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1.
Thin films can be formed in low-temperature plasma in two ways: as a result of material modification usually in a discharge
of non-organic gas and in the course of a deposition process in a discharge of organic vapour. Thin-film formation requires
in situ control of plasma processing in order to get information on the growth mechanisms and control the deposition process.
Here are shown some effective in situ techniques of thin-film characterisation: various kinds of infrared spectroscopy (infrared
reflection absorption spectroscopy, attenuated total reflection spectroscopy, etc.), ellipsometry and microgravimetry. We
discuss the application of these methods to polymer modification as well as plasma polymerisation. The applied techniques
give very good spatial resolution, up to a few nm. The limitations of method or equipment on time resolution can be compensated
by the appropriate experimental arrangement.
Received: 4 October 2000 / Accepted: 12 December 2000 / Published online: 3 April 2001 相似文献
2.
A. Lunk P. Bachem P. Scheible L. Ulrich 《Applied Physics A: Materials Science & Processing》2001,72(5):557-564
The development of in situ diagnostics of the most important species and reactions in the plasma and/or on the surface during
thin-film growth is one of the current topics in plasma-enhanced vapor deposition. In situ thin film diagnostic methods which
could be used in plasma processing are restricted due to the presence of electrons and ions. The advantages and disadvantages
of different applicable methods will be discussed. The spectroscopic in situ control of boron nitride film growth is presented
as an example of surface modification in low-temperature, low-pressure plasma processing. The growth of cubic and hexagonal
boron nitride is observed by polarized infrared reflection spectroscopy in absorption and ellipsometric configurations as
well as by single-wavelength ellipsometry in the visible spectral range. Modeling of the experimental results gives detailed
information on growth conditions and internal stress of the films.
Received: 8 August 2000 / Accepted: 12 December 2000 / Published online: 3 April 2001 相似文献
3.
Xuemei Wang 《Applied Surface Science》2006,252(23):8331-8336
An audio-frequency plasma polymerization set-up with a planar plasma source was used to deposit thin heptadecafluoro-1-decene (HDFD) plasma polymer films. The morphology and chemical structure of the films after deposition were compared with the state of the film after a subsequent Ar-plasma treatment by means of in situ Fourier transform infrared reflection absorbance spectroscopy (FT-IRRAS), X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and atomic force microscopy (AFM) as well as contact angle measurements. The results revealed the correlation of wettability of the model Teflon-like films with change of surface chemistry and surface topography as a result of Ar-plasma treatment. 相似文献
4.
A. C. Chinellato S. E. Vidotti M. B. Moraes 《Journal of Macromolecular Science: Physics》2013,52(6):1165-1177
The surface fluorination of polycarbonate bisphenol‐A thin films was carried out by treatment with plasma of sulfur hexafluoride/argon (SF6/Ar) using a radio frequency (RF) discharges. Effects of treatment time and SF6 concentration have been studied. Surface characterization was performed using X‐ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy with attenuated total reflectance (FT‐IR/ATR), atomic force microscopy (AFM) and contact angle measurements. The effects of the surface modification on the carbon dioxide (CO2) gas permeation of the fluorinated films were evaluated. The results showed effective fluorination of all samples, with C‐F, C‐F2 and even C‐F3 groups attached to the polycarbonate, depending on the treatment conditions. The presence of incorporated fluorine molecules absorbed into the polymer structure during treatment was also shown. The polymer films showed an increase of their surface roughness and a decrease in their surface tension due to the plasma treatment. Plasma fluorination also decreases polycarbonate CO2 permeability considerably. The films treated with the lower concentration of SF6 showed the highest barrier values; however, significant differences between the permeability values for the samples treated for different times were not observed. 相似文献
5.
