Preparation of undoped and indium doped ZnO thin films by pulsed laser deposition method

An original modification of the standard Pulse Laser Deposition (PLD) method for preparing both undoped and indium doped zinc oxide (ZnO:In) thin films at low substrate temperature is proposed. This preparation method does not demand any further post‐deposition annealing treatment of the grown films. The developed method allows to grow thin films at low substrate temperature that prevents them from the considerable loss of their intrinsic electrical and optical properties. The influence of deposition parameters on the electrical and optical parameters of the undoped and the indium doped ZnO thin films is also analysed. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical and structural properties of epitaxial GaN films grown by pulsed laser deposition

Epitaxial GaN films have been grown on c-cut sapphire substrates by pulsed laser deposition (PLD) using a KrF laser. The properties of GaN films were improved by increasing the growth temperature to 800°C and the nitrogen pressure during growth to 10 mTorr. Room-temperature photoluminescence exhibits a strong band-edge emission at 3.4 eV. From transmission electron microscopy (TEM), the predominant defects in PLD-GaN observed are stacking faults parallel to the interface and screw dislocations along c-axis, the latter differing from the previously published results where most of the threading dislocation in GaN grown by other techniques are of edge type with Burgers vector of .     

Structure and magnetism of ZnO/Co multilayers prepared by pulsed laser deposition

ZnO/Co multilayers were fabricated on silicate (100) substrate by a pulsed laser deposition method at room temperature. The x‐ray diffraction (XRD) results reveal that the as‐deposited multilayer film is composed of amorphous phase, which leads to high saturation magnetization and low coercivity. Higher coercivity is observed in the ZnO/Co films annealed at 390 °C due to the formation of crystalline metallic Co and semiconducting ZnO. But much higher annealing temperature leads to the oxidation of metallic Co and the reaction between Co and ZnO, which decreases the saturation magnetization and coercivity obviously.     

Properties of InAs co‐doped ZnO thin films prepared by pulsed laser deposition

InAs co‐doped ZnO films were grown on sapphire substrates by pulsed laser deposition. The grown films have been characterized using X‐ray diffraction (XRD), Hall effect measurements, Atomic force microscope (AFM) and Field emission scanning electron microscope (FESEM) in order to investigate the structural, electrical, morphological and elemental properties of the films respectively. XRD analysis showed that all the films were highly orientated along the c‐axis. It was observed from Hall effect measurements that InAs co‐doped ZnO films were of n‐type conductivity. In addition, the presence of In and As has been confirmed by Energy dispersive X‐ray analysis. AFM images revealed that the surface roughness of the films was decreased upon the co‐doping. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Pulsed laser deposition of pure fluoroapatite film without OH groups

The relation between O₂ pressure and composition in the pulsed‐laser deposition of fluoroapatite was investigated using both on‐axis and off‐axis methods to determine the optimal conditions for obtaining a pure fluoroapatite film without OH groups. Through this, it was found that an O₂ pressure of 10 Pa, combined with an off‐axis method, results in P/Ca and F/Ca values (0.6 and 0.2, respectively) that match closely with a stoichiometric composition of Ca₁₀(PO₄)₆F₂. Fourier transform infrared spectroscopy analysis confirmed that this optimized film was almost pure fluoroapatite, with no evidence of any OH groups originating from hydroxyapatite. X‐ray diffraction also revealed that this fluoroapatite film crystallizes with a c‐axis orientation perpendicular to its surface.     

Growth and optical absorption spectra of ZnO films grown by pulsed laser deposition

ZnO films on Al₂O₃ substrate were grown by using a pulsed laser deposition method. Through photoluminescence (PL) and X-ray diffraction (XRD) measurements, the optimum growth conditions for the ZnO growth were calculated. The results of the XRD measurement indicate that ZnO film was strongly oriented to the c-axis of hexagonal structure and epitaxially crystallized under constraints created by the substrate. The full-width half-maximum for a theta curve of the (0 0 0 2) peak was 0.201°. Also, from the PL measurement, the grown ZnO film was observed to be a free exciton, which indicates a high quality of epilayer. The Hall mobility and carrier density of the ZnO film at 293 K were estimated to be 299 cm²/V sec and , respectively. The absorption spectra revealed that the temperature dependence of the optical band gap on the ZnO films was − .     

