调制掺杂的应变In0.60Ga0.40As/In0.52Al0.48As多量子阱结构的光致发光谱研究

报道了调制掺杂的应变In_0.60Ga_0.40As/In_0.52Al_0.48As多量子阱中室温光致发光光谱.观察到n=1和2电子子带到n=1重空穴子带的强发光峰.在低温下可以观察到n=1电子子带到n=1轻空穴弱发光肩胛.通过对发光强度随激发功率及温度依赖关系以及理论模型的分析研究,认为该调制掺杂量子阱中辐射复合效率降低的主要机制是应变失配位错对载流子的陷阱作用.界面上的失配位错是陷阱的主要来源.并用静态的光致发光理论模型 关键词：     

Magnetooptical investigations of single self assembled In0.3Ga0.7As quantum dots

We present results from magnetooptical investigations of large elongated single self assembled In_0.3Ga_0.7As quantum dots with a low surface density of . Compared to conventional In_0.6Ga_0.4As quantum dots the dimension of the investigated dots is enlarged by nearly one order of magnitude using a low strain In_0.3Ga_0.7As nucleation layer. In addition, the exciton exhibits a smaller g-factor of 0–0.4 and a larger diamagnetic coefficient of 20– in Faraday geometry, reflecting the increased extension of the exciton wavefunction, with respect to In_0.6Ga_0.4As quantum dots. From power dependent investigations we observe biexciton binding energies ranging from 1.7 to 1.9 meV. Excited state emission appears typically 2–5 meV above the ground state which is consistent with the increased dimensions of the structure. Furthermore we find linear polarization degrees of up to 0.6 from exciton emission of the elongated quantum dot structure.     

Electromodulation spectroscopy of In0.53Ga0.47As/In0.53Ga0.23Al0.24As quantum wells

In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As quantum wells (QWs) of various widths have been grown by molecular beam epitaxy on the InP substrate and investigated by electromodulation spectroscopy, i.e. photoreflectance (PR) and contactless electroreflectance (CER). The optical transitions related to the QW barrier and the QW ground and excited states have been clearly observed in PR and CER spectra. The experimental QW transition energies have been compared with theoretical predictions based on an effective mass formalism model. A good agreement between experimental data and theoretical calculations has been observed when the conduction band offset for the In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As interface equals 60%. In addition, it has been concluded that the conduction band offset for the In_0.53Ga_0.23Al_0.24As/InP interface is close to zero. The obtained results show that InGa(Al)As alloys are very promising materials in the band gap engineering for structures grown on InP substrate.     

In0.53Ga0.47As/In0.52Al0.48As量子阱中的正磁电阻效应

在低温强磁场条件下,对In_0.53Ga_0.47As/In_0.52Al_0.48As量子阱中的二维电子气进行了磁输运测试.在低磁场范围内观察到正磁电阻效应,在高磁场下这一正磁电阻趋于饱和,分析表明这一现象与二维电子气中的电子占据两个子带有关.在考虑了两个子带之间的散射效应后,通过分析低磁场下的正磁电阻,得到了每个子带电子的迁移率,结果表明第二子带电子的迁移率高于第一子带电子的迁移率.进一步分析表明,这主要是由两个子带之间的 关键词： 二维电子气 正磁电阻 子带散射     

应力导致InAs/In0.15Ga0.85As量子点结构中In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术，在In_0.15Ga_0.85As/GaAs量子阱生长了两个InAs/In_0.15Ga_0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In_0.15Ga_0.85As阱层的厚度和生长温度，获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果，发现该样品量子点的光学性质也同时得到 关键词： 合金分解效应 0.15Ga_0.85As量子点')" href="#">InAs/In_0.15Ga_0.85As量子点 光致发光光谱 压电调制光谱     

Spatial variation of bandgap energy in In0.53Ga0.47As

We report the observation of spatial variation of the bandgap energy of In_0.53Ga_0.47As in high quality epitaxial samples grown lattice matched to InP. Nine samples grown by three different techniques (LPE, VPE and MBE) were investigated and they all showed this apparently random spatial variation. A bandgap variation as large as 15 meV was observed over distances of the order of 1 mm, an effect corresponding to two percent of bandgap energy.     

Band offsets in In0.15Ga0.85As/ GaAs and In0.15Ga0.85As/Al0.15Ga0.85As studied by photoluminescence and cathodoluminescence

Photoluminescence and cathodoluminescence measurements of strained undoped In_0.15Ga_0.85As/GaAs and In_0.15Ga_0.85As/Al_0.15Ga_0.85As quantum well structures with emission lines attributed to the first electron–first heavy hole and first electron–first light hole excitonic transitions have been analysed theoretically within the eight-band effective mass approximation. For In_0.15Ga_0.85As/GaAs the results are consistent with either type I or type II alignment of the light hole band. In the case of In_0.15Ga_0.85As/Al_0.15Ga_0.85As our results indicate type II alignment for the light hole band and offset ratio ofQ = 0.83.     