S. Zanini M. Orlandi C. Colombo E. Grimoldi C. Riccardi 《The European Physical Journal D - Atomic, Molecular, Optical and Plasma Physics》2009,54(2):159-164
A detailed study of argon plasma-induced graft-polymerization of polyethylene glycol acrylate (PEGA) on polypropylene (PP)
substrates (membranes and films) is presented. The process consists of four steps: (a) plasma pre-activation of the PP substrates;
(b) immersion in a PEGA solution; (c) argon plasma-induced graft-polymerization; (d) washing and drying of the samples. Influence
of the solution and plasma parameters on the process efficiency evaluated in terms of amount of grafted polymer, coverage
uniformity and substrates wettability, are investigated. The plasma-induced graft-polymerization of PEGA is then followed
by sample weighting, water droplet adsorption time and contact angle measurements, attenuated total reflection infrared spectroscopy
(ATR-IR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) analyses. The stability of the obtained
thin films was evaluated in water and in phosphate buffer saline (PBS) at 37 °C. Results clearly indicates that plasma-induced
graft-polymerization of PEGA is a practical methodology for anti-fouling surface modification of materials. 相似文献
6.
Gallium nitride thin films were grown on silicon carbide (0001) by plasma‐assisted molecular beam epitaxy (PAMBE). The samples were cooled down in nitrogen plasma and characterized in situ by reflection high energy electron diffraction (RHEED), photoelectron spectroscopy (XPS/UPS), and atomic force microscopy (AFM) revealing stoichiometric and smooth GaN films virtually free of contaminations. We present valence band data obtained by UPS with strong emission from surface states inside the fundamental band gap. These states and the observed 2 × 2 surface reconstruction are highly sensitive towards residual molecules. Once these surface states have disappeared the original state could not be recovered by surface preparation methods underlining the necessity of in situ investigations on as‐grown surfaces. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
7.
Surface properties of metals and plastic substrates and properties of plasma polymerized films on these substrates are reported. The surface and film properties were measured with ellipsometry, surface potential difference, photoelectron-emission and fluid contact angles. Light scattering, profilometry and scanning electron microscopy were used to characterize surface roughness and topography. The modification of the adhesive properties of low energy surfaces (such as Teflon) by plasma polymerization is shown. Adhesive properties of plasma films on metals is also shown. It is shown that photoelectron-emission may be a valuable tool for detecting the presence and decay of excited molecules and radicals formed during plasma polymerization. 相似文献
8.
L.J. Anderson 《Applied Surface Science》2010,256(10):3293-3298
Thin films derived from linalyl acetate were fabricated using the Radio Frequency (RF) plasma polymerisation technique between RF power levels of 10 and 75 W. The optical properties of the films were investigated using spectroscopic ellipsometry and UV-vis spectroscopy between 200 and 1000 nm. An optical band gap of approximately 3 eV for all power levels was determined from Tauc plots. The surface morphology and hardness of the material were studied using AFM and nano-indentation respectively to determine the effect of RF power on the thin film properties. Smooth surfaces with an average roughness of approximately 0.2 nm with consistent morphology were obtained across all power levels, while hardness demonstrated a linearly increasing dependence on RF deposition power, with values ranging between 0.29 and 0.44 GPa. These studies indicate the ability to tailor film characteristics by varying the RF deposition power, and the potential for the films to be used within electronic devices as encapsulation layers, insulating layers, or as semiconducting layers with the introduction of charge carriers to the chemical structure of the material. 相似文献
9.
Microcrystalline silicon (μc-Si:H) thin films with and without boron doping are deposited using the radio-frequency plasma-enhanced chemical vapour deposition method. The surface roughness evolutions of the silicon thin films are investigated using ex situ spectroscopic ellipsometry and an atomic force microscope. It is shown that the growth exponent β and the roughness exponent α are about 0.369 and 0.95 for the undoped thin film, respectively. Whereas, for the boron-doped μc-Si:H thin film, β increases to 0.534 and α decreases to 0.46 due to the shadowing effect. 相似文献
10.
The new method of immersion transmission ellipsometry (ITE) [1] has been developed. It allows the highly accurate determination of the absolute three-dimensional (3D) refractive indices of anisotropic thin films. The method is combined with conventional ellipsometry in transmission and reflection, and the thickness determination of anisotropic films solely by optical methods also becomes more accurate. The method is applied to the determination of the 3D refractive indices of thin spin-coated films of an azobenzene-containing liquid-crystalline copolymer. The development of the anisotropy in these films by photo-orientation and subsequent annealing is demonstrated. Depending on the annealing temperature, oblate or prolate orders are generated. PACS 07.60.Fs; 42.70.Gi; 78.66.Qn 相似文献
11.
