InGaAs/GaAs应变量子阱的光谱研究

分别用光致发光谱（PL），光伏谱（PV）及时间分辨谱（TRPL）的方法，测量了应变InGaAs/GaAs单量子阱和多量子阱在不同温度下的光谱，发现单量子阱与多量子阱有不同的光学4性质。多量子阱PL谱发光峰和PV谱激子峰的强度与半高宽都比单量子阱的大，但单量子阱的半高宽随着温度的升高增大很快，这是由激子－声子耦合引起的，通过时间分辨谱研究发现了量子阱子能级之间的跃迁，多量子阱的发光寿命明显比单量子阱的长，我们利用形变势模型对量子阱的能带进行了计算，很好地解释了实验结果。     

Screw misfit dislocations in soft substrates of epitaxial heterostructures

We derive compact analytical formulae for the elastic field induced by an anti-plane mismatch deformation in a heterostructure with different elastic moduli of the constituents. Unlike previous studies, we consider the possibility that the misfit dislocations may appear in the substrate, not in the epilayer. We show that this situation can be realized in heterostructures where the substrate is softer than the epilayer. In order to avoid cumbersome calculations, we consider screw misfit dislocations. The misfit dislocations emerge with zero density away from the interface in the body of the substrate when the epilayer reaches its critical thickness. Thus the epilayer remains free from dislocations if it is grown on a softer substrate. This property, which was recently observed experimentally, may find numerous applications in electronics, where epilayers are widely used as active elements.     

Formation of spin light-emitting diodes based on InGaAs/GaAs heterostructures containing ferromagnetic inclusions

The electroluminescence of light-emitting diodes based on heterostructures with InGaAs quantum wells and a delta 〈Mn〉 doped layer in the GaAs barrier is studied. It is shown that the diodes emit circularly polarized light with the degree of polarization depending on the applied magnetic field and on temperature. We assume that the temperature dependences of the degree of polarization are determined by a change in the mutual position of energy levels of Mn ions in the delta layer and of holes in a quantum well.     

Simulation of the indium profile in InGaAs/GaAs quantum-size heterostructures

A new approach to describe phenomena attendant on the growth of thin InGaAs epitaxial layers by hydride MOCVD in terms of which the boundary gas layer is considered as quasi-liquid is suggested. A numerical model for simulating the concentration profiles of the components in quantum-well heterostructures is developed. It is based on the assumption that a state close to thermodynamic equilibrium exists near the interface. The concentration profiles are simulated by jointly solving equations that describe heterogeneous equilibria and material balance at the interface. The indium profiles in InGaAs/GaAs quantum-size heterostructures are simulated at various parameters of the epitaxy process, such as temperature, initial component ratio in the gas phase, and boundary layer thickness. The results obtained agree well with the available experimental data.     

亚单层InGaAs量子点-量子阱异质结构的时间分辨光致发光谱

测定了亚单层InGaAs/GaAs量子点-量子阱异质结构在5K下的时间分辨光致发光谱.亚单层量 子点的辐射寿命在500 ps 至 800 ps之间，随量子点尺寸的增大而增大，与量子点中激子的 较小的横向限制能以及激子从小量子点向大量子点的隧穿转移有关.光致发光上升时间强烈 依赖于激发强度密度.在弱激发强度密度下，上升时间为 35 ps，纵光学声子发射为主要的 载流子俘获机理.在强激发强度密度下，上升时间随激发强度密度的增加而减小，俄歇过程 为主要的载流子俘获机理.该结果对理解亚单层量子点器件的工作特性非常有用. 关键词： 亚单层 量子点-量子阱 时间分辨光致发光谱     

Two groups of misfit dislocations in GaAs on Si

High-resolution cross-sectional and conventional plan-view transmission electron microscope observations have been carried out for molecular beam epitaxially grown GaAs films on vicinal Si (001) before and after annealing as a function of film thicknesses and observation directions between two orthogonal 110 directions. Two groups of misfit dislocations are characterized at the interface regions between GaAs and Si by analyzing whether their extra half planes exist in the film or the substrate side. Group I misfit dislocations due to stress caused by a lattice misfit between GaAs and Si consist of partial dislocations and 60° and 90° complete dislocations in an as-grown state. With an increase in the film thickness, partial dislocations decrease and complete dislocations increase. After annealing, partial dislocations almost completely disappear and 90° perfect dislocations are predominantly observed. Group II misfit dislocations due to thermal-expansion misfit-induced stress are all 60°-type complete dislocations regardless of film thicknesses and annealing treatment.On leave from Central Research Laboratory, Hitachi, Ltd., Tokyo 185, Japan     

Antiphase disorder in GaAs/Ge heterostructures for solar cells

Antiphase disorder in metal organic vapour phase epitaxy grown GaAs/(100)Ge heterostructures has been studied both in as-grown materials and in GaAs solar cells by chemical etching, transmission electron microscopy, and cathodoluminescence. All the samples are single domains at the surface due to the self-annihilation of antiphase domains whose size decreases as the misorientation angle increases. Completely antiphase domain-free epitaxy has been achieved for substrate miscuts greater than 3 degrees off towards [111]. A reversal in sublattice location has been found in the GaAs layers varying the misorientation angle and the growth temperature. A model to explain this result has been proposed based on the role of surface steps in the nucleation process. Strong interaction between antiphase boundaries and misfit dislocations has been found in all the heterostructures. In solar cells antiphase domains have been observed in high densities in the initial layer of GaAs deposited on Ge. The successful realisation of high efficiency solar cells is due to the overgrowth of these domains by single phase material over most of the wafer area.     