Fabrication and characteristics of CeO2 films on Si(1 0 0) substrates by pulsed laser deposition

A detailed investigation about the dependence of film orientation on deposition temperature and ambient oxygen pressure has been carried out for CeO₂ films on Si(1 0 0) substrates using pulsed laser deposition. It has been found that the CeO₂ film orientation varies with increasing oxygen pressure at 750°C deposition temperature. In addition, the recovery of preferential orientation of CeO₂ films grown at 20 Pa ambient oxygen pressure with increasing deposition temperature has also been found for the first time. X-ray photoelectron spectroscopy (XPS) measurements confirm that stoichiometric CeO₂ films can be grown at lower oxygen pressure (5×10⁻³ Pa). HRTEM result also indicates that the CeO₂ films grown at low oxygen pressure are of high crystallinity.     

Growth of epitaxial TmFeCuO4 thin films by pulsed laser deposition

Epitaxial thin films of TmFeCuO₄ with a two-dimensional triangular lattice structure were successfully grown on yttria-stabilized-zirconia substrates by pulsed laser deposition and ex situ annealing in air. The films as-deposited below 500 °C showed no TmFeCuO₄ phase and the subsequent annealing resulted in the decomposition of film components. On the other hand, as-grown films deposited at 800 °C showed an amorphous nature. Thermal annealing converted the amorphous films into highly (0 0 1)-oriented epitaxial films. The results of scanning electron microscopic analysis suggest that the crystal growth process during thermal annealing is dominated by the regrowth of non-uniformly shaped islands to the distinct uniform islands of hexagonal base.     

The role of the pressure in pulsed laser deposition of bioactive glass films

Effects of the Ar pressure on the morphology, structure, bonding configuration and deposition rate of the bioglass thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and crystal lattice monitor. Ar pressure has an influence on the quantity and shapes of the particles generated in the PLD process. The target bonding configuration is not correctly transferred to the films. This effect is attributed to the network rearrangement during the film growth, which is associated to special structure of glass and complex physical mechanisms of PLD. Deposition rate decreases as the pressure increases following a linear dependence.     

Synchrotron X-ray diffraction studies of heteroepitaxial ZnO films grown by pulsed laser deposition

Heteroepitaxial ZnO films were grown by pulsed laser deposition on various substrates such as GaN-buffered C-Al₂O₃, C-Al₂O₃, A-Al₂O₃, and R-Al₂O₃. The epitaxy nature of the films was investigated mainly by synchrotron X-ray diffraction. The results showed that the GaN interlayer plays a positive role in growing an unstrained, well-aligned epitaxial ZnO film on the basal plane of Al₂O₃. Importantly, the ZnO film grown on R-Al₂O₃ has two differently aligned domains. The dominant (1 1 0) oriented domain has much better alignment in the in-plane direction than the minor portion of (0 0 1) oriented domain, while in the out-of-plane direction the two domains have almost the same mosaic distribution.     

Rotary target method to prepare thin films of CdS/SiO2 by pulsed laser deposition

Thin films of CdS-doped SiO₂ glass were prepared by using the conventional pulsed laser deposition (PLD) technique. The laser target consisted of a specially constructed rotary wheel which provided easy control of the exposure-area ratio to expose alternately the two materials to the laser beam. The physical target assembly avoided the potential complications inherent in chemically mixed targets such as in the sol–gel method. Time-of-flight (TOF) spectra confirmed the existence of the SiO₂ and CdS components in the thin-film samples so produced. X-ray diffraction (XRD) and atomic force microscopy(AFM) results showed the different sizes and structures of the as-deposited and annealed films. The wurtzite phase of CdS was found in the 600^oC-annealed sample, while the as-deposited film showed a cubic–hexagonal mixed structure. In the corresponding PL (photoluminescence) spectra, a red shift of the CdS band edge emission was found, which may be a result of the interaction between the CdS nanocrystallite and SiO₂ at their interface.     

Thin film deposition of Ge33As12Se55 by pulsed laser deposition and thermal evaporation: Comparison of properties

Thin films of Ge₃₃As₁₂Se₅₅ were produced using two deposition techniques, ultra-fast pulsed laser deposition (UFPLD) and thermal evaporation (TE), and their properties have been investigated. The chemical composition of the UFPLD films was virtually identical to the composition of the chalcogenide glass targets, whereas the composition of films deposited by TE was significantly different from the target material. Heating of the substrate with a temperature gradient during deposition produced a gradient in composition in both UFPLD and TE films.     