A. Palla-Papavlu V. DincaV. Ion A. MoldovanB. Mitu C. LuculescuM. Dinescu 《Applied Surface Science》2011,257(12):5303-5307
The development of laser techniques for the deposition of polymer and biomaterial thin films on solid surfaces in a controlled manner has attracted great attention during the last few years. Here we report the deposition of thin polymer films, namely Polyepichlorhydrin by pulsed laser deposition. Polyepichlorhydrin polymer was deposited on flat substrate (i.e. silicon) using an NdYAG laser (266 nm, 5 ns pulse duration and 10 Hz repetition rate).The obtained thin films have been characterized by atomic force microscopy, scanning electron microscopy, Fourier transform infrared spectroscopy and spectroscopic ellipsometry.It was found that for laser fluences up to 1.5 J/cm2 the chemical structure of the deposited polyepichlorhydrin polymer thin layers resembles to the native polymer, whilst by increasing the laser fluence above 1.5 J/cm2 the polyepichlorohydrin films present deviations from the bulk polymer.Morphological investigations (atomic force microscopy and scanning electron microscopy) reveal continuous polyepichlorhydrin thin films for a relatively narrow range of fluences (1-1.5 J/cm2).The wavelength dependence of the refractive index and extinction coefficient was determined by ellipsometry studies which lead to new insights about the material.The obtained results indicate that pulsed laser deposition method is potentially useful for the fabrication of polymer thin films to be used in applications including electronics, microsensor or bioengineering industries. 相似文献
12.
Total internal reflection ellipsometry (TIRE) technique was used to investigate the role of surface roughness in the hybrid system composed of octadecanethiole layer on Au thin film. The samples with Au films of different microstructure were explored. The experimental results were interpreted in the model, which took into account the surface roughness of Au film in the hybrid system. It was shown that optical parameters of octadecanethiole were in correspondence for samples of different microstructure in the case of adequate models used for interpretation of TIRE data. 相似文献
13.
Polyamide 6 (PA 6) films are treated with helium(He)/CF4 plasma at atmospheric pressure. The samples are treated at different treatment times. The surface modification of the PA 6 films is evaluated by water contact angle, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The etching rate is used to study the etching effect of He/CF4 plasma on the PA 6 films. The T-peel strengths of the control and plasma treated films are measured to show the surface adhesion properties of the films. As the treatment time increases, the etching rate decreases steadily, the contact angle decreases initially and then increases, while the T-peel strength increases first and then decreases. AFM analyses show that the surface roughness increases after the plasma treatment. XPS analyses reveal substantial incorporation of fluorine and/or oxygen atoms to the polymer chains on the film surfaces. 相似文献
14.
In the present study, we investigate the influence of low energy ion bombardment on nucleation and growth of thin silver films on silicon oxide by in situ photoelectron spectroscopy (PES) combined with specific resistivity measurements. Thermally grown thin silicon oxide films were exposed to a low temperature argon plasma for different time intervals resulting in changes in surface chemical composition as monitored by angle-resolved X-ray photoelectron spectroscopy (ARXPS). We demonstrate that irradiation of the oxide surface with low energy ions results in substantially changed nucleation of silver. Furthermore, silver films deposited on plasma treated oxide tend to have lower resistivity which is attributed to the effect of reduced grain boundary and surface roughness. 相似文献
15.
16.
The application of ellipsometry to the study of corrosion is reviewed. It is concluded that the influences of surface roughness and film inhomogeneity are complicating factors in the interpretation of observations and that their effects are still insufficiently understood. Nevertheless, as a complementary tool to other methods of surface examination, ellipsometry is unique in its ability to detect and measure the formation and growth of surface films, continuously in situ; this can be done in either gaseous or liquid environments. Determination of the optical properties of thin films, and more especially spectral absorption characteristics, is potentially the basis for a valuable method of assessing averaged deviations from non stoichiometric composition of surface films. 相似文献
17.