Optical spectra in the region of exciton resonances in quantum wells and quantum dots of In0.3Ga0.7As/GaAs heterostructures

The transparency, reflection and luminescence spectra of In_0.3Ga_0.7As structures with 8 nm thickness and quantum wells limited by the barrier layer GaAs of a 9 nm (upper layer) and 100 nm (bottom layer) thickness had been studied in the region of photon energy 0.5–1.6 eV. Lines associated with the transitions hh,lh1-e1(1s,2s,3s), hh2,lh2-e2(1s,2s,3s), hh1,lh1-e2(1s) and hh3,lh3-e3(1s) had been revealed in reflection spectra. The shapes of the reflection and transparency lines had been calculated using a single oscillator model of dispersion relations and the Kramers–Kronig integrals. The binding energy of hh,lh1-e1 excitons, the effective mass m_hh^∗ and m_lh^∗ and the damping factor for the optical transitions to QW and QD had been determined. The lifetime of charge carriers on quantum dots varies in the range of 0.04–0.1 ps, while the radiative lifetime of excitons in quantum wells in the considered structure is around 2 ps.     

Exciton luminescence in In0.3Ga0.7As/GaAs quantum well heterostructures

Emission maxima related to the recombination of excitons (e1–hh1, e1–lh1, e2–hh2, and e2–lh2) were observed in photoluminescence spectra of GaAs/In_0.3Ga_0.7As/GaAs quantum wells. The emission bands due to e1–hh1 and e1–lh1 transitions were found to have a doublet character explained by the exchange interaction of excitons in quantum wells. Emission bands due to radiative E^b–hh1, E^b–lh1 transitions in the buffer GaAs layer are observed in the region of 1.5 eV.     

Structural and optical properties of In0.5Ga0.5As/GaAs quantum dots in an In0.1Ga0.9As well using repeated depositions of InAs/GaAs short-period superlattices for the application of optical communication

We report structural and optical properties of In_0.5Ga_0.5As/GaAs quantum dots (QDs) in a 100 Å-thick In_0.1Ga_0.9As well grown by repeated depositions of InAs/GaAs short-period superlattices with atomic force microscope, transmission electron microscope (TEM) and photoluminescence (PL) measurement. The QDs in an InGaAs well grown at 510 °C were studied as a function of n repeated deposition of 1 monolayer thick InAs and 1 monolayer thick GaAs for n=5–10. The heights, widths and densities of dots are in the range of 6–22.0 nm, 40–85 nm, and 1.6–1.1×10¹⁰/cm², respectively, as n changes from 5 to 10 with strong alignment along [1 −1 0] direction. Flat and pan-cake-like shape of the QDs in a well is found in TEM images. The bottoms of the QDs are located lower than the center of the InGaAs well. This reveals that there was intermixing—interdiffusion—of group III materials between the InGaAs QD and the InGaAs well during growth. All reported dots show strong 300 K-PL spectrum, and 1.276 μm (FWHM: 32.3 meV) of 300 K-PL peak was obtained in case of 7 periods of the QDs in a well, which is useful for the application to optical communications.     

Structural, optical and intraband absorption properties of vertically aligned In0.32Ga0.68As/GaAs quantum dots superlattices

The self-organization growth of In_0.32Ga_0.68As/GaAs quantum dots (QDs) superlattices is investigated by molecular beam epitaxy. It is found that high growth temperature and low growth rate are favorable for the formation of perfect vertically aligned QDs superlattices. The aspect ratio (height versus diameter) of QD increases from 0.16 to 0.23 with increase number of bi-layer. We propose that this shape change play a significant role to improve the uniformity of QDs superlattices. Features in the variable temperature photoluminescence characteristics indicate the high uniformity of the QDs. Strong infrared absorption in the 8–12 μm was observed. Our results suggest the promising applications of QDs in normal sensitive infrared photodetectors.     

In0.53Ga0.47As/In0.52Al0.48As量子阱中双子带占据的二维电子气的输运特性

研究了不同沟道厚度的In_0.53Ga_0.47As/In_0.52Al_0.48As量子阱中双子带占据的二维电子气的输运特性.在考虑了两个子带电子之间的磁致子带间散射效应后,通过分析Shubnikov-de Haas振荡一阶微分的快速傅里叶变换结果,获得了每个子带电子的浓度、输运散射时间、量子散射时间以及子带之间的散射时间.结果表明,对于所研究的样品,第一子带电子受到的小角散射更强,这与第一子带电子受到了更强的电离杂质散射有 关键词： 二维电子气 散射时间 自洽计算     

