anode fitted with solid Fe top and the deposition was done using different numbers of deposition shots at two different angular positions. Scanning Electron Microscopy shows that the size of nano-phase agglomerate is smaller when the sample is deposited using either lesser number of deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction shows that crystal structure characteristics change with increase in number of deposition shots. Measurements of magnetic properties using Vibrating Sample Magnetometer identify intermediate magnetization and coercivity in Fe thin films deposited at smaller angular position with respect to anode axis. It is concluded that the morphological, structural and magnetic characteristics of Fe thin films deposited using plasma focus device depend not only on the number of focus deposition shots but also on the angular position of the sample.     

Relativistic electron beams detection in a dense plasma focus

Fast electron beams into a hollow anode of a small plasma focus machine (2 kJ, 4 μF) were measured. The diagnostic method designed for this purpose is founded in a small Rogowski coil introduced into a cavity performed in the anode. By means of this, electron beam pulses of about 10 ns width generated in the plasma focus are detected. Simultaneously, hard X-ray signals obtained from a scintillator-photomultiplier system are registered. The electron beam energy was measured through the time-of-flight of the electrons between probe and anode top. The beams are found to be relativistic and its energy is into the range of hard X-rays energy. An analysis of signal intensities and relative delays for three hundred shots are here presented. Received 28 February 2002 / Received in final form 7 May 2002 Published online 24 September 2002     

Experimental study of soft X-ray intensity with different anode tips in Amirkabir plasma focus device

To study the effect of different anode tip geometries on the intensity of soft X-rays emitted from a 4 kJ plasma focus device (PFD), we considered five different anode tips which were cylindrical-flat, cylindrical-hollow, spherical-convex, cone-flat and cone-hollow tips. BPX-65 PIN diodes covered by four different filters are used to register the intensity of soft X-rays. The use of cone-flat anode tip has augmented the emitted X-ray three times compared to the conventional cylindrical-flat anode.     

Enhancement of X-ray emission in the side on direction in a Mather-type plasma focus

A 1.8 kJ Mather-type plasma focus (PF) for argon and hydrogen filling is examined. Two anode configurations are used. One is tapered towards the anode face, and the other is cylindrical but the face is cut at different angles. At optimum conditions, the system is found to emit Cu–Kα X-rays of about 1.6±0.1 J/sr in the side-on direction for argon filling, which is about 32% of the total X-ray emission. In 4π-geometry, maximum total X-ray yield and wall plug efficiency found are 26.4±1.3 J and 1.5± 0.1% respectively. The modified geometry may help to use the PF as a radiation source for X-ray diffraction.     

Experimental investigations of hotspots in a low energy plasmafocus operating in hydrogen-argon mixtures

We present experimental results on the investigation of hotspot formation in PFP-I, a small 3.8 kJ plasma focus device operating in hydrogen-argon mixtures, at pressures from below 0.2 torr upward. A combination of multipinhole and slit-wire X-ray photography is used to measure the characteristic size and temperature of the hotspots, over a range of pressure and gas mixing ratios. Filtered p-i-n diodes and a beam-target detector are used to investigate the time evolution of the hotspots. Typical size for the hottest emitting region, at temperatures between 200 and 400 eV, is found to be around 150 μm, with a typical duration of the high temperature phase of the order of 10 ns. In general, the temperature in the final phase of the time evolution of the hotspots reaches values which are nearly twice those of the plasma column where they are formed. Characteristic size of the hotspots is about half of that of the initial plasma column     

Scattered ionizing radiations from low-energy focus plasma and radiation dosimetery assessment

Scattered ionizing radiation emissions from a low-energy plasma focus (0.1 kJ Mather-type) device operating with different gases were studied. The plasma focus device was powered by a capacitor bank of 1 μF at 18 kV maximum charging voltage. The radiation emissions were investigated using time-integrated thermoluminescence TLD-500. These detectors were calibrated against standard X-ray machine as well as standard γ sources (⁶⁰Co and ¹³⁷Ca). Calibration of detectors showed linear relation over all the region of measurements. It was found that radiation levels would be minimum for different gases, when the gas pressure was between 0.5 and 0.8 Torr. Only helium deviated from this phenomenon as it gave maximum radiation level at 0.8 Torr pressure. It was also found that, for all the gases used, the radiation levels were maximum when the applied voltage was 15 keV.     

Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus

Pulsed laser deposition synthesized ZnO thin films, grown at 400 °C substrate temperature in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions obtained from 2.94 kJ dense plasma focus to achieve the nitrogen doping in ZnO. Structural, compositional and optical properties of as-deposited and nitrogen ion irradiated ZnO thin films were investigated to confirm the successful doping of nitrogen in irradiated samples. Spectral changes have been seen in the nitrogen irradiated ZnO thin film samples from the low temperature PL measurements. Free electron to acceptor emissions can be observed from the irradiated samples, which hints towards the successful nitrogen doping in films. Compositional analysis by X-ray photoelectron spectroscopy and corresponding shifts in binding energy core peaks of oxygen and nitrogen confirmed the successful use of plasma focus device as a novel source for nitrogen ion doping in ZnO thin films.     