T. Kohoutek J. Orava T. Wagner M. Frumar 《Journal of Physics and Chemistry of Solids》2007,68(12):2376-2380
Planar quarter wave stacks based on amorphous chalcogenide Ge-Se alternating with polymer polystyrene (PS) thin films are reported as Bragg reflectors for near-infrared region. Chalcogenide films were prepared using a thermal evaporation (TE) while polymer films were deposited using a spin-coating technique. The film thicknesses, d∼165 nm for Ge25Se75 (n=2.35) and d∼250 nm for polymer film (n=1.53), were calculated to center the reflection band round 1550 nm, whose wavelengths are used in telecommunication. Optical properties of prepared multilayer stacks were determined in the range 400-2200 nm using spectral ellipsometry, optical transmission and reflection measurements. Total reflection for normal incidence of unpolarized light was observed from 1530 to 1740 nm for 8 Ge-Se+7 PS thin film stacks prepared on silicon wafer. In addition to total reflection of light with normal incidence, the omnidirectional total reflection of TE-polarized light from 8 Ge-Se+7 PS thin film stacks was observed. Reflection band maxima shifted with varying incident angles, i.e., 1420-1680 nm for 45° deflection from the normal and 1300-1630 nm for 70° deflection from the normal. 相似文献
18.
Total internal reflection ellipsometry (TIRE) is used to study adsorption of human serum albumin and fibrinogen on thin gold films. TIRE shows very high sensitivity for protein monolayers adsorbed on metal surfaces when surface plasmon resonance effects are utilized. The measured data, expressed in ellipsometric angles psi and D are of several orders of magnitude larger in comparison with those from similar experiments performed with traditional ellipsometry. TIRE in spectral mode opens a new path for precise studies of organic layers adsorbed on metal surfaces, with a potential for resolving the adsorbed layer microstructure. 相似文献
19.
《Current Applied Physics》2010,10(2):428-435
Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxycarbide thin films obtained from the gas mixture of TMOS (tetramethoxysilane), N2, and NH3 is studied. The effects of the TMOS to N2 pressure ratio on the properties of the film and the plasma are investigated. The deposited films are analyzed by in situ ellipsometry, ex situ Fourier transform infrared spectroscopy (FTIR), and by X-ray photoelectron spectroscopy (XPS). The plasma is characterized by using optical emission spectroscopy (OES). The mass spectra of the constituents in the plasma are obtained by quadrupole mass spectroscopy. The correlation between the film properties and the plasma characteristics is explained wherever possible. As the partial pressure of N2 is decreased, the refractive index begins to decrease, reaches a minimum, and then saturates. The FTIR absorption bands are observed from about 850 to 1000 cm−1 and from 1000 to 1250 cm−1, and can be attributed to the formation of a nitrogen-incorporated silicon oxycarbide thin film. The variation of the refractive index is discussed in relationship with the deposition rate, the OES spectra, the mass spectra of the plasma, the film composition obtained by XPS, and FTIR spectra. 相似文献
20.
Polyimide thin films, which possess good stability and film uniformity, are successfully fabricated on single crystal silicon wafers coated with a thin polymer brush by suface-initiated polymerization (SIP) as an adhesive layer. The growth kinetic of polyglycidyl methacrylate (PGMA) brush was studied by the means of ellipsometry. The nano-scale morphology and chemical composition of PGMA brush and polyimide film were studied with atomic force microscopy (AFM), Fourier transform infrared spectrum (FT-IR), and X-ray photoelectron spectroscopy (XPS). The tribological behaviors of the thin films sliding against AISI-52100 steel ball were examined on a static-dynamic friction precision measurement apparatus and UMT-2MT tribometer. The worn surface of the polyimide thin films was investigated with scanning electron microscopy (SEM). The results indicated that the chemically bonded polyimide films exhibited better friction reduction and antiwear behavior compared to the polymide films on bare silicon surface. At a load of 0.5 N and sliding speed of 20 mm s−1, the durability life of the polyimide thin films is over 25,000 sliding cycles and the friction coefficient is about 0.08. 相似文献