两个子带占据的In0.53Ga0.47As/In0.52Al0.48As量子阱中填充因子的变化规律

研究了低温(15K)和强磁场(0—13T)条件下, InP基In_053Ga_047As/In_052Al_048As量子阱中电子占据两个子带时填充因子随磁场的变化规律.结果表明,在电子自旋分裂能远小于朗道能级展宽的情况下,如果两个子带分裂能是朗道分裂能的整数倍时,即ΔE₂₁=kω_c(其中k为整数),填充因子为偶数;当两个子带分裂能为朗道分裂能的半奇数倍时,即ΔE₂₁=(2k+1)ω_c/2,填充因子出现奇数. 关键词： 053Ga_047As/In_052Al_048As量子阱')" href="#">In_053Ga_047As/In_052Al_048As量子阱 填充因子 磁输运     

Optical studies of In0.53Ga0.47As

We present luminescence data obtained as a function of temperature and excitation in In_0.53Ga_0.47As and In_0.7Ga_0.3As_0.63P_0.37. We assign the different lines and correlate the luminescence results with transmission measurements.     

Hot electron relaxation in In0.53Ga0.47As

We have determined the hot carrier energy loss rate to the lattice by measuring the cooling curve of a photoexcited hot plasma in In_0.53Ga_0.47As. These measurements were made by using a sensitive upconversion technique to measure the infrared (1.2−1.6 μm) luminescence with 10 ps time resolution. We find the carrier energy loss rate to be about an order of magnitude smaller than predicted by a simple model, and surprisingly insensitive to carrier density at high densities.     

Fine structure splitting and biexciton binding energy in single self-assembled InAs/AlAs quantum dots

We report on photoluminescence investigations of individual InAs quantum dots embedded in an AlAs matrix which emit in the visible region, in contrast to the more traditional InAs/GaAs system. Biexciton binding energies, considerably larger than for InAs/GaAs dots, up to 9 meV are observed. The biexciton binding energy decreases with decreasing dot size, reflecting a possible crossover to an antibinding regime. Exciton and biexciton emission consists of linearly cross polarized doublets due to a large fine structure splitting up to 0.3 meV of the bright exciton state. With increasing exciton transition energy the fine structure splitting decreases down to zero at about 1.63 eV. Differences with InAs/GaAs QDs may be attributed to major dot shape anisotropy and/or larger confinement due to higher AlAs barriers.     

对称GaAs/Al0.3Ga0.7As双量子阱中激子的束缚能

在有效质量近似下采用简单的尝试波函数变分地计算了对称GaAs/Al_0.3Ga_0.7As双量子阱中激子体系束缚能，研究了体系束缚能随阱宽和垒宽的变化情况. 发现双量子阱中激子体系束缚能随阱宽变化同单量子阱情况类似，但束缚能的峰值出现在阱宽为10?左右，峰值位置小于单阱的情况；束缚能随垒宽的增加有一极小值，这与波函数向垒中的渗透有关.     

Fine structure of highly charged excitons in semiconductor quantum dots

An exciton in a symmetric semiconductor quantum dot has two possible states, one dark and one bright, split in energy by the electron-hole exchange interaction. We demonstrate that for a doubly charged exciton, there are also two states split by the electron-hole exchange, but both states are now bright. We also uncover a fine structure in the emission from the triply charged exciton. By measuring these splittings, and also those from the singly charged and doubly charged biexcitons, all on the same quantum dot, we show how the various electron-hole exchange energies can be measured without having to break the symmetry of the dot.     

Electron g-factor in a gated InAs-inserted-channel In0.53Ga0.47As/In0.52Al0.48As heterostructure

We report on electron g-factor in an InAs-inserted In_0.53Ga_0.47As/In_0.52Al_0.48As heterostructure. The gate voltage dependence of g-factor is obtained from the coincidence method. The obtained g-factor values are surprisingly smaller than the g-factor value of bulk InAs, and it is close to the bare g-factor value of In_0.53Ga_0.47As. The large change in g-factor is observed by applying the gate voltage. The obtained gate voltage dependence is not simply explained by the energy dependence of g-factor.     

InAlAs浓度对In_(0.83)Al_(0.17)As/In_(0.83)Ga_(0.17)As红外探测器特性的影响北大核心CSCD

红外探测器的性能受内部结构各层掺杂浓度的影响,而倍增层掺杂浓度会明显改变器件的性能。为了降低暗电流,提高器件性能,采用三元化合物In_(0.83)Al_(0.17)As作为倍增层材料,借助仿真软件Silvaco详细研究了In_(0.83)Al_(0.17)As/In_(0.83)Ga_(0.17)As红外探测器的倍增层掺杂浓度对器件电场强度、电流特性和光响应度的影响规律。结果表明,随着倍增层掺杂浓度的增加,器件倍增层内的电场强度峰值增加,同时,器件的暗电流与光响应度减小。进一步研究发现,当倍增层掺杂浓度为2×10^(16) cm^(−3)时,器件获得最优性能,暗电流密度为0.62144 A/cm^(2),在波长为1.5μm时,光响应度和比探测率分别为0.9544 A/W和1.9475×10^(9) cmHz^(1/2)W^(−1)。