Synthesis of nano-structure tungsten nitride thin films on silicon using Mather-type plasma focus

Nano-structure thin film of tungsten nitride was deposited onto Si-substrate at room temperature using Mather-type plasma focus (3.3?kJ) machine. Substrate was exposed against 10, 20, 30, and 40 deposition shots and its corresponding effect on structure, morphology, conductivity and nano-hardness has been systematically studied. The X-ray diffractormeter spectra of the exposed samples show the presence of various phases of WN and WN₂ that depends on number of deposition shots. Surface morphological study revealed the uniform distribution of nano-sized grains on deposited film surface. Hardness and conductivity of exposed substrate improved with higher deposition shots. X-ray photo-electron spectroscopy survey scan of 40 deposition shots confirmed the elemental presence of W and N on Si-substrate.     

Interferometric Method for Electronic Density Measurement in a Plasma Focus Device

A Mach-Zehnder interferometer with pulsed nitrogen laser used for electronic density studies in the plasma focus device is described. The light pulse duration of 2 ns enables interferometric measurements to be made at any instant during the plasma evolution in a 20 kJ (20 kV) device. A numerical method for interferogram processing and computation of the electronic density is presented. Some preliminary plasma studies are discussed.     

The effect of TiN nanoparticles deposition with different number of shots on SS316L by plasma focus device

In this paper, we present the result of TiN nanocrystalline deposition on SS316L, using a 4 kJ plasma focus (PF) device for 10, 20, and 30 focus shots. The effect of different number of focus shots on micro-structural changes of thin film is characterized by field emission scanning electron microscope. Existence of grains in different size confirms the formation of TiN nanocrystals on the surface of SS316L substrate. X-ray diffraction (XRD) reveals the formation of a nanocrystalline titanium nitride coating on the surface of SS316L samples. The crystalline size of TiN obtained from XRD data is strongly dependent on the number of focus shots. Thickness of the elements found on the surface of the treated sample that obtain by Rutherford backscattering spectroscopy (RBS) analysis is in the range of 150×10¹⁵?200×10¹⁵ atoms/cm². All the existence elements in the coated samples are identified by Particle Induced X-ray Emission (PIXE) spectra. Investigation on the corrosion resistance of TiN coatings was performed using an electrochemical potentiodynamic polarization. Our results suggest that TiN nanocrystalline implantation with proper ion fluences using PF can significantly improve the corrosion resistance of SS316L.     

Soft X-ray yield measurement in a small plasma focus operated inneon

The United Nations University/International Center for Theoretical Physics Plasma Focus Facility (UNU/ICTP PFF), a small plasma focus, has proven very useful as a training device for research initiation and as a test bed for applications. In this work, its performance in terms of a soft X-ray (SXR) source is examined. The total SXR yield when operated in neon is measured using low-cost detectors, including a calorimeter and a five-channel filtered PIN system. For a charging voltage of 14 kV with 2.9 kJ stored energy, the optimum operating pressure in neon is found to be in the range of 2.7-3.3 torr, resulting in a total SXR yield of 6J/shot into 4π steradians measured by the calorimeter in agreement with the PIN detectors. Spectral data shows that 64% of the total SXR yield is contributed by the Ly-α and He-α lines and 36% by the rest, mainly the radiative recombination. The low total SXR yield (0.2 % of stored energy) is consistent with numerical computations of focus dynamics, which reveals that 3% of stored energy is converted into plasma energy. This low conversion rate into plasma energy is due to the large inductance of 110 nH of this simple single-capacitor device. Thus, for development as a SXR source, reduction of inductance is necessary     

TiAlN coatings synthesised using a dense plasma focus system and varied focus shots

TiAlN coatings were synthesised by a 2.3 kJ pulsed plasma focus system. The effect of focus shots on crystallography, microstructure, surface morphology, roughness and hardness was investigated. The coating's crystallography and microstructure were investigated using X-ray diffraction (XRD) characterisation. The XRD data showed that TiAlN coatings were crystallised in the cubic NaCl B1 structure with orientations in the (111), (200), (220) and (311) crystallographic planes. Texture coefficients showed a competition between (111) and (200) planes. The coatings surface morphology and thickness analyses were carried out using scanning electron microscopy (SEM). SEM micrographs showed dense and uniformly spread film with fine-grained morphology with hardly any pit, hole and crater. The surface roughness and hardness of TiAlN coatings were investigated by atomic force microscopy and Vickers microhardness tester. Grain size and roughness were found to decrease, whereas thickness and hardness were found to increase, with increasing focus shots.     

神光Ⅲ激光装置直接驱动内爆靶产生的连续谱X光源

激光驱动的内爆靶通过轫致辐射过程可以产生覆盖1—100 keV能区的小尺寸、短脉冲和高亮度的光滑连续谱X光源,可用于高密度等离子体的点投影照相和吸收谱诊断等.本文对30—180 k J输出能量的神光Ⅲ激光装置直接驱动氘氚冷冻靶产生的连续谱X光源辐射特性进行了模拟研究,为优化内爆光源提供物理基础.采用了美国OMEGA激光装置和美国国家点火装置(NIF)使用的定标率来给出不同驱动能量时的靶参数和激光脉冲参数.研究发现,内爆靶丸在停滞阶段瞬时的密度和温度剧增可以产生尺寸约100μm、发光时间约150 ps的X光脉冲;X光辐射主要产生于被压缩的氘氚冰壳层内侧、而不是中心的高温气体热斑区;等离子体的自吸收可以显著降低1—3 keV的较低能区的X光发射,但对更高能区没有影响;X光辐射主要集中在30 keV的较低能区,氘氚聚变反应可以增强30 keV的硬X光辐射、但对30 keV的较软的X光辐射没有明显贡献.