The surface and interface nucleation of misfit dislocations as a possible source of asymmetric strain relaxation in vicinal heterostructures

The surface nucleation of misfit dislocations in vicinal (001) oriented heterostructures with compressive and tensile stresses is discussed. It is shown that beside the asymmetrical stressing of opposite dislocation slip planes due to the vicinal substrate, the surface steps have a similar effect. The effect of the steps has the same-sign asymmetry for a compressive stressed epilayer, but opposite for the tensile case. The effect on dislocation nucleation energy is calculated. For miscut angles used normally, the step energy contribution exceeds that of due to the vicinal substrate. The extension to interface nucleation is treated qualitatively.     

AlSb/GaAs(001)失配位错的高分辨电子显微学研究

用200kV六硼化镧光源的高分辨透射电子显微镜观察了AlSb/GaAs(001)外延薄膜的失配位错,结合解卷处理方法把[110]高分辨电子显微像转换为试样的结构投影图,其分辨率接近电子显微镜的信息极限.根据赝弱相位物体近似像衬理论,通过分析AlSb薄膜完整区解卷像的衬度随试样厚度的变化,确定了哑铃原子对中Al和Sb原子的位置.在此基础上构建出失配位错的结构模型,再结合模拟像与实验像的匹配,确定了AlAs型界面以及Lomer和60°两类失配全位错的核心结构.     

Effect of hydrogen on modulation-doped AlGaAs/InGaAs/GaAs heterostructures: a photoluminescence study

The effect of hydrogen on donors and interface defects in silicon modulation doped Al_xGa_1−xAs/In_yGa_1−yAs/GaAs heterostructures has been investigated by photoluminescence (PL). Hydrogenation was carried out on two sets of samples, one set consists of high quality pseudomorphic heterostructures and another set having partially lattice relaxed structures prone to the defects. On exposure of high quality pseudomorphic structures to hydrogen plasma above 150 °C, a significant blue shift in the PL peak positions as well as bandwidth narrowing is observed. This indicates, the reduction in two-dimensional electron gas in the In_yGa_1−yAs quantum well due to hydrogen passivation of silicon donors in the Al_xGa_1−xAs supply layer. The reactivation of the donors is observed upon annealing the hydrogenated sample for 1 h at 250 °C under hydrogen ambient. Another interesting feature is a significant improvement in the PL of lattice-relaxed structures upon hydrogenation of the samples above 250 °C, which is attributed to the hydrogen passivation of interface defects due to the misfit dislocations.     

Generation and evolution of partial misfit dislocations and stacking faults in thin-film heterostructures

An analysis is made of the specific features in the generation and evolution of partial misfit dislocations at the vertices of V-shaped configurations of stacking fault bands, which terminate in the bulk of the growing film at 90° partial Shockley dislocations. The critical thicknesses h _c of an epitaxial film, at which generation of such defect configurations becomes energetically favorable, are calculated. It is shown that at small misfits, the first to be generated are perfect misfit dislocations and at large misfits, partial ones, which are located at the vertices of V-shaped stacking-fault band configurations emerging onto the film surface. Possible further evolution of stacking-fault band configurations with increasing film thickness are studied.     

Excitation energy dependence of the optical properties of InGaAs/GaAs quantum well heterostructures

Il Nuovo Cimento D - We report an experimental study on a large set of InGaAs/GaAs quantum well structures by means of continuous-wave photoluminescence and photoluminescence excitation. The...     

Dependence of the heavy-hole exciton reduced mass on quantum-well size in InGaAs/GaAs heterostructures

We present low temperature photoluminescence investigations of the exciton ground state of In_0.14Ga_0.86As/GaAs quantum wells (QW) in the presence of pulsed magnetic fields up to 50 T. The exciton in-plane reduced mass and the heavy-hole in-plane mass are determined from the best fit of theoretical calculations to the magnetic field dependence of PL peaks. When the QW thickness decreases, their masses increases due to valence-band mixing effect.     

Triple-period partial misfit dislocations at the InN/GaN (0001) interface: A new dislocation core structure for III-N materials

The lattice-misfit InN/GaN (0001) interface supports a triangular network of α-core 90° partial misfit dislocations. These misfit dislocations provide excellent strain relief. However, in their unreconstructed form the dislocation contains numerous high-energy N dangling bonds, which must be eliminated by reconstructing the dislocation core. Existing single-period (SP) and double-period (DP) dislocation reconstruction models eliminate these dangling bonds via a like-atom dimerization, such as N-N dimers. However, we show that these N–N dimers are unstable for the III-N materials, so an entirely new reconstruction mechanism is needed. A “triple-period” (TP) structural model is developed which eliminates N dangling bonds via the formation of N vacancies instead of N-N dimers. The model contains no N–N (or III–III) bonds, fully bonds all N atoms to four group-III neighboring atoms, and satisfies the “electron counting rule” by transferring charge from In dangling bonds to Ga dangling bonds.