Growth control of stoichiometry in LaMnO3 epitaxial thin films by pulsed laser deposition

We have studied structural, magnetic, and optical transport properties of LaMnO₃ (LMO) thin films grown on SrTiO₃. While the stoichiometric LMO is an insulating antiferromagnet, it tends to be a ferromagnetic insulator when grown as thin films. By exploring the majority of growth parameters, we have found that the bulk-like electronic and magnetic phases can be stabilized by growing thin films under reducing atmospheres and by using more energetic laser processes. These conditions are found to reduce the La deficiency in the film resulting in the greatly improved cation stoichiometry. Since oxides are prone to reduce the oxygen content and to alter the cation ratio under such growth conditions, it suggests that the cation and oxygen stoichiometries in complex oxide thin films can be improved by properly optimizing the growth parameters.     

Stark splitting of the ground state of Er in fluorozirconate glass at low temperature

Optical properties of Er³⁺-doped ZBLAN glass matrix have been studied by luminescence spectroscopy under 488 nm excitation. The spectrum of the ⁴S_3/2⁴I_15/2 transition, carried out at temperature T = 2 K, shows a new line in the lowest energy region. This new line, centered at 17 996 cm⁻¹, was attributed to the lower transition between the Stark components of the ⁴S_3/2⁴I_15/2 transition. Measurements from T = 2 K to room temperature show the disappearance of this new line. From the results we estimate the splitting of 415 cm⁻¹ for the ground state and 100 cm⁻¹ for the ⁴S_3/2 excited multiplet. The experimental result allows us to assign the positions of the eight Stark components of the ground state multiplet of the Er³⁺ in the ZBLAN glass matrix.     

Formation of ultrasmooth thin silver films by pulsed laser deposition

Ultrasmooth thin silver films have been formed on a quartz substrate with a buffer yttrium oxide layer by pulsed laser deposition. The dependence of the surface morphology of the film on the gas (N₂) pressure in the working chamber and laser pulse energy is investigated. It is found that the conditions of film growth are optimal at a gas pressure of 10^?2 Torr and lowest pulse energy. The silver films formed under these conditions on a quartz substrate with an initial surface roughness of 0.3 nm had a surface roughness of 0.36 nm. These films can be used as a basis for various optoelectronics and nanoplasmonics elements.     

Fabrication of nano-crystalline silicon thin film at low temperature by using a neutral beam deposition method

Low temperature (<80 °C) neutral beam deposition (LTNBD) was investigated as a new approach to the fabrication and development of nano-crystalline silicon (nc-Si), which has better properties than that of amorphous silicon (α-Si). The difference between LTNBD and conventional PECVD is that the film formation energy of the nc-Si in LTNBD is supplied by controlled neutral beam energies at a low temperature rather than by heating. Especially, in this study, the characteristics of the nc-Si thin film were investigated by adding 10% of an inert gas such as Ne, Ar or Xe to SiH₄/H₂. Increasing the beam energy resulted in an increase in the deposition rate, but the crystallinity was decreased, due to the increased damage to the substrate. However, the addition of a higher mass inert gas to the gas mixture at a fixed beam energy resulted not only in a higher deposition rate but also in a higher crystallization volume fraction. The high resolution transmission electron microscopy image showed that the grown film is composed of about 10 nm-size grains.     

Properties of Co‐doped ZnO films prepared by electrochemical deposition

We prepared Co‐doped ZnO films by the electrochemical deposition. X‐ray diffraction (XRD), high resolution transmission microscopy (HRTEM), x‐ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), x‐ray absorption near‐edge structure (XANES), vibrating sample magnetometer (VSM), optical absorption, and photoluminescence (PL) measurements were carried out on the samples. The results showed Co atoms substituted Zn atoms in the ZnO lattice without the formation of the impurity phase. VSM measurements showed the ferromagnetic properties for the Co‐doped ZnO samples. When the Co doping concentration increased, the band gaps were widened and the PL peak positions shifted towards the short wavelength direction. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical properties of PbSe quantum dots doped in borosilicate glass

PbSe quantum dots (QDs) were synthesized in borosilicate glass and their optical properties were investigated. The typical quantum confinement effects were clearly observed from the absorption when the average radii of the QDs changed from 1.7 to 3.1 nm. Photoluminescence from PbSe QDs was achieved in 1.1–2.2 μm wavelength region that covers the entire fiber-optic telecommunication window. Borosilicate glasses containing controlled size of PbSe QDs provide potentials for the fiber-optic amplifiers.